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Flexible illumination for ultra-fine resolution with 0.33 NA EUV...
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Flexible illumination for ultra-fine resolution with 0.33 NA EUV lithography
2016 International Symposium on Extreme Ultraviolet Lithography, Hiroshima, Japan, 2016-10-24
Jörg ZimmermannPaul GräupnerRalf GehrkeAlexander Winkler
Carl Zeiss SMT
Christoph HennerkesStephen Hsu
ASML Brion
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22016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
EUV program at ZEISS
MET(Micro Exposure Tools)
ADT(-Demo Tool)
Starlith® 3100
Starlith® 3300
2003 2006 2009 2012
HVM series productionHVM series productionsmall seriessmall seriesprototypesprototypes
High-NA
Enhanced illumination
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32016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Resolution enhancement by low-k1 illumination
NAResolution = k1
λ·
Ernst Abbe (1873)
= 13.5 nm
= 0.33
Reduce the process factor k1
by applying enhanced illumination (similar as in DUV lithography) high sigma settings smaller pupil fill ratio customized freeform pupils
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42016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Starlith® 3300 optical train
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52016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Starlith® 3300 illuminator: Actuated fly’s eye unit enables lossless setting changes
IntermediateFocus
Field Facet Mirror
Pupil Facet Mirror
Standard pupil shapes
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62016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Pupil Fill Ratio (PFR) of EUV pupils
Pupil Fill Ratio (PFR) definition: the area of the pupil filled with energy
NI
IPFR
N
nn
max
1
N: number of grid pixels with ≤ 1
In: intensity of grid pixel n
Imax: max. intensity of any grid pixel
not applicable to discrete EUV pupils directly
PFR = 40%
applicable to corresponding tophat envelope
also applicable to greyscale freeforms
PFR = 43%
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72016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Decrease the Pupil Fill Ratio (PFR)on the Starlith® 3300 illuminator
Pupil shapes with smaller PFR can be supported on the Starlith® 3300 illuminator, by switching off pupil channels, reducing the illuminator efficiency.
illuminator efficiency =
illuminator efficiency = 78%illuminator efficiency = 100%
total energy in the pupil if all channels were switched on
total energy which is used in the actual pupil
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82016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Higher pupil flexibilityby increased number of pupil facets
Starlith® 3300:one field facet can address two pupil channels
New generation: one field facet can address many pupil channels
decrease pupil filling enable ≥ 20% pupil fill ratio
at full illuminator efficiency
Pupil switching mechanism
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92016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
New generation illumination for low-k1 imaging
Extend sigma rangeDecrease pupil filling
Highest possible resolution down to 13 nm with NA = 0.33 and k1= 0.32
Optimized pole shapes & maximum pupil flexibility
New & more illumination settings for upcoming nodes at full throughput
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102016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
New generation pupil shapes
Pupil shapes with 20% pupil fill ratio ... and with larger pupil fill ratio
….
standard settings 3300
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112016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Leafshape Dipoles for 13 nm half-pitch resolution at 100% illuminator efficiency
New generation
57.1nm2633.0
nm5.13
pNA
∆
≈ 20% pupil fill ratio
Starlith® 3300
NIL
S(n
orm
aliz
ed
imag
e lo
g sl
ope)
aerial image simulation(zero defocus, topographic mask)
half-pitch / nm
13 nm resolutionat full throughput
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122016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Dipoles for 13 nm half-pitch resolutionQuasar for 18 nm half-pitch H & V
Dipole X Dipole Y Quasar
vertical Lines&Spaces13 nm half-pitch
H&V Lines&Spaces18 nm half-pitch
horizontal Lines&Spaces13 nm half-pitch
Contact Hole array18 nm half-pitch
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132016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Hexapoles and Rotated Dipoles for DRAM
Hexapoles
for DRAM active areafor DRAM storage node (hexagonal contact hole array)16.5 nm half-pitch Single Exposure 13 nm hp SE15 nm hp Double Patterning
Rotated Dipoles 30° Rotated Dipoles 22°
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142016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Freeform pupil shapes
target shape
EUV pupil
SMO pupilfor logic cut mask
rotated pupil shapefor DRAM brickwalls
y-asymmetric3D mask compensation
all examples without light loss (100% illuminator efficiency) on new generation illumination system
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152016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Source mask optimization (SMO): Tachyon SMO NXE flow
NXE:33x0pupil verification & connectivity
Discrete mirror state & mask
co-optimization
Freeform pupil& mask
co-optimization
New EUV stages (green boxes) forNXE:33x0 FlexPupil optimization
Tachyon FEM+ Model:• Jones Pupil • Aberrations• 3D mask model• Resist model
Final pupil & OPC mask
analysis
Mask defocus optimization
0
5
10
15
0 20 40 60 80 100 120
Expo
sure
Lat
itude
(%
)
Depth of focus (nm)
CDU, shift, EPEMask
defocus
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162016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Pupil properties taken into account inTachyon SMO NXE flow
Freeform pupil& mask
co-optimization
to achieve best match of optimized freeform pupil to final EUV pupil:
min/max sigma range of illuminator generation minimum pupil fill ratio for lossless pupil
(i.e. 100% illuminator efficiency)
3300: min PFR ≈ 40%new generation: min PFR ≥ 20%
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172016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
ZEISS models integrated intoTachyon SMO NXE flow
Discrete mirror state & mask
co-optimizationZEISS pupil prediction model integrated into Tachyon SMO flow
Tachyon SMO results can make use of illumination properties most effectively
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182016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Tip-to-tip pattern: 13 nm half-pitch, 24 nm gap
with 3D mask model
SMO results: Freeform pupils
MEE
F
ILS
[1/n
m]
min. Pupil Fill Ratio min. Pupil Fill Ratio
benefit of reduced 20% pupil fill ratio for ILS and MEEF.
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192016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Via array: 20 nm squares, 42 nm min. pitch
Depth of Focus / nm
Exp
osur
e La
titud
e / %
Process window
Process window of freeform pupilis maintained by EUV pupil.(100% illuminator efficiency)
with 3D mask model
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202016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Arbitrary freeform pupil shapes are possible
Shapes designed byTomohiro Nishikado (1978)
target shape
EUV pupil
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212016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Pupil tuning can adjust proximity bias
pitch / nm
C
D /
nm
original pupil
after mask tape-out, tweek the process to adjust the proximity curve, i.e. iso-dense bias?
adjust the pupil by switching a few pupil spots
pitch / nm
C
D /
nm
after pupil tuning
pitch / nm
C
D /
nm
after pupil tuning
pitch / nm
C
D /
nm
after pupil tuningafter pupil tuning
pitch / nm
C
D /
nm
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222016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Another challenge for pupil tuning: 3D mask induced pattern shift through focus
LTE Substrate
MO/Si Multilayer (ML)
AbsorberAbsorber Absorber Absorber
Dipole Y
due to oblique incidence on mask,3D mask effect can induce imaging telecentricity (placement error divided by defocus)
pitch / nm
tele
cent
ricity
/ m
rad
Pattern shift through focus
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232016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Pupil tuning can compensate for3D mask induced pattern shift through focus
before tuning after pupil tuning
Pattern shift through focus adjust the pupil (induce a pupil imbalance)
to compensate for the 3D mask induced telecentricity through pitch(while maintaining the proximity behavior)
pitch / nm
tele
cent
ricity
/ m
rad
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242016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Summary: Flexible illumination at 0.33 NA
New generation EUVL illumination will support 20% pupil fill ratio (PFR) at full illuminator efficiency, and cover the full sigma range.
Will provide lossless pupil shapes for ultimate imaging resolution for 0.33 NA EUVL at 13 nm half-pitch, or bi-directional imaging at 18 nm half-pitch H&V.
High pupil flexibility ensures support of Source Mask Optimization (SMO).- can generate arbitrary customized freeform pupils with ≥ 20% pupil fill ratio.
- Predictive illuminator model is integrated in Tachyon SMO software.
High pupil flexibility supports pupil matching and Pupil Tuning applications.
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252016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
The roadmap continues: High NA
High NA EUVL will enable further shrink below 8 nm resolution.
High NA EUVL from illuminator perspective: larger angles anamorphic system
MAG 4x in x, MAG 8x in yAngular cone of illumination lightat reticle will be elliptical.
central obscuration in the projection pupil
reticle
wafer
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262016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Flexible illumination for High NA
same Flex Pupil concept can be used
Dipole setting forultimate resolution
∆
20% pupil fill ratio for≤ 8 nm resolution
POB obscuration
not limiting the illumination
no need to put illumination light into the pupil center
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272016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Flexible illumination for High NA
physical angles illumination pupil looks elliptical simulation SW takes the actual angles
into account for 3D mask calculation
Anamorphic system:
normalized pupil coordinates (“sigma”) pupil looks circular, by definition of
sigma coordinates business as usual for lithographer
sin x
sin y
y
x
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282016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Conclusion
High pupil flexibility at 0.33 NA- will provide lossless pupil shapes for 13 nm half-pitch resolution.
- will provide arbitrary lossless pupils with ≥ 20% PFR, for SMO and Pupil Tuning.
- Predictive illuminator model is integrated in Tachyon SMO software.
Extension to High NA EUVL- Flex illuminator concept can be extended to High NA anamorphic litho optics.
- will provide lossless pupil shapes for ≤ 8 nm half-pitch resolution and support SMO and Pupil Tuning applications.
- Low-k1 EUVL for subsequent nodes will be enabled by flexible low-PFR illumination on high-NA EUVL systems.
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292016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima
Acknowledgements
EUVL teams at ASML & ZEISS and at our partners
Federal Ministry of Education and Research (Germany)for funding of the BMBF project 16N12256K „ETIK“ and the project 16ES0255K „E450LMDAP“ within the framework of the ENIAC program
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302016-10-24Carl Zeiss SMT GmbH, Jörg Zimmermann EUVL Symposium 2016, Hiroshima