Femtosecond laser microfabrication and micromaching in ...

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Femtosecond laser microfabrication and micromaching in materials micromaching in materials Prof. Dr. Cleber R. Mendonca

Transcript of Femtosecond laser microfabrication and micromaching in ...

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Femtosecond laser microfabrication and micromaching in materials micromaching in materials

Prof. Dr. Cleber R. Mendonca

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University of Sao Paulo - Brazil

Sao Carlos

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University of Sao Paulo, Sao Carlos

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Instituto de Física de São Carlos

Professors: 72

Employers: 173Employers: 173(technical and administration)

Students: 600 (undergrad)( g )105 (master)170 (phD)

Several research areas in Physicsand Material Sciences

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Photonics GroupsPhotonics Groupspp

research areas

• study of optical nonlinearities in organic materials

• optical storage and surface relief gratings in azopolymers

• coherent control of light matter interaction

• fs-laser microfabricationfs laser microfabrication

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70 ps Q-switch/modelocked laser (532/1064 nm)

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150 fs Ti:sapphire amplifier

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40 fs Ti:sapphire amplifier

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20 fs laser oscillator

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microfabrication laboratory

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Femtosecond laser microfabrication in polymers polymers

Prof. Dr. Cleber R. Mendonca

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laser microfabrication

focus laser beam on material’s surface

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laser microfabrication

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laser microfabrication

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laser microfabrication

surface microstructuring

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fs-micromachining

photon energy < bandgap

nonlinear interaction

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fs-micromachining

nonlinear interaction

Egap

Ef = hν

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fs-micromachining

nonlinear interaction

Egap

Ef = hν

multiphoton absorptionp p

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fs-laser microfabrication

focus laser beam inside material

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fs-laser microfabrication

curved waveguides inside glass

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fs-micromachining

it is important to understand the nonlinearinteraction, as well as the nonlinear responseof materials

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Outline

introduction

fs-micromachining

microstructuring MEH-PPVg

waveguides in azopolymers

micromachining living cellsmicromachining living cells

superhydrophobic surfaces

two-photon polymerization

birefringent microstructures

fluorescent microstructures

optical circuiting

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Nonlinear Optics

E ~ Ehigh light intensity

Erad. Einter.

anharmonic oscillator

nonlinear polarization response

...EEEP )()()( +χ+χ+χ= 33221

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Multi-photon absorption

,...,, )7()5()3( χχχ

432 +++++= IIII αααβαα ...5430 +++++= IIII αααβαα

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Two-photon absorption

)( 3χThird order processes

2ω ω

ω

ance

abso

rba

Iβαα += 0 wavelength0 wavelength

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Two-photon absorption

Nonlinear interaction provides spatial confinement of the excitation

fs-microfabrication

0αα = Iβαα += 0

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Two-photon absorption

spatial confinement of excitation

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femtosecond pulses

Ti:Sapphire lasers 1 fs = 10-15 s

100 fs 50 fs 20 fs

E1 ms

1 KHz

Repetition rate

mJ

Energy

100 fs

1 KHz

12 ns

86 MHz nJ100 fs

86 MHz nJ

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femtosecond pulses

amplified laser oscillator

repetitive cumulative

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fs-micromachining

the longer the irradiation the longer the radiusthe longer the irradiation the longer the radius

silicasilica

E Mazur Harvard UniversityE. Mazur – Harvard University

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fs-micromachining: focusing

NA = 0.12

μ = 7o

NA = 0.34

μ = 20o

NA = 0.87

μ = 60o

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what is the difference ?

21 NAw −=λ

0 1 NANA

w =π

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very different confocal lenght/interaction length

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fs-micromachining

microfabrication can be controlled by

• objective NA

• number of pulses – scanning speed

• pulse energy

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two main techniques

• fs-laser micromachining

• microfabrication via two-photon polymerization

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fs-laser micromaching

Surface Volume

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fs-pulses for micromachining polymers

Oscillator: 80 MHz 5 nJ

polymers

Oscillator: 80 MHz, 5 nJ

heat diffusion time: tdiff ~ 1 μs

cumulative

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Micromachining the conductive polymer MEH-PPV

optical microscopyoptical microscopy

a: 0.07 nJb: 0.14 nJc: 0.34 nJ d: 0.68 nJ

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Micromachining the conductive polymer MEH-PPV

aaa 0.3 nJ

atomic force microscopy

bbb 2 0 nJ

py

bbb 2.0 nJ

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Micromachining the conductive polymer MEH-PPV

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Waveguides in azo-polymers

DO3

N N NO2H2N N N NO2H2N

H2CHO H2CN N NO2N

Cl

H C H C

H2CHO H2CN N NO2N

Cl

H C H C

DR13H3C H2CH3C H2C

H3C H2C

H2CHO H2CN N NO2N

H3C H2C

H2CHO H2CN N NO2N

DR13 23 2

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Waveguides in azo-polymers

(a) Optical microscope image of the waveguides micromachined (PMMA/DR1)

(b) Cross-sectional view of the waveguides

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waveguides in azo-polymers

(c) Output image of the mode profile of 632.8-nm light coupled through the waveguide

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Subcellular surgery

I. Maxwell, E. Mazur – Harvard University

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Subcellular surgery

I. Maxwell, E. Mazur – Harvard University

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microstructuring polymer: super hydrophobic surface

CCDCCD

lens

Pockelscell ps-laser

mirror cell

objectiveobjective0.65 NA

samplesample

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microstructuring polymer: super hydrophobic surface

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laser microfabrication: super hydrophobic surface

examples of fabricated surfaces

20 μm

40 μm

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laser microfabricationlaser microfabrication: super hydrophobic surface

Superhydrophobic surfacesSuperhydrophobic surfaces

flat surface microstructured surface

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microstructuring polymer

flat surfaceflat surface

θ = 118º

i t t d fmicrostructured surface

θ = 160ºθ 160

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fs-laser microfabrication

Novel concept:

build a microstructure using fs-laser and nonlinear optical processes

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two-photon polymerization

applicationsapplications

• micromechanics• micromechanics

• waveguideswaveguides

• microfluidics

• biology

• optical devices

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Two-photon polymerization

Monomer + Photoinitiator → Polymer

light

Photoinitiator is excited by two-photon absorption

22 IR PA ∝

The polymerization is confinedto the focal volume.

High spatial resolution

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Two-photon polymerization

bellow the diffraction limit

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Two-photon polymerization

even higher spatial resolution

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Two-photon polymerization setup

Laser Ti:sapphire laser oscillator

ScanningMi

• 130 fs• 800 nm • 76 MHz

y

BeamExpansion

Mirror 76 MHz• 20 mW

x

CCDcamera

resinspacer

glass (150 micron)

glass (150 micron)Objective

Objective

40 x

Illumination

40 x0.65 NA z

Illumination

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Two-photon polymerization

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Resin preparation

Monomer A Monomer B

Monomers

Monomer A Monomer B

reduces the shrinkage upon polymerization gives hardness to the polymeric structure

Ph t i iti tPhotoinitiator

Lucirin TPO-L

Appl. Phys. A, 90, 633–636 (2008)

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Two-photon polymerization

polymer

30 µm x 30 µm x 12 µm cube

polymer

30 µm x 30 µm x 12 µm cube

glass

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Two-photon polymerization

After the fabrication, the sample is immersed inethanol to wash away any unsolidified resin andethanol to wash away any unsolidified resin andthen dried

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two-photon polymerization

photonic crystal – J. W. Perry

20 µm

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Two-photon polymerization

Microstructures fabricated by two-photon polymerizationpolymerization

50 μm50 μm50 μm

20 µm 20 μm20 μm20 μm20 µm

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Microstructures containing active compounds

monomer monomer

O ti l ti dOptical active dyeActive Polymer

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Applications of two-photon polymerization

Optics and PhotonicsOptics and PhotonicsDoping microstructures with organic molecules and metals

fluorescencefluorescencebirefringenceconductivity

Bio-applicationsppFabrication using bio-compatible resins to biological applications

tissue engineering scaffoldstissue engineering scaffoldsfabrication of microneedlecell study

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Other studies

• microstructures for optical storage – birefringence

r dyeprr dyepr

NN

NN

NN

dyepr dye

φ

Light RelaxNN

NN

NN

NN

NN

NN

dyepr dye

φ

Light Relax

Er

Er

φ

trans cis trans

Er

Er

φ

trans cis trans

J. Appl. Phys., 102, 13109-1-13109-4 (2007)

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Other studies

• microstructures for optical storage – birefringence

Ar+ ion laser irradiation

• 514.5 nm• one minute

i t it f 600 W/ 2• intensity of 600 mW/cm2

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Other studies

• microstructures for optical storage – birefringence

The sample was placed under an optical microscope between crossed polarizers and its angle was varied with respect to the polarizer angle

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Other studies

• microstructures for optical storage – birefringence

J. Appl. Phys., 102, 13109-1-13109-4 (2007)

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Microstructures containing MEH-PPV

MEH-PPVMEH PPV

FluorescenceEl t L i tElectro Luminescent

Conductive

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Microstructure containing MEH-PPV

Appl. Phys. Lett., 95 1133091-3 (2009)

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Microstructure containing MEH-PPV

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Microstructure containing MEH-PPV

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Microstructure containing MEH-PPV

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Microstructure containing MEH-PPV

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Microstructure containing MEH-PPV

(a) Scanning electron microscopy

(b,c) Fluorescence microscopy of thei t t ith th it timicrostructure with the excitation

OFF (b) and ON (c)

(d) Emission of the microstructure (blackli ) d f fil ith thline) and of a film with the samecomposition (red line)

Appl. Phys. Lett., 95 1133091-3 (2009)

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Microstructure containing MEH-PPV

Fluorescent confocal microscopyimages in planes separated by 16μm in the pyramidal microstructure.

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Microstructure containing MEH-PPV

D h idi i th i t t ?Do we have waveguiding in the microstructure ?

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Microstructure containing MEH-PPV

D h idi i th i t t ?Do we have waveguiding in the microstructure ?

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Microstructure containing MEH-PPV

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Microstructure containing MEH-PPV

Appl. Phys. Lett., 95 1133091-3 (2009)

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Microstructure containing MEH-PPV

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Microstructure containing MEH-PPV

waveguiding of the microstructure fabricatedon porous silica substrate (n= 1.185)

Applications: micro-laser; fluorescent microstructures; conductive microstructures

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3D cell migration

• 3D cell migration studies in micro-scaffolds SEM of the scaffolds

110 µm pore size

52 µm pore size

Top view

110, 52, 25, 12 µm pore size

Side view

25, 52 µm pore size

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3D cell migration

50 μm pore size

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3D cell migration

110 μm pore size

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3D cell migration

12 μm pore size

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3D cell migration

52 μm pore size

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3D cell migration

• 3D cell migration studies in micro-scaffolds

Advanced Materials, 20, 4494-4498 (2008)

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Optical circuitp

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Optical circuitp

• microfabrication

• silica nanowires

• coupling microstructures

50 μm

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Silica nanowires

nanowires fabrication processnanowires fabrication process

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Silica nanowires

nanowires fabrication processnanowires fabrication process

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Silica nanowires

nanowires fabrication processnanowires fabrication process

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Silica nanowires

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Silica nanowires

1

70 μm

1 μm

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Silica nanowires

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Silica nanowires

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Silica nanowires

coupling light into nanowirescoupling light into nanowires

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Silica nanowires

coupling light into nanowirescoupling light into nanowires

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Silica nanowires

coupling light into nanowirescoupling light into nanowires

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Silica nanowires

coupling light into nanowires

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Silica nanowires

coupling light into nanowires

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Silica nanowires

coupling light into nanowires

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Silica nanowires

Poynting vector for 800 nm nanowires

Opt. Express 12, 1025-1035 (2004)

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Silica nanowires

Poynting vector for 800 nm nanowires

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Silica nanowires

Poynting vector for 600 nm nanowires

Opt. Express 12, 1025-1035 (2004)

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Silica nanowires

Poynting vector for 600 nm nanowires

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Silica nanowires

Poynting vector for 400 nm nanowires

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Silica nanowires

Power fraction in the core of the nanowires

Opt. Express 12, 1025-1035 (2004)

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Silica nanowires

Manipulating the nanowiresg

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Silica nanowires

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Silica nanowires

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Silica nanowires

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Silica nanowires

coupling light into nanowires

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Silica nanowires

coupling light into nanowires

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Silica nanowires

coupling light into nanowires

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Outline

• microfabrication

• silica nanowires

• coupling microstructures

50 μm

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Coupling microstructures

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Coupling microstructures

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Coupling microstructures

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Coupling microstructures

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Coupling microstructures

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Coupling microstructures

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Coupling microstructures

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Silica nanowires

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Coupling microstructures

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Coupling microstructures

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Coupling microstructures

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Coupling microstructures

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Coupling microstructures

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Summaryy

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Acknowledgments

FAPESPCAPESCNPq

NSFNSFARO

www.fotonica.ifsc.usp.brwww.fotonica.ifsc.usp.br

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Thank you !

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