quantum dots Continuous flow purification of …Supporting Information Continuous flow purification...
Transcript of quantum dots Continuous flow purification of …Supporting Information Continuous flow purification...
Supporting Information
Continuous flow purification of nanocrystal
quantum dots
Duckjong Kim,* †, §, Hye Kyung Park†, Hyekyoung Choi†,§, Jaehong Noh†, Kyungnam Kim†,
and Sohee Jeong,* †,§
†Department of Nano Mechanics, Korea Institute of Machinery and Materials (KIMM),
Daejeon 305-343, South Korea.
§Korea University of Science and Technology (UST), 206 Gajeong-ro, Daejeon 305-350,
South Korea.
* To whom correspondence should be addressed, [email protected], [email protected]
Electronic Supplementary Material (ESI) for Nanoscale.This journal is © The Royal Society of Chemistry 2014
Microfluidic Chip Fabrication
Si wafer dry etching
Si-Si direct bonding
/ Thermal bonding
Electrode patterning
on glass wafer
Glass wafer sand
blasting
Si-glass anodic
bonding
A A’
A A’
glass
glass
Si
Si
electrode (Cr/Au)
electrode (Cr/Au)
cross-sectional view
Figure S1: Fabrication process and fabricated microfluidic chip.
QD size analysis
Before electrophoretic purification After electrophoretic purification
A B
Figure S2. TEM micrographs of the CdSe QDs before (A) and after (B) electrophoretic purification at 50 V. CdSe QDs before and after our process are 5.10±0.64 nm and
5.10±0.61 nm in diameter respectively.
The effect of the solution environment (dilution) on removal of ligands
Figure S3. ATR-FTIR spectra of CdSe QDs capped with oleate before (blue line) and after
(red line) 100 fold dilution by hexane.