Introduction to CMOS VLSI Design Layout, Fabrication, and Elementary Logic Design.
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Transcript of Introduction to CMOS VLSI Design Layout, Fabrication, and Elementary Logic Design.
Introduction toCMOS VLSI
Design
Layout, Fabrication, and Elementary Logic Design
Fabrication and Layout Slide 2CMOS VLSI Design
Introduction Integrated circuits: many transistors on one chip.
– Very Large Scale Integration (VLSI): very many Metal Oxide Semiconductor (MOS) transistor
– Fast, cheap, low-power transistors– Complementary: mixture of n- and p-type leads to
less power Today: How to build your own simple CMOS chip
– CMOS transistors– Building logic gates from transistors– Transistor layout and fabrication
Rest of the course: How to build a good CMOS chip
Fabrication and Layout Slide 3CMOS VLSI Design
Silicon Lattice Transistors are built on a silicon substrate Silicon is a Group IV material Forms crystal lattice with bonds to four neighbors
Si SiSi
Si SiSi
Si SiSi
Fabrication and Layout Slide 4CMOS VLSI Design
Dopants Silicon is a semiconductor Pure silicon has no free carriers and conducts poorly Adding dopants increases the conductivity Group V: extra electron (n-type) Group III: missing electron, called hole (p-type)
As SiSi
Si SiSi
Si SiSi
B SiSi
Si SiSi
Si SiSi
-
+
+
-
Fabrication and Layout Slide 5CMOS VLSI Design
p-n Junctions A junction between p-type and n-type semiconductor
forms a diode. Current flows only in one direction
p-type n-type
anode cathode
Fabrication and Layout Slide 6CMOS VLSI Design
nMOS Transistor Four terminals: gate, source, drain, body Gate – oxide – body stack looks like a capacitor
– Gate and body are conductors
– SiO2 (oxide) is a very good insulator
– Called metal – oxide – semiconductor (MOS) capacitor
– Even though gate is
no longer made of metal
n+
p
GateSource Drain
bulk Si
SiO2
Polysilicon
n+
Fabrication and Layout Slide 7CMOS VLSI Design
nMOS Operation Body is commonly tied to ground (0 V) When the gate is at a low voltage:
– P-type body is at low voltage– Source-body and drain-body diodes are OFF– No current flows, transistor is OFF
n+
p
GateSource Drain
bulk Si
SiO2
Polysilicon
n+D
0
S
Fabrication and Layout Slide 8CMOS VLSI Design
nMOS Operation When the gate is at a high voltage:
– Positive charge on gate of MOS capacitor– Negative charge attracted to body– Inverts a channel under gate to n-type– Now current can flow through n-type silicon from
source through channel to drain, transistor is ON
n+
p
GateSource Drain
bulk Si
SiO2
Polysilicon
n+D
1
S
Fabrication and Layout Slide 9CMOS VLSI Design
pMOS Transistor Similar, but doping and voltages reversed
– Body tied to high voltage (VDD)
– Gate low: transistor ON– Gate high: transistor OFF– Bubble indicates inverted behavior
SiO2
n
GateSource Drain
bulk Si
Polysilicon
p+ p+
Fabrication and Layout Slide 10CMOS VLSI Design
Power Supply Voltage GND = 0 V In 1980’s, VDD = 5V
VDD has decreased in modern processes
– High VDD would damage modern tiny transistors
– Lower VDD saves power
VDD = 3.3, 2.5, 1.8, 1.5, 1.2, 1.0, …
Fabrication and Layout Slide 11CMOS VLSI Design
Transistors as Switches We can view MOS transistors as electrically
controlled switches Voltage at gate controls path from source to drain
g
s
d
g = 0
s
d
g = 1
s
d
g
s
d
s
d
s
d
nMOS
pMOS
OFF ON
ON OFF
Fabrication and Layout Slide 12CMOS VLSI Design
CMOS Inverter
A Y
0
1
VDD
A Y
GNDA Y
Fabrication and Layout Slide 13CMOS VLSI Design
CMOS Inverter
A Y
0
1 0
VDD
A=1 Y=0
GND
ON
OFF
A Y
Fabrication and Layout Slide 14CMOS VLSI Design
CMOS Inverter
A Y
0 1
1 0
VDD
A=0 Y=1
GND
OFF
ON
A Y
Fabrication and Layout Slide 15CMOS VLSI Design
CMOS NAND Gate
A B Y
0 0
0 1
1 0
1 1
A
B
Y
Fabrication and Layout Slide 16CMOS VLSI Design
CMOS NAND Gate
A B Y
0 0 1
0 1
1 0
1 1
A=0
B=0
Y=1
OFF
ON ON
OFF
Fabrication and Layout Slide 17CMOS VLSI Design
CMOS NAND Gate
A B Y
0 0 1
0 1 1
1 0
1 1
A=0
B=1
Y=1
OFF
OFF ON
ON
Fabrication and Layout Slide 18CMOS VLSI Design
CMOS NAND Gate
A B Y
0 0 1
0 1 1
1 0 1
1 1
A=1
B=0
Y=1
ON
ON OFF
OFF
Fabrication and Layout Slide 19CMOS VLSI Design
CMOS NAND Gate
A B Y
0 0 1
0 1 1
1 0 1
1 1 0
A=1
B=1
Y=0
ON
OFF OFF
ON
Fabrication and Layout Slide 20CMOS VLSI Design
CMOS NOR Gate
A B Y
0 0 1
0 1 0
1 0 0
1 1 0
A
BY
Fabrication and Layout Slide 21CMOS VLSI Design
3-input NAND Gate Y pulls low if ALL inputs are 1 Y pulls high if ANY input is 0
Fabrication and Layout Slide 22CMOS VLSI Design
3-input NAND Gate Y pulls low if ALL inputs are 1 Y pulls high if ANY input is 0
A
B
Y
C
Fabrication and Layout Slide 23CMOS VLSI Design
CMOS Fabrication CMOS transistors are fabricated on silicon wafer Lithography process similar to printing press On each step, different materials are deposited or
etched Easiest to understand by viewing both top and
cross-section of wafer in a simplified manufacturing process
Fabrication and Layout Slide 24CMOS VLSI Design
Inverter Cross-section Typically use p-type substrate for nMOS transistor
– Requires n-well for body of pMOS transistors– Several alternatives: SOI, twin-tub, etc.
n+
p substrate
p+
n well
A
YGND VDD
n+ p+
SiO2
n+ diffusion
p+ diffusion
polysilicon
metal1
nMOS transistor pMOS transistor
Fabrication and Layout Slide 25CMOS VLSI Design
Well and Substrate Taps Substrate must be tied to GND and n-well to VDD
Metal to lightly-doped semiconductor forms poor connection called Shottky Diode
Use heavily doped well and substrate contacts / taps
n+
p substrate
p+
n well
A
YGND VDD
n+p+
substrate tap well tap
n+ p+
Fabrication and Layout Slide 26CMOS VLSI Design
Inverter Mask Set Transistors and wires are defined by masks Cross-section taken along dashed line
GND VDD
Y
A
substrate tap well tapnMOS transistor pMOS transistor
Fabrication and Layout Slide 27CMOS VLSI Design
Detailed Mask Views Six masks
– n-well– Polysilicon– n+ diffusion– p+ diffusion– Contact– Metal
Metal
Polysilicon
Contact
n+ Diffusion
p+ Diffusion
n well
Fabrication and Layout Slide 28CMOS VLSI Design
Fabrication Steps Start with blank wafer Build inverter from the bottom up First step will be to form the n-well
– Cover wafer with protective layer of SiO2 (oxide)
– Remove layer where n-well should be built– Implant or diffuse n dopants into exposed wafer
– Strip off SiO2
p substrate
Fabrication and Layout Slide 29CMOS VLSI Design
Oxidation Grow SiO2 on top of Si wafer
– 900 – 1200 C with H2O or O2 in oxidation furnace
p substrate
SiO2
Fabrication and Layout Slide 30CMOS VLSI Design
Photoresist Spin on photoresist
– Photoresist is a light-sensitive organic polymer– Softens where exposed to light
p substrate
SiO2
Photoresist
Fabrication and Layout Slide 31CMOS VLSI Design
Lithography Expose photoresist through n-well mask Strip off exposed photoresist
p substrate
SiO2
Photoresist
Fabrication and Layout Slide 32CMOS VLSI Design
Etch Etch oxide with hydrofluoric acid (HF)
– Seeps through skin and eats bone; nasty stuff!!! Only attacks oxide where resist has been exposed
p substrate
SiO2
Photoresist
Fabrication and Layout Slide 33CMOS VLSI Design
Strip Photoresist Strip off remaining photoresist
– Use mixture of acids called piranah etch Necessary so resist doesn’t melt in next step
p substrate
SiO2
Fabrication and Layout Slide 34CMOS VLSI Design
n-well n-well is formed with diffusion or ion implantation Diffusion
– Place wafer in furnace with arsenic gas– Heat until As atoms diffuse into exposed Si
Ion Implanatation– Blast wafer with beam of As ions
– Ions blocked by SiO2, only enter exposed Si
n well
SiO2
Fabrication and Layout Slide 35CMOS VLSI Design
Strip Oxide Strip off the remaining oxide using HF Back to bare wafer with n-well Subsequent steps involve similar series of steps
p substraten well
Fabrication and Layout Slide 36CMOS VLSI Design
Polysilicon Deposit very thin layer of gate oxide
– < 20 Å (6-7 atomic layers) Chemical Vapor Deposition (CVD) of silicon layer
– Place wafer in furnace with Silane gas (SiH4)
– Forms many small crystals called polysilicon– Heavily doped to be good conductor
Thin gate oxidePolysilicon
p substraten well
Fabrication and Layout Slide 37CMOS VLSI Design
Polysilicon Patterning Use same lithography process to pattern polysilicon
Polysilicon
p substrate
Thin gate oxidePolysilicon
n well
Fabrication and Layout Slide 38CMOS VLSI Design
Self-Aligned Process Use oxide and masking to expose where n+ dopants
should be diffused or implanted N-diffusion forms nMOS source, drain, and n-well
contact
p substraten well
Fabrication and Layout Slide 39CMOS VLSI Design
N-diffusion Pattern oxide and form n+ regions Self-aligned process where gate blocks diffusion Polysilicon is better than metal for self-aligned gates
because it doesn’t melt during later processing
p substraten well
n+ Diffusion
Fabrication and Layout Slide 40CMOS VLSI Design
N-diffusion Historically dopants were diffused Usually ion implantation today But regions are still called diffusion
n wellp substrate
n+n+ n+
Fabrication and Layout Slide 41CMOS VLSI Design
N-diffusion Strip off oxide to complete patterning step
n wellp substrate
n+n+ n+
Fabrication and Layout Slide 42CMOS VLSI Design
P-Diffusion Similar set of steps form p+ diffusion regions for
pMOS source and drain and substrate contact
p+ Diffusion
p substraten well
n+n+ n+p+p+p+
Fabrication and Layout Slide 43CMOS VLSI Design
Contacts Now we need to wire together the devices Cover chip with thick field oxide Etch oxide where contact cuts are needed
p substrate
Thick field oxide
n well
n+n+ n+p+p+p+
Contact
Fabrication and Layout Slide 44CMOS VLSI Design
Metallization Sputter on aluminum over whole wafer Pattern to remove excess metal, leaving wires
p substrate
Metal
Thick field oxide
n well
n+n+ n+p+p+p+
Metal
Fabrication and Layout Slide 45CMOS VLSI Design
Layout Chips are specified with set of masks Minimum dimensions of masks determine transistor
size (and hence speed, cost, and power) Feature size f = distance between source and drain
– Set by minimum width of polysilicon Feature size improves 30% every 3 years or so Normalize for feature size when describing design
rules Express rules in terms of = f/2
– E.g. = 0.3 m in 0.6 m process
Fabrication and Layout Slide 46CMOS VLSI Design
Simplified Design Rules Conservative rules to get you started
Fabrication and Layout Slide 47CMOS VLSI Design
Inverter Layout Transistor dimensions specified as Width / Length
– Minimum size is 4 / 2sometimes called 1 unit– For 0.6 m process, W=1.2 m, L=0.6 m
Fabrication and Layout Slide 48CMOS VLSI Design
Summary MOS Transistors are stack of gate, oxide, silicon Can be viewed as electrically controlled switches Build logic gates out of switches Draw masks to specify layout of transistors
Now you know everything necessary to start designing schematics and layout for a simple chip!