ARGUS 54 - Optical Sputter Coater
Vacuum Process Technology LLCDr. Keqi Zhang & Ralph Faber
May 1, 2013
Motivations: Offer a deposition tool for optical coating industry that
combines the advantages of both e-beam evaporation (large area, fast rate) and IBS deposition (stable process, higher film quality).
Approaches: Plasma enhanced pulsed DC magnetron sputtering Basic concept is based on a 54-inch chamber with a
planetary system that contains six 16-inch planets.
Key Performances / Features: Sputtered deposition of multilayers of metals, and
metal oxides Large area, fast deposition rate
6 x 16-inch planets Rate: Ta2O5 / Nb2O5: 5Å/s, SiO2: 6Å/s
Uniformity: typical ±1.0%, goal: ±0.5% Thickness control
Standard: quartz crystal, time power Optional: through-the-planet optical monitoring
(Single Wavelength or Broad Band)
Optical Sputter Coater
Pulsed DC ion / plasma enhanced
Materials: Ta2O5/SiO2
Very stable and repeatable process:
Deposition rate: 5.0Å/s --- Ta2O5
6.0Å/s --- SiO2
Current status: Optical properties: excellent
Absorption: low Scattering: low
Mechanical properties Dense, durable film Film stress: 230 – 300MPa, compressive
Film uniformity Less Than ±0.5% on a 16-inch planet
High throughput; unparalleled process stability
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