Plasma Reactor (Barrel Chamber) · PR500/510 Compact, Barrel Type, Low Temperature Ashing Device...
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Yamato Scientific Co.,Ltd. www.yamato-scientific.com 2008 Plasma Reactor ( Barrel Chamber ) PR500/510 Compact, Barrel Type, Low Temperature Ashing Device PR500 (Manual version) PR510 (Touch panel version) Specifications Product code 215007 215012 Model PR500 (Flow meter) PR510 (Mass flow meter) Method Barrel type chamber direct plasma (DP) High frequency output Max. 500W Oscillating frequency 13.56MHz Tuning method Automatic tuning Reaction chamber Made of quartz, ø215×305mm Reaction gas Dual system (O2 / CF4) Control system Manual Automatic touch panel Piping material Stainless steel, Teflon Gas inlet 1/4" swagelok Vacuum pump inlet NW25 External dimensions W438×D520×H760mm W520×D630×H760mm Weight Approx. 53kg Approx. 70kg Power source (50/60Hz) AC115V / AC220V Single phase with step-down transformer AC220V~AC415V Three phase with step-down transformer Standard accessories Vacuum grease×1 pc. O-ring for reaction chamber×1 pc. Optional accessories Frame for wafers (2, 3, 4, 5 inches) Multi-purpose angled frame Aluminum etching tunnel (φ180 max.) Vacuum pump (250L/min. or more) Features Compact, space saving design with oscillation section integrated with a portion of the chamber Outstanding operability and safety with the automatic tuning system as standand component Equipped with a large quartz chamber (ø215mm) which can process big testing samples Applications Removal of photoresist Cleaning of parts Surfactant treatment Micro polishing Corresponds to wafer and glass substrate PR500/510 Designed with large chamber size made of quartz considered almost completely resistant against most plasma processes 50~500W ø215×305mm High-frequency Output Reaction chamber External dimensions do not include projections.
Transcript of Plasma Reactor (Barrel Chamber) · PR500/510 Compact, Barrel Type, Low Temperature Ashing Device...
Yamato Scientific Co.,Ltd. www.yamato-scientific.com2008
Plasma Reactor (Barrel Chamber)PR500/510Compact, Barrel Type, Low Temperature Ashing Device
PR500 (Manual version) PR510 (Touch panel version)
SpecificationsProduct code 215007 215012Model PR500 (Flow meter) PR510 (Mass flow meter)Method Barrel type chamber direct plasma (DP)High frequency output Max. 500WOscillating frequency 13.56MHzTuning method Automatic tuningReaction chamber Made of quartz, ø215×305mmReaction gas Dual system (O2 / CF4)Control system Manual Automatic touch panelPiping material Stainless steel, TeflonGas inlet 1/4" swagelokVacuum pump inlet NW25External dimensions W438×D520×H760mm W520×D630×H760mmWeight Approx. 53kg Approx. 70kg
Power source (50/60Hz) AC115V / AC220V Single phase with step-down transformer
AC220V~AC415V Three phase with step-down transformer
Standard accessories Vacuum grease×1 pc.O-ring for reaction chamber×1 pc.
Optional accessories
Frame for wafers (2, 3, 4, 5 inches)Multi-purpose angled frameAluminum etching tunnel (φ180 max.)Vacuum pump (250L/min. or more)
FeaturesCompact, space saving design with oscillation section integrated with a portion of the chamberOutstanding operability and safety with the automatic tuning system as standand componentEquipped with a large quartz chamber (ø215mm) which can process big testing samples
ApplicationsRemoval of photoresistCleaning of partsSurfactant treatmentMicro polishingCorresponds to wafer and glass substrate
PR500/510
Designed with large chamber size made of quartz considered almost completely resistant against most plasma processes
50~500W ø215×305mmHigh-frequency Output
Reaction chamber
External dimensions do not include projections.
www.yamato-scientific.comYamato Scientific Co.,Ltd.2008
Auto-tuningunit
High frequencypower
High frequencysupply electrode
Valve
: Optional Accessories
Mainvalve
CF4gas
O2gas
Purgegas
Vacuumpump
Leakvalve
A.C. Power supply
Vacuumgauge
Flow meterwith needle valve CF4
(10～100cc/min.)
Flow meterwith needle valve O2
(30～300cc/min.)
Bypasscapillary
Main switchON
Output switchOFF
Gas switch OFFGas valve CLOSE
Output switchON
Gas switch ONGas valve OPEN
Power switchON
Pump switchON
Pump switchOFF
Purge gasStop
NormalPressure
Purge gas
Termi-nation
Evacuation
Ready lamp is lit(PR500)Reaction
Predecompression
Valve
S
S
S
S
T
Wafer Ashing
Chamber
ø215mm large caliber chamber
The gas plasma equipment has a wide range of applications from ashing, etching, dry cleaning, etc.
PR500/510
Operation Flowchart
Piping System (PR500/510)
Control Panel
PR500
PR500
Auto-tuningunit
High frequencypower
High frequencysupply electrode
Valve
: Optional Accessories
Mainvalve
CF4gas
O2gas
Purgegas
Vacuumpump
Leakvalve
A.C. Power supply
Vacuumgauge
Flow meterwith needle valve CF4
(10～100cc/min.)
Flow meterwith needle valve O2
(30～300cc/min.)
Bypasscapillary
Main switchON
Output switchOFF
Gas switch OFFGas valve CLOSE
Output switchON
Gas switch ONGas valve OPEN
Power switchON
Pump switchON
Pump switchOFF
Purge gasStop
NormalPressure
Purge gas
Termi-nation
Evacuation
Ready lamp is lit(PR500)Reaction
Predecompression
Valve
S
S
S
S
T
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