Gpdk090 Drm
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1 HsinChu December 5, 2012 ITRS - YE ITWG Conference in HsinChu December 5, 2012 Lothar Pfitzner [email protected].
1 Makuhari Messe December 3, 2010 ITRS - YE ITWG Conference in Makuhari Messe (Japan) December 3, 2010 Lothar Pfitzner [email protected].
2 data preparation process
Gpdk090_DRM.pdf
Nanoimprint lithography (NIL) 1.Overview. 2.Thermal NIL resists. 3.Residual layer after NIL. 4.NIL for large features (more difficult than small one).
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