Vertex detector for the KEK B factory upgrade
description
Transcript of Vertex detector for the KEK B factory upgrade
Vertex detector for the KEK B
factory upgrade
Toru Tsuboyama (KEK) 1 March 2008 Instr08 Novosibirsk
Introduction
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Super Belle detector (LoI ‘04)
SC solenoid1.5T
New readout and computing systems
Aerogel Cherenkov counter + TOF counter
/ KL detection 14/15 lyr. RPC+Fe tile scintillator
CsI(Tl) 16X0 pure CsI (endcap)
“TOP” + RICH
Tracking + dE/dx small cell + He/C2H6remove inner lyrs. use fast gas
Si vtx. det. 4 lyr. DSSD 2 pixel/striplet lyrs. + 4 lyr. DSSD
Purpose of the Silicon Vertex Detector SVD reconstructs two vertices
of B decay. B flight length ~ 200 m.
The CP violation parameters are extracted from the distribution of distance between two vertices.
Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
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Belle 2005
J/
KSe e
Decay time difference
t
Belle SVD (4 layer)
50 cm
20 cm
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Super KEKB upgrade The present KEKB has established the CP violation in
the framework of the Standard Model by using ~1 ab-1 of data.
Further investigations needs 10-50 ab-1 data. Examination of the unitarity of the CKM matrix. Measurement of the CP violation phase coming from Penguin
diagrams. Rare decay of the B mesons, charmed mesons and lepton flavor
violation of . Any deviation from the standard model prediction
suggests existence of new phenomena such as SUSY. A Super B factory with L=1035-1036/cm2/sec is
necessary. Measurements by LHC and Super B factory
experiments are complementary.1 March 2008
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Current SVD
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Present SVD
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Has been working since 2003 Autumn. 4 layer DSSD ladders are read out with VA1TA
chips.
DSSDs Kapton flex circuit VA1TA
r = 2.0, 4.35, 7.0, 8.8 cm
Limitations of the present SVD
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Readout ASIC: VA1TA VA1 is an excellent ASIC designed for the KEK B factory. Each event causes a dead time of about 30 sec. 5 % dead time at 1.6 KHz trigger rate. No problem at the current trigger rate of
500 Hz. Hit occupancy of the innermost layer.
KEKB luminosity exceeded the design value. So do the beam backgrounds entering to
SVD. At occupancy larger than 10 %, vertexing
performance will be deteriorated significantly.
Shaping time of VA1TA, 0.8 sec, is longer than that of modern readout chips.
Four layer design. Vertexing and self tracking is possible,
though, the redundancy is minimum.
Occupancy in the first layer
Hit fi
ndin
g effi
cienc
y
Our choice
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6 layer For robust vertexing and tracking
Outer radius: 14 cm High Ks reconstruction efficiency
Inner radius: 1.0 cm For better vertex resolution.
Readout chip: APV25 Reduction of occupancy from beam
background. Pipelined readout to reduce readout
dead time. Sensor of the innermost layer:
Normal DSSD Short-strip DSSD Pixel sensors Depends on the available technology
Background is proportional to the sensitive area per channel.
Design philosophy of the upgrade SVD
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Requirements from physics To reconstruct vertices of two B mesons with ~100 m
resolution. Reconstruct slow pions decaying from D*. Lager radius in order to improve Ks reconstruction efficiency. Better impact parameter resolution would result in better
suppression of continuum events. Constraints
Ready for physics at the Super KEK B factory commissioning Immunity to the expected backgrounds from the accelerator. Effects of material should be carefully evaluated and
minimized. Data acquisition
Should work efficiently at the luminosity goal of ~1036/cm2/sec. Pipelined readout to minimize the dead time. Negligible dead time at 10 kHz average trigger rate.
Detector configuration
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6 layers for robust tracking. R=1.0 cm beam pipe. First layer R=1.3 cm. Outermost layer: R=14 cm.
Acceptance of Ks is increase by 15 %. Slanted sensors: Reduce sensor area and number of
readout channels. Material is also saved.
r =150mm(cm
)
17°
Readout system
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Readout with APV25 ASIC Developed for CMS Silicon tracker. Shaping time of the preamplifier: 50 nsec
Occupancy: 1/16 compared with VA1TA (800 nsec).
Operated with 40MHz clock 192 stage pipeline (~4 µsec trigger latency) Up to 32 readout queues 128 ch analog multiplexing (3 µsec@40 MHz) Dead time: negligible at expected trigger rate of
10 kHz
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ShaperInverterpreamp192 stageAnalog Pipeline (4 µsec)
Analog output
Trigger
128 channel Multiplexer (3 µsec)
Noise= (246 + 36/pF) @50nsec
Hit timing reconstruction KEK B-Factory: 2 nsec bunch
crossing Built-in deconvolution filter (assuming
the LHC 25 nsec bunch crossing) can not be used.
Hit time reconstruction Read out 3, 6 … slices in the pipeline. Extract the hit timing information
from the wave form. Proved in beam tests: Resolution
~ 2 nsec.
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ShaperTrigger
APV25 readout system
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Readout scheme suitable for Belle has been developed: Hybrid, Repeater system, FADC and DAQ.
Series of beam test has been done by in order to understand APV25 and to accumulate experiences.
Nov. 2007: The first experiment at the KEK new test beam line. Demonstration of the new DSSD
sensor, hybrid, repeater and FADC. CM subtraction, cluster search and
hit-time reconstruction done in FPGA is tried.
Poster presentation by Vienna HEPHY group in this conference.
Chip-on-sensor concept
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Chip-on-sensor readout
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APV25 has a steeper noise slope than VA1TA VA1TA Noise=(180+7.5/pF) e / APV25 Noise=(180+
36/pF) e Several DSSDs can be read out with one VA1TA hybrid. In case of APV25, a DSSD should be readout by one hybrid.
Chip-on-sensor concept. Mounting APV25 chips directly on sensors. Increase of material due to not only chip itself but also
support and cooling structure should affect the vertex performance.
Effects of material increase In order to evaluate the performance of 6 layer SVD with APV25
chip-on-sensor design, intensive simulations have been done. Results have been reported in the workshop by A. Kibayashi.
Conclusions are Chip on sensor readout for the innermost 2 layers would deteriorate the
vertex performance. Material increase in layer 3-6 does not reduce the vertex performance
significantly. High-multiplicity events (D+D-) is especially sensitive to material. BK* is special as only Ks can be used to estimate the B decay vertex.
Efficiency improves thanks to layers 5 and 6.
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Bench mark B+ - BJ/Ks BD+D- BK*No “chip-on-sensor”
=31 m =38.7 %
=36 m =24.9 %
=43 m =13.2 %
=127 m
“chip-on-sensor” inLayers 1 and 2
=34 m =38.3 %
=40 m =24.6%
=51 m =12.7 %
“chip-on-sensor” inLayers 3 and 4
=31 m =38.1 %
=36 m =24.5 %
=42 m =12.6 %
=137 m (T. Hara)
DSSD and pixel sensor R&D
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DSSD
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HPK stopped DSSD production. Single sided sensors are too thick to be
used in e+e- B factories. New DSSD sources
Micron semiconductor, UK. Experienced with Babar, LHCb, CDF, D0 …. Can produce 300 m-thick DSSDs from 6”
diameter wafers Design flexibility. Tata institute (Belle collaborator)
Produced single-sided sensors for the CMS experiment.
DSSD production is in progress with a foundry in Bangalore.
The sample will be available in April or May. Kyumpook Univ. (Belle collaborator)
AC-coupled single-sided and DC coupled double-sided sensors are now under evaluation.
Design of an AC-coupled double-sided sensors are in preparation.
Striplet option The innermost layer suffers
huge beam background. Occupancy reduction by APV25
may not be sufficient By inclining the strips by 45
degrees, strip area per readout channel can be reduced to almost 1 / 4, in expense of 4x readout channels.
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Striplet
Striplet 2003
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Parameters p n
Sensitive area (mm2) 71.0x7.9
Strip length (mm) 10.5Strip pitch (µm) 25.5 (p) 51 (n)
Readout pitch (µm) 51 (p) 51 (n) Num. of readout ch. 1024 1024Bias resistor (M) >10
71 mm7.9 mm
Monolithic pixel sensors
Pixel sensors are the solution to reduce the hit occupancy.
Monolithic pixel sensor should be used. Hybrid sensors are too thick to be used in B factories.
Innermost layer can be replaced with pixel sensor later.
January 2007 submissions. CAP (Hawaii) --- Monolithic Pixel Sensor project
Several iterations have been done. CAP7 --- the concept is implemented in SOIPIX. Binary readout.
SOIPIX (KEK, TIT et al.) Continuous amplifier, time-over-threshold and simple digital pipeline is implemented.
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CAP7
Summary
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SVD construction schedule
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The SVD upgrade kick-off meeting
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20 Feb 2008, just before this BPAC. Summary of the 3 to 4 years R&Ds. Please visit
http://kds.kek.jp/conferenceDisplay.py?confId=865 Today’s presentation is a summary of this meeting.
Overview09:30 Schedule (T. Tsuboyama, KEK)09:40 CDC inner radius (S. Uno, KEK)09:45 Beam pipe (H. Yamamoto, Tohoku)09:55 Overall design (T. Kawasaki, Niigata)10:25 Structure / Ladder (O. Tajima, KEK) Electronics I11:15 Pixel, ASIC ... (G. Varner, Hawaii)11:45 Pixel-- SoI technology (H. Ishino, TIT)DSSD 13:00 HPK/Micron (T.Tsuboyama, KEK)13:10 DSSD in Korea (H. Hyun, Kyungpook)Software14:00 Overview (T. Hara, Osaka)14:20 Demonstration for the Fallback option (Y.Kuroki, Osaka)
14:40 Simulation for Baseline option (A.Kibayashi, KEK)15:00 Pixel Simulation (H. Hoedlmoser, Hawaii)15:10 Tracking for SVD5.1 ? (K.Trabelsi, KEK)15:30 Requirement for Alignment precision (T.Hara, Osaka)Performance study16:00 Outer layer (I) radii (T.Hara for S.Shinomiya, Osaka)16:10 Outer layer (II) S/N and readout ptch (, Niigata)16:20 Material --- ASIC on DSSDs (T.Hara, Osaka)16:30 Readiness of fsim6 (C. Schwanda, Vienna)Electronics II17:00 APV25 and APV25 hybrid (C. Irmler, Vienna)17:10 DAQ overview (M. Friedl / M. Pernicka, Vienna)17:40 Activities in Cracow (H. Palka, INP Cracow)18:00 Monitors (S. Stanic, Nova Gorica)18:20 Diamond radiation monitor (S. Korpar, Ljubljana)