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The NEXTorr pump is not just a combination of two different pumps. The integration of the getter and the ion elements has been optimized to enhance pumping performance.
Gases released by the ion pump during the operation are intercepted and removed by the getter element, with a substantial reduction of back-streaming effects. For the same reasons, increased pumping efficiency for H2 and CH4 are obtained. Fine titanium particles which may be sputter-emitted by the ion pumps during operation are also effectively trapped by the getter element, reducing the potential contamination of the vacuum system.
Pump down
Pump down results in a chamber fitted with the NEXTorr and with a 75 l/s Sputter ion pump. A factor 2 improvement in the base pressure is achieved.
Rate of rise
Comparison between the pressure increase in a chamber equipped with the NEXTorr and with a 75 l/s ion pump when the electric power is off (Rate of Rise test). The NEXTorr keeps a much lower pressure thanks to the presence of the NEG element and to the lower outgassing rate from the small ion pump.
Applications Scanning /transmission electron
microscopes
Metrological equipment, semi-conductor defect and review tools
Surface science equipment
Portable analysers and vacuum instrumentation
General purpose UHV-XHV research systems
Particle accelerators, synchrotron radiation sources and related equipment
Industrial UHV systems.
Lainate, Italy - Avezzano, Italy - Bologna, Italy - Weil am Rhein, Germany - Nanjing, P.R. of China - Shanghai, P.R. of China - Tokyo, Japan - Seoul, Korea - Jincheon-kun, Korea - Jhubei City, Taiwan - Colorado Springs CO, USA - San Luis Obispo CA, USA - Watsonville CA, USA - New Hartford NY, USA - Bethel CT, USA - Menlo Park CA, USA
The SAES Getters Group manufacturing companies are ISO9001 certified, the Asian and Italian companies are ISO14001 certified also. Full information about certifications for each company of the Group is available on the corporate website at: www.saesgetters.com
© 2010 SAES Getters. Printed in Italy. All rights reserved. SAES® is a registered trademark of SAES Getters S.p.A., its subsidiaries and affiliates. SAES Getters reserves the right to change or modify product specifications at any time without notice.
SAES Getters S.p.A., Capital Stock Euro 12,220,000 f.p., Executive Office: Viale Italia, 77 - 20020 Lainate (Milan), ItalyRegistered with the Milan Court Companies Register no. 00774910152
NEXTorr®
SAES Getters [email protected]
B.V
S.1
05.0
w e s u p p o r t y o u r i n n o v a t i o n
Unmatched synergy by integrating
two pumping technologies
1.E-03
1.E-04
1.E-05
1.E-06
1.E-07
1.E-08
1.E-09
1.E-100.0 0.5 1.0 1.5 2.0 2.5
Tem
pera
ture
(°C)
3.0
180
160
140
120
100
80
60
40
20
0
Pres
sure
(Tor
r)
Time (day)
NEXTorr SIP Temp
Pumping & CoolingSIP degassing Pumping, baking
(170°C) & NEXTorr condi�oning
SIP OnSIP
NEXTorr
NEXTorr Ac�va�on
Pres
sure
(Tor
r)
Time (day)
NEXTorr SIP
SIPs Off: Rate of Rise Test
System isolated and TMP Off
SIP
NEXTorr
1.E-03
1.E-04
1.E-05
1.E-06
1.E-07
1.E-08
1.E-09
1.E-103.8 4.3 4.8 5.3 5.8 6.3 6.8
NEXTorr: the next step in pumping technologyNon Evaporable Getter (NEG) pumps are very compact and light, vibration-free devices, able to deliver extremely high pumping speed per unit volume with minimal power requirement. For these reasons they have been extensively used in UHV applications.
Presently available NEG pumps can save a significant amount of weight and space in UHV systems providing state of the art performance.
Equipment like scanning and transmission electron microscopes, portable analyzers, systems for surface science characterization or materials preparation can greatly benefit from reducing their weight and footprint. Even in very large research vacuum systems, like accelerators and synchrotrons, the presence of magnets, diagnostic tools and diversified instrumentations greatly limits the space available for vacuum pumps. This poses big challenges to the design of pumping groups both in term space, weight and achievable performance.
Leveraging on its multi-decade experience in getter and UHV-XHV technology, SAES® Getters has now made a further step forward in pumping technique, introducing a novel product family, the NEXTorr, which fully addresses the challenges of miniaturization and extreme performance.
NEXTorr: great performance in a small packageThe NEXTorr concept combines in a suitable design NEG and ion pumping technology. In the NEXTorr design a NEG pump is integrated with a comparatively small size ion pump. The getter element provides very large pumping speed and capacity and acts as the main pump for the active gases, leaving to the ion pump the task of removing noble gases and methane which are not pumped by the NEG. Being methane and rare gases a very small percentage of the gas composition of UHV-XHV systems, generally dominated by hydrogen and oxygenated gases, just a small pumping speed is required for the ion pump. The ion pump also provides a pressure reading, which can be used for vacuum and process monitoring. This approach radically removes the main limitations of NEG pumps, providing in a very compact design a superior product in terms of pumping speed, capacity, power consumption, reliability.
Light, compact,
large pumping speed
NEXTorr®
Is there a solution for compact, light and high performing UHV pumps?
The quick answer is NEXTorr.
Weight and volume of typical ion and NEG pumps versus pumping speed (N2).
140
120
80
100
60
40
20
00 200 400 600
SIPNEG
Pumping speed N2 (l/s)
Wei
ght (
kg)
80
60
50
70
40
30
20
10
00 200 400 600
SIPNEG
Pumping speed N2 (l/s)
Volu
me
(I)
Small weight
The weight of the NEXTorr is ≈ 10 times lighter than an ion pump of comparable performance. This allows reducing the total weight of the vacuum system, particularly important in portable systems or in analytical equipment, like scanning electron microscopes or semiconductor review tools.
Small size
The size of the NEXTorr is ≈ 10 times smaller than an ion pump of comparable performance. The NEXTorr can easily fit in a small space delivering large pumping speed and freeing space in instrumentation-packed systems. Thanks to the compact design, magnetic field is also greatly reduced.
Best in class perfomance
Very low ultimate pressure Vacuum preserved in absence of electric power Shorter bake-out time Pressure reading down to 10-10 mbar Size vs. performance Reduced magnetic effects.
NEXTorr: the next step in pumping technologyNon Evaporable Getter (NEG) pumps are very compact and light, vibration-free devices, able to deliver extremely high pumping speed per unit volume with minimal power requirement. For these reasons they have been extensively used in UHV applications.
Presently available NEG pumps can save a significant amount of weight and space in UHV systems providing state of the art performance.
Equipment like scanning and transmission electron microscopes, portable analyzers, systems for surface science characterization or materials preparation can greatly benefit from reducing their weight and footprint. Even in very large research vacuum systems, like accelerators and synchrotrons, the presence of magnets, diagnostic tools and diversified instrumentations greatly limits the space available for vacuum pumps. This poses big challenges to the design of pumping groups both in term space, weight and achievable performance.
Leveraging on its multi-decade experience in getter and UHV-XHV technology, SAES® Getters has now made a further step forward in pumping technique, introducing a novel product family, the NEXTorr, which fully addresses the challenges of miniaturization and extreme performance.
NEXTorr: great performance in a small packageThe NEXTorr concept combines in a suitable design NEG and ion pumping technology. In the NEXTorr design a NEG pump is integrated with a comparatively small size ion pump. The getter element provides very large pumping speed and capacity and acts as the main pump for the active gases, leaving to the ion pump the task of removing noble gases and methane which are not pumped by the NEG. Being methane and rare gases a very small percentage of the gas composition of UHV-XHV systems, generally dominated by hydrogen and oxygenated gases, just a small pumping speed is required for the ion pump. The ion pump also provides a pressure reading, which can be used for vacuum and process monitoring. This approach radically removes the main limitations of NEG pumps, providing in a very compact design a superior product in terms of pumping speed, capacity, power consumption, reliability.
Light, compact,
large pumping speed
NEXTorr®
Is there a solution for compact, light and high performing UHV pumps?
The quick answer is NEXTorr.
Weight and volume of typical ion and NEG pumps versus pumping speed (N2).
140
120
80
100
60
40
20
00 200 400 600
SIPNEG
Pumping speed N2 (l/s)
Wei
ght (
kg)
80
60
50
70
40
30
20
10
00 200 400 600
SIPNEG
Pumping speed N2 (l/s)
Volu
me
(I)
Small weight
The weight of the NEXTorr is ≈ 10 times lighter than an ion pump of comparable performance. This allows reducing the total weight of the vacuum system, particularly important in portable systems or in analytical equipment, like scanning electron microscopes or semiconductor review tools.
Small size
The size of the NEXTorr is ≈ 10 times smaller than an ion pump of comparable performance. The NEXTorr can easily fit in a small space delivering large pumping speed and freeing space in instrumentation-packed systems. Thanks to the compact design, magnetic field is also greatly reduced.
Best in class perfomance
Very low ultimate pressure Vacuum preserved in absence of electric power Shorter bake-out time Pressure reading down to 10-10 mbar Size vs. performance Reduced magnetic effects.
The NEXTorr pump is not just a combination of two different pumps. The integration of the getter and the ion elements has been optimized to enhance pumping performance.
Gases released by the ion pump during the operation are intercepted and removed by the getter element, with a substantial reduction of back-streaming effects. For the same reasons, increased pumping efficiency for H2 and CH4 are obtained. Fine titanium particles which may be sputter-emitted by the ion pumps during operation are also effectively trapped by the getter element, reducing the potential contamination of the vacuum system.
Pump down
Pump down results in a chamber fitted with the NEXTorr and with a 75 l/s Sputter ion pump. A factor 2 improvement in the base pressure is achieved.
Rate of rise
Comparison between the pressure increase in a chamber equipped with the NEXTorr and with a 75 l/s ion pump when the electric power is off (Rate of Rise test). The NEXTorr keeps a much lower pressure thanks to the presence of the NEG element and to the lower outgassing rate from the small ion pump.
Applications Scanning /transmission electron
microscopes
Metrological equipment, semi-conductor defect and review tools
Surface science equipment
Portable analysers and vacuum instrumentation
General purpose UHV-XHV research systems
Particle accelerators, synchrotron radiation sources and related equipment
Industrial UHV systems.
Lainate, Italy - Avezzano, Italy - Bologna, Italy - Weil am Rhein, Germany - Nanjing, P.R. of China - Shanghai, P.R. of China - Tokyo, Japan - Seoul, Korea - Jincheon-kun, Korea - Jhubei City, Taiwan - Colorado Springs CO, USA - San Luis Obispo CA, USA - Watsonville CA, USA - New Hartford NY, USA - Bethel CT, USA - Menlo Park CA, USA
The SAES Getters Group manufacturing companies are ISO9001 certified, the Asian and Italian companies are ISO14001 certified also. Full information about certifications for each company of the Group is available on the corporate website at: www.saesgetters.com
© 2010 SAES Getters. Printed in Italy. All rights reserved. SAES® is a registered trademark of SAES Getters S.p.A., its subsidiaries and affiliates. SAES Getters reserves the right to change or modify product specifications at any time without notice.
SAES Getters S.p.A., Capital Stock Euro 12,220,000 f.p., Executive Office: Viale Italia, 77 - 20020 Lainate (Milan), ItalyRegistered with the Milan Court Companies Register no. 00774910152
NEXTorr®
SAES Getters [email protected]
B.V
S.1
05.0
w e s u p p o r t y o u r i n n o v a t i o n
Unmatched synergy by integrating
two pumping technologies
1.E-03
1.E-04
1.E-05
1.E-06
1.E-07
1.E-08
1.E-09
1.E-100.0 0.5 1.0 1.5 2.0 2.5
Tem
pera
ture
(°C)
3.0
180
160
140
120
100
80
60
40
20
0
Pres
sure
(Tor
r)
Time (day)
NEXTorr SIP Temp
Pumping & CoolingSIP degassing Pumping, baking
(170°C) & NEXTorr condi�oning
SIP OnSIP
NEXTorr
NEXTorr Ac�va�on
Pres
sure
(Tor
r)
Time (day)
NEXTorr SIP
SIPs Off: Rate of Rise Test
System isolated and TMP Off
SIP
NEXTorr
1.E-03
1.E-04
1.E-05
1.E-06
1.E-07
1.E-08
1.E-09
1.E-103.8 4.3 4.8 5.3 5.8 6.3 6.8
w e s u p p o r t y o u r i n n o v a t i o n
NEXTorr® D 100-5
The NEXTorr D 100-5 is an extremely compact pump able to sorb gases very effectively and with large capacity down to the XHV level.The getter cartridge is made of porous sintered getter disks (St 172) stacked in a highly efficient gas trapping structure featuring pumping speed in excess of 100 l/s (H2). The cartridge is integrated into a CF 35 flange containing a heating element for the getter activation. After the activation is carried out (500°C x 1 h), the pump removes gases at room temperature without any need for electric power to operate. On the other side of the same flange, a diode ion pump featuring 6 l/s(Ar) is connected. Gas flows from the vacuum system to the ion pump through an optimized conductance. The optimized conductance and the special internal design of the ion pump allow the maximum exploitation of the ion pump sorption performance. The configuration of the ion pump with respect of the getter cartridge provides additional pumping synergies. Gases released by the ion pump during the operation, are intercepted and removed by the getter element, with a substantial reduction of back-streaming effects. For the same reasons, increased pumping efficiency for H2 and CH4 are obtained. Fine titanium particles which are known to be continuously emitted by ion pumps during operation are also effectively trapped by the getter element, reducing potential contamination of the vacuum system.
The NEXTorr D 100-5 comes with a dedicated power supply.
74.5
80
31
36
105
16576
Total pump weight (magnets included) 2.2 kgTotal pump volume 0.5 litreType of ion pump Diode Operation Voltage Ion Element 5.0 kVdcOperation Voltage NEG Element 9.0 Vdc
General Features
High pumping speed for all active gases
Pumping speed for noble gases and methane
Constant pumping speed for active gases in UHV-XHV
No intrinsic pressure limitations
Minimal power requirement during operations
Extremely compact and light pump
Reduced magnetic interference
Able to measure pressure lower than 10-9 mbar
Applications
Improvement of the ultimate vacuum in UHV-XHV systems
Reduction of the footprint and weight of vacuum systems
Scanning /transmission electron microscopes
Surface science equipments
Portable analysers vacuum instrumentations
General purpose UHV systems
Particle accelerators, synchrotron radiation sources and related equipments
HIGHLIGHTS
NEXTorr® D 100-5
SAES Getters [email protected]
Pumping speed curves for various gases
Initial pumping speed (l/s)
Gas NEG activated NEG saturated
O2 100 3.5H2 100 -CO 70 6N2 40 5
CH4 15 7Argon1 6 6
Sorption capacity (Torr∙l)
GasSingle run capacity 2 Total capacity 3
O2 5 >500H2 135 N/A 4
CO 0.6 >120N2 0.3 >25
CH4 30 50,000 hours at 10-6 Torr
NEG section Getter alloy type St 172Alloy composition ZrVFeGetter mass (g) 13.5 g
Getter surface (cm2) 114ION section Voltage applied DC+5kV
Number of Penning cells 4Standard bake-out temperature 150°C
1 Measured at 3x10-7 Torr.2 Capacity values with the NEG element at room temperature, corresponding to a drop of the pumping speed to
10% of its initial value. A drop to 15% and 50% has been considered in the case of N2 and CH4.3 Total capacity values for each single gas obtained after many reactivations (getter fully consumed). Capacity
values for the various gases are not additive (a getter fully reacted with one gas specie will not sorb another gas).4 After the getter element has reached its room temperature H2 capacity (135 Torr∙l) it can be “regenerated”. The
regeneration process extracts the H2 stored in the getter. After being regenerated, the pump can start pumping H2 again.
The SAES Getters Group manufacturing companies are ISO9001 certified, the Asian and Italian companies are also ISO14001 certified. Full information about our certifications for each company of the Group is available on our website at: www.saesgetters.com
© 2010 SAES Getters. Printed in Italy. All rights reserved. SAES® is a registered trademark of SAES Getters S.p.A., its subsidiaries and affiliates.
SAES Getters reserves the right to change or modify product specifications at any time without notice.
D.VS.106.0
Product Product description CodeNEXTorr PUMP NEXTorr D 100-5 5H0169Pump power supply NEXTorr PS NIOPS-02 3B0396Power supply cables NEXTorr kit of cables 3B0397Power supply input cable NIOPS-02 input cable 3B0398Output cable ION element NIOPS-02 output cable ION 3B0399Output cable NEG element NIOPS-02 output cable NEG 3B0400
Ordering information
1
10
100
1000
0,0001 0,001 0,01 0,1 1 10 100
Pum
ping
Spe
ed [l
/s]
Sorbed Quantity [Torr l]
NEXTorr D-100-5sorption test (according to ASTM F798-97)
Sorption temperature:25 °CActivation: 60' @ 9 V (45W)Sorption pressure: 3E-6 Torr
H2
CO
N2
O2
CH4
The NEXTorr pump is not just a combination of two different pumps. The integration of the getter and the ion elements has been optimized to enhance pumping performance.
Gases released by the ion pump during the operation are intercepted and removed by the getter element, with a substantial reduction of back-streaming effects. For the same reasons, increased pumping efficiency for H2 and CH4 are obtained. Fine titanium particles which may be sputter-emitted by the ion pumps during operation are also effectively trapped by the getter element, reducing the potential contamination of the vacuum system.
Pump down
Pump down results in a chamber fitted with the NEXTorr and with a 75 l/s Sputter ion pump. A factor 2 improvement in the base pressure is achieved.
Rate of rise
Comparison between the pressure increase in a chamber equipped with the NEXTorr and with a 75 l/s ion pump when the electric power is off (Rate of Rise test). The NEXTorr keeps a much lower pressure thanks to the presence of the NEG element and to the lower outgassing rate from the small ion pump.
Applications Scanning /transmission electron
microscopes
Metrological equipment, semi-conductor defect and review tools
Surface science equipment
Portable analysers and vacuum instrumentation
General purpose UHV-XHV research systems
Particle accelerators, synchrotron radiation sources and related equipment
Industrial UHV systems.
Lainate, Italy - Avezzano, Italy - Bologna, Italy - Weil am Rhein, Germany - Nanjing, P.R. of China - Shanghai, P.R. of China - Tokyo, Japan - Seoul, Korea - Jincheon-kun, Korea - Jhubei City, Taiwan - Colorado Springs CO, USA - San Luis Obispo CA, USA - Watsonville CA, USA - New Hartford NY, USA - Bethel CT, USA - Menlo Park CA, USA
The SAES Getters Group manufacturing companies are ISO9001 certified, the Asian and Italian companies are ISO14001 certified also. Full information about certifications for each company of the Group is available on the corporate website at: www.saesgetters.com
© 2010 SAES Getters. Printed in Italy. All rights reserved. SAES® is a registered trademark of SAES Getters S.p.A., its subsidiaries and affiliates. SAES Getters reserves the right to change or modify product specifications at any time without notice.
SAES Getters S.p.A., Capital Stock Euro 12,220,000 f.p., Executive Office: Viale Italia, 77 - 20020 Lainate (Milan), ItalyRegistered with the Milan Court Companies Register no. 00774910152
NEXTorr®
SAES Getters [email protected]
B.V
S.1
05.0
w e s u p p o r t y o u r i n n o v a t i o n
Unmatched synergy by integrating
two pumping technologies
1.E-03
1.E-04
1.E-05
1.E-06
1.E-07
1.E-08
1.E-09
1.E-100.0 0.5 1.0 1.5 2.0 2.5
Tem
pera
ture
(°C)
3.0
180
160
140
120
100
80
60
40
20
0
Pres
sure
(Tor
r)
Time (day)
NEXTorr SIP Temp
Pumping & CoolingSIP degassing Pumping, baking
(170°C) & NEXTorr condi�oning
SIP OnSIP
NEXTorr
NEXTorr Ac�va�on
Pres
sure
(Tor
r)
Time (day)
NEXTorr SIP
SIPs Off: Rate of Rise Test
System isolated and TMP Off
SIP
NEXTorr
1.E-03
1.E-04
1.E-05
1.E-06
1.E-07
1.E-08
1.E-09
1.E-103.8 4.3 4.8 5.3 5.8 6.3 6.8