GenSys75

Other activities include on-site process implementation, training and tuning

GENCOA products cover 3 sputtering related areas

Reactive gas controller & endpoint detector

Linear ion sources

planar & rotatable Magnetron Sputter

Cathodes and Magnetic Systems

GENCOA Key Company Facts

• GENCOA is a private limited company (Ltd)

• Founded 1995 by Dr Dermot Monaghan

• Located in Liverpool, UK

• Employs 34 people 6 design (Pro E 3D CAD) 4 process development & simulation 14 assembly & test 4 sales & tech support (2 Asia based) 3 administration & accounts 3 hardware & software (Speedflo) • > 3000 magnetrons in the field

• > 500 speedflo systems in the field

GENCOA Key Company Advantages

• 8 types of magnetic systems for rotatable magnetrons • 3 tube size formats for rotatable: 152mm, 100 and 75mm OD • Unique dry target cooling • 10 types of planar magnetic designs • On-site process implementation • Unique PDF+ algorithm for reactive gas process control • In-situ and ex-situ* PEM, lambda sensor, target voltage • Key IPR covering dual rotatable magnetrons and magnetic anode assisted rotatable processes.

• GENCOA provide process solutions by supplying components and know-how that exceeds your expectations:

GenSys75 – 3” OD rotatable target magnetron

Gencoa Rotatable System - patent pending design

Combines all the advantages of rotatable magnetrons without the problems of breaking water seals, dynamic seal and power contact wear.

• All static water to vacuum sealing – 10-8 mbar l/s He leak tight, no wear. • Clean-room compatible. • In-direct target cooling – no water seal break during target change.

GenSys75

• 75mm & 100mm OD tube formats with same end-block. • Optimized magnetic fields to get the best possible target use & target cleanliness. • DLIM type magnetics for AC operation. • Magnetically balanced or unbalanced designs for different applications. • Auxillary magnetically active anodes for process stability and enhanced plasma control. • Integral gas delivery systems for reactive sputtering and uniformity control. • On-site process support and tuning for all rotatable applications.

• GENCOA have developed a new type of small tube magnetron – The Gencoa Rotatable System (GRS) is ‘dry,’ in-directly target cooled, with no rotating water seals and no rotating power contact.

GenSys75 – 3” OD rotatable target magnetron - fits into planar magnetron ports

• The Gensys75 has been developed primarily to allow conversion of existing planar magnetron sputter systems to use rotatable technology. This is achieved by the narrow end-block ensuring the target length and uniformity matches the existing planar target length

• Fits into confined spaces – can directly replace any planar magnetron with equivalent target length and target to substrate separation.

• >70% target use from flat targets >85% from dog-boned design.

• Fast target change – no need to break water seal - full clean-room compatibility.

• Bonded or mono-block targets. • Lower target material costs.

Fast target change – no need to break water seal - full clean-room compatibility

High coolant capacity – 15mm Ø water connections – allows upto 2m target length

Multi-power mode compatible - DC, DC pulsed, Hipims, RF and AC

Only rotating element is a ferro-fluidic type feed-through for the motor drive belt

GenSys75 double cathode assembly can fit into 220mm flange port widths

Single, dual, triple or quad sources can be configured to customer flange requirements with Gencoa standard anode and gas delivery options.

Standard, unbalanced, focused & DLIM magnetic options available for dual cathodes

GenSys75 - 400mm long with standard type DLIM magnetics and 16kW AC oxygen plasma

Plasma control by Double Low Impedance Magnetics - DLIM

Adjustment of angle relative to substrate position

DC

AC

This shows a typical DLIM design for reactive SiO2, TiO2 Nb2O5, AZO and ITO

GenSys75 – 3” OD rotatable target magnetron in DLIM configuration for AC power

Angular position of racetracks options

Focused option gives a narrower coating flux profile. Heat and plasma load will be higher on the substrate compared to standard magnetics – can be adjusted by tilting the magnetic arrays towards each other.

Unbalanced (PP type) and linked magnetics are also available for plasma bombardment

Varying the angle changes the plasma bombardment

GenSys75-360 – I/V for standard magnetics with aluminium target and DC power

Target length 360mm

GenSys75, 360mm long single at 3.1 mTorr DC (single) test

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Power (kW)

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All magnetic designs are carefully optimized to provide high target use and

optimum plasma and layer properties

This shows a standard magnetic field for a single cathode

Gencoa offer 3 tube OD formats – the standard 152mm with SCI end-blocks and

75mm OD and 100mm OD targets with the GenSys75

*SCI end-blocks require an additional adaptor flange for 75mm OD targets

Conversion of an SCI MM side mount mini type end-block to the

75mm OD target is also an option

Gas bar options and magnetically guided anodes are available to further enhance

the performance of your process

Supplementary magnetic anodes for rotatable cathodes with DC & DC pulsed power

More stable environment to avoid process drifts

The introduction of an optional magnetically guided hidden auxiliary anode and gas bar offers the following benefits: • lower plasma heating of the substrate – x3 power possible for web coating •reduced substrate movement influence on the plasma impedance • lower discharge voltages – lower impedance – lower TCO resistivity • less drift of plasma impedance and instability for non-conducting layers • more consistent uniformity •gas injected uniformly and protects hidden anode surface

1.00E-04

1.00E-03

1.00E-02

1.00E-01

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0 2 4 6 8 10 12

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tivity,

Ohm

-cm

Sample position

Resisitivity conventional (BOC) & DLIM at room temperature (every 25 mm)

resistivity BOC

resistivity DLIM

Comparison of reactive AZO in-front of a double AC rotatable magnetron

Comparing the 2 different magnetic designs

Gencoa Rotatable Magnet Bar Products

GRS75

Applications Component parts supplied

LS Low strength

Low strength for higher voltage sputtering

RF Radio frequency

Strength optimized for RF power modes with active anode

SSF Standard Strength

Focused

Standard field strength of 550 Gauss over the target with balanced field design

PP-RT Unbalanced ion assist processes

Single and multi-cathode unbalanced magnetic designs for high levels of ion assistance for deco and hard coatings

TCO Transparent

conduction oxide films

Single cathode magnetics with active anode for reduced resistivity TCO layers for DC and DC pulsed operation (patented)

LH/Web Single cathode with

lower heating of substrate

Single cathode magnetics with active anode for reduced heat loads during vacuum web coating for DC and DC pulsed operation – allows up to 3 x the power level compared to conventional magnetics (patented)

DLIM For better dual

cathode AC discharges

Double cathode Low Impedance Magnetics for high rate reactive deposition of oxides with lower substrate heating and plasma interference (patented)

DLIM-DC-TCO Single anode shared between 2 cathodes

for TCO

Double cathode low TCO resistivity magnetics for DC powered double magnetrons with an additional active anode (patented)

Gencoa have developed a wide range of magnet bar options for the GenSys75

magnetrons in order to control the plasma better

Magnet pack

Active magnetically

guided anode

The shorter GenSys75 with modular designs are the ultimate in flexibility for process

development – any process can be handled

• Single or dual configurations can be used with RF, DC, DC pulsed, AC & Hipims power configurations.

• Optional magnetic anodes for better plasma control.

• Various magnetic designs available and all

easily interchangeable for different layers development from one process module.

• The addition of a Speedflo gas controller, sensors and gas bars for reactive processes.

Sales agents / distributors located around the world and 95% of output is exported from the UK Main markets are USA, EU, Japan, Taiwan, Korea & China Local Gencoa based staff for technical support in USA, EU & Asia

GENCOA worldwide company presence