Thermal limitation of Silicon EUV Pellicle and possible...
Transcript of Thermal limitation of Silicon EUV Pellicle and possible...
Thermal limitation of Silicon EUV Pellicle and possible improvements for mass production of
EUV Lithography
Sungwon Kwon, Yongseok Jung, Hwanchul Jeon, Jinsu Kim,
Jaehyuck Choi, Byung-Gook Kim, and Chan Uk Jeon
Wednesday 7 October (2015)
Semiconductor R&D Center, Samsung Electronics Co., Ltd
Outline
Motivation – Current status of EUV pellicle development
– Prediction on the thermal stability
– Two types of Silicon
Experimental – Heat-load test on wafers
– Heat-load test on membranes
– New capping material
– Improvement of the thermal stability
Summary
2 International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Current status of EUV pellicle development p-Si pellicle with SiN capping (by ASML)
– One of the most potential candidates for the 1st generation of EUV pellicle
– The compatibility for EUV HVM is still doubtful: heat-load
A suggestion for improvement on the thermal stability
– Si-based pellicle: good alternative within a time-line
Time line 2015 2016 2017 2018
p-Si : ASML & industry
Si-based : SEC
Production: industry adoption
HVM
Pilot: complete EUV pellicle solution
Membrane
Capping
Today
Co-work with industry
Membrane w/ capping
Proto-type w/ infrastructure
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*Poly-crystal silicon (p-Si)
International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Prediction on the thermal limitation of Si Thermal stress exceeds the yield strength (σSi) of Si thin-film.
– Si can undergo thermal softening effect during EUV exposure.
A main risk for Si pellicles: repeated heat-load
– High temperature and stress: material perspective, ‘creep deformation’
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Region of Si transition Bulk σSi ~1GPa
App. Opt., Vol.50, No.21 (2011)
International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Two types of Silicon's Poly-crystal silicon (p-Si) and single-crystal silicon (c-Si)
– p-Si: grain boundaries between grains (surface-to-surface)
– c-Si: well-ordered structure (bond between atoms)
Different mechanisms of deformation against external forces
2~4GPa @fatigue
Poly-crystal Si
Surface-to-surface split at the grain boundaries
Poly-crystal Si
4~10GPa @fatigue
Single-crystal Si
Elongation with maintaining the atomic bonds
Single-crystal Si
Muhlstein et al, Sensors & Actuators, 2001
5 International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Heat-load test on wafers Si surface analysis after 532nm LASER expose on wafers
– p-Si: changing - grain growths and more number of grains
– c-Si: no changing - remains with the same orientation
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Phase p-Si c-Si (001)
Category SEM (50k) EBSD (100k) Concept SEM (50k) EBSD (100k) Concept
Ref.
<Tm
>Tm
**EBSD (Electron backscatter diffraction) ***Si thickness 50nm, SiOx thickness 100nm
International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Short-term heat-load test Heat-load test on Si membranes
– Continuous heating with a 355nm LASER during 30min.
– 50nm Si freestanding membrane with 20nm SiN capping
c-Si is more stable than p-Si under the same heat-load.
– Equal result with the previous on wafer tests
An window for 355nm LASER
Pyrometer or FLIR
Vacuum chamber (10-2T.)
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LASER power and peak temperature
International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Long-term heat-load test Methodology of quantification test
– Pulse heating with a 355nm LASER and EUV trans. measurement
– Criterion: exposure time to drop by 3% of EUV trans.
c-Si shows 50% longer exposure time than p-Si.
Mechanism of EUV trans. drop during and after heat-load
– High temperature heating induces micro-cracks within a membrane.
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*DIC (Differential Interference Contrast) images
Scattering
Early heating
Si membrane
Long-time heating
EUV trans. drop Normal
150hrs/3%
+50% Membrane
225hrs/3%
International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Procedure for new capping material Categories: Optical/Mechanical/Thermal/Chemical
– Test procedure and the results of atomic H treatment
Emissivity on the 50nm films at 100℃
Mat’ls pSi SiN B4C Mo
(Pre) H plasma
(Post) H plasma
ΔThick (nm) 4.7 nm 0.5 nm 0.8 nm 1 nm
ΔThick (%) 12 % 0.9 % 1.5 % 3.8 %
9 International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Selection of new capping material Candidates of radiation emissivity enhancer against heat-load
B4C for new capping material
– Improvement of total emissivity: ~10 times higher than p-Si with SiN capping
Category SiN Mo B4C SiO2
Thermal Emissivity
On 50nm film (@100°C) 0.008 0.027 0.145 0.012
Δ (-raw Si) +0.007 -0.308 +0.208 +0.001
TEC (10-6/K) 3.58 4.8-5.1 3.0-5.0 0.56
Chemical H plasma resistance (1/Etch Rate, p-Si=1) 9.4 4.7 5.9 15.7
Mechanical
Modulus (GPa)
50nm cap. on Si wafer 166.3 168.9 170.1 170.2
Δ (-raw Si) 1.4 4 5.2 5.3
Hardness (Gpa)
50nm cap. on Si wafer 17.9 12.7 15.4 14.2
Δ (-raw Si) 5 -0.2 2.5 1.3
SiN 4nm
p-Si 25nm
SiN 4nm
ε=0.01~0.03 εt=0.01
~0.03
εt ~ x10
TSi ~x1.6 ε=0.01~0.03
B4C 4nm
c-Si 40nm
B4C 4nm
εt=0.15
~0.22
ε ~ 0.1 ε ~ 0.001
10 International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Improvement of the thermal stability Heat-load test on the c-Si membrane and new capping (B4C/c-Si)
– Exposure time to 3% EUV trans. loss: ~2 times longer than p-Si with SiN capping
– Possibility for HVM within the methodology
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150hrs/3%
+50%
>100%
Membrane
Membrane + New Capping
225hrs/3% >320hrs
International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Future plan Verification of the methodology in this study
– Comparison with the results from the actual EUV scanners
Compatibility of the new pellicle with other infrastructures
– EUV pellicle frame and etc.
Improvement for fabrication process
– Supplying SOI wafers is another key technology for the new pellicle.
Consideration of the next generation pellicle after Si pellicles
– Alternative solutions for the EUV 500W era
12 International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Summary p-Si pellicle might have not enough thermal stability for EUV HVM.
c-Si pellicle is more stable than p-Si pellicle, however it is still not enough for EUV HVM.
New capping material is chosen to improve the radiation emissivity.
B4C/c-Si combination shows better thermal stability than SiN/p-Si, which can be applicable for EUV HVM.
13 International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]
Thank you for your attention
14 International Symposium on Extreme Ultraviolet Lithography, 7 October 2015, Maastricht, NL. e-mail: [email protected]