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Transcript of Scanning Microwave Microscopy December 15, 2010 Page 1 Agilent Technologies Agilent Technologies...
Scanning Microwave Microscopy
December 15, 2010Page 1
Agilent Technologies
Scanning Microwave Microscopy (SMM Mode) Electromagnetic materials characterization at high spatial resolution
Scanning Microwave Microscopy
December 15, 2010Page 2
Overview • SMM System – PNA with AFM• Features and Benefits• Microwave Network Analyzer Basics (VNA)
• System overview
•Calibrated capacitance & dopant density
• Beyond SCM, what can be done with SMM - Applications
• Biological samples• Thin films and coatings• Quantum dots/quantum structures• Summary
Scanning Microwave Microscopy
December 15, 2010Page 3
Features & Benefits
• Provides exceptionally high spatial electrical resolution
• Offers highest sensitivity and dynamic range in the industry
• SMM facilitates
– Complex impedance (resistance and reactance)– Calibrated capacitance– Calibrated dopant density– Topography measurements
• Works on ALL semiconductors Si, Ge, III-V and II-VI• Does not require and oxide layer• Operates at multiple frequencies (variable up to 18GHz)
Scanning Microwave Microscopy
December 15, 2010Page 4
What is a Vector Network Analyzer?Vector network analyzers (VNAs)…• Are stimulus-response test systems• Characterize forward and reverse reflection and transmission responses
(S-parameters) of RF and microwave components• Quantify linear magnitude and phase• Are very fast for swept measurements• Provide the highest level
of measurement accuracy
S21
S12
S11 S22
R1 R2
RF Source
LO
Test port 2
BA
Test port 1
Phase
Magnitude
DUT
Reflection
Transmission
Scanning Microwave Microscopy
December 15, 2010Page 5
High-Frequency Device Characterization
TransmittedIncident
TRANSMISSION
Gain / Loss
S-ParametersS21, S12
GroupDelay
TransmissionCoefficient
Insertion
Phase
ReflectedIncident
REFLECTION
SWR
S-ParametersS11, S22 ReflectionCoefficien
t
Impedance, Admittance R+jX
, G+jB
ReturnLoss
, G r,T t
Incident
Reflected
TransmittedRB
A
A
R=
B
R=
Scanning Microwave Microscopy
December 15, 2010Page 6
Scanning Microwave Microscopy (SMM) Basic Idea
Tip and sample form a capacitor
Measuring C yields er
C = e0 er A/d
Actuator
Capacitance
C ~ fF
Capacitance bridges too slow
Integration times of several seconds not practical for imaging
Scanning Microwave Microscopy
December 15, 2010Page 7
System Overview
Coaxial cable
Network Analyzer
• Network analyzer sends an incident RF signal to the tip through the diplexer• RF signal is reflected from the tip and measured by the Analyzer• Magnitude & phase of the ratio between the incident & reflected are calculated• Apply a model to calculate the electrical properties• AFM scans and moves tip to specific locations to do point probing
Scanning AFM in X and Y and Z (closed loop)
Scanning Microwave Microscopy
December 15, 2010Page 8
Compatible with Agilent 5420 & 5600LS AFM/SPM
5420 AFM 5600LS AFM
Scanning Microwave Microscopy
December 15, 2010Page 9
Sub 7 nm Conductive tip development
Alumina CarrierAgilent Precision Machining and ProcessTechnologies to deliver RF/MW to the conductive tip
Pt/Ir Cantilever
Scanning Microwave Microscopy
December 15, 2010Page 10
Simultaneous Imaging of Topography, Capacitance, and dC/dV
Scanning Microwave Microscopy
December 15, 2010Page 11
PNA Controls from PicoView
Scanning Microwave Microscopy
December 15, 2010Page 12
Calibration staircase sample (collaboration with National Institute of Standards
and Technology, NIST)
10 micronSILICON
SILICONOXIDE
METAL
TOP VIEW
SIDE VIEW
60 mm
50mm
20
0 n
m
Gold caps on SiO2 „staircase“ on Si.AFM topography 3D view (left) and schematic overview (right).
Capacitance calibration
SILICON
SILICONOXIDE
METAL
TOP VIEW
SIDE VIEW
60 mm
50mm
20
0 n
m
C2
C1
2*
1
CAd
signal
Transfer Function: S11 signal [dB] capacitance [F]
Scanning Microwave Microscopy
December 15, 2010Page 13
0
8
16
4
12
dB
10µm
Sample: „NIST2“ staircase with goldcaps
Capacitance Calibration
Capacitance (amplitude)
SILICON
SILICONOXIDE
METAL
TOP VIEW
SIDE VIEW
60 mm
50mm
20
0 n
m
C2
C1
Scanning Microwave Microscopy
December 15, 2010Page 14
Capacitance Calibration
2*
1
CAd
signal
Scanning Microwave Microscopy
December 15, 2010Page 15
Enhancing the Sensitivity
DPMM approach:
Use the Flatband transfer function as
AM mixer to modulate the reflected MW signal at the rate of drive frequency (<100 KHz).
The AM modulation amplitude is function of the dopant density.
0
011 ZZ
ZZS
L
L
k
A B
LO LO
A/D A/D
Source
Probetip
Sample
Sca
nne
r
Coupler Coupler Wave-guide
Agilent PNA AFM
Agilent DPMM
LF AC Bias
LFDemodulator
dC/dV Module
Imaging Dopant Density
December 15, 2010Page 16
Scanning Microwave Microscopy
Scanning Microwave Microscopy
December 15, 2010Page 17
Dopant Density calibration with IMEC Standard
Si Wafer
DepositLayers withVarious DopingLevels
Cleave or polish from top to expose the layers
Den
sity (/cm
³)
Depth [µm] 30 20 10 0
101
4 101
7 102
0
1
000
1
0
.00
1
Res
isti
vity
[Ωcm
] 6
5
4
3
1
7
8
2
Spec sheet IMEC calibration sample
edge
bulk
Scanning Microwave Microscopy
December 15, 2010Page 18Page 18
Dopant Density calibration with IMEC Standard dC/dV Amplitudebulk edge
1 2 3 4 5 6 7 8
Scanning Microwave Microscopy
December 15, 2010Page 19
Images of an SDRAM
• Very high sensitivity• Can see semiconductor, insulators and conductors• Can be calibrated• Can also get inductance and reactance
Topography Capacitance dC/dV
Images of SDRAM chip acquired with SMM Mode. The underneath n-type (bright) and p-type doped structure clearly indentified in both capacitance and dC/dV Images (W.Han)
Scanning Microwave Microscopy
December 15, 2010Page 20
SMM Images of SRAM Chip
Topography (A and C) and dC/dV (B and D) images of SRAM. C and D are zoomed scans on one of the transistors in the n well marked in the blue square in A / B. A very fine line feature of 10 to 20 nm in width can be seen in the dC/dV image, as pointed in D, indicating high resolution capability of the scanning microwave microscope.
Scanning Microwave Microscopy
December 15, 2010Page 21
Simultaneous Images of SRAM Chip
Simultaneous topography (A), capacitance (B), and dC/dV (C) images of an SARM chip. Alternating lightly doped p and n wells are clearly identified in both capacitance and dC/dV images. Five of the six transistors in a unit cell are marked in B and C.
Scanning Microwave Microscopy
December 15, 2010Page 22
Dopant on SiGe
Topography (left) capacitance (middle) and dC/dV (right) images of a dpoed SiGe device acquired with Scanning Microwave Microscopy (SMM). Both capacitance and dC/dV images showed dopant structure not seen topography.
Scanning Microwave Microscopy
December 15, 2010Page 23
InGaP/GaAs Transistor
Topography (left) and impedance (right) images of a cross section of a InGaP/GaAs hetrrojunction bipolar transistor. Different regions from the emitter to the subcollector with different dopant levels were clearly resolved in the impedance image. (W. Han sample courtesy of T. Low)
Scanning Microwave Microscopy
December 15, 2010Page 24
Semiconductor Failure Analysis
Optical image of a small section of the tested SRAM chip. The failed bit contains an n-type FET (the 48th on that row) with an abnormal Vt.
Four sets (A, B, C, and D) of scanning microwave microscopy images on the failed SRAM chip. Each set contains topography (top), dC/dV (middle), and VNA amplitude (bottom) images acquired simultaneously. The red squares outlined the failed 48th n-type FET, the blue squares are normal n FETs on the same row.
Scanning Microwave Microscopy
December 15, 2010Page 25
Bacteria Cells
Topography (left) and impedance (right) images of dried bacteria cells.
(W. Han, Sample courtesy of N Hansmeier, T. Chau, R.Ros and S. Lindsay at ASU)
Scanning Microwave Microscopy
December 15, 2010Page 26
Summary
• Characterization of electromagnetic materials at High spatial resolution
• Offers highest sensitivity and dynamic range in the industry
• Complex impedance
• Sidewall diffusion – Calibrated capacitance – unique – Calibrated dopant density – unique
• Works on ALL semiconductors Si, Ge, III-V and II-VI• Does not require and oxide layer• Operates at multiple frequencies (variable up to 18GHz)
Scanning Microwave Microscopy
December 15, 2010Page 27
Back-up Slides
Scanning Microwave Microscopy
Scanning Microwave Microscopy
December 15, 2010Page 28
Scanning Microwave Microscopy
December 15, 2010Page 29
• Scanning only• qualitative• poor sensitivity• limited 1015-1020 Atoms/cm3• No Conductors/Insulators
Scanning Microwave Microscopy
December 15, 2010Page 30
Lightwave Analogy to RF Energy
RF
Incident
Reflected
Transmitted
Lightwave
DUT
Scanning Microwave Microscopy
December 15, 2010Page 31
Standard Vector Network Analyzeras a reflectometer
Highly resistive load High SNRLow Resolution
Low resistive loadHigh SNRLow Resolution
Load close to 50 OhmsLow SNRHigh Resolution Figure 1: reflection
coefficient vs.. impedance
0
011 ZZ
ZZS
L
L
A BLO LO
A/D A/D
Source
Probe
Very small capacitor High SNRLow Resolution
Scanning Microwave Microscopy
December 15, 2010Page 32
Simplified Single Frequency Solution
A B
LO LO
A/D A/D
Source
Half wave lengthCoaxial resonator
50 Ohm
Probe
freq (500.0MHz to 3.000GHz)
S(1
,1)
1.910E90.001 / -90.076
m1
m1freq=S(1,1)=0.001 / -90.076impedance = Z0 * (1.000 - j0.003)
1.910GHz
1.0 1.5 2.0 2.50.5 3.0
-40
-20
-60
0
freq, GHz
dB
(S(1
,1))
1.910G-57.55
m2
m2freq=dB(S(1,1))=-57.550
1.910GHz