(1)Packaging Pressure sensors (Continued from Lecture...
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Transcript of (1)Packaging Pressure sensors (Continued from Lecture...
1
Micro and Smart Systems
Lecture - 39
Prof K.N.Bhat,
ECE Department , IISc Bangalore
email: [email protected]
(1)Packaging Pressure sensors (Continued from Lecture 38) (2)Micromachined Silicon Accelerometers
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Topics for Discussions• Continued from Lecture -38 on pressure sensor Packaging and testing
•Accelerometer operating principle and types
•SOI based accelerometer – a case study
• Surface micromachined comb type accelerometer structure of ADXL type and the force balance circuit
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Photograph of Integrated pressure sensor chip in a TO39 header
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Integrated pressure sensor in a package
Pressure port
header
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Diced pressure sensor
Metal cap welded to the header
Teflon “O” ring
JigMale part
Pressure portN2 pressure
from cylinderJig
Female part
Metal Washer
Lead from the header
Aluminium wire bonding
Schematic of packaged
pressure sensor mounted in a Jig
for testing
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0 1 2 3 4 5 6 70
500
1000
1500
2000
2500 Sensitivity at the sensor output = 60 mV / bar / 10 VSensitivity at the amplfier output = 270 mV / bar / 10 VDiferential gain of the amplifier = 4.5
Out
put (
mV
)
Pressure ( bar )
Pressure Vs Output Voltage of the packaged Integrated Pressure Sensor
Amplified sensor output
sensor output
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Applications of Pressure sensors• Mapping Pressure on the wings of aircraft
•Automobile industry•Micro-fluidics for Flow sensing
•Biomedical applications –Blood Pressure measurement and Intracranial Pressure (ICP) monitoring
•Oceanography for Depth measurement . Packaging is critical
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Flow Sensor
Pyrex
Pyrex
P1 P2Silicon
Flow rate = P/R Capacitive Pressure sensor
Inlet OutletR - Fluidic resistance P = (P1 – P2 )
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• Despite several engineering challenges, MEMS offer high performance and are small, low power, and relatively cheap.
• Parameters of pressure sensor are sensitivity, nonlinearity , offset voltage and Maximum operating pressure and range
• Micro machined Sensors have been fabricated along with Electronics by the batch process of silicon wafers using SOI approach
• The pressure sensors find wide range of Applications for industrial, automotive, biomedical and aerospace and defense establishments.
• Pressure sensors constitute about 60% of the microsystem market
Summary and Conclusions
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K.N.Bhat, Silicon Micromachined Pressure Sensors”,Journal of Indian Institute of Science , Vol.87,pp210-213, 2007
S.R. Manjula , Teweldebhran Kifle, E. Bhattacharya, and K.N. Bhat 'Physical Model for the Resistivity and Temperature Coefficient of Resistivity in Heavily Doped Polysilicon' IEEE Transactions on Electron Devices (USA) , July 2006
V.Vinoth Kumar, Amitava DasGupta and K.N.Bhat,“Processoptimization for monolithic integration of piezoresistive pressure sensor and MOSFET amplifier with SOI approach” Journal of Physics, Institute of Physics Publishing, Vol.34, pp210-215, 2006
References
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Acceleration Sensors
Steady State condition,
Displacement , , is a measure of acceleration
F Ma kx
Force, F
Spring . Spring constant = k
Reference plane
MASS
Fixed electrodeDisplacement x
x ax Ma kSensitivity =
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• Piezoresistive: by integrating a piezoresistor
on the spring element
• Capacitive by measuring the change in
capacitance between the ‘proof mass’ and a
fixed electrode . The mass is also referred to as ‘seismic mass’
Approaches to Measure Acceleration
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A A’
Seismic Mass
Frame
Beam
1
2
3
ResistorSeismic MassFrame
Beam
Framecross section at A-A’
Top view
Piezoresistive Silicon Micro Accelerometer
1
2
3
Vin
Vo
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Seismic MassFrame Beam Frame
Bumper
Bumper
LeadsTop cap
Bottom cap
Damping gap
Micro structure of an accelerometer with airdamping and bumpers to serve as over-range stopmechanism.
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Capacitive Accelerometer
Beam
Mass
Si (10 μm)
SiO2 (1 μm)
Bulk Si
Metal Contact
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SOI based Accelerometer Fabrication1. SOI or polySi
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2. Patterned mechanical structure (polysi or single crystal ) over the sacrificial SIO2
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Beam
Mass
Si or PoySi
SiO2 (1 μm)
Bulk Si
3. Oxide Etch, Release the mechanical strycture
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SOI accelerometer fabrication
Beam
Mass
Electrodes (Cr / Au)
Si or PolySi
SiO2 (1 μm)
Bulk Si
4. Metallize
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KOH Etching of Si Convex corners
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MICROPHOTOGRAPH OF PATTERENED SAMPLE AFTER ETCHING
50m
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Undercutting Of Convex Corners is present
(411) Planes are exposed
Undercutting Of Convex Corners is Absent
Microphotograph Of Bent Portion Of Beam
(a) 30% KOH at 65C
(b) 30% KOH solution containing 30% tertiary-butanol solution
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Alternate Approach to prevent ender-cutting at convex corners
• The width of the corner beam must be about twice the thickness of the square pattern
•Programs that simulate the structure to achieve by etching with a given mask are commercially available
Modify the etch- mask pattern as shown “Corner compensation” scheme”
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Resonance frequency 35.5 KHz measured using laser dopler vibrometer
Thickness =14.45 m
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0.0 0.5 1.0 1.5 2.015.1015.1515.2015.2515.3015.3515.4015.4515.5015.55
UZ1
Cap
acita
nce(
Pf)
Voltage(volts)
Results obtained by electrostatic actuation of the structure fabricated in the laboratory
Sensitivity=0.2 pF/ V/ g
Released SOI (Mass)
SiO2anchor
Support Beam
Si substrate
oACapaci tance C
d
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Dynamic test result using Laser Doppler vibrometer (Vibration Amplitude versus frequency)
Resonance frequency=35.5KHz
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Vibration test result obtained on silicon micro-accelerometer fabricated with SOI wafer processing fabricated as part of E3-222 course in the lab at CEN IISc Bangalore
Resonance frequency =35.5kHZ frequency,
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Applications of Micromachined Accelerometers
• Front and side airbag crash sensing
• Vehicle and traction control systems
•Inertial Measurements and Navigation
•Human Activity for pacemaker control
(a) Acceleration Measurement
(b) Vibration Measurement• Engine management and condition monitoring
• Monitoring Seismic activity ( Earth quake)
•Shock and impact monitoring
•Security Devices
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Summary
• Pressure sensor packaging and testing
•Accelerometer operating Principle and approaches
• Fabrication of accelerometer with Silicon on Insulator wafer
•Testing by Electrostatic actuation and frequency response for testing capacitive accelerometer
We have discussed the following