Nanolithography using DI Nanolithography Software for Explorer

PMMA C6 spun at 4000 RPM onto a Si(100) Substrate: thickness ~ 200 nm Baked at 115oC for 30 seconds Pattern scratched onto surface:

Previously used NSC A tip did the actual writing T-B ~ -5 nA, Setpoint = 5 nA With feedback off, a relative z offset of 100 nm was added to the z scanner to move

the tip closer to the surface Write speed was 1m/s

AfterBefore

Nanolithography: OU Symbol

Nanolithography: OU Symbol - Zoom in

Nanolithography: OU Symbol - Line Scan

Nanolithography: OU Symbol - 3D View

Nanolithography: Luke -first write

Nanolithography: Vertical and Horizontal lines

Nanolithography: Tip image Before and After