SPIE Photomask 2009 · technical conference and exhibition for the photomask industry. Held 14-17...

SPIE Photomask 2009 Slideshow – http://spie.org/pm Photos courtesy Bernd Geh – Photographic Arts www.bgeh-photography.com

The 29th Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry.

Held 14-17 September 2009Monterey Marriott and Monterey Conference Center

Monterey, California

http://spie.org/pm

Keynote SpeakerDr. Michael Polcari, President and CEO, SEMATECH

Conference Sessions

Poster and Exhibit Reception

Photomask Reception

Panel Discussion

Please join us next year:

13-17 September 2010Monterey, California

http://spie.org/pm

Documents