https___~avreddy_VLSI Fabrication Principles, Silicon and Gallium Arsenide - 1994 Ghandi (Wiley,...
3
Home Products Overview TCAD Overview Process Simulation 3D 2D Athena SSuprem 4 MC Implant Elite MC Etch & Deposit Optolith Device Simulation Stress Simulation Interactive Tools Virtual Wafer Fab TCAD Videos Analog, Mixed Signal, RF Custom IC CAD Interconnect Modeling Digital CAD Product Examples Downloads & Support Licensing PDK Design Flows Technical Library Services Corporate More about Athena Brochure 3.4 MB Release Notes Manual Competitors Training Materials Presentations Materials Download Examples Supported Platforms Connect Connect with other Silvaco TCAD users on LinkedIn: Silvaco TCAD Tools Group SSuprem 4 2D Core Process Simulator SSuprem 4 is a 2D process simulator that is widely used in the semiconductor industry for design, analysis and optimization of various fabrication technologies. SSuprem4 accurately simulates all major process steps in modern technology by using a wide range of physical models for diffusion, ion implantation, oxidation, etching, deposition, silicidation, epitaxy and stress formation. More... Elite Advanced Physical Etching and Deposition Simulator Elite is an advanced 2D topography simulator for modeling physical etching, deposition, reflow and CMP planarization processes for modern semiconductor technologies. Within the Athena framework, Elite provides seamless bidirectional integration with SSuprem4 and Optolith process simulators and contains an additional MC Deposit/Etch module, which provides several Monte Carlo based atomistic etching and deposition models. More... MC Implant Advanced Monte Carlo Implantation Simulator MC Implant is a generic ion implantation simulator, which models ion stopping, defect generation, and ion implantation distributions in amorphous and crystalline materials. Extensive comparisons with measured profiles have shown that MC Implant is highly accurate and predictive. The simulator can be used for majority of ion/material combinations, arbitrary geometries, different substrate orientations, implant doses, energies and angles. More... MC Etch & Depo 2D Monte Carlo Deposition and Etch Simulator MC Etch & Depo is an advanced topology simulation module seamlessly interfaced with Elite, through the Athena framework. The module includes several Monte Carlo based models for the simulation of etch and deposit processes which use fluxes of atomic particles. More... Athena Process Simulation Framework Athena framework integrates several process simulation modules within a userfriendly environment provided by Silvaco TCAD interactive tools. Athena has evolved from a worldrenowned Stanford University simulator SUPREMIV, with many new capabilities developed in collaboration with dozens of academic and industrial partners. Athena provides a convenient platform for simulating processes used in semiconductor industry: ion implantation, diffusion, oxidation, physical etching and deposition, lithography, stress formation and silicidation. Key Features: Fast and accurate simulation of all critical fabrication steps used in CMOS, bipolar, SiGe/SiGeC, SiC, SOI, IIIV, optoelectronic, MEMS, and power device technologies Accurately predicts multilayer topology, dopant distributions, and stresses in various device structures Advanced simulation environment allows: easy creation and modification of process flow input decks including automatic control of layout mask sequences automatic and userdefined mesh generation and control interactive plotting of 2D structures and distributions as well as 1D crosssections runtime extraction of important process and device parameters optimization of process flow and calibration of model parameters Focused TCAD support team of Ph.D. physicists continuously developing models for new semiconductor technology advances Replaces costly wafer experiments with simulations to enable shorter technology development cycles and higher yields Silvaco's strong encryption is available to protect valuable customer and third party intellectual property. PURCHASE | DOWNLOADS | CONTACT US Search MC Implant Advanced MonteCarlo Implantation Simulator Generic ion implantation simulator which models ion stopping, defect generation, and ion implantation distribution in amorphous and crystaline materials
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Transcript of https___~avreddy_VLSI Fabrication Principles, Silicon and Gallium Arsenide - 1994 Ghandi (Wiley,...
3/29/2015 SILVACO Products ATHENA Process Simulation Framework
http://www.silvaco.com/products/tcad/process_simulation/athena/athena.html 1/3
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SSuprem 4 2D Core ProcessSimulatorSSuprem 4 is a 2Dprocess simulator thatis widely used in thesemiconductor industryfor design, analysis andoptimization of variousfabricationtechnologies. SSuprem4 accuratelysimulates all major process steps inmodern technology by using a wide rangeof physical models for diffusion, ionimplantation, oxidation, etching,deposition, silicidation, epitaxy and stressformation.
More...
Elite Advanced Physical Etchingand Deposition SimulatorElite is an advanced2D topographysimulator for modelingphysical etching,deposition, reflow andCMP planarizationprocesses for modernsemiconductor technologies. Within theAthena framework, Elite providesseamless bidirectional integration withSSuprem4 and Optolith process simulatorsand contains an additional MC Deposit/Etchmodule, which provides several MonteCarlo based atomistic etching anddeposition models.
More...
MC Implant Advanced MonteCarlo Implantation SimulatorMC Implant is ageneric ionimplantation simulator,which models ionstopping, defectgeneration, and ionimplantationdistributions in amorphous and crystallinematerials. Extensive comparisons withmeasured profiles have shown that MCImplant is highly accurate and predictive.The simulator can be used for majority ofion/material combinations, arbitrarygeometries, different substrateorientations, implant doses, energies andangles.
More...
MC Etch & Depo 2D Monte CarloDeposition and Etch SimulatorMC Etch & Depo is anadvanced topologysimulation moduleseamlessly interfacedwith Elite, through theAthena framework. Themodule includesseveral Monte Carlo based models for thesimulation of etch and deposit processeswhich use fluxes of atomic particles.
More...
AthenaProcess Simulation Framework
Athena framework integrates several process simulation modules within auserfriendly environment provided by Silvaco TCAD interactive tools. Athenahas evolved from a worldrenowned Stanford University simulator SUPREMIV,with many new capabilities developed in collaboration with dozens of academicand industrial partners. Athena provides a convenient platform for simulatingprocesses used in semiconductor industry: ion implantation, diffusion,oxidation, physical etching and deposition, lithography, stress formation andsilicidation.
Key Features:
Fast and accurate simulation of all critical fabrication steps used inCMOS, bipolar, SiGe/SiGeC, SiC, SOI, IIIV, optoelectronic, MEMS, andpower device technologiesAccurately predicts multilayer topology, dopant distributions, andstresses in various device structuresAdvanced simulation environment allows:
easy creation and modification of process flow input decksincluding automatic control of layout mask sequencesautomatic and userdefined mesh generation and controlinteractive plotting of 2D structures and distributions as well as 1Dcrosssectionsruntime extraction of important process and device parametersoptimization of process flow and calibration of model parameters
Focused TCAD support team of Ph.D. physicists continuously developingmodels for new semiconductor technology advancesReplaces costly wafer experiments with simulations to enable shorter technology development cycles andhigher yieldsSilvaco's strong encryption is available to protect valuable customer and third party intellectual property.
PURCHASE | DOWNLOADS | CONTACT US
Search
MC Implant Advanced MonteCarlo Implantation SimulatorGeneric ion implantation simulator which models ion stopping,defect generation, and ion implantation distribution in amorphousand crystaline materials
3/29/2015 SILVACO Products ATHENA Process Simulation Framework
http://www.silvaco.com/products/tcad/process_simulation/athena/athena.html 2/3
Optolith Advance 2D OpticalLithography SimulatorOptolith is a powerfulnonplanar 2Dlithography simulatorthat models all aspectsof modern deep submicron lithography:imaging, exposure,photoresist bake, development and reflow.Optolith provides a fast and accuratealternative to experimental evaluation ofmask printability and process control.Optolith simulates both projection imagingand proximity printing with a large masktoresist gap.
More...
Typical 90nm CMOS Process Flow
Athena Framework Architecture
Athena Inputs/Outputs
Rev. 042313_22
3/29/2015 SILVACO Products ATHENA Process Simulation Framework
http://www.silvaco.com/products/tcad/process_simulation/athena/athena.html 3/3
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