chappp5

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5.2 Principles of Chemical Vapor Deposition Figure 5.1 Figure 5.2 Figure 5.3 5.3 Experimental Approach

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Transcript of chappp5

  • 5.2 Principles of Chemical Vapor Deposition

    Figure 5.1

    Figure 5.2

    Figure 5.3

    5.3 Experimental Approach

  • 5.3.1 Chemical Vapor Deposition (CVD)

    5.3.2 Chemical Vapor Condensation (CVC)

    Figure 5.4

    5.3.3 ParticlePrecipitationAided Chemical Vapor Deposition

    Figure 5.5

    Figure 5.6

    5.3.4 Catalytic Chemical Vapor Deposition

  • Figure 5.7

    5.4 Examples of Nanostructured Materials

    5.4.1 Semiconductor Quantum Dots

    5.4.1.1 Temperature Dependencies

    Figure 5.8

    5.4.1.2 Variation with AsH3 Partial Pressure

    Figure 5.9

    5.4.1.3 Variation with Surface Structure

    n

    Figure 5.10

  • Figure 5.11T T

    5.4.2 Ceramic Nanostructured Materials

    5.4.2.1 Oxides

    Figure 5.12

    5.4.2.2 Carbides

    Figure 5.13

  • Figure 5.14

    Figure 5.15

    5.4.2.3 Nitrides

    Figure 5.16

    x y

  • x y

    5.4.3 Carbon Nanotubes

    5.4.3.1 Dense Substrate

    Figure 5.17

    Figure 5.18

  • 5.4.3.2 Porous Substrate

    Figure 5.19

    Figure 5.20

  • Figure 5.21

    5.4.3.3 UltraFine Powder Substrates

    5.4.4 Diamond

    5.4.4.1 Kinetic Approach

    5.4.4.2 Formation Mechanism

    5.4.4.3 Enhancement of Diamond Formation

    Figure 5.22

  • Figure 5.23

    Figure 5.24

    5.5 Summary

    References