'US-Japan Seminar on Dielectric and Piezoelectric Ceramics ... · DCBiasandTemperatureEffects, A....
Transcript of 'US-Japan Seminar on Dielectric and Piezoelectric Ceramics ... · DCBiasandTemperatureEffects, A....
The l(fh US-Japan Seminar on
Dielectric and Piezoelectric Ceramics
PROGRAM SUMMARY
and
EXTENDED ABSTRACTS
General Chairs: Shoko Yoshikawa, Active Control eXperts, Inc./Div. of Cymer, USA
Yukio Sakabe, Murata Manufacturing Co., Ltd., Japan
Program Chairs: Susan Trolier-McKinstry, Perm State University, USA
Masatoshi Adachi, Toyama Prefectural University, Japan
Sponsored by:
Office ofNaval Research
Shoei Chemical Co.
Additional Supportfrom:
Asian Office ofAerospace Research and Development(US Air Force Office ofScientific Research)
Ferro Corporation
September 26-29, 2001
The Providence Biltmore Hotel
Providence, Rhode Island, USA
10th US-Japan Seminar on Dielectric and Piezoelectric Ceramics
September 26-29, 2001
Providence, Rhode Island, USA
PROGRAM
Wednesday, September 26
5:00 - 7:30 p.m. Registration7:30 - 9:00 p.m. Welcome Reception
Thursday, September 27
7:00-8:00 am. Registration
8:00 - 8:15 a.m. Introduction and Welcome: Shoko Yoshikawa, US General Chair, and Yukio
Sakabe, Japan General Chair
SESSION I. DIELECTRICS
Session Chair: Noboru Ichinose, Waseda UniversityClive Randall, Penn State University
8:15 - 9:15 am. Plenary Lectures - Dielectricsfor RFApplications
PI. 1 8:15- 8:45 a.m. Multilayer Ceramic Integrated Materials Systems for Wireless, Energy 1
and Life Science Micro-System Applications, David L. Wilcox. Sr. and
S. Dai, Motorola Laboratories, USA.
PI.2 8:45 -9:15 a.m. Progress of Dielectric Resonator Materials for Microwave and Millimeter- 9
Wave Applications, Hiroshi Tamura. Murata Manufacturing Company,Ltd., Japan
9:15 - 9:30 am. Break
9:30 a.m.-Noon Poster Summaries and Poster Viewing
Multilayer Capacitors
1.1 Ultra-thin Ni-compatible X7R Dielectric Based on Alkoxide Derived Barium Titanate, 15
P. Pinceloup, I. Burn. K. Albertsen, T. Ohba, and J. Roelofsma, DMC2, USA.
1.2 Hydrothermal BaTi03 Based High K, Low Loss Dielectrics for Thin Active Layer BME 19
MLCC Applications, S. Venigalla. D. L. Schultz, and J. A. Kerchner, Cabot Corporation,USA.
1.3 BME X7R and Y5V Dielectrics for Thin Layer MLC Applications, H. Park. D. McCauley, 23
M. Megherhi, M. Chu, and E. Davis, Ferro Electronic Materials, USA.
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Thursday, September 27
Multilayer Capacitors, continued
1.4 Physical and Electrical Properties of Low Fired K-3800 X8R Dielectric, G. H. Maher and 27
S. C. Maher, MRA Laboratories, USA.
1.7 Development of 100% Silver Compatible Dielectric Compositions for High Performance 31
Discrete and Integrated Passive Component Applications, B. Foster. W. Symes, E. Davis,M. Creedon, J. Bonistall, P. Pruna, J. Burton, and S. Witter, Ferro Electronic Materials,USA.
Capacitors: Reliability andDiffusion
1.8 Effect of Milling Process on Core-shell Microstructure and Electrical Properties for BaTi03- 35
based Ni-MLCC, Y. Mizuno, T. Hagiwara, H. Chazono, and H. Kishi, Taiyo Yuden
Company, Ltd., Japan.
1.9 Reliability of Base Metal Electrode Multilayer Ceramic Capacitors, L. A. Mann. J. J. Beeson, 39
M. S. Randall, J. L. Paulsen, and E. K. Reed, KEMET Electronics Corporation, USA.
1.10 Effect of Occupational Sites of Rare-earth Elements on Dielectric Properties ofBaTi03, 43
H. Kishi. N. Kohzu, H. Chazono, J. Sugino*, H. Ohsato*, and T. Okuda*, Taiyo Yuden
Company, Ltd., *Nagoya Institute ofTechnology, Japan.
1.11 Cation Diffusion in Barium Titanate, J. Itoh. I. Yashima, N. OhashiA, I. SakaguchiA, 47
H. HanedaA, and J. TanakaA, Mitsui Mining & Smelting Company, Ltd., Japan, ANational
Institute for Materials Science, Japan.
1.12 Oxygen in Diffusion and Defect Structure in Perovskite Oxides, I. Sakaguchi. H. Haneda, 51
S. Hishita, N. Ohashi, and M. Sekita, National Institute for Materials Science, Japan.
10-minute Break
Materials Development
1.13 Transmission Electron Microscopy Investigation ofBi203-ZnO-Nb20s Pyrochlore and 55
Related Phases, J. C. Nino. I. M, Reaney*, M. T. Lanagan, and C. A. Randall, Center for
Dielectric Studies, Perm State University, USA, *Dept. ofEngineering Materials, Universityof Sheffield, U.K.
1.14 Bi-pyrochlore Materials for Microwave Applications, C. A. Randall. M. T. Lanagan, 59
H-J. Youn, I. Reaney, H. Sogabe, J. Nino, A. Baker, and T. Shrout, Penn State University,USA.
1.15 Dielectric and Ferroelectric Properties of (Ag,Li)(Nb,Ta) Ceramics, Y. Sakabe. T. Takeda, 63
Y. Ogiso, and N. Wada, Murata Manufacturing Company, Ltd, Japan.
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Thursday, September 27
Film Capacitors
1.16 Ba(TixZri.x)03 Film as Dielectric for Capacitor Applications, B-H.Tsao. S. Heidger*, and 67
J. A. Weimer*, University of Dayton Research Institute, *Air Force Research Laboratory,Wright-Patterson Air Force Base, USA.
1.17 Dielectric Properties of Perovskite Superlattices Measured Using Fine Planar Electrodes, 71
T. Tsurumi. T. Ichikawa, T. Harigai, and S. Wada, Tokyo Institute ofTechnology, Japan.
1.18 Initial Results for MOCVD (Ba,Sr)Ti03 Thin Film Capacitors on Metal Foils, 75
D. Y. Kaufman*, S. K. StreifferA. J. ImAt, S. SahaA, O. AucielloA, and R. Erck*,
Argonne National Laboratory; *Energy Techology Division, AMaterials Science Division
,fnow of Agere Systems, USA.
High Frequency and Tunable Dielectrics
1.19 Measurement of Dielectric Properties of BaTi03-Based Materials in the 10 MHz to 1GHz 79
Frequency Range, C. Nies. E. Deyneka, and M. T. Lanagan*, AVX Corporation, USA,Perm State University, USA.
1.20 Microwave Properties ofDielectric Oxide and High Tc Superconductor System, S. Sugihara. 83
T. Kawashima, C. Ishizuka, andN. Kimura, Shonan Institute ofTechnology, Japan.
1.21 Double-Layer Type Microwave Absorber Made ofMagnetic-Dielectric Composite Material, 87
M. Saitoh, T. Yamamoto. H. (Okino) Niori, M. Chino, and M. Kobayashi*, National Defense
Academy, *Tayca Company, Japan.
1.22 Progress in BaTi03 Thin Films: High Frequency Applications and Property Investigations, 91
J-P. Maria. C. B. Parker, F. Ayguavives, A. Tombak, G. Stauf, A. Mortazawi, and
A. I. Kingon, North Carolina State University, USA, *ATMI Corporation, USA.
1.23 Application of Ferroelectrics in Microwave Phased-Array Antennas, J. B. L. Rao, 95
P. P. Patel. P. K. Park*, T. K. Dougherty*, J. A. Zelik*, A. MoffatA, and L. C. Research
Sengupta+, Naval Laboratory, *Raytheon Systems Company, ASFA, Inc., and +Paratek
Microwave, Inc., USA.
1.24 Field Dependence of Dielectric Properties of(Pb,Sr)Ti03 Thin Films, M. Adachi. K. Tsu, 99
and T. Karaki, Toyama Prefectural University, Japan.
Noon to 1:00 p.m. Lunch
m
SESSION H. MEMORY
Session Chair: Takaaki Tsurumi, Tokyo Institute ofTechnologyAngus Kingon, North Carolina State University
1:00- 2:00p.m. Plenary Lectures -Memory ApplicationsPage
PII.l 1:00 - 1:30 p.m. Material Processing Requirements for Ferroelectric Non-Volatile Memory 103
(FRAM) Technology, Glen R. Fox. R. Bailey, B. Kraus, F. Chu, S. Sun,
and T. Davenport, Ramtron International Corporation, USA.
Thursday, September 27
PII.2 1:30 - 2:00 p.m. Recent Study on Ferroelectric Thin Films and Their Applications, 109
Tadashi Shiosaki and S. Okamura, Nara Institute of Science and
Technology (NAIST), Japan.
2:00-2:15p.m. Break
2:15 - 5:00 p.m. Poster Summaries and Poster Viewing
Memory
11.25 A Novel Fabrication Process of Ferroelectric Capacitors with the Self-align Patterning of 115
Top Electrodes, S. Okamura. T. Kobayashi, K. Suzuki, and T. Shiosaki, Nara Institute of
Science and Technology, Japan.
11.26 Preparation and Properties of SrBi2Ta209 Ferroelectric Thin Films Using Excimer UV 119
Irradiation, T. Havashi. and D. Togawa, Shonan Institute of Technology, Japan.
11.27 Chemical Processing and Ferroelectric Properties of MBi4Ti40i5 (M:Alkaline Earth Metals) 123
Thin Films, K. Kato**. K. Suzuki*, K. Nishizawa*, and T. Miki*, *National Institute of
Advanced Industrial Science and Technology, Japan, "''Frontier Collaborative Research
Center, Tokyo Institute of Technology.
11.28 Integration and Characterization of Sub-micron MFIS FETs Transistor with Pt/Pb5Ge3Oi (/ 127
High-k/Si Structure, F. Zhang and S. T. Hsu, Sharp Laboratories, USA.
11.29 Low Temperature Deposition of Epitaxial-Grade PZT Films by MOCVD, H. Funakubo. 131
M. Aratani, T. Oikawa, and K. Saito*, Tokyo Institute of Technology, Japan, *Philips JapanLtd., Japan.
11.30 Retention Properties in Single-crystalline PLZT Thin Film Capacitors, N. Kamehara. 135
M. Kurasawa, and K. Kurihara, Fujitsu Laboratories, Ltd., Japan.
IV
Thursday, September 27
Film Deposition
II.31 Synthesis and Properties of Tungsten Bronze (Sr,Ba)(Nb,Ta)206 Thin Films by the 139
Chemical Solution Deposition, W. Sakamoto. Y. Horie, T. Yogo, and S. Hirano, Nagoya
University, Japan.
MEMS
11.33 Electrical Properties ofPbZr03Thin Films Prepared by Chemical Solution Deposition, 143
H. Maiwa and N. Ichinose*, Shonan Institute of Technology, Japan, *Waseda University,
Japan.
11.34 Microelectrornechanical Systems (MEMS) Accelerometers Using Lead Zirconate Titanate 147
Thick Films, L. P. Wang*, R. Wolf*, K. DengA, L. ZouA, Y. Wang*, P. WlodkowskiA,R. J. Davis*, and S. Trolier-McKinstrv*. *Penn State University, USA,A Wilcoxon
Research, USA.
11.35 Piezoelectric Properties of Pb(Ybi/2Nbi/2)03-PbTi03 Epitaxial Films with (100) and (111) 151
Orientation, T. Yoshimura and S. Trolier-McKinstry, Penn State University, USA.
11.36 Preparation ofTexture Controlled Lead Zirconate Titanate Diaphragm Type Film Actuator, 155
T. Iiiima. B. P. Zhang, and K. Kunii*, Tohoku National Industrial Research Institute, Japan,*NIDEC COPAL Corporation, Japan.
10-minute Break
Fundamentals
11.37 Why the Atomic Structure Matters to Dielectric and Piezoelectric Performance, 159
T. Eeami. University of Pennsylvania, USA.
11.38 Polarization Relaxation in Piezoelectric OJPtyMgiaNbMPr-O.SPbTiO:,, P. Viehland. 161
Naval Seasystems Command, USA.
11.39 Statistical Model for Poling Hard PZT, W. A. Schulze and M. K. Jha, Alfred University, 165
USA.
11.40 Electric Field Effects on Dielectric Properties of MPB PZT Ceramics via Monoclinic 169
Distortion at Low Temperatures, R. Guo. E. Alberta, A. Thomas, B. A. Jones, and
L. E. Cross, Perm State University, USA.
11.41 Harmonic Analysis of the Electro-Mechanical Response ofElectroactive Materials, 173
C. B. DiAntonio, F.A. Williams, Jr., and S. M. Pilgrim. Alfred University, USA.
II.42 Calculation of Electrostrictive Coefficients and Their Complex Nature Through Fourier 177
Analysis, C. B. DiAntonio, F. A. Williams, Jr., S. M. Pilgrim. Alfred University, USA.
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Thursday, September 27
Fundamentals, continued
11.44 Visualization of the Domain Orientation in PbTi03 Single Crystals by Vertical and 181
Lateral Piezoresponse Microscopy, H. COkino") Niori. T. Ida, H. Ebihara, and
T. Yamamoto, National Defense Academy, Japan.
11.45 Domains and Piezo Images of PZT Family Thin Films Observed by AFM and KFM, 185
Y. Masuda. K. Kakimoto^ S. Fujita, and K. Watanabe*, Hachinohe Institute of
Technology, Japan, ^agoya Institute of Technology, * Seiko Instrument Company,
Japan.
11.46 Progress in Flexoelectric Measurements, L. E. Cross and W. Ma, Perm State University, 189
USA.
7:00 p.m.- 9:00p.m. Dinner Banquet
Friday, September 28
SESSION m. PIEZOELECTRICS
Session Chair: Tadashi Shiosaki, Nara Institute ofScience and Technology
Yet-Ming Chiang, Massachusetts Institute ofTechnology
8:30 - 9:30 a.m. Plenary Lectures - Piezoelectrics
PHI. 1 8:30 - 9:00 a.m Domain Contribution to the Piezoelectric Properties of PZT Ceramics, 193
Takaaki Tsurumi and S. Wada, Tokyo Institute of Technology, Japan.
PIII.2 9:00 - 9:30 am New High Temperature Morphotropic Phase Boundary Piezoelectrics 201
Based on Bi(Me)03-PbTi03 Ceramics, R. Eitel", C. A. Randall', T. R.
Shrouf, P. W. RehrigA, Wesley HackenbergerAt and S. Park*, "Perm State
University, ATRS Ceramics, Inc., and *Fraunhofer Technology Center,USA.
9:30 - 9:45 cm Break
9:45 a.m-Noon Poster Summaries and Poster Viewing
Sinsle Crystal Piezoelectrics
111.47 Growth and Properties of 3" Single Crystal of Piezoelectric Pb[(ZnI/3Nb2/3)o 9iTi0,o9]03, 209
M. Matsushita. Y. Tachi, S. Nagata, and K. Echizenya*, Kawatetsu Mining Company, Ltd.,
Japan, *Kawasaki Steel Company, Ltd., Japan.
111.48 Electromechanical Response of [001] Oriented Single Crystal Lead Zinc Niobate Titanate: 213
DC Bias and Temperature Effects, A. Amin. L. C. Lim\ and T. S. Ramotowski, Naval
Undersea Warfare Center, USA, AOffice ofNaval Research, USA, and 'National Universityof Singapore, Singapore.
VI
Friday, September 28
Sinsle Crystal Piezoelectrics. continued
111.49 Crystal Growth and Electrical Properties of High Tc Relaxor-based Single Crystals, 217
N. Ichinose, Y. Saigo, Y. Hosono*, and Y. Yamashita*, Waseda University, Japan,Toshiba Company, Japan.
111.51 Recent Progress of Growth of Ferroelectric Relaxor PMN-PT Single Crystals at SICCAS, 221
W.A. Schulze. C. Feng*, and Z. Yin*, C. B. DiAntonio, F. A. Williams, Jr., and S. M. Pilgrim,Chinese Academy of Sciences, China, Alfred University, USA.
111.52 Compressive Properties ofPiezoelectric Single Crystals, L. Ewart and E. A. McLaughlin. 225
Naval Undersea Warfare Center, USA.
111.53 Effects of Surface Condition on the Electrical and Chipping Properties of PZNT Single 229
Crystal Vibrators for Medical Array Transducers, T. Kobavashi. Y. Hosono, M. Izumi,K. Itsumi, K. Harada, and Y. Yamashita, Toshiba Company, Japan.
111.54 New Orientation Cuts for Enhanced Electromechanical Properties ofPMN-PT and 233
PZN-PT Single Crystals, J. Chen. R. Panda, H. Beck, and R. Gururaja, ImagingSystems, Agilent Technologies, Inc., USA.
111.55 Domain Configuration and Polarization Switching in PZN-5%PT Crystals, S. E Parkf. 237
J. K. Lee*, and K. S. Hong*, *Seoul National University, Korea, ^raunhofer-IBMT
Technology Center, USA.
111.56 Domain Dynamics and Microstructure ofPbtZniaNbagJOrPbTiOs Single Crystals, 241
E. Furman. H. Yu, and C. A Randall, Penn State University, USA.
111.57 Poling Field Dependence ofFerroelectric Properties in Pb (Zni/3Nb2/3)o,9iTi0.o903 Single 245
Crystal, T. Ogawa. M. Matsushita', Y. Tachi", and K. Echizenya*, Shizuoka Institute of
Science and Technology, Japan, "Kawatetsu Mining Company, Ltd., Japan, *Kawasaki Steel
Company, Ltd., Japan.
10-minute Break
111.58 Piezoelectric Properties ofKNb03 Single Crystals with Various Crystallographic 249
Orientations, S, Wada. A. Seike, H. Kakemoto, and T. Tsurumi, Tokyo Institute of
Technology, Japan.
111.59 The Study ofFatigue Anisotropy in Pb(Zni/3Nb/2a)03-PbTi03 Ferroelectric Single 253
Crystals, M. Ozeul*. K. Takemuraf, S. Trolier-McKinstry*, and C. A Randall*,
fNEC Corporation, Japan, *Penn State University, USA.
111.60 Phase Transitional Behavior of the Morphotropic Phases in PZN-PT and PMN-PT 257
Single Crystals, Y. Lu, D.-Y. Jeong, Z.-Y. Cheng, and P.M. Zhang. Penn State University,USA.
VH
Friday, September 28
Non-Pb Based Actuator Materials
111.61 Electrical Properties of Morphotropic Phase Boundary in (Bii/2Nai/2)Ti03-KNb03 Solid 261
Solution System, T. Takenaka. H. Nagata, and H. Ishii, Science University of Tokyo,Japan.
111.62 Shaped Growth of Oriented Single Crystal Rods and Fibers in the (Bii/2Nai/2)i.xBaxZryTi|.y03 265
(BNBZT) System, B.P. Nunes, J. Shen, A. N. Soukhojak, Y-M. Chiang. Massachusetts
Institute of Technology, USA.
111.63 High Electrostrictive Strain Relaxors Based on Sodium Bismuth Titanate, S. A. Sheets, 269
A. N. Soukhoiak. N. Ohashi, and Y-M. Chiang, Massachusetts Institute of Technology,USA.
111.65 Weak Field Permittivity and High-Field Electromechanical Characterization ofFerroelectric 273
Ceramics at Cryogenic Temperatures, C. J. Pagoda, M. L. Mulvihill*, and S. M. Pilgrim,Alfred University, USA, *Xinetics, USA.
Lead-Containing Actuator Materials
111.66 Cryogenic Characterization of Perovskite Pb(Mg0.BNio.2)i/3Ta2/303 and Tetragonal 277
Tungsten Bronze Ba6FeNb903o and Ba6CoNb903o Relaxor Ferroelectrics, C. J. Pagoda.
and S. M. Pilgrim, Alfred University, USA.
111.67 Piezoelectric Properties of Transparent Pb(Nii/3Nb2/3)i-x.yZrxTiy03 Ceramics, E. F. Alberta 281
and A.S. Bhalla. Penn State University, USA.
111.68 Low-temperature Sintering of PZT with LiBi02 as a Sintering Aid, T. Hayashi and 285
J. Tomizawa, Shonan Institute of Technology, Japan.
111.69 Fracture Behavior of Ferroelectric Ceramics, C. S. Lynch. Georgia Institute of Technology, 289
USA.
Noon to 1:00p.m. Lunch
SESSION IV. PROCESSING
Session Chair: Tadashi Takenaka, Science University ofTokyoShoko Yoshikawa, Active Control eXperts, Inc./Div. ofCymer
1:00 - 2:00p.m. Plenary Lectures - Novel Processing
PIV.l 1:00 - 1:30 p.m. Texture Engineering and Enhanced Properties of Piezoelectric and 293
Dielectric Bulk Ceramics, Toshihiko Tani. Toyota Central R&D
Laboratories, Inc., Japan.
viii
Friday, September 28
PIV.2 1:30-2:00 p.m Micropen Direct Write Fabrication of Integrated Electroceramic Devices, 301
Duane Dimos. P. G. Clem, N. S. Bell, K. VanHeusden', R. Parkhill*, and
K. Church*, Sandia National Laboratories, USA, 'Superior Micropowders,
USA, *Sciperio, Inc., USA.
2:00-2:15P.m Break
2:15 - 5:00p.m Poster Summaries andPoster Viewing
Piezoelectric Devices
IV.71 Cymbal and BB Underwater Transducers and Arrays, R. E. Newnham. J. Zhang, S. Alkoy, 305
R. Meyer, W. J. Hughes, A. C. Hladky-Herrion, J. Cochran, and D. Markey, Penn State
University, USA.
IV.72 Design and Modeling ofPorous FGM Piezoelectric Actuators, A. Almajid, M. Tava. K. 309
Takagi*, J.-F. Li*, R. Watanabe*, *Tohoku University, Japan, University of Washington,USA.
IV.73 Piezoelectric Ceramic Transducers for Miniaturized Applications, A. I. Kingon. A. 313
Gruverman, J. F. Mulling, D. J. Kim, J. P. Maria, J. A. Palmer, E. Grant, and P. Franzon,
North Carolina State University, USA.
IV.74 Advanced Sonar Technologies for 21st Century Torpedoes, J. G. Kelly, G. T. Stevens, 317
and F. Nussbaum*. Naval Undersea Warfare Center, USA, *ANTEON, USA.
IV.75 Active and Passive Structural Vibration Control using Piezoelectric Ceramics, S. Yoshikawa. 319
and M. Giovanardi, Active Control eXperts, Inc., A Division ofCymer, USA.
IV.76 Large Displacement Piezoelectric Actuators Using Shear, M. T. Strauss. HME, USA. 323
Textured Piezoelectrics
IV.77 Templated Grain Growth of Textured Piezoelectric Ceramics, S. T. Kwon, E. M Sabolsky, 327
G. L. Messing, and S. Trolier-McKinstry, Penn State University, USA.
IV.78 Single Crystal Ferroelectrics from Polycrystalline Precursors, A. M. Scotch, E. P. 331
Gorzkowski, P. T. King, and D. J. Rockosi, S. Wu, M. P. Harmer. and H. M. Chan,
Lehigh University, USA.
IV.79 Grain Orientation in BNKT-PZT Solid Solutions Made by RTGG Method, T. Kimura. 335
and Y. Abe, Keio University, Japan.
IV.80 Processing and Application of Solid State Converted High Strain Undersea Transmitting 339
Materials, K. McNeal. R. Gentilman, K. Ostreicher, and D. Fiore, Materials Systems, Inc.,
USA.
IX
Friday, September 28
IV.81 Templated Grain Growth of Textured PMN-PT Utilizing Phase Compatible Seed Materials, 343
P. W. Rehrig'. W. S. Hackenberger", J. H. Adair, and T. R Shrout, Penn State University,
USA, TRS Ceramics, Inc., USA.
IV.82 Extruded Electroactive "Single Crystal" Fibers, M. R. Pascucci. H. B. Strock, and P. 347
Bystricky CeraNova Corporation, USA.
IV.83 Textured Piezoelectric Materials Fabricated by Templated Grain Growth, M. M. Seabaugh. 351
G. L. Cheney, K. Hasinska, A. M. Azad, S. L. Swartz, and W. J. Dawson, NexTech Materials,
Ltd., USA.
10-minute Break
Powders and Consolidation
IV.84 Preparation of run-sized BaTi03 Fine Particles Using a New 2-step Thermal Decomposition 355
of Barium Titanyl Oxalates, S. Wada. M. Narahara, and H. Kakemoto, and T. Tsurumi,
Tokyo Institute ofTechnology, Japan.
IV.85 A Highly Distorted Perovskite Phase in a PMN-PT Powder Synthesized via the Modified 359
Columbite Method, H. Yamada. Cerone. Inc., USA.
IV.86 The Formation of PLZT from Oxides During Calcination, J. P. Dougherty. E. Breval, 363
M. Klimkiewicz, and J. D. Weigner', Penn State University, USA, 'Lockheed Martin,USA.
IV.87 Synthesis ofNanosized Pb(Zr0.7,Tio.3)03 Particles via Mechanical Activation, X. Liu and 367
R. E. Riman, Rutgers University, USA.
Net Shape Forming
IV.88 Layered Manufacturing for Prototyping of Net Shape Grain Oriented Piezoelectric Materials, 371
M. Allahverdi, K. Nonaka, and A. Safari. Rutgers University, USA.
IV.89 Robocast 3-3 PZT-5H - Polymer Composites, B. ATuttle. J. E. Smay, J. Cesarano, III, 375
M.F. Bourbina, E. L. Venturini, D. H. Zeuch, W. R. Olson, J. S. Wheeler, and J. A. Voigt,Sandia National Laboratories, USA.
Conductors
IV.91 Microstructure and Grain Boundary Effects on the High-field Electrical Properties ofPTCR 379
Barium Titanate, P. Cann. C. T. Chao, and R. B. Gall, Iowa State University, USA.
X
Saturday, September 29
SESSION V
Session Chair: Yukio Sakabe, Murata Manufacturing Company, Ltd.
Susan Trolier-McKinstry, Penn State University
9:00 -11:00 am. Plenary Lectures
PV. 1 9:00 - 9:30 a.m. Integrated Passive Device Thin Film, Thick Film and Disruptive 383
Technology for Wireless and High Speed Signal Processing
Applications, Robert H. Heistand. II. J. L. Galvagni, A. P. Ritter,
R. M. Kennedy III, and G. Korony, AVX Corporation, USA.
PV.2 9:30 - 10:00 am. Micromachined Capacitor Ultrasonic Transducers, B. T. Khuri-Yakub. 391
M. Karaman, C.-H. Cheng, S. Ergun, G. Yaralioglu, B. Bayram, U.
Demerci, S. Hansen, M. Badi, and O. Oralkan, Stanford University, USA.
PV.3 10:00 - 10:30 tm Recent Developments in Dielectrics and Piezoelectrics in Europe, 401
Andrew J. Bell. Leeds University, UK.
PV.4 10:30- 11:00 a.m. Three-Dimensional Analysis of Inverted Domain Structures in LiNb03 409
by SHG Interference Microscope, Y. Uesu. H. Shibata, and Y. Shindoh,Waseda University, Japan.
11:00-11:30 cm. Break
11:30 cum. - 1:00p.m. Farewell Lunch
XI
SESSION I. DIELECTRICS
Plenary Lectures- Dielectricsfor RFApplications
PI. 1 Multilayer Ceramic Integrated Materials Systems for Wireless, Energy, and Life 1
Science Micro-System Applications, David L. Wilcox. Sr. and S. Dai, Motorola
Laboratories, USA.
PI.2 Progress ofDielectric Resonator Materials for Microwave and Millimeter-Wave 9
Applications, Hiroshi Tamura. Murata Manufacturing Company, Ltd., Japan
Multilayer Capacitors
1.1 Ultta-thin Ni-compatible X7R Dielectric Based on Alkoxide Derived Barium 15
Titanate, P. Pinceloup, I. Burn. K. Albertsen, T. Ohba, and J. Roelofsma, DMC2,
USA.
1.2 Hydrothermal BaTiQj Based High K, LowLoss Dielectrics for Thin Active Layer 19
BME MLCC Applications, S. Venigalla. D. L. Schultz, and J. A. Kerchner, Cabot
Corporation, USA.
1.3 BME X7Rand Y5V Dielectrics for Thin Layer MLC Applications, H. Park. D. 23
McCauley, M. Megherhi, M. Chu, and E. Davis, Ferro Electronic Materials, USA.
1.4 Physical and Electrical Properties ofLow Fired K-3 800 X8R Dielectric, G.H. 27
Maher and S. C. Maher, MRA Laboratories, USA.
1.7 Development of 100% Silver Compatible Dielectric Compositions for High 31
Performance Discrete and Integrated Passive Component Applications, B. Foster.
W. Symes, E. Davis, M. Creedon, J. Bonistall, P. Pruna, J. Burton, and S. Witter,
Ferro Electronic Materials, USA.
Capacitors: Reliability and Diffusion
1.8 Effect ofMilling Process on Core-shell Microstructure and Electrical Properties for 35
BaTiCVbased Ni-MLCC, Y. Mizuno. T. Hagiwara, H. Chazono, and H. Kishi,
Taiyo Yuden Company, Ltd., Japan.
1.9 Reliability of Base Metal Electrode Multilayer Ceramic Capacitors, L. A. Mann, 39
J. J. Beeson, M. S. Randall, J. L. Paulsen, and E. K. Reed, KEMET Electronics
Corporation, USA.
1.10 Effect of Occupational Sites ofRare-earth Elements on Dielectric Properties of 43
BaTi03, H. Kishi. N. Kohzu, H. Chazono, J. Sugino*, H. Ohsato*, and T. Okuda*,
Taiyo Yuden Company, Ltd., *Nagoya Institute of Technology, Japan.
1.11 Cation Diffusion in Barium Titanate, J. Itoh. I. Yashima, N. OhashiA, I. SakaguchiA, 47
H. HanedaA, and J. TanakaA, Mitsui Mining & Smelting Company, Ltd., Japan,
ANational Institute for Materials Science, Japan.
1.12 Oxygen in Diffusion and Defect Structure in Perovskite Oxides, I. Sakaguchi. 51
H. Haneda, S. Hishita, N. Ohashi, and M. Sekita, National Institute for Materials
Science, Japan.
Materials Development
1.13 Transmission Electron Microscopy Investigation of Bi203-ZnO-Nb205 Pyrochlore 55
and Related Phases, J. C. Nino. I. M. Reaney*, M. T. Lanagan, and C. A. Randall,
Center for Dielectric Studies, Penn State University, USA, *Dept. of Engineering
Materials, University of Sheffield, U.K.
1.14 Bi-pyrochlore Materials for Microwave Applications, C. A. Randall. M. T. Lanagan, 59
H. J. Youn, I. Reaney, H. Sogabe, J. Nino, A. Baker, and T. Shrout, Penn State
University, USA.
1.15 Dielectric and Ferroelectric Properties of (Ag,Li)(Nb,Ta) Ceramics, Y. Sakabe. 63
T. Takeda, Y. Ogiso, and N. Wada, Murata Manufacturing Company, Ltd,
Japan.
Film Capacitors
1.16 Ba(TixZri.x)03 Film as Dielectric for Capacitor Applications, B-H.Tsao. S. Heidger*, 67
and J. A. Weimer*, University of Dayton Research Institute, *Air Force Research
Laboratory, Wright-Patterson Air Force Base, USA.
1.17 Dielectric Properties of Perovskite Superlattices Measured Using Fine Planar 71
Electrodes, T. Tsurumi. T. Ichikawa, T. Harigai, and S. Wada, Tokyo Institute
of Technology, Japan.
1.18 Initial Results for MOCVD (Ba,Sr)Ti03 Thin Film Capacitors on Metal Foils, D. Y, 75
Kaufman*, S. K. StreiffeiA J. ImAt, S. SahaA, O. AucielloA, and R. Erck*, Argonne
National Laboratory; *Energy Techology Division, AMaterials Science Division,
*now of Agere Systems, USA.
High Frequency and Tunable Dielectrics
1.19 Measurement of Dielectric Properties of BaTi03-Based Materials in the 10 MHz to 79
1GHz Frequency Range, C. Nies. E. Deyneka, and M. T. Lanagan*, AVX
Corporation, USA, *Penn State University, USA.
1.20 Microwave Properties ofDielectric Oxide and High Tc Superconductor System, 83
S. Sugihara. T. Kawashima, C. Ishizuka, and N. Kimura, Shonan Institute of
Technology, Japan.
1.21 Double-Layer Type Microwave Absorber Made of Magnetic-Dielectric Composite 87
Material, M. Saitoh, T. Yamamoto. H. (Okino) Niori, M. Chino, and M. Kobayashi*,
National Defense Academy, *Tayca Company, Japan.
1.22 Progress in BaTi03 Thin Films: High Frequency Applications and Property 91
Investigations, J-P. Maria. C. B. Parker, F. Ayguavives, A. Tombak, G. Stauf*,
A. Mortazawi, and A. I. Kingon, North Carolina State University, USA,
*ATMI Corporation, USA.
1.23 Application of Ferroelectrics in Microwave Phased-Array Antennas, J. B. L. Rao, 95
P. P. Patel. P. K. Park*, T. K. Dougherty*, J. A. Zelik*, A. MoffatA, and L. C.
Sengupta+, Naval Research Laboratory, *Raytheon Systems Company, ASFA, Inc.,
and "^Paratek Microwave, Inc., USA.
1.24 Field Dependence ofDielectric Properties of (Pb,Sr)Ti03 Thin Films, M. Adachi. 99
K. Tsu, and T. Karaki, Toyama Prefectural University, Japan.