Download - High purity spherical silicon - cv21.co.jp silicon Brochure ver1..pdf · High purity spherical silicon Specification CV21 clean venture 21 ・High purity and uniform size spherical

Transcript
Page 1: High purity spherical silicon - cv21.co.jp silicon Brochure ver1..pdf · High purity spherical silicon Specification CV21 clean venture 21 ・High purity and uniform size spherical

High purity spherical silicon

■Specification

CV21 clean venture 21

・High purity and uniform size spherical silicon by CV21 original technology for solar cell and MEMS etc.

・Low cost and high purity silicon is made of the sludge in Semiconductor and Solar cell factory for melting material of solar silicon ingot.

■Application

■Spherical silicon line up

・High purity silicon for melting material・Uniform size high purity spherical silicon(1.1mm∮ for cell)

items contents

Controllablecenter diameter

0.8~1.8mm∮

Uniformity between silicon

±20μ>

Heavy metals >99.9999999%(9N)

items contents

Diameter range

0.5~5.0mm∮

Dopantelement

<5ppb or controllable

Heavy metals >99.9999%(6N)

Silicon spheres of technology save the earth

The concentrating type spherical solar cell

Light module

Table.Type for Cell Table.Type for melting material

Manufacture of Spherical silicon cell & ModuleClean Venture 21 Corporation Engineering Dept.〒601-8355 38 Kisshoinishiharadonoushirocho minami-ku Kyoto JapanTEL : +81-(0)75-692-3211 FAX ︓ +81-(0)75-671-2101URL : http://www.cv21.co.jp E-mail ︓ [email protected]

Information & Contact

■Features

Page 2: High purity spherical silicon - cv21.co.jp silicon Brochure ver1..pdf · High purity spherical silicon Specification CV21 clean venture 21 ・High purity and uniform size spherical

High purity spherical silicon

CV21 clean venture 21

■Heavy Metal Concentration

Element For cell Formaterial

Al 0.2> 3Ti 0.2> 0.8V 0.2> 0.2>Cr 0.2> 0.2>Fe 0.5 50Co 0.2> 2Ni 0.2> 20Cu 0.2> 30Zn 0.2> 0.9Zr 0.2> 0.2>Ag 0.2> 0.4W 0.2> 1

total 0.5 108

Table. Heavy metal concentrationMethod; ICP-MS Unit ppbw

■Surface condition

Fig. After melting Fig. After mechanical polishing Fig. After Chemical polishing

・The surface condition according to the use

■Particle size distributionfor melting material

・ Moreover we will sort the size out according to your request.

Fig. The grade scale example just after the melting(Example Target 3mm∮)

・The concentration according to the use.

Particle size distribution

Diameter (mm)

Frequency

CumulativeFrequency

Manufacture of Spherical silicon cell & ModuleClean Venture 21 Corporation Engineering Dept.〒601-8355 38 Kisshoinishiharadonoushirocho minami-ku Kyoto JapanTEL : +81-(0)75-692-3211 FAX ︓ +81-(0)75-671-2101URL : http://www.cv21.co.jp E-mail ︓ [email protected]

Information & Contact