Mechanisms during FAST 4: Oxide ceramics · f *= stress intensification factor G = grain size n =...
Transcript of Mechanisms during FAST 4: Oxide ceramics · f *= stress intensification factor G = grain size n =...
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March 24, 2011 | FAST School | O. Guillon | 1
Mechanisms during FAST 4:
Oxide ceramics
Olivier Guillon
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Outline
Methodology to answer this question:
FAST vs. Hot Pressing
• Identification of main densification mechanism
• Evaluation of microstructure
Effect of heating rate
Effect of electric field/current
Lower temperatures, higher densities, smaller grain sizes
…compared to free sintering!
Question: What really happens during FAST?
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Goal
Transition from the „black box“ era to the intelligent „tool box“ approach
When you know how a tool works, you can get more out of it!
Based on experimental evidence
?
!
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FAST vs. Hot Pressing
FAST (HP 25/1, FCT Systeme) Measuring system:
• Pyrometer (P) from 450°C (standard)
• Thermocouple (T) from
room temperature (optional)
HP (HPW 150, FCT Systeme) Measuring system:
• Thermocouple (T)
Temperature calibration
By melting copper powder
(T)
Sample
HP FAST
(P)
(T)
Graphite
felt
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a - alumina (Al2O3)
Insulator (dielectric)
Model material for sintering studies
Purity: 99.99 %
Average particle size: 150 nm
(TMDAR, Taimei Chem., JP)
Purity: 99.80 %
Average particle size: 700 nm (CT 3000 SG, ALMATIS, USA)
Theoretical density: 3.986 gcm-3
Powder filling
Ø 20mm pressing tool
Initial compaction
(50 MPa, 3 min)
Load adjustment
15-50 MPa
Start of the sintering experiments
Heating rate: 10 Kmin-1
Max. temperature: 1100-1250 °C
Atmosphere: Vacuum
Dwell time: up to 2 h J. Langer, M. Hoffmann, O. Guillon, Acta Materialia (2009)
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Sintering behavior of alumina
Curves for FAST and HP show similar trends, for both particle sizes
Densification starts earlier for FAST but same final densities
Differences in relative density at the beginning of dwell time:
150 nm: Drrel = 0.076 DT ≈ 25 K
700 nm: Drrel = 0.026 DT ≈ 05 K
Rela
tive d
ensity
Time
Dwell time Dwell time
Time
Re
lative
den
sity
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Analysis of the sintering mechanism
r = relative density pa = applied pressure
H = numerical constant T = temperature
f = stress intensification factor* G = grain size
n = stress exponent m = grain size exponent
0
lnh
hz
n
am
zp
kTG
HD
dt
d
dt
df
r
r
1
True strain:
1
01
11
r
rf* after Montes et al., Comp. Mat. Sci. (2006)
ρ0 green density
or Helle et al., Acta Metall. (1985)
0
0
²
1
rrr
rf
Mechanism Stress
exp. n
Grain size
exp. m
Lattice diffusion 1 2
Grain boundary
diffusion
1 3
Viscous flow 1 0
Grain boundary
sliding
1 or 2 1
Plastic
deformation
≥3 0
M.N. Rahaman, Ceramic Processing and Sintering (2003)
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Grain size measurement
Sample cross-section
Homogeneous grain size
in the whole sample for all
investigated densities
Grain size analysis
(linear intercept method on
SEM micrographs)
h
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Grain size measurement
Marked grain growth from ρrel > 0.95
Identical sintering trajectories for FAST and HP
Reduced grain growth in comparison to free sintering
R. Zuo, E. Aulbach, J. Rödel
Acta Mater. (2003)
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Analysis of the sintering mechanism
r = relative density pa = applied pressure
H = numerical constant T = temperature
f = stress intensification factor* G = grain size
n = stress exponent m = grain size exponent
n
amp
GkT
HD
dt
df
r
r
11
T & G
const.
T & (fpa)
const.
Rela
tive d
ensity
Time
Dwell time
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Analysis of the sintering mechanism
r = relative density pa = applied pressure
H = numerical constant T = temperature
f = stress intensification factor* G = grain size
n = stress exponent m = grain size exponent
n
amp
GkT
HD
dt
df
r
r
11
T & G
const.
T & (fpa)
const.
n ≈ 1
for FAST and HP
m ≈ 3
for FAST and HP
Densification is controlled
by grain boundary
diffusion
Rela
tive d
ensity
Time
Dwell time
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Calculation of the activation energy
RT
Q
eDD0
Similar value for the activation energy:
Grain boundary diffusion
HP Q = 430 ± 50 kJ/mol
FAST Q = 420 ± 35 kJ/mol
Wang & Raj,
J. Am. Ceram. Soc. (1990) Q = 440 ± 45 kJ/mol
D0 = diffusion coefficient T = absolute temperature
D0 = pre-exponential factor R = gas constant
Q = activation energy
Rela
tive d
ensity
Time
Dwell time
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Results for other materials
Comparative studies FAST / HP:
Cubic zirconia (8YSZ), ionic conductor: same densification mechanism and sintering trajectory
Zinc oxide (ZnO), semi-conductor: same densification mechanism (grain size very sensitive to temperature variations)
Tetragonal zirconia (TZ3Y): same densification mechanism and sintering trajectory
AlCuFeB quasi-crystals: same densification mechanism
L. Ramond, G. Bernard-Granger, A. Addad, C. Guizard, Acta Mater (2010)
G. Bernard-Granger, A. Addad, G. Fantozzi, G. Bonnefont, C. Guizard, D. Vernat, Acta Mater. (2010)
J. Langer, M. Hoffmann, O. Guillon, J. Am. Ceram. Soc. (2011)
J. Langer, M. Hoffmann, O. Guillon, J. Am. Ceram. Soc. (2011)
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Results for other materials
K. Morita, B.N. Kim, H. Yoshida, K. Hiraga,
Scripta Mater. (2010)
MgAl2O4 spinel
SPS
with grain size
Similar mechanisms as for hot pressing
Low stress regime: diffusion
High stress regime: climb-controlled dislocation creep
Densification maps for MgO
R. Chaim, M. Margulis
Mat.Sci. Eng. A (2005)
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Investigation of the initial sintering stage
Thermal conductivity proportional to the contact area between particles
Same values for HP und FAST samples above 65% density
Effect of the temperature overshoot at the beginning of the FAST process?
Th
erm
al conductivity
Relative density
Laser Flash
measurements
J. Langer, M. Hoffmann, O. Guillon,
Acta Materialia (2009)
Alumina
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Temperature profile during FAST process
Overheating up to 130 °C at the
beginning of the heating process
(pyrometer control only above ~400°C;
input power fixed)
Effects on neck formation and neck
growth (especially for nano-powders)
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Effect of the pressing tool and
temperature control
0 1 2 3 4 5 6 7 80.50
0.55
0.60
0.65
0.70
0.75
0.80
0.85
0.90
0.95
1.00
1) FASTPyrometer
2) FASTThermocouple
3) HPThermocouple
4) HPFAST-Tool
TMDAR
50 MPaR
ela
tive
De
nsity,
rre
l
Time, 103*t [sec]
Begin of
Dwell Time
Tmax
= 1200 °C
Density difference depends on:
• the pressing tool used
• the temperature control
Alumina
FASTThermocouple:
without overshoot
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Effect of temperature control
Dramatic effect of transient overheating on densification kinetics
for sensitive materials like ZnO (20 nm particle size)
J. Langer, M. Hoffmann, O. Guillon, J. Am. Ceram. Soc. (2011)
0 1 2 3 40.45
0.50
0.55
0.60
0.65
0.70
0.75
0.80
0.85
0.90
0.95
1.00
FAST
HP
NG20
750 °C
50 MPa
Re
lative
De
nsity,
rre
l
Time, 103*t [sec]
Starting point
Dwell time
(a)
0.0 0.5 1.0 1.5
FASTPyro
FASTThermo
HP
Starting point
Dwell time
(b)
NG20
550 °C
50 MPa
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Consequences on properties
400 450 500 550 600 650 700 750
103
2x103
Re
sis
tivity,
re
l [
cm
]
FAST rrel
= 0.74
HP rrel
= 0.75
NA90
50 MPa / 750 °C
Temperature, T [°C]
Slightly lower resistivity for FAST samples, but same order of magnitude
Correlates with the larger interparticle contact area shown by
Young‘s modulus measurements (due to initial temperature overshoot)
ZnO 90 nm
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Outline
Methodology to answer this question:
FAST vs. Hot Pressing
• Identification of main densification mechanism
• Evaluation of microstructure
Effect of heating rate
Effect of electric field/current
Lower temperatures, higher densities, smaller grain sizes
…compared to free sintering!
Question: What really happens during FAST?
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Effect of heating rate: alumina
-800 -600 -400 -200 0 200 400 600
0.5
0.6
0.7
0.8
0.9
1.0
Rel
ativ
e D
ensi
ty
Time (s)
35 K/min
50 K/min
100 K/min
150 K/min
Isothermal step
Same final density is reached
Is there a change in the densification mechanism?
O. Guillon & J. Langer,
J Mater Sci, 2010
1200°C
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Effect of heating rate: alumina
Slope independent of the heating rate
Same results for 8YSZ
Heating rate
[K/min]
Slope
[10-3 K-1]
10 1.7 ± 0.2
35 1.6 ± 0.2
50 1.7 ± 0.2
100 1.5 ± 0.2
150 1.4 ± 0.3
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Master Sintering Curve approach
n
amp
kTG
HD
dt
df
r
r
1
RT
QDD exp
0
dtRT
Q
Td
pHD
kG
nn
a
m
exp
1
0
rfr
),(exp1
00 0
TtdtRT
Q
Td
G
pHD
kt
n
m
n
a
r
rf
r
r
43
3
G
D
G
D
kTdt
d bbVV
r
r
r
rrr
r
0
)(3
)(exp
1))(,(
00
mt G
D
kdt
RT
Q
TtTt
A unique MSC ρ=f(Θ) can be obtained if:
• only one diffusion mechanism is dominant during sintering
• the microstructure is function only of density
Free sintering:
FAST/HP:
with
Su &Johnson, J Am Ceram Soc (1996)
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-16 -15 -14 -13 -12 -11 -10
0.5
0.6
0.7
0.8
0.9
1.0
Rel
ativ
e D
ensi
ty
Log()
200 250 300 350 400 450 500
0.10
0.15
0.20
0.25
0.30
0.35
0.40
0.45
0.50
Res
idua
l sum
of s
quar
es
Activation energy (kJ/mol)
MSC: alumina
Master Sintering Curve obtained for the whole sintering cycle
Apparent activation energy of 290 kJ/mol
No change in the densification behavior
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Activation energy values
M. Aminzare, F. Golestani-fard, O. Guillon, M. Mazaheri, H.R. Rezaie,
Materials Science & Engineering A, 2010
Free sintering of alumina (same powder)
Literature: Q = 400-1100 kJ/mol (!)
Dry pressing: 700 20 kJ/mol
Pressure filtration: 605 15 kJ/mol
Interplay between different diffusion mechanisms
when whole sintering curve taken into account
In the density range 70-85%:
450 kJ/mol for both sample types
Dry pressing
Pressure filtration
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High(er) heating rates
F. Meng, Z. Fu, J. Zhang, H. Wang, W. Wang, Y. Wang, Q. Zhang,
J Am Ceram Soc (2007)
Exothermic reaction to produce heat (SHS)
Applied pressure: 60-120 MPa
Heating rate of 1600°C/min
Dense alumina (99%)
in a few minutes
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High(er) heating rates
J. Zhang, F. Meng, R. Todd, Z. Fu, Scripta Mater. (2010)
Same grain size and density, but different resistance to mechanical abrasion
(1)
(3)
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High(er) heating rates
Grain boundaries in non-equilibrium:
Diffuse, open structure as opposed to
relaxed boundaries?
Higher diffusion coefficient and thicker GB?
Also to be seen in other materials?
(1)
(4)
As-sintered
Annealed at 1500°C
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High heating rates: ZnO
S. Schwarz, O. Guillon
20 nm particles
50 MPa
Higher heating rates improve sinterability
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High heating rates: ZnO
50°C/min 100°C/min (ρ= 67%)
S. Schwarz, A. Thron, K. van Benthem, O. Guillon
Curved GB Faceted GB
(ρ= 76%)
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Outline
Methodology to answer this question:
FAST vs. Hot Pressing
• Identification of main densification mechanism
• Evaluation of microstructure
Effect of heating rate
Effect of electric field/current
Lower temperatures, higher densities, smaller grain sizes
…compared to free sintering!
Question: What really happens during FAST?
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March 24, 2011 | FAST School | O. Guillon | 32
Carbon contamination?
Secondary Ion Mass Spectroscopy (SIMS)
S
Cross section x
y
h
TM TR
Carbon hardly diffuses into the specimen (constant C-signal at depth of ~2 µm)
Oxygen vacancies are responsible for specimen darkening
No influence of carbon on electrical conductivity / sintering behavior
J. Langer, M. Hoffmann, O. Guillon,
J. Am. Ceram. Soc. (2011) 8YSZ
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XPS measurements on pure ZnO
• Identical emission spectra for FAST und HP
• Only ZnO could be detected
• No trace of carbon
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Resistivity changes in pure ZnO
Sample
Al2O3-felt
Sample resistance
T = 750 °C 2.5x102 Ω
Graphite tool resistance
T = 750 °C 2.0x10-3 Ω
100 200 300 400 500 600 700
0.6
0.7
0.8
0.9
1.0
Relative density
Re
lative
de
nsity,
rre
l
Temperature, T [°C]
a)
103
104
105
106
Resistance
NA90
SPS / 750 °C /
50 MPa / 5 min
Re
sis
tan
ce
, R
[
]
Vanmeensel et al. J. Mater Sci. (2008)
Semi-conductor behavior
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Electrical boundary conditions
sample
Al2O3-discs
pa direction of current
0 1 2 30.55
0.60
0.65
0.70
0.75
0.80
0.85
0.90
0.95
1.00
(a) Standard
(b) Electrically insulated
FAST
NA90
750 °C
50 MPa
Re
lative
de
nsity,
rre
l
Time, 103*t [sec]
0 1000 2000 3000
0.60
0.65
0.70
0.75
0.80
0.85
0.90
0.95
1.00
Starting point
dwell time
750 °C
ZnO
J. Langer, M. Hoffmann, O. Guillon,
J. Am. Ceram. Soc. (2011)
No effect of electrical boundary conditions
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Sintering trajectory of pure ZnO
No significant effect of the electric field / current
Effect of the temperature overshoot
(electrically insulated)
(b)
z
x
rrel = 0.97 2 µm
(a) rrel = 0.97
z
x
2 µm
Standard FAST
Insulated FAST
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Behavior of doped ZnO
Sample resistance:
T = 750 °C ~ 5 Ω
T. Misawa, N. Shikatani, Y. Kawakami, T. Enjoji, Y. Ohtsu, H. Fujita
J Mater Sci (2009)
Standard SPS
Insulated SPS
Magnetic
current
probe
Error due to positioning
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Current flow through the sample
M. Herrmann, B. Weise, K. Sempf, A. Bales, J. Raethel, I. Schulz
Workshop IFAM Dresden (2006)
Resistivity of sample material [Ωm]
Graphite tool
I sam
ple/I
tota
l
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Electrically conductive composite materials
K. Vanmeensel, A. Laptev, O. Van der Biest, J. Vleugels
Acta Mat (2007)
Electrical conductivity of a composite material depends on:
- volume fraction of conductive and insulating phases (incl. porosity)
- temperature
Polder-Van Santen mixture rule:
m matrix
p particles
Similar equation for thermal conductivity
with
V*m volume fraction of
matrix phase in a
partially sintered compact
*
*
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Electrical conductivity
90 vol.% TiN (grey) - ZrO2 (white)
pores (black)
Dense ZrO2-TiN composites
K. Vanmeensel, A. Laptev, O. Van der Biest, J. Vleugels
J Eur Ceram Soc (2007)
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Percolation threshold
K. Vanmeensel, A. Laptev, O. Van der Biest, J. Vleugels
Acta Mater (2007)
Percolation: a continuous path for current is created
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Effect on densification
ZrO2-TiN (60/40)
Transition from insulator to conductor-like behavior during sintering
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Effect of electric field on surface diffusion
Before densification takes place
Neck growth kinetics estimated from I-V curves
(without additional Joule heating)
No effect of electric field
(limited to 10 V/cm)
Specific Surface Area measurements confirm this result
(identical with and without electric field)
TZ-3Y @ 1050°C
Sample thickness:
2 mm
M. Cologna, R. Raj
J. Am .Ceram. Soc. (2010)
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Flash sintering
M. Cologna, B. Rahkova, R. Raj
J. Am .Ceram. Soc. (2010)
TZ-3Y
DC-Field But why then:
Proposed explanation:
Joule heating at grain boundaries (several hundreds of °C)
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400 600 800 10000.50
0.55
0.60
0.65
0.70
0.75
0.80
0.85
0.90
Rela
tive D
ensity
Temperature
0V
40V/cm; max. 0.02 A/cm²
40V/cm; max. ~1.5 A/cm²
40V/cm at 1150°C; max ~6 A/cm²
1200 20 40 60 80 100 1200.50
0.55
0.60
0.65
0.70
0.75
0.80
0.85
0.90
Isothermal time [min]
Flash sintering: an effect of current
0 2 4 6 8 10 12 14 16 18
4.35
4.40
4.45
4.50
4.55
4.60
4.65
4.70
4.75
8YSZ flashed at 1150°C with 40V/cm; max. 5A
current switch off
induces a
temperature drop
of ~ 450 °C
Ab
so
lute
De
ns
ity
[g
/cm
³ ]
Isothermal time [min]
R. Baraki, S. Schwarz, O. Guillon
8YSZ
AC Field from room temperature
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Comparison Flash Sintering / FAST
FAST:
limited voltage, applied from the beginning
electric equipotential affected by the conducting pressing tool
Flash sintering conditions are not expected in standard FAST
S. Schwarz,
O. Guillon
ZrO2 (sinter-forging)
DVsample =10 V
electrode
ZrO2 (in graphite tool)
DVsample =2.68 V
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Conclusions
Identification of sintering mechanism requires „clean“ experimental
conditions to avoid misunterpretations
For „insulating“ oxide ceramics:
• Same densification mechanism for HP and FAST
(not only based on activation energy considerations)
• Identical grain growth behavior
• No effect of electrical field during sintering in FAST
Transient heating affects subsequent densification
Densification behavior may depend on the heating rate (or not: MSC)
Large electric current (not field) may lead to additional phenomena
(Flash sintering)