Kelvin probe microscop

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Kelvin Probe Microscopy KPFM Nanofabrication and characterization

Transcript of Kelvin probe microscop

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Kelvin Probe Microscopy

KPFM

Nanofabrication and characterization

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KPFM

Nanofabrication and

characterization

Presented by :

1) Moataz Mostafa,

Physics Department

2) Iman Alhamdan,

Chemistry Department

3) Ahmed AbdelGawad,

Electrical Engineering

4) Ahmed Mounir.

Electronics Engineering

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Slide 1

Outline

Nanofabrication and characterization

1. Introduction.2.Working Principle.3.Applications.

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1- Introduction

KPFM

• Kelvin probe force microscopy was proposed by

Nonnenmacher in 1991 as a tool to measure the local contact

potential difference between a conducting atomic force

microscopy (AFM) tip and the sample.

• KPFM has been used extensively as a unique method to

characterize the Nano-scale electronic/electrical properties of

metal/semiconductor surfaces and semiconductor devices.

Recently, KPFM has also been used to study the electrical

properties of organic materials/devices and biological

materials.

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1- Introduction

KPFM

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1- Introduction

KPFM

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2- Working Principle

KPFM

• We applied an ac modulation

bias VAC (frequency fAC) with a

dc offset bias VDC between a tip

and a sample to generate an

electrostatic force between the

tip and the sample as shown in

Fig point (1).

• The cantilever deflection by an

electrostatic force is detected by

a photo detector, and then the

component signal

of frequency fAC is derived by a

lock-in amplifier point (2).

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2- Working Principle

KPFM

• The signal is transferred to

a feedback controller as

shown in Fig point (3)

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2- Working Principle

KPFM

• The intended potential,

that is, CPD is obtained

by adjusting the dc offset

bias VDC so that the

component signal of

frequency fAC becomes

zero.

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2- Working Principle

KPFM

VCPD = (φtip - φsample) / -e

Where φsample and φtip are the work functions of the sample and tip,

and e is the electronic charge. When an AFM tip is brought close to the

sample surface, an electrical force is generated between the tip and

sample surface, due to the differences in their Fermi energy levels.

.

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2- Working Principle

KPFM

(a) depicts the energy levels of the tip and

sample surface when separated by a

distance d and not electrically connected

(note, the vacuum levels are aligned but

Fermi energy levels are different).

Equilibrium requires Fermi levels to line-up

at steady state, if the tip and sample

surface are close enough for electron

tunneling. Upon electrical contact, the

Fermi levels will align through electron

current flow, and the system will reach an

equilibrium state

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2- Working Principle

KPFM

(b). The tip and sample surface

will be charged, and an apparent

VCPD will form (note, the Fermi

energy levels are aligned but

vacuum energy levels are no

longer the same, and a VCPD

between the tip and sample has

formed). An electrical force acts

on the contact area, due to the

VCPD

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2- Working Principle

KPFM

(c) This force can be nullified. If

an applied external bias (VDC)

has the same magnitude as the

VCPD with opposite direction,

the applied voltage eliminates

the surface charge in the

contact area. The amount of

applied external bias (VDC) that

nullifies the electrical force due

to the VCPD is equal to the work

function difference between the

tip and sample

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2- Working Principle

KPFM

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2- Working Principle

KPFM

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2- Working Principle

KPFM

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2- Working Principle

KPFM

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3 - Applications

KPFM

• The range of applications of KPFM has been shown in the variety

of samples and structures studied. Including QDs, organic

devices, multi-junction hetero-structures, solar cells and devices

under external biasing

• KPFM shows an interesting advantage in the study of smaller devices.

Surface impact devices perform better at smaller scales, and KPFM is

very sensitive to surface properties. KPFM becomes an ideal tool to

probe nanostructures for electronic properties. In this respect, KPFM

performed in UHV can provide an advantage over in-air KPFM because

UHV avoids contaminates that may perturb the potential profiles.

KPFM can provide critical information about surface potential

distribution, which can help increase solar cell’s efficiencies and

device performance.

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KPFM

Nanofabrication and

Characterization

References:

1. http://phys.au.dk/

2. https://cel.archives-ouvertes.fr/cel-00917935/document

3. http://kummelgroup.ucsd.edu/pubs/paper/110.pdf

4. http://www.spm.iis.u-

tokyo.ac.jp/takihara/Kelvin%20probe%20force%20microscopy_e.html#1

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KPFM

Nanofabrication and

Characterization

Thanks for Your Attention

Any Questions?