Layout Decomposition for Triple Patterning Lithographybyu/papers/C07-ICCAD2011-TPL-slides.pdf ·...
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Outline
Layout Decomposition for Triple PatterningLithography
Bei Yu1 Kun Yuan2 Boyang Zhang1 Duo Ding1
David Z. Pan1
1ECE Dept. University of Texas at Austin, Austin, TX USA
2Cadence Design Systems, Inc., San Jose, CA USA
Nov. 7, 2011
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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Outline
Outline
1 Introduction
2 AlgorithmTPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
3 Experimental Results
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Overcome the lithography limitations
193nm based lithography tool, hard for sub-30nm
Delay or limitations of other techniques, i.e. EUV, E-Beam
Double/Multiple Patterning LithographyOriginal layout is divided into two/several masks (layout decomposition)Decrease pattern density, improve the depth of focus (DOF)Objective: minimize both conflicts and stitches
a
b
c
b
ca2
a1Stitch
a1
b
ca2
mask2
mask1
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Triple Patterning Lithography (TPL)
b
a cConflicts
b
a c
Layout is decomposed into three masks
Similar but more difficult than 3 coloring problem
Why Triple Patterning Lithography (TPL) ?
Resolve some native conflict from DPL
Reduce the number of stitches
Triple effective pitch, achieve further feature-size scaling (22nm/16nm)
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Layout Decomposition
DPL Layout Decomposition
Iterative Method (remove conflict→ minimize stitch) Local Optimal
Cut based methodologies (ICCAD’08, ICCAD’09, ASPDAC’2010)
Minimize conflict and stitch simultaneously
ILP Formulation (Yuan et. al ISPD’2009)→ optimal but slowHeuristic (Xu et. al ISPD’2010)→ only for planar layout
TPL Layout Decomposition
Previously only via layout is considered (Cork et. al SPIE’08)
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Layout Decomposition
Our work is the first systematic study for general layout
Mathematical Formulation
Novel Color representations
Semidefinite Programming based approximation
TPL Layout Decomposition is HARDER
Solution space is much bigger
Conflict graph is NOT planar
Detect conflict is not P, but NP-Complete
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Problem Formulation
Problem: TPL Layout Decomposition
Input: layout and minimum coloring space.Output: decomposed layout,
minimize the stitch number and the conflict number.
Two Lemmas:
Deciding whether a planar graph is 3-colorable is NP-complete
Coloring a 3-colorable graph with 4 colors is NP-complete
Theorem 1
TPL Layout Decomposition problem is NP-Hard
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Layout Graph and Decomposition Graph
Graphs Construction∗:1 Given input layout.2 Generate Layout Graph (LG).3 Projection.4 Generate Decomposition Graph (DG).
* same with Yuan et. al ISPD’09
Two sets of edges:
CE : conflict edge.
SE : stitch edge.
bf
ea
c d
Input Layout
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Layout Graph and Decomposition Graph
Graphs Construction∗:1 Given input layout.2 Generate Layout Graph (LG).3 Projection.4 Generate Decomposition Graph (DG).
* same with Yuan et. al ISPD’09
Two sets of edges:
CE : conflict edge.
SE : stitch edge.
bf
ea
c d
Input Layout
da
bf
c
e
Layout Graph
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Layout Graph and Decomposition Graph
Graphs Construction∗:1 Given input layout.2 Generate Layout Graph (LG).3 Projection.4 Generate Decomposition Graph (DG).
* same with Yuan et. al ISPD’09
Two sets of edges:
CE : conflict edge.
SE : stitch edge.
bf
ea
c d
Input Layout
da
bf
c
e
Layout Graph
bf
ea
c d
project
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Layout Graph and Decomposition Graph
Graphs Construction∗:1 Given input layout.2 Generate Layout Graph (LG).3 Projection.4 Generate Decomposition Graph (DG).
* same with Yuan et. al ISPD’09
Two sets of edges:
CE : conflict edge.
SE : stitch edge.
bf
ea
c d
Input Layout
da
bf
c
e
Layout Graph
bf
ea
c d
project
d1a
bf
c
e1
d2
e2
Decomposition Graph
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Overview of the TPL Decomposition Flow
ILP / Vector Programming
Input Layout
Output Masks
Layout Graph Construction
Bridge Computation
Independent Component Computation
Decomposition Graph Construction
Layout Graph Simplification
Resolve Layout Decomposition problem:Integer Linear Programming (ILP)Vector Programming
Three graph based Simplifications – improve scalability
Vector Programming can be replaced by approximation methods:Semidefinite Programming (SDP)Mapping Algorithm
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Overview of the TPL Decomposition Flow
ILP / Vector Programming
Input Layout
Output Masks
Layout Graph Construction
Bridge Computation
Independent Component Computation
Decomposition Graph Construction
Layout Graph Simplification
Resolve Layout Decomposition problem:Integer Linear Programming (ILP)Vector Programming
Three graph based Simplifications – improve scalability
Vector Programming can be replaced by approximation methods:Semidefinite Programming (SDP)Mapping Algorithm
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Overview of the TPL Decomposition Flow
ILP / Vector Programming
Input Layout
Output Masks
Layout Graph Construction
Bridge Computation
Independent Component Computation
Decomposition Graph Construction
Layout Graph Simplification
Resolve Layout Decomposition problem:Integer Linear Programming (ILP)Vector Programming
Three graph based Simplifications – improve scalability
Vector Programming can be replaced by approximation methods:Semidefinite Programming (SDP)Mapping Algorithm
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Overview of the TPL Decomposition Flow
ILP / Vector Programming
Input Layout
Output Masks
Layout Graph Construction
Bridge Computation
Independent Component Computation
Decomposition Graph Construction
Layout Graph Simplification
Resolve Layout Decomposition problem:Integer Linear Programming (ILP)Vector Programming
Three graph based Simplifications – improve scalability
Vector Programming can be replaced by approximation methods:Semidefinite Programming (SDP)Mapping Algorithm
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Mathematical Formulation
min∑
eij∈CE
cij + α∑
eij∈SE
sij (1)
s.t. cij = (xi == xj) ∀eij ∈ CE
sij = xi ⊕ xj ∀eij ∈ SE
xi ∈ {0, 1, 2} ∀i ∈ V
∑cij is the number of conflicts,
∑sij is the number of stitches
Represent 3 colors using two 0-1 variables (0, 0), (0, 1), (1, 0)
Similar to previous DPL works, (1) can be transferred to ILP
Solving ILP is NP-Hard problem, suffers from runtime penalty
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Graph Simplification
Independent Component Computation
Partition the whole problem into several sub-problems
Bridge Computation
Further partition the problem by removing bridges
a
b
a
b
Remove bridge
a
b
a
b
Rotate colors to insert bridge
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Graph Simplification (cont.)
Layout Graph Simplification
Iteratively remove node withdegree ≤ 2
Push the nodes into stack
Right layout can be directlycolored
bf
ea
c d
(a)
da
bf
c
e
(b)
d
a
b f
c
e
fc
(c)
d
a
b f
c
ed
be
af
c
(d)
b
d
a
b f
c
ee
af
c
(e)
d
a
f
c
ee
af
c
b
(f)
d
a
f
c
e
fc
b
(g)
d
f
c
a
b
e
(h)
bf
ea
c d
(i)
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Vector Programming
New representation of colors
Three vectors (1, 0), (− 12 ,√
32 ) and (− 1
2 ,−√
32 )
same color: ~vi · ~vj = 1
different color: ~vi · ~vj = −1/2
(- , )√32
12
(1, 0)
(- ,- )√32
12
Vector Programming:
min∑
eij∈CE
23(~vi · ~vj +
12) +
2α3
∑eij∈SE
(1− ~vi · ~vj) (2)
s.t. ~vi ∈ {(1, 0), (−12,
√3
2), (−1
2,−√
32
)}
Equal to Mathematical Formulation (1)
Still NP-Hard
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Semidefinite Programming (SDP) Approximation
Relax Vector Programming (2) to Semidefinite Programming (SDP)
SDP: min A • X (3)
Xii = 1, ∀i ∈ V
Xij ≥ −12, ∀eij ∈ CE
X � 0
SDP (3) can be solved in polynomial time
Mapping Algorithm
Continuous SDP Solutions⇒ Three Vectors
Tradeoff between speed and globaloptimality
Vector Programming Solutions
SDPSolutions
Mapping
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Example of SDP Approximation
A =
0 1 1 −α 11 0 1 0 11 1 0 1 0−α 0 1 0 11 1 0 1 0
After solving the SDP:
X =
1.0 −0.5 −0.5 1.0 −0.5
1.0 −0.5 −0.5 −0.51.0 −0.5 1.0
. . . 1.0 −0.51.0
SDP: min A • X (3)
Xii = 1, ∀i ∈ V
Xij ≥ −12, ∀eij ∈ CE
X � 0
43
2
1
5
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
TPL Decomposition FlowMathematical Formulation and Graph SimplificationSemidefinite Programming (SDP) Approximation
Example of SDP Approximation
A =
0 1 1 −α 11 0 1 0 11 1 0 1 0−α 0 1 0 11 1 0 1 0
After solving the SDP:
X =
1.0 −0.5 −0.5 1.0 −0.5
1.0 −0.5 −0.5 −0.51.0 −0.5 1.0
. . . 1.0 −0.51.0
SDP: min A • X (3)
Xii = 1, ∀i ∈ V
Xij ≥ −12, ∀eij ∈ CE
X � 0
43
2
1
5
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Experimental Results
Experimental Setting:
implement in C++
Intel Core 3.0GHz Linux machine with 32G RAM
15 layouts based on ISCAS-85 & 89 are tested
Layout parser: OpenAccess2.2
ILP solver: CBC
SDP solver: CSDP
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Experimental Results – Graph Simplification
1
10
100
1,000
10,000
C43
2
C49
9
C88
0
C1,
355
C1,
908
C2,
670
C3,
540
C5,
315
C6,
288
C7,
552
S1,48
8
S38,4
17
S35,9
32
S38,5
84
S15,8
50
CP
U R
un
tim
e (s
)
Runtime Comparison of Normal ILP and Accelerated ILP
Normal ILP
Accelerated ILP
Graph Simplification can save 82% runtime 1
Still maintain the optimality1Normal ILP uses Independent Component Computation
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Experimental Results – How fast is SDP?
0
5
10
15
20
25
30
35
40
45
50
C432
C499
C880
C1,35
5
C1,90
8
C2,67
0
C3,54
0
C5,31
5
C6,28
8
C7,55
2
S1,48
8
S38,4
17
S35,9
32
S38,5
84
S15,8
50
CP
U R
unti
me
(s)
Runtime Comparison of Normal ILP and Accelerated ILP
Accelerated ILPSDP Based
SDP can effectively speed-up ILP
Compared with Accelerated ILP, SDP can save 42% runtime
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Experimental Results – How good (bad) is SDP?
0
10
20
30
40
50
60
70
80
90A
ILP
SD
P
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
AIL
PS
DP
Co
nfl
ict
Nu
m a
nd
Sti
tch
Nu
m
Comparison of Accelerated ILP (AILP) and SDP
C43
2
C49
9
C88
0
C1,
355
C1,
908
C2,
670
C3,
540
C5,
315
C6,
288
C7,
552
S1,48
8
S38,4
17
S35,9
32
S38,5
84
S15,8
50
Stitch Num
Conflict Num
Conflict NumStitch Num
SDP can achieve near optimal results.
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Experimental Results – Dense Layout
Circuit SE# CE# Accelerated ILP SDP Basedst# cn# CPU(s) st# cn# CPU(s)
C1 16 247 1 5 5.5 0 6 0.29C2 38 289 0 15 17.32 0 16 0.77C3 24 381 0 14 33.41 0 15 0.32C4 56 437 9 32 203.17 9 32 0.49
avg. - - 2.5 16.5 64.9 2.25 17.3 0.468ratio - - 1 1 1 0.9 1.05 0.007
For very dense layout
SDP can achieve 140× speed-up.
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Experimental Results – S1488
Stitch number: 0
Conflict number: 1
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
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IntroductionAlgorithm
Experimental Results
Conclusion
First systematic work on triple patterning layout decomposition
Mathematical formulation to minimize both stitches and conflicts
Novel color representations
Semidefinite programming based approximation
Expect to see more researches on Triple Patterning Lithography
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
![Page 30: Layout Decomposition for Triple Patterning Lithographybyu/papers/C07-ICCAD2011-TPL-slides.pdf · Outline Layout Decomposition for Triple Patterning Lithography Bei Yu1 Kun Yuan2 Boyang](https://reader036.fdocuments.net/reader036/viewer/2022071210/602167380c147771324bc171/html5/thumbnails/30.jpg)
IntroductionAlgorithm
Experimental Results
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ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography
![Page 31: Layout Decomposition for Triple Patterning Lithographybyu/papers/C07-ICCAD2011-TPL-slides.pdf · Outline Layout Decomposition for Triple Patterning Lithography Bei Yu1 Kun Yuan2 Boyang](https://reader036.fdocuments.net/reader036/viewer/2022071210/602167380c147771324bc171/html5/thumbnails/31.jpg)
IntroductionAlgorithm
Experimental Results
Appendix – ILP Formulation
min∑
eij∈CE
cij + α∑
eij∈SE
sij (4)
s.t. xi1 + xi2 ≤ 1
xi1 + xj1 ≤ 1 + cij1 ∀eij ∈ CE
(1− xi1) + (1− xj1) ≤ 1 + cij1 ∀eij ∈ CE
xi2 + xj2 ≤ 1 + cij2 ∀eij ∈ CE
(1− xi2) + (1− xj2) ≤ 1 + cij2 ∀eij ∈ CE
cij1 + cij2 ≤ 1 + cij ∀eij ∈ CE
xi1 − xj1 ≤ sij1 ∀eij ∈ SE
xj1 − xi1 ≤ sij1 ∀eij ∈ SE
xi2 − xj2 ≤ sij2 ∀eij ∈ SE
xj2 − xi2 ≤ sij2 ∀eij ∈ SE
sij ≥ sij1, sij ≥ sij2 ∀eij ∈ SE
ICCAD2011 1A.1 Layout Decomposition for Triple Patterning Lithography