You$are$to$add$this$reac.on:$$SiH4$(g)$7>$Si$(s)$+$2H2$(g)$

For details of our model, see ReactorLab.net, Resources, Grad CRE Notes, LPCVD of polysilicon in wafer-stack tube reactor

Weerts, W. L. M. , de Croon, M. H. J., and Marin, G. B., 1997. “Low-Pressure Chemical VaporDeposition of Polycrystalline Silicon: Analysis of Nonuniform Growth in an Industrial-Scale Reactor,”J. Electrochem. Soc., vol. 144, no. 9, pp. 3213-3221.

This$is$only$the$le>$side$of$the$table$Data$for$higher$T’s$are$also$shown$

For details of converting collision frequency and sticking coefficient - or decomposition probability - see ReactorLab.net, Resources, Grad CRE Notes, Step coverage and determination of sticking coefficients, file Komiyama_trench.pdf

For details of our model, see ReactorLab.net, Resources, Grad CRE Notes, LPCVD of polysilicon in wafer-stack tube reactor