Introduction to COMS VLSI Design

25
Introduction to CMOS VLSI Design CMOS Transistor Theory Eutectics.blogspot.in

description

Introduction to CMOS VLSI Design: This Presentations is design in way to provide basic summary of CMOS Vlsi design This Presentation is Made at Eutectics.blogspot.in the following is the structure of presentation : 2: Outline 3: Introduction 4: MOS capacitor 5: Terminal Voltage 6: nMOS Cutoff 7: nMOS Linear 8: nMOS Saturation 9: I-V Characteristics 10 : Channel Charge 11: Carrier velocity 12: nMOS Linear I-V 13: nMOS Saturation 14: nMOS I-V Summary 15: Example 16: pMOS I-V 17: Capacitance 18: Gate Capacitance 19: Diffusion Capacitane 20: Pass Transistor 21: Pass transistor ckts 22: Effective Resistance 23: RC Delay Model 24: RC values 25: Inverter Delay Estimate

Transcript of Introduction to COMS VLSI Design

Page 1: Introduction to COMS VLSI Design

Introduction toCMOS VLSI

Design

CMOS Transistor Theory

Eutectics.blogspot.in

Page 2: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Outline Introduction MOS Capacitor nMOS I-V Characteristics pMOS I-V Characteristics Gate and Diffusion Capacitance Pass Transistors RC Delay Models

Page 3: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Introduction So far, we have treated transistors as ideal switches An ON transistor passes a finite amount of current

– Depends on terminal voltages– Derive current-voltage (I-V) relationships

Transistor gate, source, drain all have capacitance– I = C (V/t) -> t = (C/I) V– Capacitance and current determine speed

Also explore what a “degraded level” really means

Page 4: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

MOS Capacitor Gate and body form MOS capacitor Operating modes

– Accumulation– Depletion– Inversion

polysilicon gate

(a)

silicon dioxide insulator

p-type body+-

Vg < 0

(b)

+-

0 < Vg < Vt

depletion region

(c)

+-

Vg > Vt

depletion regioninversion region

Page 5: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Terminal Voltages Mode of operation depends on Vg, Vd, Vs

– Vgs = Vg – Vs

– Vgd = Vg – Vd

– Vds = Vd – Vs = Vgs - Vgd

Source and drain are symmetric diffusion terminals– By convention, source is terminal at lower voltage

– Hence Vds 0

nMOS body is grounded. First assume source is 0 too. Three regions of operation

– Cutoff– Linear– Saturation

Vg

Vs Vd

VgdVgs

Vds+-

+

-

+

-

Page 6: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

nMOS Cutoff No channel Ids = 0

+-

Vgs = 0

n+ n+

+-

Vgd

p-type body

b

g

s d

Page 7: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

nMOS Linear Channel forms Current flows from d to s

– e- from s to d Ids increases with Vds

Similar to linear resistor

+-

Vgs > Vt

n+ n+

+-

Vgd = Vgs

+-

Vgs > Vt

n+ n+

+-

Vgs > Vgd > Vt

Vds = 0

0 < Vds < Vgs-Vt

p-type body

p-type body

b

g

s d

b

g

s dIds

Page 8: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

nMOS Saturation Channel pinches off Ids independent of Vds

We say current saturates Similar to current source

+-

Vgs > Vt

n+ n+

+-

Vgd < Vt

Vds > Vgs-Vt

p-type body

b

g

s d Ids

Page 9: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

I-V Characteristics In Linear region, Ids depends on

– How much charge is in the channel?– How fast is the charge moving?

Page 10: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Channel Charge MOS structure looks like parallel plate capacitor

while operating in inversion– Gate – oxide – channel

Qchannel = CV

C = Cg = oxWL/tox = CoxWL

V = Vgc – Vt = (Vgs – Vds/2) – Vt

n+ n+

p-type body

+

Vgd

gate

+ +

source

-

Vgs

-drain

Vds

channel-

Vg

Vs Vd

Cg

n+ n+

p-type body

W

L

tox

SiO2 gate oxide(good insulator, ox = 3.9)

polysilicongate

Cox = ox / tox

Page 11: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Carrier velocity Charge is carried by e- Carrier velocity v proportional to lateral E-field

between source and drain v = E called mobility E = Vds/L

Time for carrier to cross channel:– t = L / v

Page 12: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

nMOS Linear I-V Now we know

– How much charge Qchannel is in the channel

– How much time t each carrier takes to cross

channel

ox 2

2

ds

dsgs t ds

dsgs t ds

QI

tW VC V V VL

VV V V

ox = W

CL

Page 13: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

nMOS Saturation I-V If Vgd < Vt, channel pinches off near drain

– When Vds > Vdsat = Vgs – Vt

Now drain voltage no longer increases current

2

2

2

dsatds gs t dsat

gs t

VI V V V

V V

Page 14: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

nMOS I-V Summary

2

cutoff

linear

saturatio

0

2

2n

gs t

dsds gs t ds ds dsat

gs t ds dsat

V V

VI V V V V V

V V V V

Shockley 1st order transistor models

Page 15: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Example Example: a 0.6 m process from AMI semiconductor

– tox = 100 Å

– = 350 cm2/V*s

– Vt = 0.7 V

Plot Ids vs. Vds

– Vgs = 0, 1, 2, 3, 4, 5

– Use W/L = 4/2

14

28

3.9 8.85 10350 120 /

100 10ox

W W WC A V

L L L

0 1 2 3 4 50

0.5

1

1.5

2

2.5

Vds

I ds (m

A)

Vgs = 5

Vgs = 4

Vgs = 3

Vgs = 2

Vgs = 1

Page 16: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

pMOS I-V All dopings and voltages are inverted for pMOS Mobility p is determined by holes

– Typically 2-3x lower than that of electrons n

– 120 cm2/V*s in AMI 0.6 m process Thus pMOS must be wider to provide same current

– In this class, assume n / p = 2

Page 17: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Capacitance Any two conductors separated by an insulator have

capacitance Gate to channel capacitor is very important

– Creates channel charge necessary for operation Source and drain have capacitance to body

– Across reverse-biased diodes– Called diffusion capacitance because it is

associated with source/drain diffusion

Page 18: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Gate Capacitance Approximate channel as connected to source Cgs = oxWL/tox = CoxWL = CpermicronW

Cpermicron is typically about 2 fF/m

n+ n+

p-type body

W

L

tox

SiO2 gate oxide(good insulator, ox = 3.90)

polysilicongate

Page 19: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Diffusion Capacitance Csb, Cdb

Undesirable, called parasitic capacitance Capacitance depends on area and perimeter

– Use small diffusion nodes

– Comparable to Cg

for contacted diff

– ½ Cg for uncontacted

– Varies with process

Page 20: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Pass Transistors We have assumed source is grounded What if source > 0?

– e.g. pass transistor passing VDD

Vg = VDD

– If Vs > VDD-Vt, Vgs < Vt

– Hence transistor would turn itself off nMOS pass transistors pull no higher than VDD-Vtn

– Called a degraded “1”

– Approach degraded value slowly (low Ids)

pMOS pass transistors pull no lower than Vtp

VDDVDD

Page 21: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Pass Transistor Ckts

VDDVDD Vs = VDD-Vtn

VSS

Vs = |Vtp|

VDD

VDD-Vtn VDD-Vtn

VDD-Vtn

VDD

VDD VDD VDD

VDD

VDD-Vtn

VDD-2Vtn

Page 22: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Effective Resistance Shockley models have limited value

– Not accurate enough for modern transistors– Too complicated for much hand analysis

Simplification: treat transistor as resistor

– Replace Ids(Vds, Vgs) with effective resistance R

• Ids = Vds/R

– R averaged across switching of digital gate Too inaccurate to predict current at any given time

– But good enough to predict RC delay

Page 23: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

RC Delay Model Use equivalent circuits for MOS transistors

– Ideal switch + capacitance and ON resistance– Unit nMOS has resistance R, capacitance C– Unit pMOS has resistance 2R, capacitance C

Capacitance proportional to width Resistance inversely proportional to width

kg

s

d

g

s

d

kCkC

kCR/k

kg

s

d

g

s

d

kC

kC

kC

2R/k

Page 24: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

RC Values Capacitance

– C = Cg = Cs = Cd = 2 fF/m of gate width

– Values similar across many processes Resistance

– R 6 K*m in 0.6um process– Improves with shorter channel lengths

Unit transistors– May refer to minimum contacted device (4/2 )– Or maybe 1 m wide device– Doesn’t matter as long as you are consistent

Page 25: Introduction to COMS VLSI Design

CMOS VLSI DesignEutectics.blogspot.in

Inverter Delay Estimate Estimate the delay of a fanout-of-1 inverter

C

CR

2C

2C

R

2

1A

Y

C

2C

C

2C

C

2C

RY

2

1

d = 6RC