Poster for ASM Comet It Ion PDF
2
Poster Design & Printing by Genigraphics ® - 800.790.4001 SURFACE ENGINEERING BY ION IMPLANTATION OF MATERIALS Younes Sina a,* , Carl J. McHargue b,** a Material Science and Engineering Dep., The University of Tennessee, Knoxville, TN 37996-0759, USA b Center for Materials Processing, The University of Tennessee, Knoxville, USA, TN 37996-0759, INTRODUCTION ION IMPLANTATION CAN BE USED TO ANALYZING TECHNIQUES ADVANTAGES AND DISADVANT AGES OF ION IMPLANTA TION MODIFICATION OF STRUCTURE REFERENCES ABSTRACT CONTACT Younes Sina The University of Tennessee, Knoxville, Material Science and Engineering Department Email: [email protected] du Phone:865-258 1964 Website:http://www .younessina .blogspot.com Ion implantation consists of directing an energetic ion onto surface of a target material. The ions penetrate through the target and gradually loss their energy and finally come to rest ma ny at omic laye rs be low the surface. Ion impla ntation tec hnique is bein g inve stig ated as a gene ral method for altering the near-surface properties of metals, ceramics, and polymers. Ion implantation is an attractive technique for altering the near-surface properties of a wide range of materials. Any element can be injected into a solid forming usually a non-equilibrium comp osit ions and struc tures that can not be achieved by conventional processing methods. •Alter near-surface composition to produce both equilibrium and non-equilibrium compositions •Change crystalline structure •Change mechanical properties •Change chemical reactivity •Produce nanophases •Pattern substrates Some of ion implantation applications are summarized in the following table: Mech a nic al Ch e mic al El ec tr omag n et i c We ar Co rr os io n su pe r co n du ct ivit y Fr icti on Ox idat ion Phot oc ondu ct ivit y Hard ne ss Cat aly sis Resi st iv it y Fatigue Electrochemica l Magnetic properties Plasticity Reflectivity Ductil i ty Diel ectric properties Adhesion Ion implantation technique allows some of ions penetrate into the surface of a material (including metals, ceramics, and polymers) producing a non- equi libr ium stru cture. Forming of amo rpho us st ruct ur es , supe rs at ur at ed so luti ons and metastable compounds may modify some of the material properties. The University of Tennessee, Knoxville Advantages of Ion Implantation: • Controlled doping • Depth of penetration can be controlled by controlling energy of the ion beam • Concentration higher than solid solubility possible • Reactive ions can also be implanted • Implantation of different ions • Low temperature process Disadvant ages of Ion Implantation: • Costly accelerator for ion implantation • Low throughput of the implanter Hip Implant 90% of hip replacements are implanted with nitrogen Nanoindentation-Al 2 O 3 Implanted crystalline samples: hardness ~1.3 × unimplanted Implanted amorphous samples: hardness ~0.5×unimplanted Accelerator for ion implantation The most important analyzing methods to study ion impla nte d mater ials are Ruthe rfo rd Backscatter ing (RBS), Transmission Electron Micr osco py (TEM), and Phot olumine scence Spectroscopy (PL). Nanometer Iron Particles • Sapphire implanted with 1×10 17 Fe/cm 2 (160 keV)at RT • 1-3 nm pure bcc iron single crystals Interaction of Ions with Target 1. C.W. White, C.J. McHargue, P.S. Sklad, L.A. Boatner, and G.C. Farlow, Materia ls Scienc e Repo rts , Ion Impl antation and Anne alingof Crystalline Oxides , Vol.4,No 2,3 July 1989, North Holland Amsterdam 2. T. Burakowski, T. Wierzchon, Surface Engineering of Metals: Principles, Equipment, Technologies , CRC Press, USA, 1999 IONIMPLANTAION PROCESS
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Transcript of Poster for ASM Comet It Ion PDF
8/8/2019 Poster for ASM Comet It Ion PDF
http://slidepdf.com/reader/full/poster-for-asm-comet-it-ion-pdf 1/1
Poster Design & Printing by Genigraphics ® - 800.790.4001
SURFACE ENGINEERING BY ION IMPLANTATION OF MATERIALS
Younes Sina a,* , Carl J. McHargue b,**
a Material Science and Engineering Dep., The University of Tennessee, Knoxville, TN 37996-0759, USAb Center for Materials Processing, The University of Tennessee, Knoxville, USA, TN 37996-0759,
INTRODUCTIONION IMPLANTATION CAN BE USED TO
ANALYZING TECHNIQUES
ADVANTAGES AND DISADVANTAGES
OF ION IMPLANTATION
MODIFICATION OF STRUCTURE
REFERENCES
ABSTRACT
CONTACT
Younes SinaThe University of Tennessee, Knoxville,Material Science and Engineering DepartmentEmail: [email protected]
Phone:865-258 1964Website:http://www.younessina.blogspot.com
Ion implantation consists of directingan energetic ion onto surface of atarget material. The ions penetratethrough the target and gradually losstheir energy and finally come to restmany atomic layers below thesurface. Ion implantation techniqueis being investigated as a generalmethod for altering the near-surfaceproperties of metals, ceramics, andpolymers.
Ion implantation is an attractive technique foraltering the near-surface properties of a widerange of materials. Any element can be injectedinto a solid forming usually a non-equilibriumcompositions and structures that can not beachieved by conventional processing methods.
•Alter near-surface composition to produce bothequilibrium and non-equilibrium compositions•Change crystalline structure•Change mechanical properties•Change chemical reactivity•Produce nanophases•Pattern substrates
Some of ion implantation applications aresummarized in the following table:
Mechanical Chemical Electromagnet ic
Wear Corrosion superconductivity
Friction Oxidation Photoconductivity
Hardness Ca talysis Resis tivi ty
Fatigue Electrochemical Magnetic properties
Plasticity Reflectivity
Ductil ity Dielectri c properties
Adhesion
Ion implantation technique allows some of ionspenetrate into the surface of a material (includingmetals, ceramics, and polymers) producing a non-equilibrium structure. Forming of amorphousstructures, supersaturated solutions andmetastable compounds may modify some of thematerial properties.
The University of Tennessee, Knoxville
Advantages of Ion Implantation:• Controlled doping• Depth of penetration can be controlled by
controlling energy of the ion beam
• Concentration higher than solid solubilitypossible• Reactive ions can also be implanted• Implantation of different ions• Low temperature processDisadvantages of Ion Implantation:• Costly accelerator for ion implantation
• Low throughput of the implanter
Hip Implant
90% of hip replacements are implanted with nitrogen
Nanoindentation-Al2O3
Implanted crystalline samples: hardness ~1.3 × unimplanted
Implanted amorphous samples: hardness ~0.5×unimplanted
Accelerator for ion implantation
The most important analyzing methods to studyion implanted materials are RutherfordBackscattering (RBS), Transmission ElectronMicroscopy (TEM), and PhotoluminescenceSpectroscopy (PL).
Nanometer Iron Particles
• Sapphire implanted with 1×1017 Fe/cm2(160 keV)at RT
• 1-3 nm pure bcc iron single crystals
Interaction of Ions with Target
1. C.W. White, C.J. McHargue, P.S. Sklad, L.A. Boatner, and G.C.Farlow, Materials Science Reports, Ion Implantation and Annealingof Crystalline Oxides , Vol.4,No 2,3 July 1989, North
Holland Amsterdam2. T. Burakowski, T. Wierzchon, Surface Engineering of Metals:
Principles, Equipment, Technologies , CRC Press, USA, 1999
IONIMPLANTAION PROCESS
