NeSSI - depts.washington.edu...NeSSI. Mel Koch. Executive Director, CPAC. February , 2010 ... NeSSI...

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2010 IFPAC Session (New Sampling/Sensor Initiative) NeSSI Mel Koch Executive Director, CPAC February , 2010

Transcript of NeSSI - depts.washington.edu...NeSSI. Mel Koch. Executive Director, CPAC. February , 2010 ... NeSSI...

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2010 IFPAC Session (New Sampling/Sensor Initiative)

NeSSI

Mel KochExecutive Director, CPACFebruary , 2010

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Overview / History / Goals

• History / Objectives– Peter Van Vuuren, Rob Dubois, and Jeff Gunnell  efforts

• Future Directions – Excerpts from an IUPAC talk by Jeff Gunnell

• Goals and Expectations for this session

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What is NeSSI?• Industry-driven effort to define

and promote a new standardized alternative to sample conditioning systems for analyzers and sensors

Standard fluidic interface for modular surface-mount components

ISA SP76

Standard wiring and communications interfaces

Standard platform formicro analytics

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NeSSI™ - objectivesFacilitate the acceptance / implementation of

modular, miniature & smart sample system technology based on ANSI/ISA SP76 standard

Provide a technology bridge to the process for...“sensor/lab-on-a-chip” micro-analytical devices

Promote the concept of field-mounted (By-Line) smart analytical systems

Lay the groundwork for Pipe to Pixel™ open connectivity architecture for intrinsically safe transducer communications and industry standard communication protocols

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Programmable Substrate Heater

NeSSI™ “Sandwich” concept

Ethernet LAN

Analyzer

ControllerV

A

P F

SAM

CANbus

PDA

Auxiliary Heating/Cooling

SubstrateT

T

Standard Sampling Interface

dcs

o&muser

Standard Connectivity

Interface

DevelopmentFocus can beon Sensors !

R. Dubois, Dow

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Future directions in Process Analytics

• Jeff Gunnell (ExxonMobil) to a IUPAC meeting in August, 2009

• NeSSI International Forum in November, 2009 at CPAC

• IFPAC  January, 2010

• ISA AD  April, 2010

• NeSSI session at CPAC  May, 2010 ?

• IMTeC June 2‐3, 2010

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Future directions in Process Analytics

Jff

IUPAC Congress 2009

There are no purely technical questions...

• How does Process Analytics add value?

Copyright Danielle Dubois

Esso Sriracha Refinery and Aromatics Plant, Thailand

...just technical aspects of economic questions

• What’s on the horizon?

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Processing Plants and Process Analytics• Scale of plants is huge: millions of tons per year of products

– commodity products – margins are small ‐ costs are crucial• Flow rates of hundreds of tons per hour in pipes and vessels

– if something goes wrong you quickly have a large amount of off‐spec material

“Measurement of the chemical composition or physical properties of the streams inside a processing plant”

Attributes• Continuous analysis• Unattended operation

– data available round the clock, close to real time

ExxonMobil’s Fife Ethylene Plant, near Cowdenbeath, Scotland

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What constitutes a Process Analytics system?

Samplepreparation Measurement  Data

Transmission

ProcessControl 

Support andMaintenance 

A Samp. returnValidationCalibration

ShelterSafetyUtilitiesServices

Maintenance aidsPerformance mon.

Infrastructure and support systems

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What is on the horizon for Process Analytics?

Samplepreparation Measurement  Data

Transmission

ProcessControl 

Support andMaintenance 

A

Advances in:• Sample preparation modular designs• Data transmission smart systems• Measurement new technologies

NeSSI: New Sampling and Sensor Initiative

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What technologies will influence measurement?In Process Analytics, advances are often enabled 

by developments in other technology disciplines– communications, computing, semiconductor manufacturing,...

Lasers and detectors• lower cost, more reliable, more tuneable, shorter 

wavelength

Computing technology• intelligent systems, data visualisation

Communications• wireless systems

Micro‐Electro‐Mechanical Systems (MEMS)• integration of mechanical elements, sensors, 

actuators, electronics on a silicon substrate

Nanotechnology• structures, devices and systems at nanometer scale Quadrupole MS on a chip: Photo courtesy of Microsaic Systems Ltd.

A micro‐GC: Photo courtesy of Concept to Volume B.V.

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Estimated value of the installed base of process analyser systems USD 15 Billion

Estimated annual market for new equipment- analysers, sample systems, system integration

USD 1.8 Billion

Estimated annual maintenance value (2006) USD 3.5 Billion

Estimated future growth rate (CAGR 2006 to 2012) 5 - 6% per year

Data by courtesy of PAI Partners in their report PAI/2008.PAI Partners contact details: [email protected] and  [email protected]

It  is estimated that over a 15 year life:... for every $1 we spend building a system ...

... we spend $2 owning it ... ...and we get $10 payback ...

J.J.Gunnell and P. van Vuuren, “Process Analytical Systems: a vision for the future” JPAC 6‐1 (2000)and presented at IFPAC 2000

Big numbers: the global market

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Page 13 IUPAC7 August 2009

Summary: in the future expect:

• More on-line Process Analytics systems, less lab measurements– driven by value of measurements

• Smarter, integrated systems– driven by lower cost to own

• Smaller, located closer to the process or inside the process– driven by lower cost to build

• More spectroscopic techniques– tuneable lasers, optical cavities, chemometrics

• More MEMs-based analysers– micro-GCs, micro-MS,...

• More nano-sensors

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Goals and Expectations for this Session

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NeSSI Platform/SAM/Component/Product developers:

• Provide an overview of the current status and availability of NeSSI based products and sensors

• Obtain input and get alignment on the goals for an overall smart analytical system architecture based on the NeSSI/SAM sampling/communication platform 

• Understand the role of the Sensor Actuator Manager (SAM) and what gaps exist in terms commercializing a “standard” SAM device

• Identify the gaps in the current NeSSI platform, sensors, SAM applets  etc. that will allow targeted development 

• Understand the options for adopting external communication protocols based on OPC and other standard DCS communication protocols

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End‐users

• Learn what is new from the NeSSI product developers• Learn about the current acceptance of NeSSI based  system and the extent it will become the de facto sampling and smart analytical system implementation for new and replacement projects

• Assist with identifying gaps that are preventing general acceptance of NeSSI‐based analytical systems at the end‐user level

• Understand the drive towards Gen II/III systems that will achieve lower total cost of ownership

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System Integrators:

• Understand the reasons for adapting  your business model for supporting NeSSI /SAM and Smart Analytical Systems

• Provide input as to what is necessary to adopt NeSSI based systems at the system integration level

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Micro‐Analytical Sensor Developers

• Learn how to use the NeSSI platform to facilitate the design of micro‐analytical sensors that will interface to a process sample via the NeSSI sampling platform, interfacing to SAM and taking advantage of existing communication interfaces to DCS and other remote diagnostic HMIs

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Newcomers

• Become familiar with the Gen II and Gen III concepts that support a new generation of Smart Analytical Systems and the role of NeSSI/SAM as an enabling sampling and communications platform 

• Participate in a forum where you can network  with suppliers, end‐users, system integrators and technology developers that will bring you up to speed about this new paradigm in process analysis that is a major driver towards lowering the total cost of ownership of a new generation of process analyzers

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Addendum

• Relevant Status  of Developments on display in the exposition hall

• NeSSI Newsletter topics are being requested

• The Program for IMTeC in Paris, Francein June (1‐4) is being developed and Steve Doe is buying his ticket asap

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Acknowledgements

• Jeff Gunnell• Peter VanVuuren (recent IFPAC Achievement Award recipient)

• Rob Dubois• NeSSI Steering team• Etc.