Processor Development and current trends · 2019. 1. 29. · Phase Change Memory In phase change...

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© 2010 IBM Corporation Processor Development and current trends Dr. Harry Barowski, Technology Development, IBM Systems &Technology Group Guide Share Europe E S G

Transcript of Processor Development and current trends · 2019. 1. 29. · Phase Change Memory In phase change...

Page 1: Processor Development and current trends · 2019. 1. 29. · Phase Change Memory In phase change memory, data are stored by switching small regions of a "phase-change" material between

© 2010 IBM Corporation

Processor Development and current trends

Dr. Harry Barowski, Technology Development, IBM Systems &Technology GroupGuide Share Europe ESG

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2 © 2010 IBM Corporation2

Burlington

Poughkeepsie

▲Austin

Fujisawa

▲Almaden

▲ Peking

▲ Zürich

Tucson

YasuYamato

▲ Tokio

▲Delhi

▲Haifa

Dublin

Greenock

Hursley

East FishkillEndicott

▲ Yorktown HeightsTorontoRochester

Boulder

Rom

Raleigh

Krakau

Perth

Bangalore

Gold Coast

Sydney

Paris

Pune

ShanghaiTaipei

Moskau

San Jose

Santa Teresa

Böblingen

São Paolo

Beaverton

Kairo

• Burlington

• Poughkeepsie

▲Austin

• Fujisawa

▲ Almaden

▲ Peking

▲ Zürich

• Tucson

• Yasu• Yamato

▲ Tokio

▲Delhi

▲Haifa

• Dublin

• Greenock

• Hursley

• East Fishkill

• Endicott

▲ Yorktown Heights• Toronto

• Rochester

• Boulder

• Rom

• Raleigh

• Krakau

• Perth

• Bangalore

• Gold Coast

• Sydney

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• Shanghai

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▲ Research• Hardware Development• Software Development• Hardware and Software Development

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IBM development and research centers

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3 © 2010 IBM Corporation

Milestones of the semiconductor technologyTransistor (1947), Bardeen, Brattain & Shockley

Integrated Circuitry (1959), Kilby

Moore‘s Law (1965)‏– „Cramming more components onto

integrated circuits“– Complexity and number of transistors double

every 12 months, resp. 24 month (1975 - ‏(…•

Microprocessor (1971)‏– Intel 4004 – 2300 transistors, 700 kHz clock

Cell/B.E. (2005)‏– 250 million transistors in 90nm CMOS SOI– Heterogeneous Multicore-Architecture

POWER6/POWER7 (2006/2010)‏– Dualcore microprocessor with 790 million

transistors @ 5GHz in 65nm CMOS SOI technology (POWER6)

– Octocore microprocessor with 1,2 billion transistors @ >4GHz in 45nm CMOS SOI technology (POWER7)‏

– Record setting clock frequencies beyond 4GHz barrier!

Cell/B.E.1 PPE + 8 SPEs @ 3,2 GHz

POWER7OctoCore >>4GHz!

Processor and technology development GSE

500.000x transistors 500.000x transistors

6.000x frequency6.000x frequency

Intel 4004

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4 © 2010 IBM Corporation

Trends in silicon technology: CMOS generations and wafer size

200 mm8“

300 mm12“

180 nm

130 nm

90 nm65 nm

45 nm32 nm 23 nm

450 mm18“

?

Processor and technology development GSE

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Scaling benefits: past & future

Smaller devices – more performance/power!– Less gate capacity– Less wiring distance (even if wires are scaled, RC was constant)‏– => higher clock frequencies / performance– => less power / increased efficiency

Higher density (almost doubled with each CMOS generation) ‏– => allows for more complexity => higher performance– Greater caches

Reduced cost: more chips / wafer

Past

Futu

re

Devices will not gain performance due to scaling– Amplification of transistors will drop

Gate/Subthreshold leakage effects– Power loss worsens with smaller devices and thinner oxides

Density limited by wiring and viasCosts increase due to photolithography limits

– (optical proximity, photoresist roughness, immersion lithography) ‏

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6 © 2010 IBM Corporation

Optical lithography: Ultraviolett => DeepUV => ExtremeUV?

Extreme Ultra-Violet (EUV)‏Lithography

Exposure/Patterning

Double patterning/exposure with 193nm immersion?

(According to ITRS)‏

Processor and technology development GSE

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New devices?Physical limits reached?20219nmCMOS16

Emerging new devices: CNT FET / SET / spin devices

EUV destructionPhotoresist limitations

EUV limits201715nmCMOS15

450mm wafer production3D integrationNew transistor models/designshigh refractive index immersion lithography

No performanc gains . Reduced density gaingate length ~ mean free path => current limited by contacts

Economic limit?Deterministic dopingQuasi-ballistic transport:193nm lithography ends

201422nmCMOS14

EUVlight?Double exposure/patterningUTB-FDSOI / DoubleGate (FinFET)‏AirGap

193nm (ArF) lithography at limitsVariability controlLow-k slowdown

201132nmCMOS13

Immersion (water based) lithographyHigh k, metal gate

193nm: NA>1 requiredGate leakage

200945nmCMOS12

Final frontier20255nmCMOS17

Solution/ForecastTechnical limitsLimits of technologyGeneral Availability

Technology

CMOS future: Saturation of technology?

Final frontier?

© 2010 IBM Corporation

Processor and technology development GSE

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Double patterning/exposure

© 2010 IBM Corporation

subtrateHard mask/etch layer

Photo resist

expose cover etch

Sidewallformation etch Spacer

removal

1) Double patterning by Litho-Etch, Litho-Etch (LELE) ‏

2) Self-aligned double patterning process (SADP) ‏

2ndexposure etch

1stexposure

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Masking material

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EUV lithography @ 13.5 nm wavelength exposure system

© 2010 IBM Corporation

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© 2010 IBM Corporation

End of scaling forces innovation!

• New materials• Innovative device structures

Silicon-On-Insulator

Copper wiring, Low-K dielectric

Strained siliconDouble-Gate Transistor (FinFET) ‏

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© 2010 IBM Corporation

High-K, metal gate technology in CMOS

Problem:Isolation SiO2 layer between gate and channel reached atomic dimension

11 Å ≈ three atomic layers only!Innovation:Add high-k dielectric HfOx onto SiO2• Reduces gate leakage by factor 10x• but: maintains device performance•

Processor and technology development GSE

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© 2009 IBM Corporation

State-of-the-art Technologie, e.g. SEM of 10 Layers of Metal

2x(0.25µm) ‏

4x(0.50µm) ‏

8x(1.2µm) ‏

Layer Thickness

Aktuelle Entwicklungen auf Prozessor und Speicherebene

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IBM CMOS Innovation path

Clock frequency/perform

ance

time

Bulk SiliziumAluminium

Bulk SiliziumKupfer

SOIKupfer

PFET

NFET

Tensile

Gate Poly

Compressive

SOICu/Low-K

SOIStrained SiCu/Lower-K

Interlayer

High-K

Metal gate

SOIStrained Si

High K Metal Gate

Cu/Ultralow-KSOI

Strained SiUT-SOI/FinFet

High K Metal Gate Cu/Airgap

Back End Innovation

Transistor Innovationen

Source: accroding K. Bernstein, IBM research © 2010 IBM Corporation

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Energy density as design challenge!

0

12

3

45

6

7

89

10

1984 1986 1988 1990 1992 1994 1996 1998 2000 2002 2004 2006 2008 2010

Proz

esso

r Fre

quen

z (G

Hz)

„Wishful Thinking“

Realität ?

D.J. Frank et al., IBM J. RES. & DEV. VOL. 46 NO. 2/3 MARCH/MAY 2002 © 2010 IBM Corporation

Power equations:Pactive = α f C Vdd²Pleakage = Ileakage Vdd (≈> Vdd

‏(3

Energy density restricts clock frequency!

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Scaling into smaller dimensions aims for increased device performance

=> Increasing active switching power density

Physical effects: Scaling leads to leakage currents

=> Dramatic increase of passive power density

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System Performance exploiting Multicore-technology

Mod

ule

Hea

t Flu

x(w

atts

/cm

)2

0

2

4

6

8

10

12

14

Vacuum IBM 360 IBM 370

IBM ES9000

IBM 3090S

IBM 3090

IBM GP

Merced

Pentium II(DSIP)

Squadrons

Pentium 4

Prescott

Low-PowerMulti-Core

Bipolar

NMOS / PMOS /CMOS

1950 1960 1970 1980 1990 2000 2010

CMOS

CMOS CMOS

Performance

Density

Disruptive evolution steps

as

„Phase transitions“!

© 2010 IBM Corporation

Processor and technology development GSE

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Example: POWER 7 Processor Chip - OctoCore

© 2010 IBM Corporation

• 567mm², 45nm lithography, Cu, SOI, eDRAM• 1.2B transistors

•Equivalent function of 2.7B•eDRAM efficiency

• Eight processor cores•12 execution units per core•4way SMT per core•32 threads per chip•256KB L2 per core

• 32MB on chip EDRAM shared L3• Dual DDR3 Memory Controllers

•100GB/s memory bandwidth per chip sustained• Scalability up to 32 sockets

•360GB/s SMP bandwidth/chip•20,000 coherent operations in flight

• Advanced pre-fetching Data and Instruction• Binary Compatibilty with POWER6

Ron Kalla, HotChips2009

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Phase Change Memory

In phase change memory, data are stored by switching small regions of a "phase-change" material between one of two phases: • a highly resistive amorphous phase, and• a highly conductive crystalline phase. • Switching is done by using voltage/current pulses to control time temperature within this small volume.

Phase change memory has a number of advantages as a prospective next-generation solid-state memory, including • Solid-state memory array & • potential for CMOS compatibility • Large resistance contrast • Media familiarity from CD-RW • Inherently fast transformation

© 2010 IBM Corporation

Processor and technology development GSE

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3D Integration for new era of 3D circuitry?

A.W. Topol (IBM), IEDM 2005.

Bonded oxide interfaceBonded interface

Gates

Bottom SOI IC

Top SOI IC

IBM J. RES. & DEV. VOL. 50 NO. 4/5 JULY/SEPTEMBER 2006

© 2009 IBM Corporation

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© 2010 IBM Corporation

New device structures of future CMOS transistors

Source DrainBack Gate Oxide

Gate

Back Gate

BackBack--GateGate

M. Ieong et al., IEDM 2001

FinFETFinFET

J. Kedzierski et al., IEDM 2001-3

C-Y Sung et al., IEDM 2005

Direct Substrate BondingDirect Substrate Bonding

B. Doris et al., VLSI 2004

Simplified HOTSimplified HOT

B. Doris et al., IEDM 2002

UTSOIUTSOI

6nm FET6nm FET

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Future CMOS alternatives: Advanced new nano technologies

Molecular Logic

Carbon Nanotubes for FET

Spintronics

Source: public press room IBM research © 2010 IBM Corporation

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Research in nano technology: 3D Chips and computation on atomic scales

State of the art– Information stored with millions of atoms.– Harddisc-Drives: some TeraBytes capacity

Nanotechnology promises– 3D Chips– Storage of data on atomic scales (atoms/molecules)‏– Switches based on atomic molecules– Increases density by a factor of 1000– iPod capable of storing 30.000 HD movies

Older research topics– Millipede– …

Illustration of the preferred magnetic orientation of an iron atom on a specially prepared copper surface. The stability of an atom's magnetic orientation can help determine that atom's suitability for storing data.

Schematic three-dimensional image of a molecular "logic gate" of two naphthalocyanine molecules, which are probed by the tip of the low-temperature scanning tunneling microscope.

An animated view of the Millipede nanomechanical storage device illustrates how an individual tip creates an indentation in a polymer surface (bottom) and how a large number of such tips are operated in parallel (top).

© 2010 IBM Corporation

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Trend: Multicore and application optimized Systems

SupercomputerGaming Application

Protein foldingDOE ApplicationsModelling of Neocortex

ApplicationGames 3D rendering

BladeCenterApplication

networking Data MiningXMLCell blades

© 2010 IBM Corporation

Processor and technology development GSE

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© 2010 IBM Corporation

Changing Paradigmas in a Digital World/Future

Multimedia is key! -era everywhereSearch engines (like Google, Inktomi) extend search for document files, images, streaming media

Natural information processing (like human brain) ‏– Information wrapped in multimedia containers

needs for high bandwidth and compute power– New killer applications:

video processing and digital entertainmentRealistic information processing for (online) gamingSurveillance support

(i.e. Videocams on airports) ‏Simulation/Visualisierung:

polygon modelling > real data processingMedia/streaming services:

High bandwidth, new algorithms

Compute power up to 1018 – 1020 FLOPsand high bandwidth

needed!

Processor and technology development GSE

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© 2010 IBM Corporation

Nature as example of power efficient computing?

Human brain:• 100 billion neurons• 100 trillion synapses• Up to 10000 synapses per neuron

PowerPC core + 8x Synergistic Processor Element + Element interconnect bus mimic neuron

Processor and technology development GSE

Heterogeneous multicore architecture:* exploiting parallel computing

with data parallelism (SIMD)‏* distributed memory

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© 2009 IBM Corporation

Accelerator-Example: Cell Synergistic Processor Element (SPE) ‏Synergistic Processor Element (SPE):• Provides the computational performance• Simple RISC User Mode Architecture • Dual issue VMX-like• Graphics SP-Float• IEEE DP-Float• Dedicated resources: unified 128x128-bit RF, 256KB

Local Store• Dedicated DMA engine: Up to 16 outstanding

requests

Source: „The cell processor“ J. Leenstra, IBM Entwicklung GmbH, technical talk CeBit 2006

Processor and technology development GSE

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1994 1996 1998 2000 2002 2004 2006 2008 2010 ……

ASCIWhite

EarthSimulator

BlueGene/L

ASCIRed

Teraflops

Blue Pacific

1,000

750

500

250

0

HybrIde

ArchItecture

Sources: www.top500.org; not drawn to scale; all statements regarding IBM future direction and intent are subject to change or withdrawal without notice, and represent goals and objectives only

RoadRunner

History of fastest supercomputers (TOP500.org)‏ 10,000

Sources: http://movementarian.com/2006/08/18/flops-mips-watts-and-the-human-brain/; all statements regarding IBM future direction and intent are subject to change or withdrawal without notice, and represent goals and objectives only

10 billion neurons

Chip technology based on standard PPC440

(700MHz BG/L) (850MHz BG/P)‏1976Cray 1s

170 MFlops

© 2010 IBM Corporation

BlueGene/L

PowerXCell 8i

Enhanced Cell/B.E.45nm lithography, 3.2 GHz

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QPACE – most energy efficient HPC System based on PowerXCell!

Node Card (NC) – Rialto

PowerXCell 8iNetwork

Processor(NWP) ‏

Memory

CH0

CH1

Service Processor

(SP)‏

Node CardCPLD

(NCPLD) ‏

Status LEDTemperature

Sensors Flash

VPD

1 .. 2048 1 .. 64

Debug Connector

Front-End Node (FEN)‏

Quantum Chromodynamics Parallel computing on Cell

Highly optimized system using hybrid, multicore, specialized processor architecture!200 TFLOPs peak performance, 50 TFLOPs sustained performanceFactor > 4 less system cost than State-of-the-Art-SupercomputersHighest energy efficiency ever above State-of-the-Art-Supercomputer (>770 MFlops/W) ‏3D Torus topology w/ 6 nearest neighbour interaction based on FPGA network processor

© 2010 IBM Corporation

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SC

homogeneous Multicore

AcceleratorSingle Core

Single-Thread

(Simultaneous)-Multi-Thread

Massive Multi-Threading

Heterogeneous Multi Core (SoC)‏

ST SMT MMT

Trends of the processor architecture

MC Acc

© 2010 IBM Corporation

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Massive Parallel cluster:- blade center based - several possible OS in same chip/blade- OS-based assignment of resources

SMP system:- single thread orientated- superscalar structures- classic scale-up system

Uni processor system:

Hybrid setup:- may be blade center based- OS over various systems- based on various kinds of systems

Many Core:- still coherent memory

Trends of system structure

© 2010 IBM Corporation

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IBM: System Performance from Atoms towards application

Application

S/W Development

Tools

MiddlewareOperating

System Hypervisor

SemiconductorsDevice, process, interconnect

PackageI/Os, wiring level cooling, …

Microprocessor Core

Microarchitecture, logic circuits, design methodology

CacheCache levels,

granularity, latency, throughput

Interconnect

I/O

Compilers

SMP System StructureFabric, switches, busses, memory system, protocols, …

Software

SMPHardwareSystem30-40% -> 10-15%

CAGR

70%-80% CAGR Virtualization,cluster management,etc.

© 2010 IBM Corporation

Processor and technology development GSE

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Outlook: Hybrid Systems and heterogeneous ManyCore-Systems with distributed memory

Prozessor Kern 1Prozessor Kern 2

.Prozessor Kern n

Accelerator 1Accelerator 2

.Accelerator 3

Cache 1Cache 2

.Cache n

Hauptspeicher

...

• Parallelism (Multi-Core) ‏

• Accelerator-Cores (Specialization/Optimization)‏• Integration

(System on Chip, SoC)‏

• Modularity (Flexibility) ‏

• Software optimization

• nano technology

„post von Neumann“ era begins!

© 2010 IBM Corporation

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© 2010 IBM Corporation

Summary

Moore's law still valid!

CMOS scaling continued towards structure sizes beyond 20nm– Lithography not the limiting issue.– EUV still in development.

Technical challenges:– Manufacturing Defects, Yield – “Soft Errors” and fault tolerance

• “On-line”-recognition of soft errors• Recovery/Availability

– Power Density• Optimize devices • Exploit new materials

Mikro-Architecture/System-Architecture– Rethinking paradigms!– Exploit parallelism by use of multicore techniques and vector/SIMD processing– Exploit hybride architectures

Processor and technology development GSE

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Thank you!

Green IT: www.ibm.com/de/ibm/

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Disclaimer

(c) Copyright International Business Machines Corporation 2010.All Rights Reserved. The following are trademarks of International Business Machines Corporation in the United States, or other countries, or both.

IBM IBM Logo Power Architecture

Other company, product and service names may be trademarks or service marks of others.

All information contained in this document is subject to change without notice. The products described in this document are NOT intended for use in applications such as implantation, life support, or other hazardous uses where malfunction could result in death, bodily injury, or catastrophic property damage. The information contained in this document does not affect or change IBM product specifications or warranties. Nothing in this document shall operate as an express or implied license or indemnity under the intellectual property rights of IBM or third parties. All information contained in this document was obtained in specific environments, and is presented as an illustration. The results obtained in other operating environments may vary.

While the information contained herein is believed to be accurate, such information is preliminary, and should not be relied upon for accuracy or completeness, and no representations or warranties of accuracy or completeness are made.

THE INFORMATION CONTAINED IN THIS DOCUMENT IS PROVIDED ON AN "AS IS" BASIS. In no event will IBM be liable for damages arising directly or indirectly from any use of the information contained in this document.

IBM Microelectronics Division The IBM home page is http://www.ibm.com1580 Route 52, Bldg. 504 The IBM Microelectronics Division home page is Hopewell Junction, NY 12533-6351 http://www.chips.ibm.com

© 2009 IBM Corporation

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© 2009 IBM Corporation

Publicly Available Information

•Introduction to the Cell Broadband Engine White Paper•Cell Broadband Engine Public Registers Guide (subset of CDA version) ‏•Cell Broadband Engine Linux Reference Implementation Application Binary Interface Specification •SPU C/C++ Language Extensions Software Reference Manual•SPU Application Binary Interface Specifications•SPU Assembly Language Specifications•Broadband Engine Linux Application Binary Interface Specification•Cell Broadband Engine SDK Libraries, Overview and User’s Guide•Cell Broadband Engine Architecture•Cell Broadband Engine Datasheet•SPU Instruction Set Architecture Specifications•Cell Broadband Engine Processor Full System Simulator•XLC Alpha Edition for Cell Broadband Engine•IBM Cell Broadband Engine Software Sample and Library Source Code•GCC Toolchain for Cell Broadband Engine•Cell Broadband Engine SPE Management Library•Linux Kernel patch for Cell Broadband Engine•SDK Installation script

•Introduction to the Cell Microprocessor, Article•A 4.8GHz Fully Pipelined Embedded SRAM in the Streaming Processor of a Cell Processor, Article•A Double-Precision Multiplier with Fine-Grained Clock-Gating Support for a First-Generation Cell Processor, Article•A Streaming Processing Unit for a Cell Processor, Article•The Design and Implementation of a First-Generation Cell Processor, Article•Microprocessor Report - Cell Moves into the Limelight, Analyst Report •Microprocessor Reports - 2004 Technology Awards, Analyst Report

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