GaAs band gap engineering by
colloidal PbS quantum dots
Bruno Ullrich
Instituto de Ciencias Físicas,
Universidad Nacional Autónoma de
México, Cuernavaca, Morelos C.P.
62210, Mexico
Acknowledgements
• Joanna Wang (WPAFB)
• Akhilesh Singh (UNAM)
• Puspendu Barik (UNAM)
• DGAPA-UNAM PAPIIT project
TB100213-RR170213 (PI Bruno
Ullrich)
Motivation
• Work in 2009 showed that PbS
quantum dots (QDs) notably alter the
emission of GaAs
• Tailored photonic applications?
• Ullrich et al., J. Appl. Phys. 108,
013525 (2010)
Presentation’s outline
Essentially, two points will be covered:
a) Optical properties of colloidal PbS
QDs on GaAs
b) Absorption edge engineering of
GaAs with PbS QDs
Sample preparation
Oleic acid capped PbS QDs are
dispersed on GaAs either by a
supercritical CO2 method*) or by
spin coating.
*)Wang et al., Mat. Chem. Phys.
141, 195 (2013).
Why PbS, why GaAs?
• PbS possesses a large Bohr radius
(∼20 nm). Emission covers the
attractive range for optical fibers
• GaAs is “fast” and meanwhile a main
player in optoelectronics
SEM image of a typical sample
20 nm
Particle size:
2.0±0.4 nm
We are dealing with a size-hybrid
• Sample can be considered – to a
certain extend – as free standing
(regularly arranged) energy
confinement potentials with
similarities to superlattices.
• Indeed, electronic states of the QDs
are coupled via tunneling.
Photoluminescence
0
50
100
150
200
250
0.9 1.0 1.1 1.2 1.3 1.4
PL
in
ten
sity
(a
rb. u
nit
s)
Energy (eV)
120 W/cm2
90 W/cm2
72 W/cm2
60 W/cm2
48 W/cm2
30 W/cm2
18 W/cm2
12 W/cm2
6 W/cm2
5 K
Experimental setup
Photo-doping
1.155
1.160
1.165
1.170
1.175
1.180
0 20 40 60 80 100 120 140
EP
L (
eV)
Iex
(W/cm2)
Burstein-Moss effect
• Doping by excited charge carriers
increases the QD band gap
• Generation of at least one electron-hole
pair per QD
• Reversible band gap alteration
proportional to Iex2/3
• Ullrich et al., J. Appl. Phys. 115, 233503
(2014)
Transmittance
0
1
2
3
4
1.0 1.1 1.2 1.3 1.4 1.5 1.6
Tra
nsm
itta
nce
(n
orm
ali
zed
)
Energy (eV)
300 K
200 K
100 K
10 K
GaAsPbS/GaAs
Absorption edge manipulation
0.0
0.2
0.4
0.6
0.8
1.0
1.2
1.0 1.1 1.2 1.3 1.4 1.5 1.6
TR
(n
orm
ali
zed
)
Energy (eV)
10 KRT
Eg
PbS/GaAs
GaAs
Slope of the edge
-1.10
-1.00
-0.90
-0.80
-0.70
-0.60
-0.50
-0.40
-0.30
0 50 100 150 200 250 300 350
Norm
ali
zed
slo
pe
(1/e
V)
Temperature (K)
GaAs
PbS/GaAs
Band gap shift
-80
-70
-60
-50
-40
-30
-20
-10
0
1.35 1.36 1.37 1.38 1.39 1.40 1.41 1.42
dT
R/d
E (
1/e
v)
Energy (eV)
2.0 nm QDs
(CO2)
3.0 nm QDs
(Spin-coating)
SI-GaAs
PbS/GaAs
RT
?Reasons?• Charge transfer (Urbach tail alteration)
• Superposition of absorption spectra
• Interfacial impurities
• Vibronic mode manipulation
• Influence of preparation method and doping of the substrate (currently ongoing studies)
• Change of reflectance
Conclusion and future
• QDs alter the optical properties of the host
• Concentration on the emission properties for
technological applications (emission from the
interface?)
• Possible influence of the QD size on the
optical properties of the host
• Formation of opto-electronically active
junctions
Thank you!
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