Introduction to Auger Electron Spectroscopy (AES)
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Transcript of Introduction to Auger Electron Spectroscopy (AES)
Introduction to Auger Electron Spectroscopy
(AES)
Center for Microanalysis of Materials
Frederick Seitz Materials Research Laboratory
University of Illinois at Urbana-Champaign
What is Auger?
Auger Electron Spectroscopy (AES) is a Auger Electron Spectroscopy (AES) is a widely used technique to investigate the widely used technique to investigate the chemical composition of surfaces.chemical composition of surfaces.
Why the Odd Name?
The Machine
The Man
Auger (as in ‘Pierre’)
1923:Pierre Auger discoversthe Auger process
Electron Spectroscopy
Pierre Victor Auger (May 14, 1899 – December 24, 1993) was a French physicist, born in Paris. He worked in the fields of atomic physics, nuclear physics, and cosmic ray physics. [1] The process where Auger electrons are emitted from atoms is used in Auger electron spectroscopy to study the elements on the surface of materials.[1] This method was named after him, despite the fact that Lise Meitner discovered the process a few years before in 1922. http://en.wikipedia.org/wiki/Pierre_Victor_Auger
Why is Auger so surface sensitive?
Ref: Charles Evans & Assoc. web page tutorial by Ron Flleming http://www.cea.com
IncidentElectron
STEP 3(alternative)an x-ray is emittedto conserve energyreleased in step 2
STEP 3KLL Auger electronemitted to conserveenergy released instep 2
STEP 2L electron fallsto fill vacancy
STEP 1Ejected electron
-or-
K
L1
L2
L3
1s
2s
2p
CONDUCTION BAND
VALENCE BAND
FREEELECTRONLEVEL
FERMILEVEL
E(Auger)=E(K)-E(L2)-E(L3)
E(X-ray)=E(K)-E(L2)
Auger Transition Named:KLL
Auger Energy Scale
The AES instrument measures The AES instrument measures the kinetic energy of all collected the kinetic energy of all collected electrons.electrons.
AES Electron vs. X-ray Photon
Relative Probabilities of RelaxationRelative Probabilities of Relaxationof a K Shell Core Holeof a K Shell Core Hole
5
B Ne P Ca M n Z n Br Z r
10 15 20 25 30 35 40 Atom ic Number
Elem en tal Sym bol
0
0.2
0.4
0.6
0.8
1.0
Pro
ba
bili
ty
Note: The lightNote: The lightelements have aelements have alow cross sectionlow cross sectionfor X-rayfor X-rayemission.emission.
Auger ElectronAuger ElectronEmissionEmission
X-ray PhotonX-ray PhotonEmissionEmission
Auger Stats
Primary Beam = 3 - 20 KeV electrons
Detection Sensitivity = ~1 atomic %
Sampling Distance (depth) = 2 to 4 nm
Analysis Diameter = 80nm to several mm
Elements Detectable = Li and above
Auger Data Formats
Raw Data Differentiated Data
AES Can Identify Elements
Auger Sensitivity Factors
Elemental variation in sensitivity factors3kV Primary Beam Voltage
5kV Primary Beam Voltage
Ref: Charles Evans & Assoc. web page tutorial by Ron Flleming http://www.cea.com
Peak Height / Quantitation
For quantitation the derivativeform of the data is used.
Sensitivity Factors are usedto adjust the peak heights ofall elements present in thesample.
The composition is normalizedto 100% to determine the amountof each element.
Identify surface contaminants and Identify surface contaminants and composition.composition.
Study composition as a function of Study composition as a function of depth.depth.
Analyze sample features as small as Analyze sample features as small as 80nm. Using an electron gun for the 80nm. Using an electron gun for the primary beam allows small analysis primary beam allows small analysis spot sizes.spot sizes.
Additional Capabilities of Auger Spectroscopy
Remove adsorbed gases from Remove adsorbed gases from the sample.the sample.
Eliminate adsorption of Eliminate adsorption of contaminants on the sample. contaminants on the sample.
Prevent arcing and high voltage Prevent arcing and high voltage breakdown.breakdown.
Increase the mean free path for Increase the mean free path for electrons, ions and photons.electrons, ions and photons.
Degree of VacuumDegree of Vacuum1010
1010
1010
1010
1010
22
-1-1
-4-4
-8-8
-11-11
Low VacuumLow Vacuum
Medium VacuumMedium Vacuum
High VacuumHigh Vacuum
Ultra-High VacuumUltra-High Vacuum
PressurePressureTorrTorr
Why UHV for Surface Analysis?
AES Instrument Configuration
Elements of Typical Auger System: Electron Gun Analyzer Secondary Electron Detector Ion Gun Sample Stage Introduction System
Significance of Primary Beam
The Electron Beam is functioning The Electron Beam is functioning both as the imaging beam and the both as the imaging beam and the primary beam for analysis. This meansprimary beam for analysis. This meansthat the area of interest on the samplethat the area of interest on the samplecan be directly aligned for analysis.can be directly aligned for analysis.
MRL Instrumentation
PHI Model 660 Scanning Auger Microprobe
Sputtering Samples
Al/Pd/GaN Thin Film Example
(cross section)
Al/Pd/GaN Profile Data
Al/Pd/GaN Atomic Concentration Data
Area Specific Depth Profile Example
SP UTTER T IM E (M IN .)
PE
AK
-TO
-PE
AK
Fracture surface of Carbon fibers in BN matrix - analysis area outlined in black
Depth profile on fiber to determ ine point of fracture. Variations in fracture surfaceinterface for d ifferent sam ple treatments w ill be reflected in depth profile.
From research by C . Cofer/J. Econom y, M aterials Science D ept.
Summary of Surface Techniques
Permissions
• Used with explicit permission from Center for Microanalysis of Materials
• I have reformatted some of the pages
• Please do not duplicate / redistribute