Presentation given at SKYREC seminar, 2011

20
Activated carbon and UV treatment in TOC removal field tests Tero Luukkonen, 20.10.2011

description

Presentation given at SKYREC (2011) seminar describing results of activated carbon and UV treatment in organic material removal from deionized recovery boiler make-up water.

Transcript of Presentation given at SKYREC seminar, 2011

Page 1: Presentation given at SKYREC seminar, 2011

Activated carbon and UV treatment in TOC removal field tests

Tero Luukkonen, 20.10.2011

Page 2: Presentation given at SKYREC seminar, 2011

Main participants in the project

Page 3: Presentation given at SKYREC seminar, 2011

Active carbon tests TOC reductions Effects on conductivity of water Silica

UV treatment tests TOC reductions Effects of number of UV lamps, wavelenght, H2O2 and

TiO2 catalyst LC-OCD measurement results

Contents

Page 4: Presentation given at SKYREC seminar, 2011

Active carbon tests: experimentalset-up

Water treatment process of Stora Enso Oulu mill

Page 5: Presentation given at SKYREC seminar, 2011

Active carbon tests: experimentalset-up

Test scheme of pilot scale AC filters.

Test scheme of full scale AC filters.

demineralized water

Page 6: Presentation given at SKYREC seminar, 2011

AC 1

MB

AC 2

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Active carbon: TOC reductions

Pilot scale AC filters

Full scale AC filters

Residual TOC removal 38 – 57 %

Residual TOC removal 40 – 65 %

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Active carbon: LC-OCD results(after ~ 10 months in use)

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5demineralized water: 155 ppb

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3AC1: 62 ppb

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14MB: 125 ppb 0

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2AC2: 37 ppb

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AC vs. RO (LC-OCD)

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2AC + MB + AC: 37 ppb

0 3 0 2

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RO (Ahlholmens Kraft): 42 ppb

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3AC: 62 ppb

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Active carbon: conductivity

0,0000,0100,0200,0300,0400,0500,0600,0700,0800,090

18.12.10 3.3.11 17.5.11 31.7.11

Con

duct

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AC1 MB AC2

Pilot scale AC filters and MB unit

Full scale AC filter

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23.3.11 2.5.11 11.6.11C

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ctiv

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S/m

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Full scale AC MB

Page 11: Presentation given at SKYREC seminar, 2011

MB unit needed after AC to decrease conductivity Correlation between TOC removal efficiency and

conductivity was a bit unclear (linear R2 only ~ 0,5) Conductivity rise at AC bed was due release of ionized

compounds from AC itself – not ionization of TOC AC bed was not operating as biological filter because

of low nutrient content of water

Active carbon: conductivity,some remarks

Page 12: Presentation given at SKYREC seminar, 2011

Silica causes severescale problems in water-steam cycle

Measured on-lineduring full scale test

New AC bed releasedsilica for ~ 2 weeks

Silica was removedwith subsequent MB

Active carbon: silica

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23.3.11 12.5.11 1.7.11

Silic

a (g

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UV treatment: experimental set-up

Influent water

UV champers

MB unitMB

Demineralizedwater

UV

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One chamber: max. 30 % TOC removal Four chambers: only 4 % increase in TOC removal

Effect of TiO2 catalyst: negligible Effect of H2O2: ? (experimental set-up failed: plastic piping

released organic compounds)

Effect of wavelenght: Medium pressure lamp (wavelenght peaks at 254 nm and 185

nm): better (30 % TOC removal) Low pressures lamp (wavelengh peak sharply at 185 nm): not

that effective

UV treatment: results

Page 15: Presentation given at SKYREC seminar, 2011

TiO2 shouldenhancehydroxyl radicalformation

This type ofcatalyst (porousnet) had noeffect

TiO2 catalyst

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UV treatment: H2O2 dosing

H2O2 (35 %), elevated to ~ 40 m from dosing pointFlowmeter

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Unknown peaks in LC-OCD chromatogramwhich are probablyplastic additives

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UV treatment: LC-OCD

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5demineralized water: 155 ppb

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19UV: 108 ppb

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4UV + MB: 113 ppb

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Active carbon can remove up to 40 - 60 % of residualorganic material (TOC)

AC bed lifetime before regeneration is at least 10 months

Subsequent MB is needed to remove elevatedconductivity and silica

AC works fine in full scale

Conclusions: AC

Page 20: Presentation given at SKYREC seminar, 2011

UV treatment was able to remove up to 30 % of residualTOC

Removal efficiency did not improve with: Lower wave lenght (more energy) H2O2 (oxidant) TiO2 (catalyst) Number of UV chambers (contact time)

Possible reason for this: water should be pretreated with e.g. RO (this is normal procedure in microelectronic orpharmaceutical industry water treatment)

Conclusions: UV