半導體製程微污染前瞻即時監控系統

New Fast Technology Co., Ltd.

半導體產業製程微污染監控需求

高階製程技術演進

Sources of Contamination

Airborne Molecular

Contaminant

Volatile Organic

Contaminants

ParticlesCations /

Anions

Non-volatile

Residue

Absorbed

Molecules

Metal

Ion

Chemical

Contamination

Yield Improve !!

Root cause

control

Real time

(資料來源: 玉山投顧整理)

NFA In-line Monitoring System Advantages

NFA In-line Analyzer Off-line Lab Testing

全自動化

廠置佈點規劃, 全自動化採樣

人工操作

人員攜帶採樣裝置至現場採樣

採樣管路auto-prepurge 人員需自行清洗採樣裝置

分析方法整合,採樣後即刻分析 人員操作分析機台

軟體自動數據計算與報告 人工處理數據與報告

即時監測技術

auto-prepurge

無時效性

人員攜帶採樣裝置至現場採樣

程控採樣後立即分析 人員需自行清洗採樣裝置

分析與自動報告輸出 人員操作分析機台 (機台分析排程)

機台狀態與監控環境異常即時發報 人工處理數據與報告

數據準確性

& 穩定性

Auto-recalibration

人為污染

& 誤差導入

採樣/清洗 汙染

ISTD 即時修正 不同人分析操作可能導致之誤差

QC 機制確保數據正確性 人工檢核數據與報告

NFA In-line Monitor Equipment

Elements

MA/MB

VOCs

Nano-particle

NFA-121

NFA-1007 advanced

NFA-ALIS

NFA-i108s

IS-T10R

NFA-i108PNFA-C350

Stable

Automatic Real timeAccurate

Low DL Simple

Total Solution

NFA Inline Equipment Configuration

廠置佈點(採樣點)

自動化採樣(濃縮/稀釋)

偵測器分析(定性/定量)

結果資料庫 數據輸出與異常發報

1 234

5678910

ug/m

3

OOC Alarm

PFA Sampling tube

MC Monitoring and Metrology(Volatile Organics Contaminant)

➢ 空氣中有機污染物分類 (WHO)

分類 沸點溫度

極易揮發性有機物化合物 (VVOCs) 0~50-100 ℃

揮發性有機物化合物 (VOCs) 50-100~240-260 ℃

半揮發性有機物化合物 (SVOCs) 240-260~380-400 ℃

➢ 空氣中有機污染物採樣與分析

( EPA TO-14; TO-15; TO-17 / NIEA A723.73B ; NIEA A715.15B )

MSDGCTD

NFA-1007/AdvancedNFA-ALIS

NFA-1007/Advanced In-line VOCs Monitoring - I

Method: refer NIEA-PA107 (環境檢驗方法偵測極限測定指引)

MDL = 2.998 x S (2.998 – confidence level for 8 repeat runs / S - RSD*CDL)

0

10

20

30

40

50

pp

tv

MDL of NFA-1007/Advanced

Analysis Capability

Long Term Stability

NFA-1007/Advanced In-line VOCs Monitoring - II

STD auto-calibration / QC and ISTD auto-recalibration (option) function

NFA-ALIS AMC Lab Intelligent System- I

0.990

0.995

1.000

1.005

1.010

檢量線相關係數, R 值 Cal-1 Cal-2

IPABenzene Toluene

NFA-ALIS AMC Lab Intelligent System- II

Accuracy and Stability Verification

Re

cove

ry r

ate

70%

80%

90%

100%

110%

120%

130%

查核樣品_10ppb 回收率%

cycle-1 cycle-2 cycle-3 cycle-4 cycle-5 cycle-6 cycle-7 cycle-8

MA & MB Monitoring and Metrology(Anion/Cation Contaminants)

➢ 空氣中陰陽離子採樣與分析

(NIEA A507.10B; NIEA A757.10B; NIEA W415.53B )

NFA-C350

➢ Typical MA & MB

✓ Anions: F-、Cl- 、NO2- 、Br- 、NO3

- 、PO42- 、SO4

2-

✓ Cations: NH4+、Na+ 、Mg2+ 、Ca2+

Ion Chromatography

Analysis Capability

NFA-C350 In-line MA/MB Monitoring - I

0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1.0

Fluoride Chloride Nitrite Bromide Nitrate Phosphate Sulfate Ammonia Sodium Magnesium Calcium

ug/m

3

MDL of MA/MB

* MDL calculation is based on impinger sampling parameters and DL of Ion chromatography

NFA-C350 In-line MA/MB Monitoring - II

Method: refer Comparison of Cleanroom Samplers for

Inorganic Airborne Molecular Contaminants

Sampling Efficiency and Accuracy

0%

20%

40%

60%

80%

100%

120%

140%

Fluoride Acetate Formate Chloride Nitrite Bromide Nitrate Sulfate

%

Sampling Efficiency (%)

40%

50%

60%

70%

80%

90%

100%

110%

120%

130%

Fluoride Acetate Formate Chloride Nitrite Bromide Nitrate Phosphate Sulfate

Recovery

Rate

查核樣品 50 ppb Recovery Rate

cycle-1 cycle-2 cycle-3 cycle-4 cycle-5 cycle-6 cycle-7 cycle-8 cycle-9 cycle-10

Ultra Trace element Monitoring and Metrology

➢ Multi-elements:

➢ 化學試劑中超微量元素分析

(SEMI C1-0310 ; SEMI C44-0708 ; NIEA M105.01B)

Li ; Be ; Na ; Mg ; Al ; K ; Ca ; Sc ; Ti ; V ; Cr ; Mn ; Fe ; Co ; Ni ; Cu ; Zn ; Ge ; Ga

As ; Se ; Rb ; Sr ; Y ; Zr ; Nb ; Mo ; Ru ; Rh ; Pd ; Ag ; Cd ; In ; Sn ; Sb ; Te ; Cs ; Ba

La ; Ce ; Pr ; Nd ; Sm ; Eu ; Gd ; Tb ; Dy ; Ho ; Er ; Tm ; Yb ; Lu ; Hf ; Ta ; W ; Pt

Au ; Hg ; Tl ; Pb ; Bi ; Th ; U ; B ; P ; Si

NFA-i108s

IS-T10R

ICP-MS

NFA-i108s In-line Trace Element Monitoring - I

Analysis Capability

Method: refer 5990-8341EN

MDL = 2.998 x S (2.998 – confidence level for 8 repeat runs / S - RSD*CDL)

0

1

2

3

4

5

6

7

8

9

10

Na Mg Al K Ca Cr Fe Ni Co Cu Zn Ag Pb Li Be Ti V Ga Ge As Sr

pp

t

MDL of ChemicalsUPW

NH4OH 29%

H2O2 31%

HNO3 70%

HF 49%

H2SO4 9.8%

OK-73

NBAC

IPA 99%

NFA-i108s In-line Trace Element Monitoring - II

Accuracy and Stability Verification

40%

60%

80%

100%

120%

140%

160%

Li Be B Na Mg Al K Ca Ti V Cr Mn Fe Ni Co Cu Zn Ga Ge As Sr Zr Nb Mo Ag Cd In Sn Sb Ba Ta Pt Au Tl Pb Bi

Re

co

ve

ry R

ate

查核樣品 5ppt in HF 回收率%

Cycle-1 Cycle-2 Cycle-3 Cycle-4 Cycle-5 Cycle-6 Cycle-7 Cycle-8 Cycle-9 Cycle-10

In-line dilution system: ACC Module for Accurate Dynamic Dilution

✓ Target: Dilute 10x (w/w%)

✓ Check method: Assay ; H2SO4 product conc. : 96.169 %

NFA-i108s In-line Trace Element Monitoring - III

Nano-particle Monitoring and Metrology

➢ Typical nano-particle species

➢ 化學試劑中奈米顆粒分析

(NIEA M105.01B ; NIST-SP-1200-21 ; SEMI C1-0310 )

Mg , Al , Fe, Ti, ,Si, Ag, Au

NFA-i108P

ICP-MS

(one ion cloud per particle)American Chemical Society, 2014, 86, 2270−2278

Nature NanoTechnology, 2015, 10, 835-844

Single Nano-particle Analysis with ICP-MS

Environ. Toxicol. Chem. 2012, 31, 115-121

Dissolved metal vs. Nano-particle Analysis

Microsecond Scanning with no Settling Time

TRA data

Spherical particle shape.

The particle is solid, not hollow.

The total elemental composition is known or can be determined.

The elemental components are uniformly distributed throughout

the particle. (i.e., the particle is not constructed in layers.)

The elemental determination is free from interferences

The particle is completely and consistently atomized and ionized

in the plasma, free from matrix effects (the ionization efficiency matches

that of the ionic calibration standard solution and reference material)

The nebulization efficiency can be accurately determined and

remains constant between reference materials and samples

Additional assumptions for Analysis

Nano-particle Analysis Easy Work Flow

Blank Analysis

Run one ion standard

---for diameter calculation

---with the element targeted

Run one Reference Material

---for Nebulization Efficiency calculation

--- with Au NIST RM, target element independent

Sample Analysis

TRA data convert

time (sec)

resp

onse

(cp

s)

freq

uen

cy

response (cps)

ICP-MS TRA data Response vs frequency

• Analyte response factor • Mass of analyte in particle• Nebulization efficiency

(calculated from reference material)

• Analyte density• Analyte mass fraction in sample

particle

Size distribution

convert

Calculate

Input

Method Verification

Mixed Nano-particle in UPW

NIST RM 8012 / 8013 : 30nm / 60nm Au

20nm Fe2O3 RM 50nm SiO2 RM

Nano-particle RM Verification - I

Nano-particle RM Verification - II

y = 35718x - 8322.9R² = 0.997

0.0E+00

1.0E+05

2.0E+05

3.0E+05

4.0E+05

4 6 8 10 12

part

icle

s/m

L

RM Conc. (ppt)

20 nm Fe RM in H2O2

Linear of Fe Nano-particle RM in Chemicals

y = 55.575x - 97.778

R² = 0.9994

0

2000

4000

6000

8000

10000

12000

0 50 100 150 200

Par

ticl

e num

ber

Acquisition Time (sec)

20nm Fe RM in IPA

y = 39333x - 7617.1

R² = 0.9999

0.E+00

1.E+05

2.E+05

3.E+05

4.E+05

5.E+05

2 4 6 8 10 12

par

ticl

es/m

L

RM Conc. (ppt)

20 nm Fe RM in NH4OH

y = 206.67x - 919.33

R² = 0.9999

0

5000

10000

15000

20000

25000

30000

35000

40000

0 50 100 150 200

Par

ticl

e num

ber

Acquisition Time (sec)

20nm Fe RM in NBAC

y = 940.31x - 16553

R² = 0.9999

0

40000

80000

120000

160000

200000

0 50 100 150 200

Part

icle

num

ber

Acquisition Time (sec)

50nm Si RM in NBAC

y = 4860.4x + 47051

R² = 0.9966

0.E+00

1.E+05

2.E+05

3.E+05

4.E+05

5.E+05

6.E+05

0 20 40 60 80 100

Par

ticl

es/m

L

RM Conc. (ppt)

50 nm Si RM in H2SO4

y = 86.328x - 769.22

R² = 0.9999

0

3000

6000

9000

12000

15000

18000

20 70 120 170 220

Par

ticl

e num

ber

Acquisition Time (sec)

50 nm Si RM in IPA

y = 15588x + 105622

R² = 0.997

0.E+00

1.E+05

2.E+05

3.E+05

4.E+05

5.E+05

6.E+05

7.E+05

0 5 10 15 20 25 30 35

par

ticl

es/m

L

RM Conc. (ppt)

50nm Si RM in NH4OH

Nano-particle RM Verification - III

Linear of Si Nano-particle RM in Chemicals

Conclusions of Nano-particle Analysis with ICP-MS

➢ The property of ICP-MS : high sensitivity and low background

can get the low BED measurement ability.

➢ Provides Complete information including element-species

、 particle size distribution、 particle amounts (particles/L)

、 sample concentration .

➢ The analysis method were verified with nano-particle RM,

precision、 accuracy and stability are all reliable.

NFA-i108P In-line Nano-particle Monitoring - I

Nano-Particle Analysis Capability

* Note: Particle size detection ability would influence by the chemical purity level of target element

0

10

20

30

40

50

60

70

80

90

100

Fe Ag Au Si Fe Al Si Ti Fe Al Si Fe Al Si Ti Fe Al Si Ti Fe Al Si Ti Fe Al Si Ti Fe Al Si Zn

UPW H2O2 31% H2SO4 98% TMAH OK-73 NH4OH 29% IPA NBAC

nm

BED of Chemicals

Method:G5714-90000

NFA-i108P In-line Nano-particle Monitoring - II

Precision Verification

0

5

10

15

20

25

30

Day 1 Day 2 Day 3 Day 4 Day 5 Day 6 Day 7 Day 8 Day 9 Day 10 Day 11 Day 12 Day 13 Day 14 Day 15

RP

D (

%)

Precision of Fe Nano-particle in NH4OH

0

5

10

15

20

25

30

Day 1 Day 2 Day 3 Day 4 Day 5 Day 6 Day 7 Day 8 Day 9 Day 10 Day 11 Day 12 Day 13 Day 14 Day 15

RP

D (

%)

Precision of Fe Nano-particle in H2SO4

NFA-i108P In-line Nano-particle Monitoring - III

60%

70%

80%

90%

100%

110%

120%

130%

140%

UPW H2O2 H2SO4

98%

TMAH OK-73 NH4OH

Recovery

Rate

查核樣品_20nm Fe RM 回收率%

60%

70%

80%

90%

100%

110%

120%

130%

140%

UPW H2O2 H2SO4

98%

TMAH OK-73

Re

co

ve

ry R

ate

查核樣品_50nm Si RM 回收率%

Accuracy Verification

NFA-i108P In-line Nano-particle Monitoring - IV

Accuracy and Stability Verification

40%

50%

60%

70%

80%

90%

100%

110%

120%

130%

Day 1 Day 2 Day 3 Day 4 Day 5 Day 6 Day 7 Day 8 Day 9 Day 10 Day 11 Day 12 Day 13 Day 14 Day 15

Recovery

Rate

查核樣品 20nm Fe RM Recovery Rate in NH4OH

50%

60%

70%

80%

90%

100%

110%

120%

130%

140%

Day 1 Day 2 Day 3 Day 4 Day 5 Day 6 Day 7 Day 8 Day 9 Day 10 Day 11 Day 12 Day 13 Day 14 Day 15

Recovery

Rate

查核樣品 20nm Fe RM Recovery Rate in H2SO4

NFA-HMI Database System

• Full integration/Database System

• Auto production trend-chart and file auto- upload (ex. Excel, CSV, Htm……etc.)

• Easy search history data (weekly, monthly and annually)

• Multi-function trend-chart and data process system (single compound、grouping、sampling port….)

Data Output & Display

Sampling Port Trend Chart

Conclusions

NFA In-line Monitoring System FeaturesItems Description

廠置佈點規劃Multi-port monitoring, area: 31400 m2 (100 m)

~ 70650 m2 (150 m)

整合式去活化採樣閥組/管路設計

截彎取直減少dead volume並使用去活化/well-

conditioned管路,以獲得最佳化樣品進樣效率與

避免交叉污染

數據即時性 即刻採樣分析, 即時反應現場/原料品質狀況

數據準確性與穩定性

客製化標準品與內標準品, 確保樣品分析的可靠

性與穩定性

Auto-recalibration & QC 機制導入, 確保數據正

確性

自動異常發報 & 鎖點功能可設定各監控點上下限值 & 異常發報並對於異

常點位自動執行鎖點與復歸

低偵測極限 方法最佳化以達高階製程需求最低偵測能力

系統自動化與操作介面人性化全自動化採樣分析, 軟體自動數據計算與報告輸

出

SEMI S2 認證機台 符合半導體產業等級安規需求

Total Solution Provider

NF Lab. ServiceApplication Target Sampling method Instrements Type MDL

VOCs Outgassing TD-GC-MS Organic 0.01 ng/cm2 (12'')

Metal Surface-extraction (NF method) ICP-MS Inorganic 10^-3 ng/cm2 (12'')

F-/Cl-/NO2-/Br-/NO3

-/PO43-/SO4

2- /NH4+ Surface-extraction (NF method) IC Inorganic 0.3 ng/cm

2 (12'')

TD-GC-MS single ppb

TD-GC-TOF sub ppb

F-/Cl-/NO2-/Br-/NO3

-/PO43-/SO4

2-

CHOO-/CH3COO/Li+/NH4+/Na+/Mg2+

K+/Ca2+/Mn2+/Sr2+/Ba2+

Impinger (NF method) IC Inorganic 1 µg/m3

GC-TCD ppm

GC-PDHID 0.1ppm

總碳氫化合物(THC)檢測 THC/CH4/NMHC GC-FID Organic 1ppm (Methane)

硫/磷化合物檢測 P/S compounds GC-FPD Inorganic/Orgnaic ppm

VOCs TD-GC-MS Organic ppb

P/S compounds TD-GC-FPD Inorganic/Orgnaic ppm

高分子添加物解析

高分子材料單體解析Involatile organic compounds -- Py-GC-MS Organic --

有機溶劑雜質分析 VOCs Direct/ Dilution GC-MS Organic ppb

差異性分析 VOCs Direct/ Dilution GC-TOF Organic sub ppb

混酸成分分析F-/Cl-/NO2

-/Br-/NO3-/PO4

3-/SO42-

/COOH-/CH3COO-Direct/ Dilution IC Inorganic 2ppb

超純水品質檢測

製程化學品(酸、鹼、有機溶

劑)檢測

Metal Direct/ Dilution ICP-MS Inorganic ppq

酸濃度分析 Acid / Base -- Auto-titrator Inorganic %

奈米粒子粒徑、濃度分析 Single nanoparticle Direct/ Dilution SNP-ICP-MS Inorganic 10nm

CO/CO2/N2/Ar/H2/He/O2/CH4

C2H6/C3H8Canister

Inorganic/Orgnaic

零件/產品表面汙染物檢測

濾網、零部件、建材等Headspace

特定氣體殘留不純物分析

氣體純度檢測

零件/產品表面汙染檢測

環境/無塵室/製程氣體空降分

子檢測

煙道廢氣排放檢測

VOCs Tube/Canister/Bag/On-line Organic

(BED)

Application Target Sampling method Instrements Type MDL

VOCs Outgassing TD-GC-MS Organic 0.01 ng/cm2 (12'')

Metal Surface-extraction (NF method) ICP-MS Inorganic 10^-3 ng/cm2 (12'')

F-/Cl-/NO2-/Br-/NO3

-/PO43-/SO4

2- /NH4+ Surface-extraction (NF method) IC Inorganic 0.3 ng/cm

2 (12'')

TD-GC-MS single ppb

TD-GC-TOF sub ppb

F-/Cl-/NO2-/Br-/NO3

-/PO43-/SO4

2-

CHOO-/CH3COO/Li+/NH4+/Na+/Mg2+

K+/Ca2+/Mn2+/Sr2+/Ba2+

Impinger (NF method) IC Inorganic 1 µg/m3

GC-TCD ppm

GC-PDHID 0.1ppm

總碳氫化合物(THC)檢測 THC/CH4/NMHC GC-FID Organic 1ppm (Methane)

硫/磷化合物檢測 P/S compounds GC-FPD Inorganic/Orgnaic ppm

VOCs TD-GC-MS Organic ppb

P/S compounds TD-GC-FPD Inorganic/Orgnaic ppm

高分子添加物解析

高分子材料單體解析Involatile organic compounds -- Py-GC-MS Organic --

有機溶劑雜質分析 VOCs Direct/ Dilution GC-MS Organic ppb

差異性分析 VOCs Direct/ Dilution GC-TOF Organic sub ppb

混酸成分分析F-/Cl-/NO2

-/Br-/NO3-/PO4

3-/SO42-

/COOH-/CH3COO-Direct/ Dilution IC Inorganic 2ppb

超純水品質檢測

製程化學品(酸、鹼、有機溶

劑)檢測

Metal Direct/ Dilution ICP-MS Inorganic ppq

酸濃度分析 Acid / Base -- Auto-titrator Inorganic %

奈米粒子粒徑、濃度分析 Single nanoparticle Direct/ Dilution SNP-ICP-MS Inorganic 10nm

CO/CO2/N2/Ar/H2/He/O2/CH4

C2H6/C3H8Canister

Inorganic/Orgnaic

零件/產品表面汙染物檢測

濾網、零部件、建材等Headspace

特定氣體殘留不純物分析

氣體純度檢測

零件/產品表面汙染檢測

環境/無塵室/製程氣體空降分

子檢測

煙道廢氣排放檢測

VOCs Tube/Canister/Bag/On-line Organic

空氣/煙道揮發性有機污染物分析 (VOCs Analysis)

材料有機物逸散頂空分析 (Head Space Analysis)

熱裂解分析&高分子材料鑑定 (Pyrolysis Analysis)

高純度氣體分析(Bulk gas/Special gas Analysis)

Wafer 表面污染物分析(Wafer Surface Analysis)

化學試劑奈米粒子分析(Nano-particle Analysis)

陰陽離子分析(Anions/Cations Analysis)

化學試劑超微量元素分析(Ultra Trace Metal Analysis)

酸鹼濃度分析(Assay Analysis)

NF Lab. Service

New-Fast always thinks to provide

total analysis solution for your need !

Thanks for your attention~

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