VTS Corporation Overview & Product...

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VTS Corporation

Overview &

Product Presentation

VTS CORPORATION

VTS Corporation, a leader of Equipment industry based on the core technologies in Deadeok

Valley in Korea, will cope with the requirements of equipment and process and grow to “a

small-sized but large-hearted company with activities to think and practice the promise with

the customer first”.

General Information

Location

Incorporation Date

TEL / FAX

#1331, Gwanpyeong-dong, Yuseong-gu, Daejeon, Korea

6th, January, 2003

+82-42-634-8500 / +82-42-634-9595

Web site

www.vtsc.co.kr

Contact

[email protected]

2003 ~ Beginning

▶ Established VTS corporation

▶ Promising Small & Medium Enterprise

(KERI)

▶ Technology Transfer

(KRISS. Calibration & Pump Test system)

Company History

2007 ~ Mass Fabrication System Development

Accumulation of diverse R&D system

Technology

Roll to Roll sputter &

Solar-cell Metallization System development

▶ Established R&D center

▶ Venture Company Certification acquisition

▶ INNO-BIZ & ISO 9001 Certification acquisition

▶ Specialized in parts & materials confirmation

(Ministry of Commerce)

2010 ~ Actual Growth phase

Roll to Roll Annealing system &

Large-scaled MOCVD development

▶ Roll to Roll Sputter Export (S-company, China)

▶ C-Si Solar-cell Metallization system Export

(G company, China)

▶ Roll to Roll Annealing system sale

(E company, Korea / S company, China)

▶ 3Milion U.S dollars Export award

(Korea International Trade Association)

VTS Corporation

BUSINESS FIELD

Touch Screen Panel Solution

C-Si Solar cell Metallization System

Compound Semiconductor

R&D

Roll to Roll Sputter RaON series

Roll to Roll Annealing System RaON D series

Screen Printer SiMON-S series

Dry Equipment SiMON-D series

Firing Equipment SiMON-F series

Large-scaled MOCVD ZiON 2100

Evaporator DaON series

OLED system

PLD & ALD system

etc.

CE Certification

VTS Corporation

CERTIFICATION

3Million Dollars

Export award

Only 1! Number 1! World Best ! Happy VTS

Venture company Certification

Specialized in parts & materials Confirmation

ISO 9001 INNO-BIZ

VTS Corporation

PATENT

No Category

Evaporator

MOCVD

Sputter

Screen printer

Roll to Roll Sputter

Metallization

MOCVD

MOCVD



Name of Patent

Micro E-beam Source

Reactor for Chemical Vapor Deposition

The Magnetron Source and the Sputter system using the same

Paste Feeder

Roll to roll sputter device pumping efficiency improvements

Metallization device comprising inkjet multi-head module for metallization

The reactor for Chemical Vapor Deposition include multiple nozzle

The reactor for Chemical Vapor Deposition include insulator

Continuous heat treatment method of ITO film using IR heater

Vacuum roll for Roll to Roll Sputter

Division

Registration

Registration

Registration

Registration

Pending

Pending

Registration

Pending

Pending

Pending

Date

2008.10.02

2009.10.30

2010.08.03

2010.08.13

2011.01.17

2011.02.15

2011.03.31

2011.03.31

2011.10.20

2011.10.20

1

2

3

4

5

6

7

8

9

10

VTS CORPORATION

MASS PRODUCTION FACILITIES

PRESENTATION

/PRODUCT/■■■■■■

Roll to Roll Sputter system

PRODUCT #1.

Roll to Roll Sputtering system

RaON series

+ MODEL

RaON 550 FCCL

for FCCL production with max 550mm width film.

RaON 1300R

for R-type ITO film production with max 1300mm width film.

RaON 1300C

for index matched ITO film production with max 1300mm width film.

+ SALES RESULTS

RaON 550 FCCL

S company in Korea.

RaON 1300R

Zhuhai S company in China

Specification Roll to Roll Sputter system

RaON 1300R

+ Composition Vacuum chamber

Winding system

High vacuum pumping unit

Pre-treatment unit

Deposition unit

Control unit

Cooling system

Approx. 4,156mm

Approx. 4,060mm

Approx. 14,030mm

Approx. 50 MTW

+ Equipment Technique

The system consisting of zones for unwinding & heating,

pretreatment, buffer, coating, in- situ monitoring(applicable for

Oxide coating), rewinding

Continuous operation from roll to roll

Large cooling drum to cool the film during the coating process

Cooling/heating equipment for the coating drum

Pump equipment for short pump down with Polycold

Pre-treatment by glow discharge on separate cooling drum

4 Single magnetrons for ITO and 2 Dual magnetrons for reactive

sputter process

Electronically controlled winding system with 3 driving motors

which allows fully reversible winding

Continuous in-situ measurement for transmittance, non-contact

sheet resistance

Plasma Emission Monitor control for long-term stability of film

thickness and precise layer stoichiometry sputtered in reactive

mode


RaON 1300C


Winding system


Pre-treatment unit

Deposition unit

Control unit

Cooling system

Approx. 4,755mm

Approx. 4,755mm

Approx. 16,000mm


Cathode

∙ 1-ion source

∙ 3-SMS (ITO, Ag)

∙ 7-DMS (Nb2O5, SiOX)

Independently, each drum’s temp. controlled.

Composition of vacuum pump : TMP, Booster, Rotary,

Polycold (4-kinds, 33sets)

Two-main drum, 1-chamber type

Rectangular shape main chamber

Separate 7-zone

Residual oxygen gas removing zone

Movable roll driving & cathode module

Mountable 1km length @ 188㎛


RaON 550 FCCL


Winding system


Pre-treatment unit

Deposition unit

Control unit

Cooling system


One coating drum to cool the film during the coating

process

Cooling/heating port for coating drum

Pump equipment for short pump down with TMP

Electrically controlled winding system with 3 driving

motors (servo motor system UW,MR,RW)

Coating substrate: PI & PET film (12.5 ~ 200㎛)

Coating metallic materials stored in continuous roll form

Deposited to one side of the film to form a multi-layer

at high rate

Ion beam source is equipped with gas inlet system for

Ar &reactive gases

Approx. 9,070mm

Approx. 3,630mm

Approx. 3,120mm


Roll to Roll Annealing system

PRODUCT #2.


RaON D series

+ MODEL

RaON 550DD

for 550mm width double side ITO coating film.

Duplex type

RaON 1300D

for 1300mm width ITO coating film.

One story type

+ SALES RESULTS

RaON 550DD

E company in Korea

RaON 1300D

Zhuhai S company in China

Approx. 2,000mm

Approx. 14,000mm

Approx. 2,500mm


Excellent productivity in comparison with convection oven.

Excellent removal ability of outgassing of hard-coating film.

Minimize damage of film by no tension driving in heat-treatment

section.

Excellent temperature uniformity through individual control of total

91zone.

Heat-treat both side at a time by duplex type (RaON DD series)

Approx. 11,000mm

Approx. 2,000mm

Approx. 2,900mm



PRODUCT #2.


RaON D series

1300D RaON

550DD RaON

+ Composition

Unwinding module

IR heating furnace & Conveyor module

Rewinding module

Test sheet Roll to Roll Annealing system

+ Electrical Characteristics

TEST Conditions

∙ Convection oven: 152℃ / 60min

∙ IR lamp heater: 161 ± 8 ℃ / 5min

∙ IR ceramic heater: 162 ± 3℃ / 5min

∙ Sheet resistance measure: RC2175

(4-point probe R-check)

Results

∙ Resistance tendency

IR ceramic > IR lamp > Convection oven 300

320

340

360

380

400

420

440

Before Annealing Convection Oven IR Lamp heater IR Ceramic heater

GNSAB

N7BB

CN7B

G1LA

Sheet Resistance

Sheet Resis

tance (Ω

/□

)


+ Optical Characteristics

TEST Conditions

∙ Convection oven: 152℃ / 60min

∙ IR lamp heater: 161 ± 8 ℃ / 5min

∙ IR ceramic heater: 162 ± 3℃ / 5min

∙ Optical characteristics measure: COH400

(Nippon Denshoku haze meter)

Results

∙ Transmittance tendency

IR ceramic > IR lamp > Convection oven 83.5

84

84.5

85

85.5

86

86.5

87

87.5

Before Annealing Convection Oven IR Lamp heater IR Ceramic heater

GNSAB

N7BB

CN7B

G1LA

Transmittance

Transm

itta

nce (%

)


+ Optical Characteristics

0

2

4

6

8

10

Before

Annealing

Convection

Oven

IR Lamp heater IR Ceramic

heater

GNSAB

N7BB

CN7B

G1LA

Haze

Haze

2.5

3

3.5

4

Before

Annealing

Convection

Oven

IR Lamp heater IR Ceramic

heater

GNSAB

N7BB

CN7B

G1LA

b *

b*

C-Si Solar-cell Metallization system

SiMON series

+ MODEL

SiMON-SB & ST series

Screen printer (Belt & Turn table type)

SiMON-D series

Electrode pattern dry system

SiMON-F series

Firing system

+ SALES RESULTS

SiMON-S

S company in Korea

SiMON-S & SiMON-D

G solar company in China

1MW R&D SiMON-S & SiMON-D

Korea university in Korea

1MW R&D SiMON-S

KIMM research in Korea


Metallization system

PRODUCT #3.

Specification Metallization system

Technical Specification

● Throughput 2400wph max (Dual line)

● Max. Wafer size 156mm X 156mm (+/-1mm)

● Wafer thickness 180㎛ (+/-20㎛)

Process Parameters

● Print Speed 70 ~ 550mm/s

● Screen Alignment Motorized via actuators for X,Y and θ

● Alignment system 3 CCD camera vision system

Foot Print Information

● Approx Dimensions 2500mm(L) X 1700mm(W) X 1860mm(H)

● Align accuracy : ±10㎛

● Breakage rate: less than 0.2%

● Type : 3 stages, using flat belt in-feed and out-feed

● Now, we are developing turn table type screen printer. (Development completion in Sep. 2011)

SiMON-S

Feature


● Max. Temperature rating 400 ˚C

● Operating temperature range 200˚C~300 ˚C

● Number of Heating zones 3 convection

● Total Heated Length 3000mm

● Number of cooling zones 1 forced cooling (FAN cooling system)

● Belt width 500mm

● Belt material SUS 310 Fine wire mesh

● Belt speed range 20mm/s ~ 70mm/s

● Control PLC, Temperature control by SCR

● User Interface 12.1” touch screen panel

● Working Dimensions 500mm wide (dual line)

● Conveyor height above the floor 1200mm +/-50mm

● Heater IR heater (800W, 72ea)

Specification

SiMON-D


Specification

● Max. Temperature rating 1000 ˚C

● Operating temperature range 400˚C~900 ˚C

● Number of Heating zones independent heating zone , Firing furnace docked with Dryer

● Total Heated Length 10000mm (dryer 3000mm+ firing 7000mm)

● Number of cooling zones 1 forced cooling (water & air cooling system)

● Cooling Section 2000mm

● Belt width 500mm

● Belt material Inconel Fine wire mesh

● Belt Speed 20mm/s ~100mm/s

● Powered exhausts 6 top port

● Working Dimensions 500mm wide (dual line)

● Conveyor height above the floor 1200mm +/-50mm

● Electrical spec. 380V, 150A (3 phase)

● Heater Tungsten wire type

SiMON-F


GaN MOCVD system

PRODUCT #4.

Compound Semiconductor

GaN MOCVD system

ZiON series

+ MODEL

ZiON 300 2inch substrate 3wafers




+ FEATURE

Available applications

GaN based UHB LED production

Highest quality of epitaxial growth for GaN blue LED

Low material consumption

Re-productivity & Uniformity is excellent

Easy handling latest system design

Reactor chamber

RF induction heater providing excellent temp.

Specification GaN MOCVD system

+ Performance

Growth rate More than 2㎛/hr

Thickness uniformity Less than 3 %

Background doping level at room temp.

(Hall measurement)

Less than 1 x 1017

㎝-3

Mobility at room temperature

(Si-doped, n <1 x 1017

㎝-3)

More than 350 ㎠/Vs

HR-XRD FWHM (0002) Less than 250 arcsec

HR-XRD FWHM (1012) Less than 350 arcsec

Specification GaN MOCVD system

+ Specification

Reactor Horizontal

Temperature uniformity ± 1 ℃ @ 700 ℃

± 3 ℃ @ 1200 ℃

Heater type RF induction Heater Generator (300kW)

Gas flow Ring-type Gas injection

(Patented)

WF rotation Dual Rotation

Gas Feeding Side input injection shower head

Susceptor SiC Coated Graphite Planetary

disk

Pumping Center pumping with Dry pump

VTS CORPORATION

R&D SYSTEM

PRESENTATION


R&D system

PRODUCT #5.

Thin Film Deposition R&D system

DaON series

+ MODEL

DaON 1000E E-beam Evaporator

DaON 1000T Thermal Evaporator

DaON 1000TE Thermal & E-beam Evaporator

DaON 1000IE Ion beam assisted E-beam Evaporator

+ SALES RESULTS

DaON series

∙ Korea Institute of Industrial Technology

∙ I company in Korea

∙ Korea Advanced Institute of Science Technology

∙ and more.

+ APPLICATION

Semiconductor, Solarcell, Optoelectrics device,

Magnetic material, IC, LSI, Super lattice, etc.


R&D system

PRODUCT #5.

OLED R&D system

VTSEL system

+ MODEL

VTSEL 1000 OLED Deposition

+ SALES RESULTS

VTSEL 1000

∙ D company in Korea

∙ E company in Korea and more.


R&D system

PRODUCT #5.

Sputter R&D system

DaON-S series

℃

+ SALES RESULTS

DaON-S series

∙ Hanbat university in Korea

∙ Dongshin university in Korea

∙ ETRI(Electronics and Telecommunications Research Institute)

and more.

+ MODEL

DaON-S 1000F Face to face Sputter

DaON-S 1000C Co-sputter

+ APPLICATION

Semiconductor, Solarcell, Optoelectrics device,

Magnetic material, IC, LSI, Super lattice, etc.


R&D system

PRODUCT #5.

PLD R&D system

VTSL series

+ MODEL

VTSL 1000 1 inch Target carrousel type

VTSL 2000 2 inch Target carrousel type

+ SALES RESULTS

VTSL series


∙ Gunsan university in Korea

∙ Korea Advanced Institute of Science Technology and more.


R&D system

PRODUCT #5.

Mini Sputter

DaON-MS series

+ SALES RESULTS

DaON-MS series

∙ KRICT(Korea Research Institute of Chemical Technology) in Korea

∙ Korea university in Korea

and more.

+ MODEL

DaON-MS 1000 SEM Metallizers

DaON-MS 2000 Mini Sputtering system

+ APPLICATION

Suitable SEM, Carbon package, Thin film deposition for R&D


R&D system

PRODUCT #5.

Cluster system

Cluster system

+ APPLICATION

Sputter, E-beam evaporator and PECVD system for Solar-cell, Semiconductor, OLED

+ SALES RESULTS

Cluster system K company R&D center in Korea


R&D system

PRODUCT #5.

RTP System

RtON series

±

+ SALES RESULTS

RtON series

∙ I company in Korea


∙ KIER(Korea Institute of Energy Research) in Korea

and more.

+ MODEL

RtON 2000 1 sheet of Dia. 2inch wafer

RtON 4000 1 sheet of Dia. 4inch wafer

+ APPLICATION

Rapid thermal oxidation, Semiconductor device fabrication,

Solar-cell fabrication


R&D system

PRODUCT #5.

Vacuum Gauge Calibration System

VGCS series

+ CALIBRATION RANGE

Atmosphere pressure to 1 x 10-5

torr range

High vacuum calibration

+ SALES RESULTS

VGCS series

∙ Samsung in Korea

∙ Pakistan vacuum society in Pakistan

∙ KASTO(Korea Association of Standards & Testing

Organizations)

and more.

+ MODEL

VGCS 1000 Basic comparative calibration

VGCS 3000 2High grade direct & comparative calibration

Thank you!

www.vtsc.co.kr

VTS CORPORATION

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