TK6103 – MEMSkey expertise, key projects, key customers, highlights

28.1.2011Jyrki KiihamäkiVTT Technical Research Centre of Finland

228/01/2011

Sales speech(to be used while standing in elevator)

We turn MEMS design ideas into working wafer level prototypes using oursuperior competence in development of process steps and seamlesslyintegrating them into functional fabrication process flows

Our customers are mainly companies somehow involved in MEMS devicesupply chain (materials, equipment, and sensor manufacturers)

Our strenghts are long experience in key areas of this multi-disciplinaryfield, good relationships with the other local and international players, andmastering of the toolset available in Micronova clean room

We differentiate ourselves from others by havingWidest set of processing competencesHigh proportion of female scientists

328/01/2011

ExpertiseIC-compatible MEMS processdevelopment and process integration

DRIE (deep silicon etching) and SOI-MEMSSacrificial layer etching (wet, HF-vapor etching,O2-plasma)Thin film MEMS (surface micromachining, polysilicon MEMS,ALD films, integration of piezo-films)Amorphous metalsWafer bonding

DevicesSi resonatorsFPI, thermopiles, IR-sourcesMagnetometers, accelometersPressure sensorsand many more …

428/01/2011

Projects

Vaisto (Vaisalaproduction)Si-resonators (VTI co-operation)CSOI research (inseveral projects)E3car, ESIPAlebondIQ-Fuel (MEMS parts)Cosy-3DMEMS Relia

Customers

VTI Technologies Oy

Okmetic Oyj

Vaisala

Picosun, IR, OxfordInstruments, …

528/01/2011

HighlightsDRIE development

Visible light FPI

ALD-nanolaminates

CSOI accelometers

Resonators

Etch resultWidth at a top 210 nmDepth 16.6 umaspect ratio 80:1

Reticle opening 1.2 um

628/01/2011

Publications 2010Electrically tunable surface micromachined Fabry-Perot interferometer for visible lightBlomberg, Martti; Kattelus, Hannu; Miranto, AkseliSensors and Actuators A: Physical. Elsevier. Vol. 162 (2010), 184-188

ALD thin films in MEMS Fabry-Perot interferometersRissanen, Anna; Blomberg, Martti; Puurunen, Riikka; Kattelus, Hannu

10th International Conference on Atomic Layer Deposition, ALD 2010. Seoul, South-Korea, 20 - 23 June 2010.Conference DVD. The Materials Research Society of Korea. Seoul (2010)

Experimental study of the effects of size variations on piezoelectrically transduced MEMS resonatorsJaakkola, Antti; Lamy, J.; Dekker, James; Pensala, Tuomas2010 IEEE International Frequency Control Symposium (FCS). Newport Beach, CA, USA, 1 - 4 June 2010. IEEE. Piscataway, NJ,USA (2010), 410 - 414

MEMS and piezo actuator based Fabry-Perot interferometer technologies and applications at VTTAntila, Jarkko; Miranto, Akseli; Mäkynen, Jussi; Laamanen, Mari; Rissanen, Anna; Blomberg, Martti; Saari, Heikki; Malinen, JoukoNext-Generation Spectroscopic Technologies III. Orlando, FL, USA, 5 - 6 April 2010Proceedings of SPIE - The International Society for Optical Engineering, Article number 76800U. Vol. 7680 (2010)

Electrically tunable surface micromachined Fabry-Perot interferometer for visible lightBlomberg, Martti; Kattelus, Hannu; Miranto, A.Sensors and Actuators A: Physical. Vol. 162 (2010) No: 2, 184 - 188

Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectraLaamanen, Mari; Blomberg, Martti; Puurunen, Riikka; Miranto, Akseli; Kattelus, HannuSensors and Actuators A: Physical. Vol. 162 (2010) No: 2, 210 - 214

Low-Temperature Processes for MEMS Device FabricationKiihamäki, Jyrki; Kattelus, Hannu; Blomberg, Martti; Puurunen, Riikka; Laamanen, Mari; Pekko, Panu; Saarilahti, Jaakko; Ritala, Heini;Rissanen, AnnaNATO Science for Peace and Security Series B: Physics and Biophysics : Advanced Materials and Technologies for Micro/Nano-Devices,Sensors and Actuators. Part 3. Springer. The Netherlands (2010), 167-178

A process for SOI resonators with surface micromachined covers and reduced electrostatic gapsDekker, James, R.; Alastalo, Ari; Kattelus, HannuJournal of Micromechanics and Microengineering. IOP Science. Vol. 20 (2010) No: 4, 045003

Atomic layer deposition in MEMS technology (chapter 26)Puurunen, Riikka; Kattelus, Hannu; Suntola, TuomoHandbook of Silicon Based MEMS Materials and Technologies. Elsevier. Boston, USA; Oxford, UK (2010), 433-446

Studies on aluminium corrosion during and after HF vapour treatmentRitala, Heini; Kiihamäki, Jyrki; Heikkilä, MikkoMicroelectronic Engineering. Vol. 87 (2010) No: 3, 501-504

728/01/2011

Faces from Welppu, in no particular order

Riikka MeeriPanu Mari Kirsi Jyrki

Jaakko GaoHeini Ari Anna James

Martti is currently the CTO of VTT Memfab Ltd.

828/01/2011

• Process gases:• Anhydrous HF• Ethanol• Nitrogen

• Temperature 45°C• Pressure 0.1-0.2 bar• 3 pcs 150 or 200 mm wafers, carrier for pieces• Etch rate of thermal oxide 0.1 bar 10 nm/min and 0.2 bar 100 nm/min

H2O ( and EtOH) ionizes HF and thereby initiates etching reaction:

2HF + H2O HF2- + H3O+

SiO2 + 2HF2- + 2H3O+ SiF4 + 4H2O

- Water initiates & catalyses process- Ethanol scavenges water vapor from the wafer surface & catalyses etching reaction

HF vapor etching of SiO2

Applications:• Release etching:

• No drying, non sticking, fragile small structures• Dry mask oxide etching• Does not etch Al• Resonators, Fabry Perot interferometers

928/01/2011

Monolithically integrated visible light spectrometerScientific and technological outcome

Target of the project: fabricating and characterizing monolithically integrated ( =500 nm) FPIs onphotodiodes as well as separate MEMS FPIs for visible light, and realizing a miniature spectrometerdemonstration for Hannover MesseMain results:

First in the world technology: fabrication of monolithically integrated FPIs on photodiodes for = 500nmExtending the wavelength range of ALD FPI technology - fabrication of the separate FPI chips for= 420 nm/500 nm and testing of structures for = 600 nm/670 nm/750nm

Realization of miniature ‘pen spectrometer’ demonstration (measurement range 430 nm – 570 nm)for Hannover MesseFirst in the world MEMS FPI aperture size: largest diameter 2mm (market competitor 1,95 mm)

Exploitation potentiality: fluorescence imaging in diagnostics, industrial (bio)process monitoring,colorimetry for waste water analysis, environmental monitoring

Contact person:Anna Rissanen

Monolithical FPI measurement results

1028/01/2011

MEMS team summary (impartially balanced scorecard)

PeopleHighly skilled, multidisciplinary team, 60% of researchers have doctors´degree (chemistry, physics, electronics)20% of researchers are from abroadBig equipment responsibilities (stepper, plasma etchers, vapor etcher,spin etcher, ALD, PECVD)

ProjectsMainly jointly funded projects (~ 65%)Profitable contract research (~ 25%)Basic funding (< 10%)Average utilization rate ~85%

Scientific publications (according to JURE:ten publications in 2010)

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WANTED!dead or alive Special characteristics:

Expertise in clean room workand process development

Knowledge on analysis methodsand tools, process & devicemodelling and simulation tools

Education: Higher universitydegree in Electronics, Physics orChemistry (Doctoral degree is abonus)

Background: Industry orinternational experience is highlyappreciated, too

A research scientist withslanted sense of humour

This is just an advance warning. Officialannouncement will be published Feb/Mar2011,

meanwhile you can fill ”open application”

http://www.vtt.fi/careers/

1228/01/2011

VTT creates business fromtechnology