Negative Differential Resistance and Instabilities in 2D ...serge/113.pdf · Negative Differential...

31
-- -- Semiconductors 2D in Instabilities and Resistance Differential Negative Vickers J. A. and Ridley, K. B. Balkan, N. by ed. [Physics] Series ASI NATO 307 B 1993) York (New Press Plenum 53-82, pp. , TRANSFER SPACE REAL ON BASED DEVICES LOGIC EMITTING LIGHT HETEROSTRUCTURES InGaAs/InAlAs COMPLEMENTARY IN Mastrapasqua Marco and Luryi Serge Laboratories Bell AT&T 07974 NJ Hill, Murray ABSTRACT devices logic light-emitting novel of implementation the and principle the discuss We conducting complementary between electrons hot of (RST) transfer real-space the on based doped is emitter, the layers, these of One layers. n for contacts more or two has and -type a into injected are electrons field, this by Heated field. electric lateral the applying complementary p is current injection The independently. contacted layer, collector -type transferred the of recombination the from arising signal luminescence a by accompanied region. active collector designed specially a in electrons functional implement to one enables RST by injection charge of symmetry peculiar The the in gate OR exclusive an as acts contacts emitter two with structure simplest The gates. logic The voltages. input the on light output the and current collector the both of dependence electrically is and NAND and OR as functions such performs device multiterminal at demonstrated are operations logic powerful These functions. these between reprogrammable temperature. room transistors. RST of properties symmetry the of studies theoretical recent review also We variety a reveal simulation, device transient and modeling continuation on based studies, These of novelty striking a and instabilities of multiply-connected RST A characteristics. current-voltage the in occurs injection hot-electron which in states steady anomalous support can transistor reflection the break states these of Some electrodes. emitter the between voltage any of absence electron the states, anomalous the In midpoint. at channel the to normal plane the in symmetry hot-electron of formation The electrode. collector the from field fringing a to due is heating state. collector-controlled a such to transition a represents transfer real-space in domains INTRODUCTION 1. new of development the is research microelectronics the in direction important An devices functional an require normally would that tasks logic perform can which , offers (CHINT) transistor injection charge The transistors. several of assembly context. this in opportunities interesting 1 devices of class a to refers concept CHINT The principle the on based 2,3 between electrons hot of (RST) transfer real-space of this employing devices functional Several layers. conducting contacted independently literature. the in discussed been have principle 4-8 conducting the of One 1a. Fig. in illustrated is structure CHINT generic The voltage heating the with cathode, hot-electron a of role the plays emitter, the layers, contacts the to applied S and D separated is collector, the layer, conducting other The . the of increase the in itself manifests effect RST The barrier. heterostructure a by current collector I C bias collector positive constant a at V C high sufficiently a when , bias heating V DS applied. is is discussion, present our for essential transistors, RST of property fundamental A the equivalence symmetry 9,10 states internal the between S [V D , V C] at device the of configurations: bias external different S [ V D , V C ] S [ - V D ( , V C - V D ] ) . (1)

Transcript of Negative Differential Resistance and Instabilities in 2D ...serge/113.pdf · Negative Differential...

Page 1: Negative Differential Resistance and Instabilities in 2D ...serge/113.pdf · Negative Differential Resistance and Instabilities in 2D Semiconductors ed. by N. Balkan, B. K. Ridley,

----Semiconductors2DinInstabilitiesandResistanceDifferentialNegative

VickersJ.A.andRidley,K.B.Balkan,N.byed.[Physics]SeriesASINATO 307B 1993)York(NewPressPlenum53-82,pp.,

TRANSFERSPACEREALONBASEDDEVICESLOGICEMITTINGLIGHTHETEROSTRUCTURESInGaAs/InAlAsCOMPLEMENTARYIN

MastrapasquaMarcoandLuryiSerge

LaboratoriesBellAT&T07974NJHill,Murray

ABSTRACT

deviceslogiclight-emittingnovelofimplementationtheandprinciplethediscussWeconductingcomplementarybetweenelectronshotof(RST)transferreal-spacetheonbased

dopedisemitter,thelayers,theseofOnelayers. n forcontactsmoreortwohasand-typeaintoinjectedareelectronsfield,thisbyHeatedfield.electriclateraltheapplying

complementary p iscurrentinjectionTheindependently.contactedlayer,collector-typetransferredtheofrecombinationthefromarisingsignalluminescenceabyaccompanied

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INTRODUCTION1.

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literature.theindiscussedbeenhaveprinciple 4−8

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currentcollector I C biascollectorpositiveconstantaat V C highsufficientlyawhen,biasheating V DS applied.is

isdiscussion,presentourforessentialtransistors,RSTofpropertyfundamentalAthe equivalencesymmetry 9,10 statesinternalthebetween S [V D , V C] atdevicetheof

configurations:biasexternaldifferent

S [ V D , V C ] →← S [ − V D (, V C − V D ]) . (1)

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thetonormalplanetheinsymmetryreflectionthefromfollowscorrespondenceThissimilaraAlthoughmiddle.theinchannelthecutswhichdirectionsource-drain

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CharacterizationElectrical3.

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----

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For3a.Fig.cf.height, V D > 0 reverse-biasedaisdrainthenearcross-sectiondevicethe,pn 5aFig.inthosetosimilarbetocharacteristicstheexpectwouldOneheterojunction.

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I CRST (V D) totalthetothanrather, I C (V D) expect.naivelycouldoneas6,Fig.of

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________________________________________________________________________________________________

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withtogether13aFig.ofcurvesefficiency I D, I C, I S and, W tot theallwhilethatseeWe.atdiscontinuityaexperiencecurrentsterminal V D ∼∼ 1.2 remainsinputpowertotaltheV,

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________________________________________________________________________________________________

26-30.and22Figs.below:cf.space,

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current.leakagethewithassociatedradiationnonvanishingleakagethewithassociatedefficiencyradiativelowthethatstressedbeshouldIt

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----

1 2

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COLLECTOR-CONTROLLEDANDINSTABILITIESHOT-ELECTRON6.STATES

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forModels µ and τe offunctionaas T e user-definedfromderivedtypicallyarevelocity-fieldMC)(e.g. v (F ) temperature-fieldand T e(F ) homogeneousforrelations

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bydeterminedisspeedrampingcriticalThe20a).(Fig.currentRSTlargeacarriesstateelectrons.channelbyscreenedis20b)(Fig.fieldfringingincreasingthewhichatratethe

ofvalueThe τcr ∼∼ 32.3 fromtravelelectronoftimethetocorrespondsroughlyps S andD channel.theofmiddlethetocontacts

atstateanomalousThe V D = 0 highsufficientlyaforonlyexists V C valuetheand,of V C

cr andgeometrydevicetheondependsdisappears,statethiswhichbelow, v sat.ofvalueThe V C

cr voltageendramptheforanddefined,sharplyis V above V Ccr hasone,

τcr ∝ V criticalrelevantthethatindicatesThis21a.Fig.cf.approximation,goodato(currentdisplacementtheisparameter ∝ dV ⁄dt atocomparedbeshouldwhich),

(currenttransient ∝ v sat emitter.theinprocessesscreeningelectronwithassociated)

________________

aIn† "normal" fordevice,theofstate V DS = 0 determinedcurrent,minimalaonlydrawscollectorthe,ofvariationastatethisIntemperature.theandheightbarriertheby V C ofeffectsolethehas

channel.theinconcentrationelectronthetransistor,field-effectainascapacitively,changing

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----

|0

|10

|20

|30

|40

|50

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Time, psec

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| | | | | |

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Pot

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20Fig. withtransistortransferreal-spaceaofsimulationTime-dependent. L CH = 5 µm,d B = 0.2 µ andm, v sat = 107 fromlinearlyrampedisvoltagecollectorThecm/s. V C = at0 t = to0V = atV2 t τ= situations:twoforplottedareresultsThe. =τ ps32.0 < τcr andlines)(solid

=τ ps32.5 > τcr lines).(dashed(a) figureleft currentCollector: I C (t Dottedstructure.devicetheofcross-sectionshowsinset;)

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voltagesendramp V shortFor. L CH dependencethe τcr (L CH) quadratic,approximatelyislongforand L CH linear.isdependencethe

|0

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|3

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| | | | | |1

| | | | | | | | |10

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forstate,normaltheinsettles τ < τcr (stateanomalousthein d 22).Fig.ofnotationtheinfigureLeft ofDependence: τcr 5aforvoltageendramptheon µ device.m V C

cr = V.1.21figureRight labelsCurve: VSD (voltageendramptheindicate V velocitysaturatedthevolts,in)

(S 10in) 7 cm⁄ (thicknessbarriertheands D A1000in) ˚ indicatelinesstippleanddashedThe.respectively.dependences,quadraticandlinear

CharacteristicsStationary atstatesstationarytwothefromStarting. V D = 0 possibleisit,characteristicsthedetermineto I D (V D) and I C (V D) voltagecollectorfixedaat V C = 2 V

thetorelative S methodcontinuationpredictor-correctortheWithelectrode. 34 canone,anyfromstartingcharacteristic,theofcomponentsconnectedshaped,arbitrarilytrace

locusthetocorrespond22Fig.incurvesThecomponent.eachwithinstateestablished

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theinpointsof (V D, I D) givenaatstatesteadyahasdevicethewhichforplane V C To.displayedtheknowledge,our I D (V D) aofexamplefirsttherepresentsdependence

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22Fig. characteristicsCurrent-voltage.method.continuationthebyobtained

23Fig. profilepotentialchannelThe. V (x )sametheatstatesCHINTdifferentin

(biasexternal V C = ,V2 V D = V).0.825

statethatindicatesThis d oframpingrapidinfoundfirsthadwe(which V C at V D = 0,ofvariationquasi-staticabyaccessibleexperimentallyis20)Fig.cf. V D fixedat V C The.

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geometry.devicetheandassumedparameterstransport

statesanomalousUnstable statenormalthetoadditionIn. o stateanomaloustheand d,(statesanomalousotherthreereveals22Fig. a , b and, c at) V D = 0 profilesThe. V (x )

24.Fig.inshownarestatestheseinchannelthealongactualtheproblem,theofnaturenon-lineartheofbecausethatclearisIt

theofrepresentationsirreducibletoaccordingtransformnotmaystatesstationaryatbehaviordevicethegoverningequationstheofgroupsymmetry V D = 0 The.

theseorsymmetricfullyeitherisstatesanomaloustheinfieldsinternalofdistributionsymmetrytheunderanotheroneintotransformandpartnersofsetaformstates

statesThus,operations. a and c thoughevenother,eachintotransformreflectionunderstateshand,othertheOnrepresentations.linearone-dimensionalonlyhasgroupthe o,

b and, d theBiasingsymmetric.are D torespectwithelectrode S reflectionthebreakssymmetrydifferentofstatesbetweentransformationcontinuousaallowsandsymmetry

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loop.theon

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Pot

entia

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24Fig. fourtheinpotentialchannelThe.atstatesanomalous V D = 0.

atstatesfivetheOf V D = 0 and V C = 2 (twoonlyV, o and d respectwithstableare)instatesofevolutionthefollowingbyascertainedbeenhasThisperturbations.smallto

atstatessteadytheofvicinitythe V D = 0 statesinitialthe25,Fig.simulations,theseIn.a ± , b ± and, c± fromdisplacedlooptheonstateawithcoincidetoassumedbeenhavea , b and, c voltageinfinitesimalanbyrespectively,, δV D ±= 10 thesethoughEvenmV.

foundweones,stationarycorrespondingthefromindistinguishablevirtuallyarestatesthat a + , b − and, c− intoevolved o while, a − , b + and, c+ into d instabilitiestheseAll.

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electrons.channelbyscreeningthetoduequenchcompleteitsordomain,hot-electron

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|30

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25Fig. statesnon-stationarytheofEvolution. c+ andlines)(solid c− atlines)(dashed V D = .0inshowniscurrentinjectiontheofdependenceTime figureleftthe selectedthemarksymbols;

inplottedareprofilestemperatureelectronthewhichatevolution,theintimes figurerightthe .The "plateau" thein I C (t neardependence) t = whensituationthetocorrespondsevidentlyps20

nearalreadyexistsdomainhot-electronfully-developeda D thenearyetnotbut S electrode.

ascertainedbeusuallycanstategivenaofstabilityofquestionthethatNotewithout simulationstime-dependentcostly – diagramsphasetheinspectingbyI D (V C,V D) and I C (V C,V D) statesofinstabilityThebelow.discussed a and c associatedis

theinNDRawith I C (V C) dependence, ∂I C⁄∂V C < 0 ofthatand, b bothwith ∂I C⁄∂V C < 0and ∂I D⁄∂V D < 0 found.beenyethasrulethistocounterexampleNo.

characteristics.current-voltageCHINTofmappingsDC shows26Fig. I D (V DS)atdevicesingleaforcharacteristics T = 300 voltagescollectorfixedofseriesausingK

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(V CS topologicalnumerousshowscharacteristicstheofexaminationClose).lowatFETmodeaccumulationanasBeginningtransformations. V CS (< 1.0 onsettheV),

theinregionNDRslightaofformationtheinitiatesRSTof +V DS (direction ∼∼ 1.0 AtV).higher V CS bothforappeartobeginfoldsseparate, V DS > 0 and V DS < 0 thealthough,

Atconnected.singlyremaincurves V CS ∼∼ 1.2 inappeartobeginsloopdisconnectedaV,minimumabyboundedsurfaceatocorrespondingplane,left-handthe V CS 3Dthein

(27Fig.inshownAs26.Fig.inspace V CS = 1.5 needle-liketheandloopclosedthisV),theandopen,tocontinuebothplaneleft-handtheofbottomthefromemanatingfold

frombackwardstracingbyreachedknee(theplaneright-handtheinnotch‘‘S-shaped’’V DS ∞+= asleftwardmoves) V CS Byincreases. V CS = 1.6 ischaracteristictheV,

componentconnectedsinglyaandorigin,theincludeswhichloopaintotransformedtwoTheseloop.thewithintersectionsorfoldsnohasbutmultivaluediswhich

largerfortopologysametheessentiallymaintaincomponents V CS theiralthoughinseparation (I ,V ) 22.Fig.cf.increases,

-2

2 1

2

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0.1

VDS (Volts) VCS(Volts)

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26Fig. CHINT: I D-V DS forcharacteristics1.0V ≤ V CS ≤ (2.0V L CH = 5µm, d B = 0.2µm,v sat = 1×107cm⁄ representCurvess).

constantatsimulations V CS byseparated∆V CS = 0.1V.

anomalousofmultiplicitytheNote V DS = 0 atgeneral,Instates. V DS = 0 canwe,numberoddanexpect m S numberevenanandstatessymmetricof m A asymmetricof

theinpathunboundedoneonlyandonebealwaysshouldtherebecauseones, (V DS , I D)Varyingpairs.incomestatesasymmetricsymmetry,bywhile,plane, V CS havewe,

(withcasesrealizetoablebeen m S, m A) = 4)(5,and4),(3,2),(3,,0)(3,,0)(1, aIn.ofvariationcontinuous V CS thewhensituationaatarrivecourse,ofcan,one I D (V DS)

thetouchesonlycurve V DS = 0 anistherepointsingularthisAtcrossing.withoutaxisdistinctofnumbertotaltheandstates,symmetrictwoofdegeneracyaccidental

even.becomesstatessymmetricdisconnectedtopologicallytobelongmaypartnerssymmetrytheInterestingly

theofbranches I D−V DS asymmetricunpairedofexistencethefactinisItcharacteristic.ledhasthat27Fig.incurveouterconnected,singlythealongstates 23 discoverytheto

origin.thefromdisconnectedloop,theoftheofmapashows28Figure I C-V DS thetocorresponding, I D-V DS 27.Figs.inplot

sincestatedevicethedefinecompletelytheyTogether, I C = I S + I D ofslicesAlthough.I C-V DS givenaforspace V CS space,3Dtheinsymmetryistheresymmetric,notare

symmetrytheunderinvariantiscurrentcollectortheSince(1).Eq.byexpressedofplotstransformation, I C-V DS definedPoints28.Fig.cf.self-intersections,manyhave

thewithintersectionsingleaby V DS = 0 statessymmetrictocorrespondaxis( I C = 2 I D = 2 I S reflective,representintersectionscoincidenttwobydefinedpoints);

pairs.asymmetric

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|-2.0

|-1.0

|0.0

|1.0

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|-0.3

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|-2.0

|-1.0

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|1.0

|2.0

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|0.3

|0.4

|0.5

|0.6

|0.7

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27Fig. CHINTSingle: I D-V DS characteristicfor26Fig.from V CS = whichV1.50

componentself-intersectingabothcontainsloop.disconnectedaand

28Fig. CHINTSingle: I C-V DS characteristicfor V CS = thetocorrespondingV1.50 I D-V DS 27.Fig.in

have28,and27Figs.incurvesbyrepresentedthoselikemappings,spacePhasecloseinfinitesimallytheirself-intersections,ofvicinitytheinexceptthatpropertythe

vectorsstatecloseinfinitesimallytocorrespondpoints z ∈ R multidimensionaltheinspace R fieldstheall[i.e.devicetheofstatethedescribing, n (x ,y ), T e (x ,y ), ψ (x ,y ) etc.].,

aondistancefiniteabyseparatedpointstrue:alwaysisconverseThe (V , I ) planestatesdistinctmacroscopicallytocorrespond z pseudo-arclengththeinContinuation.

experimentalcontrast,Instate.devicetheofevolutionsmoothcompletelyaproducesinstanceforpoints,limitattransitionsabruptforcesimulations)MC(andmeasurements

k→u as22,Figs.in V DS orformationthetocorresponding0,fromincreasedisnegativeresultantThedomain.high-temperaturehigh-field,aofrepositioning I D at u

toduedrain,theofthatthanlowerisdomainelectronhottheinpotentialtheasarisesfield.collectorunscreenedthe

fororiginthefromstartedsimulationscontinuationofresultstheshows29Fig.V DS > 0 velocitysaturationhigherausing, vsat theBoth. V CS and V DS forthresholds

inpointslimitorfoldscausing IV withincrease vsat forreducedarethresholdsThe.smaller L CH inabovedescribedthosetosimilararedependenciesThese30.Fig.see,

transientaofspeedrampcriticalthewithconnection V CS inducetorequiredexcitationstablethe d atstate V DS = 0.

artificialsomewhattheofspiteIn v (F ) and T e(F ) canitsimulation,theinassumedRSTthepastobservedstepsnonlineartheofcausethethatconcludedsafelybe

Transientcontinuation.bypredictedfoldsandloopstheareexperimentsinthreshold29Fig.in(e.g.foldsthatindicateproceduresmeasurementtocorrespondingsimulations

for V CS = 3.0 transitionstatethewhereofPredictionslength.sometofollowedbecanV)dccompletefromaccuratelyextractedbecanoccurwill IV mustanalysisthisbutmaps,

circuitexternalaswellasterminalsallateffectsNDRofconsiderationincludeconfigurations.†

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ofcontinuitytheforbasisphysicaltheiswhatunderstandtointerestingverybewouldIt† W tot notedfootnotetheand13bFig.seecharacteristics,CHINTexperimentalintransitionsmanyatempirically

(6).Eq.below

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----

|0.0

|1.0

|2.0

|3.0

|4.0

|-0.1

|0.0

|0.1

|0.2

|0.3

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VCS=2.00V

VCS=3.00V

VCS=4.00V

|0.0

|1.0

|2.0

|3.0

|-0.05

|0.00

|0.05

|0.10

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VDS (Volts)

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/µm

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VCS=1.0V

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VCS=2.0V

VCS=2.5V

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29Fig. CHINT: I D-V DS aascharacteristicsoffunction V CS (L CH = 5 µm, d B = 0.2 µm,

v sat = 2 × 107 cm⁄ onlyshownareResultss).thefor V DS > thefrominitiatedbranches0

origin.

30Fig. CHINT: I D-V DS aascharacteristicsoffunction V CS (L CH = 2 µm, d B = 0.2 µm,

v sat = 1 × 107 cm⁄ onlyshownareResultss).thefor V DS > thefrominitiatedbranches0

origin.

ResultsSimulationtheofSummary6.3

complicatedpossesstransistorsinjectionchargeThe – multiply-connectedoften –IV highsufficientlyaofApplicationcharacteristics. V DS fixedaat V CS > 0 aforces

domain.electronhotaofformationthebyaccompaniedtransition,switchingatoelectronsofratesupplyfinitethewhenformdomainsthePhysically, " spothot " is

fringingtheunscreendomainsdepletedThespot.thatfromfluxRSTthebyexceeded(field "normally" collectorbecomesRSTtheandelectrons)channelbyscreened

controlled.peculiartheironbasedbetolikelyaredevicesRSTofapplicationsPotential

inupshowssymmetrysameThepolarity.fieldheatingthetorespectwithsymmetrydeviceRSTmultiterminalaofStatesformation.domainhot-electrontheofanalysisthe

arebiasgeneralunder "adiabatically" theofstatesanomalousthetoconnectedatconfigurationsymmetric V D = 0 potentveryprovetolikelyisanalysissymmetryThe.

2b,Fig.ofgateORNANDtheassuchgeometry,complicatedmoreofdeviceswithisgroupsymmetrywhose C 3 v atoccurthatPhenomena. V DS = 0 essentialthecapture

general.indomainsRSTthewithassociatedphysicsmodeltransportausingoutcarriedbeenhaveabovedescribedsimulationsThe

mobilitydifferentialnegativeafromresultinginstabilitiesusualtheeliminateswhichverifiedbeenhaveresultsTheexcluded).artificiallybeenhaslatter(the 23 remainto

InGaAs.forappropriatemodelvelocity-fieldrealisticmoreawithvalidqualitatively2,Fig.inthoselikestructure,deviceRSTparticularaofsimulationquantitativeaFor

anomaliesnoveltheHowever,model.transportrealisticaneedclearlywouldoneinreproducedqualitativelybecan6,Sect.indiscussed any channelallowsthatmodel

flux.RSTtheincludesself-consistentlyandheatedbetoelectronsmethodscontinuationofusetheisanalysisabovetheoffeatureessentialAn

theSlicingspace.phasedevicefulltheofinspectiontheallowwhich I D (V D, V C) surfacedifferentat V C inresults I D (V D) evolvefieldsinternalThetopologies.differentofcurves

connectedaalongsmoothly I D (V D) aofapproachthesignalnotdoandtrajectoryoftypeglobalthegivesuccessfullymappingsPhase-spacetransition.switching

thetoasguessunerringangiveusuallytheyMoreover,information. stability givenaofunderstandingThesimulations.transientcostlierbysupportedsubsequentlystate,

thetotransistorsRSTofapplicationtheininvaluablebewillfashionthisingainedsystems.high-performanceofdesign

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----

CONCLUSION7.

leight-emittingnovelofimplementationtheandprinciplethediscussedhaveWeindependentlybetweenhot-electronsoftransferreal-spacetheonbaseddevices,logic

thatdevice,logicmultiterminalmonolithicAlayers.complementarycontactedThedescribed.beenhasgate,ORNANDanaselectricallyandopticallybothfunctions

thebothexhibitsheterostructure,InGaAs/InAlAs/InGaAsaninimplementeddevice, ortheand nand outputtheeitherinterminals.inputthreetheoftwoanyoffunctions

arebutlayoutthebyfixednotarefunctionsThesepower.outputopticaltheorcurrent(thirdtheonvoltagethebyinterchangeable "control" controltheofChoiceterminal.)

powerfulsuchwithdevicelogicuniqueaisThisarbitrary.moreover,is,electrodecircuitaofcoursetheinreprogrammableelectricallyisfunctionitscapabilities;

operation.thansmallermuchisdiscontinuitybandvalencetheusedheterostructuretheIn

thetodueiscurrentnon-RSTparasitictheofmostandbandconductiontheinthatthefromholesofinjection p theintolayercollector-type n atoDueemitter.-type

activetheconfininglayerInAlAswide-gapawithstructurecollectordesignedspeciallyhighermuchiscollectortheincarriersminorityofefficiencyradiativethelayer,InGaAs

andnon-radiativerelativelycurrentleakagethemakesThisemitter.theinthatthantemperature.roomatperformancelogicopticaltheenhancessubstantially

atosimilarsource,light-emittingincoherentanisdevicedemonstratedThefrequencytheimproveandpoweroutputitsincreasetoorderInLED.conventional

opticalresonantainemissionstimulatedtheofadvantagetakemustweperformance,density,currentinjectionhighThecavity. J C >∼ kA25 ⁄cm2 devicepresenttheinobtained,

longconventionalinthattocomparableefficiency,radiativeinternalhighitsandtransferreal-spaceaofimplementationfuturetheforpromisingareLED’s,wavelength

laser.logicnonlinearcomplicatedashowdeviceslogicRSTtheoptically,andelectricallyBoth

ondependencesstateinternaltheininstabilities,novelofvarietyaincludingbehavior,usetotheoretical,andexperimentalbothrequired,isworkMuchvoltages.inputthe

functionalfastofimplementationtheforfashioncontrolledaininstabilitiesthesedevices.

ACKNOWLEDGEMENTS

Cho,Y.A.Capasso,F.Belenky,L.G.collaboratorsourthanktowishWetocontributionstheirforSivcoL.D.andPinto,R.M.Hutchinson,L.A.Garbinski,A.P.

here.reviewedworkthe

REFERENCES

Hendel,H.R.andGossard,C.A.Kastalsky,A.Luryi,S.1. " BasedTransistorInjectionChargeTransferHot-ElectronReal-Spaceon ", DevicesElectronTrans.IEEE ED-31 (1984).:832

Gribnikov,S.Z.2. " heterostructure,multilayerainconductivitydifferentialNegative " Fiz.Poluprovodn.Tekh. 6 [(1972):1380 Semicond.-Phys.Sov. 6 (1973)].:1204

MorkocH.Hess,K.3. , Streetman,G.B.andShichijo,H., " resistancedifferentialNegativetransfer,electronreal-spacethrough " Lett.Phys.Appl. 35 (1979).:469

Kastalsky,A.andLuryiS.4. " devicesinjectionelectronHot ", Microstr.Superlatt. 1 (1985).:389

Kastalsky,A.5. " devicestransferreal-spaceNovel " in, ElectronicsHigh-speed byed.,62-71.pp.1986)Berlin,(Springer-Verlag,BenekingH.andKallbackB.

Sivco,L.D.andCho,Y.A.Garbinski,A.P.Pinto,M.Mensz,P.Luryi,S.6. " injectionChargelogic", Lett.Phys.Appl. 57 (1990).:1787

Page 30: Negative Differential Resistance and Instabilities in 2D ...serge/113.pdf · Negative Differential Resistance and Instabilities in 2D Semiconductors ed. by N. Balkan, B. K. Ridley,

----

Littlejohn,A.M.andKim,W.K.Tian,H.7. " logictransferreal-spaceheterojunctionNovelinvestigationmodel-basedastructures:transistor ", DevicesElectronTrans.IEEE ED-39:2189

(1992).

Sivco,L.D.andCho,Y.A.Mensz,M.P.8. " multiplierfrequencyinjectionCharge ", Appl.Lett.Phys. 61 (1992).:934

Pinto,R.M.andLuryiS.9. " indomainshot-electronofformationtheandsymmetryBrokentransistorstransferreal-space ", Lett.Rev.Phys. 67 (1991);:2351 " real-spacetheofSymmetry

transistorsinjectionchargeinstatescollector-controlledandtransfer ", Tech.Sci.Semicond.7 (1992).:B520

Luryi,S.10. " circuitslogicandtransistorsinjectionCharge ", Microstr.Superlatt. 8 (1990).:395

Luryi,Serge11. " electronshotofreal-space-transfertheonbaseddevicesemittingLight ", Appl.Lett.Phys. 58 (1991).:1727

Cho,Y.A.andSivco,L.D.Hutchinson,L.A.Luryi,S.Capasso,F.Mastrapasqua,M.12." withtransistorinjectionchargeemittingLight p collector-type ", Lett.Phys.Appl. 60:2415(1992).

Cho,Y.A.andSivco,L.D.Hutchinson,L.A.Capasso,F.Luryi,S.Mastrapasqua,M.13." propertiesopticalandelectricaltransfer:real-spaceonbasedtransistoremittingLight " To,

inappear Dev.Electr.Trans.IEEE 1993).(February,

Cho,Y.A.andSivco,L.D.Garbinski,A.P.Belenky,L.G.Luryi,S.Mastrapasqua,M.14." andORbetweenreprogrammableelectricallydevicelogicemittinglightMulti-terminal

functionsNAND " 1992-IEDM, DigestTech. tosubmittedand(1992) Dev.Electr.Trans.IEEE .

Ren,F.andSivco,L.D.Cho,Y.A.Luryi,S.Mensz,M.P.15. " three-intransferspaceRealdevicesheterostructureInGaAs/InAlAs/InGaAsterminal ", Lett.Phys.Appl. 56 (1990).:2563

Luryi,S.andSivco,L.D.Cho,Y.A.Garbinski,A.P.Mensz,M.P.16. " transconductanceHighthree-terminalinconductancedifferentialnegativeofratiopeak-to-valleylargeand

devicestransferreal-spaceInGaAs/InAlAs ", Lett.Phys.Appl. 57 (1990).:2558

Cho,Y.A.andAlavi,K.Wecht,K.People,R.17. " conduction-bandtheofMeasurementIngrownepitaxialbeammolecularofdiscontinuity 0.52Al0.48As⁄In0.53Ga0.47As N -n

byheterojunction C -V profiling", Lett.Phys.Appl. 43 (1983).:118

Dutta,K.N.andAgrawalP.G.18. LasersSemiconductorLong-wavelength Nostrand(Van,1986).YorkNewReinhold,

Luryi,S.19. " transistorsHot-electron " in, DevicesSemiconductorHigh-Speed Ed.Sze,M.S.,7.Chap.1990)York,New(Wiley-Interscience,

Shah,J.andKashK.20. " IninrelaxationenergyCarrier 0.53Ga0.47 fromdeterminedAsstudiesluminescencepicosecond ", Lett.Phys.Appl. 45 (1984).:401

Coleman,J.J.andEmanuel,M.Higman,T.Hess,K.Kizilyalli,C.I.21. " CarloMonteEnsembledevices(NERFET/CHINT)transferspacerealofsimulation ", Electron.Solid-St. 31:355

(1988).

Hess,K.andKizillyalliC.I.22. " TransistorsTransferReal-SpaceofPhysics ", Phys.Appl.J.65 (1989).:2005

Luryi,S.andPintoR.M.23. " characteristicscurrent-voltageconnectedmultiplyofSimulationtransistorsinjectionchargein " 1991-IEDM, DigestTech. (1991).507-510pp.,

Luryi,S.andSivco,L.D.Cho,Y.A.Garbinski,A.P.Schumacher,H.Mensz,M.P.24." transistorsinjectionchargeofoperationMicrowave " 1990-IEDM, DigestTech. 323-326pp.,(1990).

Fischer-Colbrie,A.andMoll,N.Hueschen,R.M.25. " inperformancemicrowaveImprovedtransferelectronreal-spaceonbasedtransistors ", Lett.Phys.Appl. 57 (1990).:386

Mizutani,T.andMaezawaK.26. " transistor-charge-injectionofcharacteristicsHigh-frequencyfield-effectmetal-insulator-semiconductorAlGaAs/InGaAs/GaAsinoperationmode

transistors", Phys.Appl.J.Jpn. 30 (1991).:1190

Page 31: Negative Differential Resistance and Instabilities in 2D ...serge/113.pdf · Negative Differential Resistance and Instabilities in 2D Semiconductors ed. by N. Balkan, B. K. Ridley,

----

Hamm,A.R.Cho,Y.A.Mastrapasqua,M.Luryi,S.Garbinski,A.P.Belenky,L.G.27.Smith,R.P.andSivco,L.D.Laskowski,J.E.Hayes,R.T. " light-emittingCollector-up

n-InGaAs/InP/p-InGaAsandn-InGaAs/InAlAs/p-InGaAsintransistorsinjectionchargeHeterostructures" tosubmitted, Phys.Appl.J. (1992).

Pinto,R.M.28. " EffectsDeviceULSIofSimulation " in, TechnologyandScienceULSI1991 J.,eds.,Cellar,K.G.andAndrews Proc.Soc.Electrochem. 91-11 (1991).

Stratton,R.29. " barrierssemiconductorinelectronscoldandhotofDiffusion ", Rev.Phys.126 (1962).:2002

BlK.30. ∅tekjaer, " semiconductorstwo-valleyinelectronsforequationsTransport ", Trans.IEEEDev.Electron ED-17 (1970).:38

Pinto,M.andLuryiS.31. " transistorsinjectionchargeinstatesCollector-controlled " in, PhysicsDevicesOptoelectronicofSimulationand Yevick,D.byed., SPIEProc. 1679 (1992).54-65pp.,

Thomas,E.R.andCaugheyM.D.32. " torelatedempiricallysiliconinmobilitiesCarrierfieldanddoping ", IEEEProc. 55 (1967).:2192

Wordeman,R.M.andBaccaraniG.33. " inovershootvelocitysteady-stateofinvestigationAnsilicon", Electron.Solid-St. 28 (1985).:407

Smith,K.R.Pinto,R.M.Jr.,Coughran,M.W.34. " semiconductorinmethodsContinuationsimulationdevice ", Math.Appl.andComp.J. 26 (1989).:47