Stephen Senturia - Microsystem Design
Cupola furnace
Wafer Processing
National Science Foundation Materials for Next-Generation Power Electronics Sokrates T. Pantelides, Vanderbilt University, DMR 0907385 Outcome: Collaborative.
OXIDATION OF SILICON a) Deal-Grove * analysis b) Cabrera - Mott analysis c) Stresses in oxide d) Oxidation Si self-interstitials * Andy Grove, early work.
Oxygen Steelmaking Introduction MATERIALS 3F03 MARCH 23, 2015.
Thin Films and Diffusion. Diffusion is not constant across cross section, and continues with every subsequent high-temperature step; hence, we use.
Module 1c
Scanning probe microscopy (SPM) and lithography
