Complimentary Metal Oxide Semiconductor (CMOS)

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TMEC R&D Present & Beyond Complimentary Metal Oxide Semiconductor (CMOS) This type of products includes all circuits that are made from CMOS silicon. This kind of circuit has been widely used to the extent where we can say that 90 percent of the manufactured semiconductor circuits in the industry are appliances or circuits that consist of CMOS silicon. A CMOS circuit consists of PMOS and NMOS. The industrial production of CMOS silicon circuits with the track the size of which is 0.8 micron can be counted as a successful step of TMEC. Although the current technology in the world has enabled the production of the circuit with the track the size of which is 65 nanometers, the foundation of the production of the two types of circuits is the same. The aspects that differentiate the production of the 65-nanometer tracked circuit from the other are the complication of the creation of the tracks; the gap between the two lines which is smaller; and the new chemical substances, such as metal gate, used in the production. TMEC offers IC design and small volume wafer fabrication service. TMEC facilities are: Design softwares: EDA tools including Cadence IC design environment, Tanner EDA tools, and Xilinx ISE Foundation Process and device simulation software: Sentaurus TCAD tools 150mm silicon wafer production line for 0.5 μm CMOS technology Mask making facilities Measurement and analysis tools

Transcript of Complimentary Metal Oxide Semiconductor (CMOS)

Page 1: Complimentary Metal Oxide Semiconductor (CMOS)

TMEC R&D Present &

Beyond

Complimentary Metal Oxide Semiconductor (CMOS)

This type of products includes all circuits

that are made from CMOS silicon. This

kind of circuit has been widely used to the

extent where we can say that 90 percent of

the manufactured semiconductor circuits in

the industry are appliances or circuits that

consist of CMOS silicon. A CMOS circuit

consists of PMOS and NMOS.

The industrial production of CMOS silicon

circuits with the track the size of which is 0.8

micron can be counted as a successful step of

TMEC. Although the current technology in the

world has enabled the production of the circuit

with the track the size of which is 65

nanometers, the foundation of the production of

the two types of circuits is the same. The

aspects that differentiate the production of the

65-nanometer tracked circuit from the other are

the complication of the creation of the tracks;

the gap between the two lines which is smaller;

and the new chemical substances, such as metal

gate, used in the production.

TMEC offers IC design and small

volume wafer fabrication service. TMEC

facilities are:

• Design softwares: EDA tools including

Cadence IC design environment,

Tanner EDA tools, and Xilinx ISE

Foundation

• Process and device simulation software:

Sentaurus TCAD tools

• 150mm silicon wafer production line

for 0.5 µm CMOS technology

• Mask making facilities

• Measurement and analysis tools