2015 CHEM SHOW · 2015 CHEM SHOW NOV 17-19 / JAVITS CENTER / NYC Official Media Partner: Figure 1:...

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CHEMICAL ENGINEERING WWW.CHEMENGONLINE.COM CHEM SHOW 2015 1 By attending the 2015 Chem Show, you are becoming part of the event’s long history at an important milestone. This year marks 100 years since the Chem Show first opened its doors to professionals in the chemical process industries (CPI). While historical circumstances and technology have changed dramatically, the main purpose of the show remains the same: to exchange ideas and solve industry problems. “The meeting has always been a venue for the CPI to address its challenges and find solu- tions to help improve the way the work of the industry is done,” says Clay Stevens, Presi- dent of International Exposition Company (IEC; Westport, Conn.; www.iecshows.com), the Chem Show’s organizer. “The show connects chemical processors that have needs to ven- dors with solutions,” Stevens adds. “The Chem Show has been, and still is, a great opportunity to engage in face-to-face dis- cussions with industry experts, and a great way to learn about equipment at a close level – to touch and see products that could solve real problems,” Stevens says. Deep roots A look back into the 100-year history of the Chem Show provides an interesting window into the origins of the modern CPI. At the out- set of the conflict then known as The Great War, trade embargoes threatened to disrupt, limit or eliminate North America's access to a wide range of valuable materials from Europe. Concern over the supply of essential industrial chemicals, including drugs, dyes and other compounds, as well as a recognized need to bring together chemical producers with manu- facturers of the equipment used to process them, led Dr. Charles Roth, chief chemist at the Standard Oil Company in New York and the IEC to organize the 1915 event, known at the time as the 1915 National Exposition of Chemical In- dustries. The organizers’ goal was to spark the growth of domestic manufacturing of drugs, dyes and other chemicals to reduce the de- pendence on imports from Europe. “World War I forced [the U.S.] into a situ- ation where it had to manufacture many chemicals and materials domestically in- stead of importing them,” IEC’s Stevens says. The CPI were not yet developed in the U.S. in the early 20th cen- tury, and the Chem Show was set up in part to show the capa- bilities of the early CPI and find ways to supply those needed chemicals, he explains. At the first Chem Show, in September 1915, 83 exhibitor companies came to New York City’s Grand Central Palace to show- case their products and meet with the few hundred chemists and engineers who attended the event. Many of the exhibitors represented chemical manufacturing companies, such as Merck & Co. and Monsanto Chemical Works. Other exhibitors were equipment makers offer- ing pumps, dryers, centrifuges, and more to the process industries. A notable exhibitor at the first Chem Show was the 68-year-old Thomas Edison, who was already a titan of American science, having fa- mously invented the electric light bulb, the pho- nograph and the first motion picture camera. Lesser known was Edison’s role in early in- dustrial chemistry. In 1915, Edison created the first synthetic form of carbolic acid (phenol), when the war created high demand for phenols and supply was uncertain. Edison also devised a synthetic version of para-phenylenediamine (PPD) when Germany cut off supplies of that compound. PPD was commonly used in dyes and inks and was also used by Edison to manufacture records for phonographs. In 1915 alone, Edison started four highly successful chemical processing plants, including one for www.chemengonline.com | www.chemshow.com TUESDAY’S SHOW DAILY The New York Chem Show: 100 Years and Counting 2015 CHEM SHOW NOV 17-19 / JAVITS CENTER / NYC Official Media Partner: Figure 1: This dryer (above) was made for a chemical manufacturer by the Buffalo Foundry & Machine Company. It was delivered by a team of horses and was exhibited in the first Chem Show. Figure 3: A newspaper clipping from September 1915 that reports on developments in the U.S. chemical industry sur- rounding the first Chem Show. Figure 2: An exhibit-floor dis- play from the early days of the Chem Show 1 2 3

Transcript of 2015 CHEM SHOW · 2015 CHEM SHOW NOV 17-19 / JAVITS CENTER / NYC Official Media Partner: Figure 1:...

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By attending the 2015 Chem Show, you are becoming part of the event’s long history at an important milestone. This year marks 100 years since the Chem Show first opened its doors to professionals in the chemical process industries (CPI). While historical circumstances and technology have changed dramatically, the main purpose of the show remains the same: to exchange ideas and solve industry problems.

“The meeting has always been a venue for the CPI to address its challenges and find solu-tions to help improve the way the work of the industry is done,” says Clay Stevens, Presi-dent of International Exposition Company (IEC; Westport, Conn.; www.iecshows.com), the Chem Show’s organizer. “The show connects chemical processors that have needs to ven-dors with solutions,” Stevens adds.

“The Chem Show has been, and still is, a great opportunity to engage in face-to-face dis-cussions with industry experts, and a great way to learn about equipment at a close level – to touch and see products that could solve real problems,” Stevens says.

Deep rootsA look back into the 100-year history of the Chem Show provides an interesting window into the origins of the modern CPI. At the out-set of the conflict then known as The Great War, trade embargoes threatened to disrupt, limit or eliminate North America's access to a wide range of valuable materials from Europe. Concern over the supply of essential industrial chemicals, including drugs, dyes and other compounds, as well as a recognized need to bring together chemical producers with manu-facturers of the equipment used to process them, led Dr. Charles Roth, chief chemist at the Standard Oil Company in New York and the IEC to organize the 1915 event, known at the time as the 1915 National Exposition of Chemical In-dustries. The organizers’ goal was to spark the

growth of domestic manufacturing of drugs, dyes and other chemicals to reduce the de-pendence on imports from Europe.

“World War I forced [the U.S.] into a situ-ation where it had to manufacture many chemicals and materials domestically in-stead of importing them,” IEC’s Stevens says. The CPI were not yet developed in the U.S. in the early 20th cen-tury, and the Chem Show was set up in part to show the capa-bilities of the early CPI and find ways to supply those needed chemicals, he explains.

At the first Chem Show, in September 1915, 83 exhibitor companies came to New York City’s Grand Central Palace to show-case their products and meet with the few hundred chemists and engineers who attended the event. Many of the exhibitors represented chemical manufacturing companies, such as Merck & Co. and Monsanto Chemical Works. Other exhibitors were equipment makers offer-ing pumps, dryers, centrifuges, and more to the process industries.

A notable exhibitor at the first Chem Show was the 68-year-old Thomas Edison, who was already a titan of American science, having fa-mously invented the electric light bulb, the pho-nograph and the first motion picture camera.

Lesser known was Edison’s role in early in-dustrial chemistry. In 1915, Edison created the first synthetic form of carbolic acid (phenol), when the war created high demand for phenols and supply was uncertain. Edison also devised a synthetic version of para-phenylenediamine (PPD) when Germany cut off supplies of that compound. PPD was commonly used in dyes and inks and was also used by Edison to manufacture records for phonographs. In 1915 alone, Edison started four highly successful chemical processing plants, including one for

www.chemengonline.com | www.chemshow.com

TUESDAY’S SHOW DAILY

The New York Chem Show: 100 Years and Counting

2015 CHEM SHOWNOV 17-19 / JAVITS CENTER / NYC

Official Media Partner:

Figure 1: This dryer (above)was made for a chemical manufacturer by the Buffalo Foundry & Machine Company. It was delivered by a team of horses and was exhibited in the first Chem Show.

Figure 3: A newspaper clipping from September 1915 that reports on developments in the U.S. chemical industry sur-rounding the first Chem Show.

Figure 2: An exhibit-floor dis-play from the early days of the Chem Show

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a chemical used in rubber manufac-turing. He and other innovators were continuously searching for ways to improve the future of the country’s CPI, IEC’s Stevens says. Attending the Chem Show gave them new ideas, which led to new inventions and new domestic production.

Growth and shiftsWithin only three years, participation in the Chem Show had grown by 250%. The number of exhibitors increased from 83 in 1915 to 288 in 1917. The dramatic growth in the first few years of the show’s existence demonstrated the importance of this kind of event to the American CPI, as it was at the time, Stevens says. As a venue for showcasing new inventions, the Chem Show thrived in the early 1920s and continued annually in New York City until 1923 when it switched to a bien-nial event. Since then it has been held every other year in New York, with the exception of one show held in Phila-delphia in 1955 and two shows in Chi-cago in 1980 and 1984.

In 1985, technical presentations and

seminars were added to the events program to complement the exhibi-tion. With those seminars and presen-tations, the Chem Show aims to help shape the future of the industry by pro-viding educational sessions on specific solutions while issues are still in their infancy, IEC’s Stevens says.

A New York tradition “There has always been a high con-centration of CPI operations in the area surrounding New York City,” Stevens says. “Over its history, the Chem Show has come to be closely associated with the great city of New York, and many people still say this is where the show should stay.”

The name “Chem Show” has also become closely associated with the event, although that moniker was not the official name of the show. Originally, the official name of the event was the Exposition of the Chemical Industries. The name Chem Show was a nick-name given to the event by the industry trade press of the time. In 1975, the or-ganizers adopted and started using the name Chem Show on event materials.

The Stevens family has also been closely associated with the Chem Show, beginning when Clay’s father Earl joined show organizer IEC in 1937. In 1957, Clay’s cousin Hank came on board, and currently eight members of the Stevens family serve the company.

Long-standing partnerWhile the first shows were domi-nated by chemical manufacturing

companies, the focus has since shifted to equipment manufacturers, chang-ing the demographics of the exhibitors, Stevens explains. In fact, of the 83 com-panies participating in the first Chem Show, only one remains 100 years later. Chemical Engineering magazine (www.chemengonline.com), then known as Metallurgical and Chemical Engineering Magazine, is participating in its fifty-sixth show, and today is one of the show’s media partners. Since 1915, Chemical Engineering has missed only one event – the 2001 Chem Show following the Sept. 11 terrorist attacks.

“I think the longstanding partnership between the Chem Show and Chemi-cal Engineering magazine has endured because both are striving for essen-tially the same basic objective,” IEC’s Stevens says, “And that is to help CPI professionals better understand what is going on in the industry, including what are the newest technologies and products, and how they can do their jobs better.”

Looking forward from 2015, the fu-ture of the CPI is likely to be defined in large part by the ways in which industry addresses the challenges of environ-mental impact, plant safety, wastewater management, Internet-enabled instru-mentation, intelligent control systems and others.

The last 100 years of the Chem Show have shaped this year’s event, and all attendees are encouraged to make the most of its offerings as the Chem Show enters its second century of serving the CPI. ■ Scott Jenkins

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Bus transportation in Manhattan at the time of the Chem Show’s inception

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Product WriteupsThis year, the Chem Show — an event encompassing all sectors of the chemical process industries (CPI) — celebrates its 100th anniversary. The 2015 Kirkpatrick Chemical Engineering Achievement Award will be presented on Wednesday. This biennial award is bestowed by Chemical Engineering to honor the most noteworthy CPI technologies that have been recently commercialized. The Product Writeups below highlight some of the equipment and services showcased at the 2015 Chem Show.

A screen filter with an automatic self-cleaning mechanism

The Model ORG au-tomatic self-cleaning screen filter (photo) removes suspended solids from process water, cooling water, condensate or water for pump seals. The ORG has a large screen area and con-nection flange area for high filtering ca-pacity. This filter

model uses minimal water during the self-cleaning cycle. It traps organic and inorganic suspended solids and then cleans the debris off the screen element automatically with a very low pressure drop. Booth 619 — Orival Inc., Englewood, N.J.www.orival.com

Use this vacuum dryer for heat- and shear-sensitive media

Rototherm D (photo) is a new continuous, in-direct vacuum dryer for free-flowing solids, designed to handle materials that are sen-sitive to heat or shear. The dryer’s shell and

rotor are both heated for a high surface-area-to-volume ratio. Dynamic baffles create plug-flow continuous conveying through the unit. Continuous operation produces consistent results, and with indirect heating, the unit uses much less energy than direct dryers, such as fluidized-bed and convec-tion dryers, according to the company. Booth 704 — Artisan Industries, Inc., Stoughton, Mass.www.artisanind.com

A portable contamination-free mixer for plastic totesThis company’s ITM Tote Mixer is a portable high-perfor-mance mixer for plastic totes, and is specifically engineered for portability, ease of use and power conservation. It has a powerful motor and rugged, collapsible impellers, and is quick-coupling and gear-reduced for high-torque mixing. The mixer completely encloses the tote and achieves prod-uct uniformity quickly. The device can be used easily by a single operator and eliminates product contamination, says the company. Booth 727 — Dynamix Agitators, Inc., Richmond, B.C., Canadawww.dynamixinc.com

Monitor sensors, logic solvers and final elementsThe DeltaV SIS process-safety system, which can be standalone or integrated with control systems, helps to reliably protect assets and improve process availability. The DeltaV SIS system continuously monitors the ability of sensors, logic solvers and final elements to perform on demand, diagnosing faults before they cause spurious trips. DeltaV SIS provides built-in functionality, eliminating complex custom programming, and enables a consistent approach throughout all safety applications. Designed to allow easy compliance with the IEC61511 international standard, DeltaV SIS can lower the upfront costs of engi-neering, installing and commissioning.Booth 305 — Emerson Process Management, Austin, Tex.www.emersonprocess.com

Inverting-filter centrifuges with automated cleaning

This company’s invert ing-f i l ter c e n t r i f u g e s (photo) are capa-ble of separation and filtration of liquids, and fea-ture pressure-as-sisted filtration

and thin-cake technology. Fully contained, there is no residual heel and very low moisture levels. Certifiable cleaning of the inverting-filter centrifuge is effectively carried out in a closed-condition, fully automated clean-in-place (CIP) cleaning sys-tem. Product change-over is quickly and easily completed. The centrifuges are easy to install, says the company, requir-ing a simple “through-the-wall” procedure. Booth 104 — Heinkel Drying and Separation Group – USA, Swedesboro, N.J.www.heinkelusa.com

This digital mass flowmeter is suitable for use with bioreactors

The ZFM digital mass flowmeter (photo) provides programmable flow measurements of gases, as well as instantaneous and elapsed-time data recordings for bioreactors and surface deposi-tions. The device can monitor in-put-output of nitrogen, carbon di-oxide and other gases in systems, and features a carbon dioxide re-actor, chemical-microcell environ-

mental monitoring, surface deposition monitoring and multi-gas and multi-range functionality. The ZFM also offers two programmable totalizers, Modbus network interface, auto-

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matic sensor zeroing, self-diagnostics and software for configuration and calibration. Primary calibrations of multi-ple gases are included with this meter. Booth 231 — Aalborg Instruments, Orangeburg, N.Y.www.aalborg.com

Pressure-vaccum vents for inline or end-of-line installation

This company’s family of high-per-formance, pres-s u r e - v a c u u m vents (photo) are used to control the pressure in l o w - p r e s s u r e storage tanks, and are designed

with special sealing technology that addresses regulatory codes that limit emissions. The product line includes an in-line model (the ES-800) and an end-of-line model (the ES-900). S-800 inline vent valves maintain pressure in the stor-age tank. This valve is installed directly into the vent-line exhaust. The ES-900 vent valve, installed directly on the end of the vent-line exhaust, has both pressure- and vac-uum-relief capability. Booth 709 — Enardo, Tulsa, Okla.www.enardo.com

These process chillers have high-power cooling capacityThis company’s process chiller is designed for reliability dur-ing continuous temperature control, and features onboard diagnostics that to help predict chiller health, touchscreen interface and communications via various protocols for re-mote chiller control. The chiller also has –80°C, high-power cooling capacity and high reliability for continuous heat re-moval. Booth 555 — Thermonics Corp., Mansfield, Mass.www.thermonics-chillers.com

Versatile flow devices with a very large control range

Mini Cori-Flow devices, such as the ML120/M1x model (photo), are suitable for numerous applications within chemical processing, indus-trial and laboratory environments as an alternative to traditional filling and dosing methods. Features of Mini Cori-Flow instruments include: measure and control for almost every fluid without recalibration; mass flowmeter and controller range of 0.05 g/h to 600 kg/h; a low-flow Coriolis instrument (down to 0.05 g/h); accuracy as high as 0.2% of reading; and direct-control

capabilities for pumps or valves. Booth 109 — Bronkhorst USA, Inc., Bethlehem, Pa. www.bronkhorstusa.com

This infrared camera helps diagnose problems in equipment

The TiX560 infrared camera (photo) is used to detect tem-perature differences and unusual thermal patterns, which may indicate abnormali-ties in electrical and mechanical equip-

ment. Inspecting hard-to-reach targets becomes simplified with the TiX560’s full 180-deg rotating lens and the large 5.7-in. LCD touchscreen with on-camera analytics. Image-enhancement features include ultra-high resolution and continuous blending. Picture-in-picture functionality allows for the overlay of a thermal image onto the equipment itself. Booth 610 — Fluke Corp., Everett, Wash.www.fluke.com

Level measurements for multiphase systems

CGR guided-wave radar de-vices (photo) are used to mea-sure levels of liquids, gases and powders with emphasis on sin-gle-level and two- and three-phase measurement capabili-ties for liquids. The devices offer high-temperature measure-ments (up to 250°C), HART communications with additional single 4–20-mA output, explo-sion-proof classifications and intrinsically safe two-wire opera-tion. CGR models are designed to measure difficult applications with multiphase level require-ments.

Booth 812 — Hawk Measurement Systems, Lawrence, Mass.www.hawkmeasure.com

A top-mount valve positioner compatible with any system

The Research Control SRD991 valve positioner (photo) mounts directly to the top of a control valve with a rugged linear potentiometer, avoiding hysteresis be-tween the positioner and actuator. With integrated network communications, in-cluding HART, Profibus-PA and Founda-tion Fieldbus H1, the SRD991 valve po-sitioner is compatible with any system’s distributed control system (DCS) or pro-cess logic controller (PLC), according to the company. Booth 405 — Badger Meter, Inc., Mil-waukee, Wis.www.badgermeter.com

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An ultrasonic homogenizer for many applicationsThe UIP2000hdT digital ultrasonic homogenizer features 2 kW of ultrasound power for batch and inline processing, and automatic data recording of power, amplitude, soni-cation time, temperature and pressure for many applica-tions, including homogenization, mixing, dispersing, wet-milling, emulsification, lysis, cell disintegration, extraction and sonochemical applications (such as phase-transfer catalysis, emulsion chemistry, synthesis and nanochem-istry). The homogenizer features continuous operation, an industrial-grade, colored touchscreen display and browser remote control, with no software installation required.Booth 628 — Hielscher USA, Inc., Ringwood, N.J.www.hielscher.com

These graphite gasket sheets are reinforced with stainless steelThe new Graflit IQ graphite gasket sheet is constructed from a graphite-based material, and is suitable for high-temperature applications. Graflit IQ is a specially engi-neered, high-quality sheet made of expanded natural graphite foil and reinforced by an expanded stainless-steel (316L) insert with anti-stick functionality. This heavy-duty material has improved surface-load resis-tance (in particular for cycling operations) and blow-out resistance, according to the company. A variety of stan-dard sheet dimensions are available, with customiza-tions available on request.Booth 115 — Donit Tesni, d.o.o., Medvode, Sloveniawww.donit.eu

Generate ultra-high purity hydrogen with this modular system

The Hydroprime hydrogen generator (photo) is intended for use in numerous manufacturing and refining applica-tions in a variety of industries. The modular, skid-mounted plant produces ultra-high purity (greater than 99.999%) hydrogen at 200 psig onsite utilizing a steam-methane reforming technology. The generator is fully automated with load-following controls to allow unattended opera-tion. The new product line has a very high natural-gas conversion rate and is highly heat integrated, which translates into low operating costs, says the company. Booth 720 — Linde Engineering North America, Inc., Blue Bell, Pa.www.lindeus-engineering.com

Tank linings that are approved for potable water use

Stonchem 444 lining for tanks and struc-tures constructed of concrete and steel (photo) offers very high tensile strength at 3,400 psi. The lining is fast-curing, dense and waterproof, with ex-tremely low levels of volatile organic com-pounds (VOCs). Addi-tionally, it is very chem-ical resistant and is NSF 61-approved for

potable water, as well as low outgassing. The lining can also be used in cleanrooms and biosafety level (BSL) 4 laboratories. Booth 319 — The Stonhard Group, Maple Shade, N.J.www.stonhard.com

Inline shear mixers with high abrasion resistance

The Cavitron family of inline high-shear mix-ers (photo) pro-vides dispersion of fine particles down to single-micrometer sizes and emulsifica-tion of immiscible liquids to size distributions in

the sub-micrometer range. The mixer has a 7,200-rpm impeller nested in four stators constructed of tungsten carbide, making it extremely resistant to fine, hard-parti-cle abrasion even at high speeds. Booth 105 — ARDE Barinco, Inc., Carlstadt, N.J.www.arde-barinco.com

A family of basket strainers with a wide capacity range This company’s multi-basket strainers and bag filters cover a wide range of flow capacities and contaminant-holding capabilities. The products contain anywhere from two to twenty-three baskets. To serve as a strainer, a unit can be ordered with perforated stainless-steel baskets. When ordered as a filter, the device is fitted with perforated stainless-steel baskets that are designed to hold disposable or cleanable filter bags. They accept in-dustry-standard #1- and #2-size filter bags or 500-series pleated cartridges. Booth 504 — Rosedale Products, Inc., Ann Arbor, Mich.www.rosedaleproducts.com

Mary Page Bailey

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Event Information and Special EventsShow Dates & HoursTuesday, November 17: 10:00 am - 5:00 pm

Wednesday, November 18: 10:00 am - 5:00 pm

Thursday, November 19: 10:00 am - 3:00 pm

Javits Convention Center655 West 34th Street, New York, NY 10001

For the latest seminar information, please visit: http://www.chemshow.com/forexhibitors/seminars.php

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Kirkpatrick Award Ceremony

Join us in the Equipment and Technology Showcase area at 3:30 p.m. on Wednesday. Each of the five finalist companies will briefly highlight its technology that is being honored for this prestigious award.

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TUE. NOV. 17 9:30 - 11:00 am

3D Printing - A Primer on Additive Manufacturing Applications in the Process Industries Presented by: Fraser Advanced Information Systems

Location: 1B03Seminar

TUE. NOV. 17 9:30 - 11:00 am

The Characterization of Bulk Material Properties – the Need for a Multivariate Approach Presented by: Freeman Technology Inc.

Location: 1B02Weighing

TUE. NOV. 17 10:30 - 10:50 am

Corning® Advanced-Flow™ Reactors: Customized solutions to meet chemical processing challenges

Presented by: Corning SAS Location: Equipment & Technology Showcase

Particle Size Analysis

TUE. NOV. 17 11:00 - 11:20 am

Low Flow Liquid Measurement and Control with Coriolis Presented by: Bronkhorst USA Inc.

Location: Equipment & Technology ShowcaseOrganic Functional Groups

TUE. NOV. 17 11:30 - 11:50 am

Washing and Dewatering Slurries with the Verti-Press Filter Presented by: Filtra-Systems

Location: Equipment & Technology ShowcaseCombustible Dust

TUE. NOV. 17 11:30 am - 1:00 pm

The Future of Wireless Technology and Simulation Software to Increase Pump Reliability and Efficiency

Presented by: Hydraulic Institute Location: 1B02

Common Industrial Reactions

TUE. NOV. 17 12:00 - 12:20 pm

Spill Containment and Removal Flooring System Presented by: Safespill Systems

Location: Equipment & Technology ShowcaseBurners & Combustion

TUE. NOV. 17 12:00 - 1:00 pm

Real-time Measurement of Three-Component Liquids for Material Characterization and Purity Control

Presented by: Anton Paar Location: 1B03

Distillation

TUE. NOV. 17 12:30 - 12:50 pm

Continuous Liquid-Liquid Extraction Presented by: Zaiput Flow Technologies

Location: Equipment & Technology ShowcaseWater Analysis

TUE. NOV. 17 1:00 - 1:20 pm

Get Your Plant's Emissions Under Control and in Compliance! Presented by: Linde Engineering North America Inc.

Location: Equipment & Technology ShowcaseAgglomeration & Granulation

TUE. NOV. 17 1:30 - 1:50 pm

Next Generation Rupture Disk Holders Presented by: BS&B Safety Systems, L.L.C.

Location: Equipment & Technology ShowcaseCorrosion

Tuesday’s Schedule

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TUE. NOV. 17 1:30 - 3:00 pm

Techniques for Converting Your Polymer Formulation into a Flowable Powder Presented by: GEA Group

Location: 1B02Solid-Liquid Separation

TUE. NOV. 17 9:30 - 11:00 am

Outlook of a Modern Safety Instrumented System Presented by: Emerson Process Management Location: Equipment & Technology Showcase

Seminar

TUE. NOV. 17 9:30 - 11:00 am

Solid-Liquid Filtration Trends for Particle Fines Removal for Chemical, Pharmaceutical and Energy Applications

Presented by: BHS - Sonthofen Inc. Location: 1B03

Weighing

TUE. NOV. 17 10:30 - 10:50 am

Flameless Venting for Combustible Dusts Presented by: CV Technology Inc.

Location: Equipment & Technology ShowcaseParticle Size Analysis

TUE. NOV. 17 11:00 - 11:20 am

Maximizing Elastomeric Coating Formulas Presented by: Stonhard

Location: Equipment & Technology ShowcaseOrganic Functional Groups

TUE. NOV. 17 11:30 - 11:50 am

Features of Dino-Lite Microscopes and Software Presented by: Dino - Lite Scopes (Big C)

Location: Equipment & Technology ShowcaseCombustible Dust

TUE. NOV. 17 11:30 am - 1:00 pm

Avoiding Caking and Unwanted Agglomeration Presented by: Jenike & Johanson, Inc.

Location: 1B02Common Industrial Reactions

TUE. NOV. 17 12:00 - 12:20 pm

New Technologies from Artisan Industries Presented by: Artisan Industries Inc.

Location: Equipment & Technology ShowcaseBurners & Combustion

TUE. NOV. 17 12:00 - 1:00 pm

ChemStewards - EHS&S Management System Presented by: Society of Chemical Manufacturers & Affiliates (SOCMA)

Location: 1B03Distillation

TUE. NOV. 17 12:30 - 12:50 pm

Improved Rupture Disc Reliability and Repeatability Via Laser Manufacturing Location: Equipment & Technology Showcase

Water Analysis

Page 11: 2015 CHEM SHOW · 2015 CHEM SHOW NOV 17-19 / JAVITS CENTER / NYC Official Media Partner: Figure 1: This dryer (above) was made for a chemical manufacturer by the Buffalo Foundry &

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