Chapter 7 電漿的基礎原理 - isu.edu.t · 47 PECVD 和LPCVD的比較 製程 LPCVD (150 mm)...

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1 Chapter 7 電漿的基礎原理

Transcript of Chapter 7 電漿的基礎原理 - isu.edu.t · 47 PECVD 和LPCVD的比較 製程 LPCVD (150 mm)...

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    Chapter 7

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    CVD

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    CVD PVD

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    ? ?

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    ?

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    () ()

    ni = ne ()

    = ne/(ne + nn)

    ne:ni:

    nn:

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    0.01% (High density plasma ,HDP) 15%

    ~100%

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    ()

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    (Radio frequency, RF)

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    e- + A A+ + 2 e-

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    e- + A A* + e-

    A* A + h ()

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    h

    h

    h:

    :

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    e- + AB A + B + e-

    CVD

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    A B

    e-

    B

    e-A

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    ()

    CF4 (F)

    e + CF4 CF3 + F + e

    4F + SiO2 SiF4 + 2O

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    CVD ()

    PECVDSiH4 N2O ()e + SiH4 SiH2 + 2H + e

    e + N2O N2 + O + e

    SiH2 + 3O SiO2 + H2O PECVD

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    (Mean Free Path, MFP)

    n21

    =

    n

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    MFP

    (a) ( b)

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    (MFP)

    :

    , MFP

    , MFP

    1p

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    Q & A

    ?

    (760 Torr)MFP

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    me

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    RF

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    (Thermal Velocity)

    v = (kTe / me)1/2

    RF , Te 2 eVve 5.93107 cm/sec = 1.33107 mph

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    :F = qvB

    (Gyro-motion)

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    mqB=

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    = v/

    v

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    , E

    f(E)

    2 - 3 eV

    ,

    :200 - 400C

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    , PECVD

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    (Sheath Potential)+-+-+-+-+-+-+

    +-+-+-+-+-+-+

    +-+-+-+-+-+-+

    +-+-+-+-+-+-+

    +-+-+-+-+-+-+

    +-+-+-+-+-+-+

    +-+-+-+-+-+-+

    +-+-+-+-+-+-+

    +-+-+-+-+-++

    ++-+-+-+-++

    ++-+-+-+++

    +++-+-+++

    +++-++++

    +++++++

    Vp

    Vf

    x

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    (flux)

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    Vol

    t

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    RF

    0

    0

    RF

    RF

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    13.56MHz

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    ()

    Vp = 10 20 V

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    ()

    0

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    ()

    V2

    A2

    A1

    V1/V2 =(A2/A1)4

    V1 (V1-V2)

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    IC : PECVD(CVD)

    CVD

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    CVD

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    PECVD LPCVD

    LPCVD (150 mm) PECVD (150 mm)

    SiH4+ O 2 SiO2 + SiH4+ N2O SiO2 +

    p =3 Torr, T=400 C p=3 Torr, T=400 C and

    RF=180 W

    100 to 200 /min 8000 /min

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    HDP-CVD

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    HDP CVD

    0.25 m, 4:1

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    PECVD

    CVD:

    : ,

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    PECVD

    1-10 Torr 1020 eV

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    PECVD

    RF

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    (RF ): 200 to 1000 eV (): 10 to 20 eV

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    (E-chuck)

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    (< 100 mTorr) MFP,

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    CVD

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    O2 H2O

    /

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    H2O, O2

    OO H

    H2O, CO2,

    O O OH H

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    LOCOS STI

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    CVD

    ()

    NF3

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    NF3

    F FF

    F N2N2F

    CVD

    N2, SiF4,

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    CVD (RPCVD)

    , SiO2, SiON, and Si3N4(High-): TiO2, and

    Ta2O5 PMD

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    MFP

    CVD //

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    (mTorr)

    MFP

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    ICP and ECR

    (Inductively coupled plasma, ICP) (Transformer coupled plasma,

    TCP)

    (Electron cyclotron resonance, ECR)( mTorr)

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    (ICP)

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    (ICP)

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    ICP

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    (ECR)

    (Gyro-frequency) (cyclotron frequency)

    mqB=e

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    (ECR)

    MW = e,

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    ECR

    B

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    ECR

    ECR

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    ECR

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    n = n+

    MFP

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    PECVD

    ICP ECR