[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International...
1
31 C-3-4 Total-Electron-YieldX-Ray Standing-Wave Measurements of Multilayer X-Ray Mirrors for the Interface Structure Evaluation Yasuji Muramatsu', Hisataka Takenaka', Eric M. Gullikson3, and Rupert C. C. Perera3 Japan Atomic Energy Research Institute, Sayo-gun, Hyogo 679-5148, Japan NTTAdvanced Technology Corporation, Musashino-shi, Tokyo 180-8585, Japan Lawrence Berkeley National Laboratory, Berkeley, Califonia 94720, USA Total-electron-yield (TEY) x-ray standing-wave spectra of multilayer x-ray mirrors by monitoring sample photocurrent are presented to obtain the information on their interface structure. This simple TEY x-ray standing-wave method enables the simultaneous spectral measurements of the x-ray standing-wave and Bragg reflection. Optical measurements of Bragg reflection and x-ray standing-wave were carried out by using the reflectometer installed in the beamline 6.3.2 at the Advanced Light Source (ALS). Figure 1 shows the simultaneously measured Bragg reflection and TEY absorptiodstanding-wave spectra of the (a) 600-"C annealed and (b) as-deposited Mo/SiC/Si multilayer mirrors, measured by varying the incident angle from 30" to 90". The standing-wave structure shifts to the higher energy region as the incident angle decrease from 90" to 70", corresponding to the energy shift of the Bragg reflection peak. These results show that the Mo/SiC/Si layers were shrunk and the annealing disarranged their interface structures. Mapping measurements of the x-ray standing-wave signals in a sample plane can also be achieved on normal incidence by this TEY x-ray standing- wave method, which provide the spatial information of the interface structure in the sample plane. These results demonstrate that the TEY x-ray standing-wave measurements are useful method for the optical evaluation of multilayer x-ray mirrors, compensating the reflectivity measurements. Fig. 1 Simultaneously measured Bragg reflection and TEY absorptiodstanding-wave spectra of the (a) 600-"C annealed and (b) as-deposited Mo/SiC/Si multilayer mirrors. Incident angles of the samples were varied from 30" to 90". (a)annealed Si L edge incident angle !? 40 . 20 p\ 80" 20 0 50" 90 100 110 Photon energy I eV 66 (b) as-deoosited r+ incident angle 40 20 0 40 20 0 40 20 a 30" 90 100 110 Photon energy I eV
Transcript of [Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International...
![Page 1: [Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference - Shimane, Japan (31 Oct.-2 Nov. 2001)]](https://reader036.fdocuments.net/reader036/viewer/2022092701/5750a5b31a28abcf0cb3f2fd/html5/thumbnails/1.jpg)
31 C-3-4 Total-Electron-Yield X-Ray Standing-Wave Measurements of Multilayer X-Ray
Mirrors for the Interface Structure Evaluation
Yasuji Muramatsu', Hisataka Takenaka', Eric M. Gullikson3, and Rupert C. C. Perera3 Japan Atomic Energy Research Institute, Sayo-gun, Hyogo 679-5148, Japan
NTTAdvanced Technology Corporation, Musashino-shi, Tokyo 180-8585, Japan Lawrence Berkeley National Laboratory, Berkeley, Califonia 94720, USA
Total-electron-yield (TEY) x-ray standing-wave spectra of multilayer x-ray mirrors by monitoring sample photocurrent are presented to obtain the information on their interface structure. This simple TEY x-ray standing-wave method enables the simultaneous spectral measurements of the x-ray standing-wave and Bragg reflection. Optical measurements of Bragg reflection and x-ray standing-wave were carried out by using the reflectometer installed in the beamline 6.3.2 at the Advanced Light Source (ALS). Figure 1 shows the simultaneously measured Bragg reflection and TEY absorptiodstanding-wave spectra of the (a) 600-"C annealed and (b) as-deposited Mo/SiC/Si multilayer mirrors, measured by varying the incident angle from 30" to 90". The standing-wave structure shifts to the higher energy region as the incident angle decrease from 90" to 70", corresponding to the energy shift of the Bragg reflection peak. These results show that the Mo/SiC/Si layers were shrunk and the annealing disarranged their interface structures. Mapping measurements of the x-ray standing-wave signals in a sample plane can also be achieved on normal incidence by this TEY x-ray standing- wave method, which provide the spatial information of the interface structure in the sample plane. These results demonstrate that the TEY x-ray standing-wave measurements are useful method for the optical evaluation of multilayer x-ray mirrors, compensating the reflectivity measurements.
Fig. 1 Simultaneously measured Bragg reflection and TEY absorptiodstanding-wave spectra of the (a) 600-"C annealed and (b) as-deposited Mo/SiC/Si multilayer mirrors. Incident angles of the samples were varied from 30" to 90".
(a)annealed
Si L edge
incident angle
!? 40
. 20 p\ 80"
20
0
50"
90 100 110 Photon energy I eV
66
(b) as-deoosited r+ incident angle
40
20
0
40
20
0
40
20
a 30"
90 100 110 Photon energy I eV
![nanotechnology - MWITt2040116/document/nanotechnology [Compatibility Mode].pdf · Nanotechnology อ.สิริหทัย ศรีขวัญใจ ครูวิชาการสาขาเคม](https://static.fdocuments.net/doc/165x107/5ed2ee8082b1917a215e8537/nanotechnology-t2040116documentnanotechnology-compatibility-modepdf-nanotechnology.jpg)
