Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker...

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Instrumentation Surface Mount Technology for Surface Mount Technology for Process Analytic Sampling Systems Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation Steve Doe, Parker Hannifin Corporation

Transcript of Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker...

Page 1: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

Instrumentation

Surface Mount Technology for Surface Mount Technology for Process Analytic Sampling SystemsProcess Analytic Sampling Systems

Steve Doe, Parker Hannifin CorporationSteve Doe, Parker Hannifin Corporation

Page 2: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

““Surface Mount” Definition:Surface Mount” Definition:

Component’s control function Component’s control function is detachable from its flowpath is detachable from its flowpath

functionfunction

Providing increased Providing increased servicability and flexibility servicability and flexibility

while reducing overall space while reducing overall space requirementsrequirements

Page 3: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Surface Mount System OptionsSurface Mount System Options

1) 1) Parker Integrated Conditioning System (PICS) w/ SP76 compliant Parker Integrated Conditioning System (PICS) w/ SP76 compliant 1½” and 2¼” elastomeric seal interfaces & instrumentation 1½” and 2¼” elastomeric seal interfaces & instrumentation componentscomponents

2) 1½” compliant interface w/ metallic seals and semiconductor grade 2) 1½” compliant interface w/ metallic seals and semiconductor grade & instrumentation components (“old” ultra-high purity “standard”)& instrumentation components (“old” ultra-high purity “standard”)

3) 13) 111//88” interface w/ metallic seals and semiconductor grade & ” interface w/ metallic seals and semiconductor grade & instrumentation components (emerging ultra-high purity instrumentation components (emerging ultra-high purity “standard”)“standard”)

4) R-Max™ stream switching interface (proprietary)4) R-Max™ stream switching interface (proprietary)

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Page 4: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

SP-76 Interface StandardSP-76 Interface Standard(Elastomeric)(Elastomeric) Roots in semiconductor Roots in semiconductor

industryindustry

Geometrically defines device Geometrically defines device features to match substrate features to match substrate

Everything above the interface Everything above the interface is device supplier specificis device supplier specific

Everything below the interface Everything below the interface is substrate supplier specificis substrate supplier specific

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

1½” Interface

2¼” Interface

Page 5: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

Keys to SP-76 Interface Standard Keys to SP-76 Interface Standard Specifies 1/8” ID flow channelsSpecifies 1/8” ID flow channels

Liquid service?Liquid service?

System commonly uses diaphragm System commonly uses diaphragm valves in lieu of ball valvesvalves in lieu of ball valves

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Geometry specifications do not allow for Geometry specifications do not allow for captured o-rings; housed in captured o-rings; housed in counterbore counterbore onlyonly

Ideal world would incorporate Ideal world would incorporate centerline spacing to support centerline spacing to support captured o-ring designcaptured o-ring design

Page 6: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

PICS SystemPICS System Designed w/ 5 flow channels Designed w/ 5 flow channels

specifically for the majority of specifically for the majority of sample conditioning systemssample conditioning systems

Utilizes 1½” SP76 (o-ring) Utilizes 1½” SP76 (o-ring) compliant elastomeric interface compliant elastomeric interface

Incorporates larger 2¼” footprint Incorporates larger 2¼” footprint to utilize existing instrumentation to utilize existing instrumentation devices; SP76 (o-ring) compliantdevices; SP76 (o-ring) compliant

Substrate heating capability Substrate heating capability available w/ minimal developmentavailable w/ minimal development

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Page 7: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

PICS SystemPICS System Substrate assembled via bolts Substrate assembled via bolts

with tapped holes in headwith tapped holes in head

Bolt interface incorporates dowel Bolt interface incorporates dowel pin feature for alignment and pin feature for alignment and added rigidityadded rigidity

O-ring connections between O-ring connections between substrate blocks substrate blocks

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Page 8: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

1½” Interface1½” Interface 1½” Interface 1½” Interface 2¼” Interface 2¼” Interface

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Std 3 channel access 5 channel accessStd 3 channel access 5 channel access 3 or 5 channel access 3 or 5 channel access

Page 9: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

COMMON

NORMALLY CLOSED

NORMALLY OPEN

AIR

3-WAY R-max

FILTER

(1.5 CR)

H2O CELL

(1.5 CR)

FLOW CONTROLLERWITH EXTERNAL NEEDLE VALVE

UPSTREAM REFERENCE

(2.5 CL)

DOME

DOME

BPR-4000

(2.5 CL)

BACK PRESSURE REGULATOR

123

3L45

IR-4000

(2.5 CR)

PRESSURE REGULATOR

3R45

123

4 3R

33R4

a123

ANALYZERCELL

METERING VALVE1.5" SUBSTRATE

123

3R45 FLOW

CONTROLLER

23

3L4

15

1

4

2

3

(2.5 C)

2

1

3

12

(2.5 CR)

4

(1.5 CL)

TEMP. SENSOR1.5" SUBSTRATE

123L

345

TEMP

a

NeSSI SYSTEMNo. 3

H20 ANALYZER

ACTUATING AIR

ASPIRATOR

ACTUATING AIR

VENT RECOVERY

ASPIRATOR

SAMPLE IN

RTN.

RETURN HDR.

IN

9

6

BY-PASS

4

TO R-max

FROM R-max

FROM R-max

3TO R-max

Page 10: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

1½” UHP System1½” UHP System Designed for delivery of ultra high Designed for delivery of ultra high

purity gasses used in semiconductor purity gasses used in semiconductor applicationsapplications

Recommended for detection Recommended for detection thresholds in the PPB rangethresholds in the PPB range

Utilizes metallic “C” or “W” seals at Utilizes metallic “C” or “W” seals at interfaces; can be adapted for o-ringsinterfaces; can be adapted for o-rings

Field connections are normally welded Field connections are normally welded faceseal type fittings; however, faceseal type fittings; however, compression can be insteadcompression can be instead

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Page 11: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

1111//88” UHP System” UHP System

Same features as 1½” Same features as 1½” system, only smallersystem, only smaller

Emerging as de-facto Emerging as de-facto standard based on desires standard based on desires of leading semiconductor of leading semiconductor equipment OEM equipment OEM

Cartridge heaters availableCartridge heaters available

Currently in full production Currently in full production

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Page 12: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

Block Assembly & ManifoldingBlock Assembly & Manifolding

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Page 13: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

R-Max Stream Select SystemR-Max Stream Select System SP-76 geometrically non-compliantSP-76 geometrically non-compliant

SP-76 intent compliantSP-76 intent compliant

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Page 14: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

NeSSI & R-Max MarriageNeSSI & R-Max Marriage SP-76 geometrically SP-76 geometrically

compliant 1½” blocks for compliant 1½” blocks for sample conditioningsample conditioning

R-Max for stream switchingR-Max for stream switching

Compression fitting Compression fitting interfaceinterface

Lower cost than same Lower cost than same functionality with all-SP76 functionality with all-SP76 block systemblock system

Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002

Page 15: Instrumentation Surface Mount Technology for Process Analytic Sampling Systems Steve Doe, Parker Hannifin Corporation.

Surface Mount Technology for Sample Surface Mount Technology for Sample Systems: Update 2002Systems: Update 2002