The MOS Transistor - Dronacharya College of...

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Transcript of The MOS Transistor - Dronacharya College of...

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The MOS Transistor

Polysilicon Aluminum

JFET – Junction Field Effect Transistor MOSFET - Metal Oxide Semiconductor Field Effect Transistor n-channel MOSFET (nMOS) & p-channel MOSFET (pMOS)

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The MOS Transistor

n+ n+

p-substrate

Field-Oxide

(SiO 2 )

p+ stopper

Polysilicon

Gate Oxide

Drain Source

Gate

Bulk Contact

CROSS-SECTION of NMOS Transistor

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Switch Model of NMOS Transistor

Gate

Source (of carriers)

Drain (of

carriers)

| VGS |

| VGS | < | VT | | VGS | > | VT |

Open (off) (Gate = ) Closed (on) (Gate = )

Ron

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Switch Model of PMOS Transistor

Gate

Source (of carriers)

Drain (of carriers)

| VGS |

| VGS | > | VDD – | VT | | | VGS | < | VDD – |VT| |

Open (off) (Gate = ) Closed (on) (Gate = )

Ron

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MOS transistors Symbols

D

S

G

D

S

G

G

S

D D

S

G

NMOS Enhancement NMOS

PMOS

Depletion

Enhancement

B

NMOS with Bulk Contact

Channel

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JFET and MOSFET Transistorsor

L = 0.5-10 mm W = 0.5-500 mm SiO2 Thickness = 0.02-0.1 mm

Device characteristics depend on L,W, Thickness, doping levels

Symbol

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MOSFET Transistor Fabrication Steps

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Building A MOSFET Transistor Using Silicon

http://micro.magnet.fsu.edu/electromag/java/transistor/index.html

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It is done. Now, how does it work?

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n-channel MOSFET Basic Operation

Operation in the Cutoff region

Schematic

pn junction: reverse bias

iD=0

for vGS<Vt0

When vGS=0 then iD=0 until vGS>Vt0 (Vt0 –threshold voltage)

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n-channel MOSFET Basic Operation

Operation in the Triode Region

For vDS<vGS-Vt0 and vGS>Vt0 the NMOS is operating in the triode region

Resistor like characteristic (R between S & D, Used as voltage controlled R)

For small vDS, iD is proportional to the excess voltage vGS-Vt0

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n-channel MOSFET Basic Operation

Operation in the Triode Region

2

02DSDStGSD

vvVvKi

2

KP

L

WK

Device parameter KP for NMOSFET is 50 mA/V2

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n-channel MOSFET Basic Operation

Operation in the Saturation Region (vDS is increased)

Tapering of the channel - increments of iD are smaller when vDS is larger When vGD=Vt0 then the channel

thickness is 0 and

2

0tGSDVvKi

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n-channel MOSFET Basic Operation

Example 12.1

An nMOS has W=160 mm, L=2 mm, KP= 50 mA/V2 and Vto=2 V. Plot the drain current characteristic vs drain to source voltage for vGS=3 V.

2

KP

L

WK

2

02DSDStGSD

vvVvKi

2

0tGSDVvKi

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n-channel MOSFET Basic Operation

Characteristic

2

DSDKvi

Example 12.1

Channel length modulation

id depends on vDS in saturation region

(approx: iD =const in saturation region)

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p-channel MOSFET Basic Operation

It is constructed by interchanging the n and p regions of n-channel MOSFET.

Symbol Characteristic

How does p-channel MOSFET operate? -voltage polarities -iD current -schematic

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MOS FIELD-EFFECT TRANSISTORS

(MOSFETs)

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MOSFET Operation

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The MOS System under external

bias

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