Electrical characterization of Ba(Zr0.1Ti0.9)O3 thin films grown by pulsed laser ablation technique
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Transcript of Electrical characterization of Ba(Zr0.1Ti0.9)O3 thin films grown by pulsed laser ablation technique
Electrical characterization of Ba(Zr0.1Ti0.9)O3 thin films grown bypulsed laser ablation technique
Sandip Halder, Sudipta Bhattacharyya, S.B. Krupanidhi *
Materials Research Centre, Indian Institute of Science, Bangalore 560012, India
Received 7 January 2002; received in revised form 11 April 2002; accepted 23 April 2002
Abstract
In situ annealed thin films of ferroelectric Ba(Zr0.1Ti0.9)O3 were deposited on platinum substrates by pulsed laser ablation
technique. The as grown films were polycrystalline in nature without the evidence of any secondary phases. The polarization
hysteresis loop confirmed the ferroelectricity, which was also cross-checked with the capacitance�/voltage characteristics. The
remnant polarization was about 5.9 mC cm�2 at room temperature and the coercive field was 45 kV. There was a slight asymmetry
in the hysteresis for different polarities, which was thought to be due to the work function differences of different electrodes. The
dielectric constant was about 452 and was found to exhibit low frequency dispersion that increased with frequency. This was related
to the space-charge polarization. The complex impedance was plotted and this exhibited a semicircular trace, and indicated an
equivalent parallel R �/C circuit within the sample. This was attributed to the grain response. The DC leakage current�/voltage plot
was consistent with the space-charge limited conduction theory, but showed some deviation, which was explained by assuming a
Poole�/Frenkel type conduction to be superimposed on to the usual space-charge controlled current. # 2002 Elsevier Science B.V.
All rights reserved.
Keywords: Ferroelectric; Thin films; Barium zirconium Titanate; Laser ablation
1. Introduction
One of the most important properties of dielectric thin
film materials is their relatively high dielectric constant,
which is not only indispensable for the application of
thin films in integrated capacitors but also fundamental
for future applications of thin film capacitors in
dynamic random access memories (DRAMs). At pre-
sent, ferroelectric materials are well recognized to be
excellent capacitor materials for DRAMs in ultra large-
scale integration [1�/4]. The most attractive advantage of
ferroelectric materials over conventional nitride-oxide is
that the former has a very high dielectric constant,
especially for memory densities above 64 MB and above
[5�/7].
Solid solution of BaTiO3 and BaZrO3 (Ba(Zrx -
Ti1�x)O3 or BZT) is very important for multilayer
ceramic capacitors. With increase in Zr percentage
three-phase transitions (as in pure BaTiO3) move closer
together and finally coalesce at x�/0.1 [8].
There had been a few reports of the synthesis of single
crystals and ceramic samples of BZT [8,9]. However, to
the best of our knowledge, there had been no attempts
of growing this material in a thin film form. Ba(Zr0.1-Ti0.9)O3 is a promising material candidate for DRAMs
because of its high dielectric constant in the paraelectric
phase. In this article we report about the growth of BZT
thin film by pulsed laser ablation. The samples were also
characterized electrically in the paraelectric phase. Their
DC electrical properties were analyzed by assuming a
distribution of trap states in the band gap. The AC
electrical properties were also studied to compare theresults obtained from the DC measurements.
2. Experimental
For the present work a KrF excimer laser operating at
5 Hz was used. The beam was focused to the desired
energy by an ultraviolet (W) grade plano convex lens of* Corresponding author
E-mail address: [email protected] (S. Halder).
Materials Science and Engineering B95 (2002) 124�/130
www.elsevier.com/locate/mseb
0921-5107/02/$ - see front matter # 2002 Elsevier Science B.V. All rights reserved.
PII: S 0 9 2 1 - 5 1 0 7 ( 0 2 ) 0 0 2 2 2 - 2
50 cm focal length and was coupled into the vacuum
chamber through a quartz port. The angle of incidence
of the beam with the target was 458 with an energy
density (fluence) of 4 J cm�2. The deposition pressurewas controlled with an MKS operated in conjunction
with a mass flow controller.
A dense ceramic target of Ba(Zr0.1Ti0.9)O3 was pre-
pared via the conventional solid-state reaction. The
starting materials (BaCO3, TiO2 and ZrO2 all of purity
99.99%) were ball-milled for 4 h in acetone and then
calcined at 1300 8C for 4 h. The calcined powder was
then pressed into 18 mm targets. The targets weresintered at 1360 8C for 6 h. A freshly polished surface
was used for each deposition, and the target was
mounted on a rotating carousel to ensure uniform
ablation. Substrates were placed in parallel with the
target at a distance of 3 cm. The substrates used for the
present deposition were (111)-oriented Pt on
TiO2½SiO2½Si. The films were grown in situ at different
temperatures (610�/670 8C). Prior to deposition thebase pressure of the chamber was brought down to
2.5�/10�5 Torr. During deposition the oxygen pressure
was maintained at 50 mTorr.
The Ba(Zr0.1Ti0.9)O3 films were characterized structu-
rally by X-ray diffraction (XRD). Compositional uni-
formity was determined at various points over the film
using energy dispersive X-ray analysis (EDAX). The
film thickness was determined by an optical spectro-meter (Filmetrics F20). The film thickness varied
between 400 and 700 nm. With the help of a shadow
mask, Au dots of 1.96�/10�3 were deposited by thermal
evaporation.
3. Results and discussion
3.1. Structural characterization
3.1.1. Effect of oxygen pressure
Fig. 1(a) shows the XRD patterns for the films
deposited at different oxygen pressures between 50 and
100 mTorr, while keeping the temperature constant at
670 8C. All the films are polycrystalline in nature. At
low oxygen pressures, the films tend to show bettercrystallinity. With increase in oxygen pressure the
intensity of the perovskite peaks decreases. It was seen
that when the films are deposited at a pressure of 100
mTorr, (100) and (200) peaks are absent and the
intensity of (110) peak has reduced. With increase in
pressure, the energy of the deposited species is reduced,
hence affecting the crystallinity which accounts for the
decrease in peak heights at higher pressures. Thecrystallite size analysis using the Scherrer equation
reveals it to be approximately 60 nm for films deposited
at all pressures.
3.1.2. Effect of temperature
From the XRD pattern, Fig. 1(b), for the films
deposited at different substrate temperatures, it has
been found that the crystallinity increases with the
deposition temperature. It has been observed from
crystallite size analysis that there was a significant
increase in grain size with an increase in substrate
temperature. For the films deposited at 610 8C the
crystallite size was around 60 nm, while the grain size is
around 130 nm at 670 8C. As observed from earlier
reports [10] the variation can be attributed to the
increase in mobility of the deposited species at higher
substrate temperatures.
Fig. 1. (a) XRD graph of BZT films deposited at different pressures.
(b) XRD graph of BZT films deposited at different temperatures.
S. Halder et al. / Materials Science and Engineering B95 (2002) 124�/130 125
3.2. Polarization hysteresis
The ferroelectric nature of the Ba(Zr0.1Ti0.9)O3 thin
films was confirmed from the polarization hysteresis
measurements, as shown in Fig. 2. The measured values
of spontaneous and remnant polarization were 13.4 and
5.9 mC cm�2, respectively, with a coercive field of 45 kV
cm�1. The asymmetric behavior that occurred in the
films can be induced by various factors, such as defect
charges present in the ferroelectric material or due to
different work functions of the top and bottom electro-
des [11].
3.3. Dielectric properties
Fig. 3(a) shows the change of o?r with temperature for
different frequencies. The value of o?r at lower frequen-
cies (100 Hz) rises sharply with increase in temperature,
while at higher frequencies (100 KHz) it is found to
decrease. This suggests the contribution of the space
charge to the complex dielectric constant at lower
frequencies [12�/15]. At higher frequencies, the merging
of the dielectric curves indicates that the space-charge
effect diminishes. The influence of the space charge is
also reflected in the imaginary part of the dielectric
constant (/o??r); as shown in Fig. 3(b) where we observed
similar frequency dispersion at higher temperatures. The
dielectric phase transition is shown in Fig. 4. It is evident
from the o �/T curve that the phase transition was
diffused in nature, which occurred between 270 and
330 K. The diffused nature of the phase transition could
be due to the fine grained structure of the films.
3.4. I �/V characteristics
The DC leakage behavior of a typical Ba(Zr0.1Ti0.9)O3
thin film is shown in Fig. 5. It was seen that the current�/
voltage characteristics were highly non-linear in nature.
The plot has been given in log�/log scale. A power law
relation could represent the current with voltage as
I �V a:
The exponent ‘a ’ is a parameter that characterizes the
type of conduction. In the log�/log plot, the slope of the
I �/V curve would give the measure of the parameter ‘a ’.Fig. 2. Polarization hysteresis curve of a typical in situ deposited BZT
thin film.
Fig. 3. (a) Real part of dielectric constant as a function of frequency at
various temperatures. (b) Imaginary part of dielectric constant versus
frequency at different temperatures.
S. Halder et al. / Materials Science and Engineering B95 (2002) 124�/130126
It was seen that, in the observed I �/V plot, the low-
field region began with a linear dependence on the
voltage, as evident from the unit slope of the plot.
Hence, we might conclude that the bulk is dominating
the low-field conduction through the thin film, and there
is no interface barrier (Schottky) near to the electrodes.
If there were a barrier in the electrode, then, particularly
at the low fields, the major part of the voltage drop
would be across the interface (since the resistance of a
Schottky barrier at low field would be very high). In
such a case, the true bulk-like nature would not be
observed. The Arrhenius plot of the current at a low
voltage (0.5 V) is also shown in Fig. 6. The correspond-
ing activation energy was found to be 0.80 eV. This
could be attributed to the movement of oxygen vacan-
cies [16].
Beyond a voltage of 5 V, there was a non-linearity
observed. The slope of I �/V plot at that region was
around 8.14 at room temperature. At higher tempera-
tures, the slope was slightly reduced. For example, the
slope in the non-linear region was 6.08 at a temperature
of 150 8C. This trend was observed in the intermediate
temperatures also. Since the film was deposited at high
temperature, it could be expected to consist of a
columnar microstructure, i.e. column-shaped grains
extending from one side to the other side of the film
along the thickness. It is a reported fact that the in situ
deposited films tend to show a fibrous grain structure
[17]. Scott reported that, in columnar grains, the current
would be governed by the space-charge-limited conduc-
tion mechanism [18]. In space-charge controlled current,
the current should follow a square-law dependence on
voltage. However, in the presence of traps in the sample,
the traps first would get filled with the injected charges,
and then the current would sharply rise to the trap-filled
limit [19]. At this region, for the traps with distributed
energy levels, the value of ‘a ’would be of the order of 7�/
10. At low temperature, the electron distribution among
the various energy levels would be a sharply decreasing
function near the Fermi energy. But as the temperature
increases, the distribution function would start getting
rounded and the change in the electron density would be
a relatively slowly changing function with energy. The
rise in the space-charge current in the trap-filled region
is basically a consequence of this behavior of the Fermi�/
Fig. 4. Dielectric constant versus temperature.
Fig. 5. Current�/voltage characteristics of thin BZT sample.
Fig. 6. Arrhenius plot of the DC conductivity.
S. Halder et al. / Materials Science and Engineering B95 (2002) 124�/130 127
Dirac distribution function; at the trap-filled voltage,
the Fermi energy basically passes through the trap
energy levels. However, since the electron population
in the trap levels becomes more homogeneous at high
temperature, the rise in the current is expected to be
slower than that at lower temperature. Beyond the
region where the current shows a very rapid increase
with voltage, there exists another region of the I �/V
curve, in which current varies relatively slowly. This
region is known as the trap-free space-charge regime,
since all the trap levels would be filled by this time, and
any further charge carriers would directly be injected in
the conduction band. In such a case, the sample would
behave as if there are no traps in it, and the current
would vary as the square of the voltage. The high-field
I �/V curve is shown in Fig. 7 and the slope was found to
be 1.96. This was also another proof that the space-
charge contribution was dominant in the high-field
region of the I �/V plot. The low-field conduction was
governed by the bulk-generated charge carriers, and was
ohmic in nature. This was evident from the unit slope of
the low-field current�/voltage plot in the log�/log scale.
The low-field region, the trap-filled limit and the high-
field trap-free square-law regime formed a triangle
called the Lampert’s triangle [20].
The high-field region of the I �/V curve, which
exhibited a slope of nearly ‘2’ in the log�/log scale, was
also a function of temperature. This could be explained
on the basis of the existence of shallow traps in the
sample. Since the value of the Fermi�/Dirac probability
function is always lesser than unity above the Fermi
level, and the location of the shallow traps is also above
Fermi level, it could be assumed that the shallow traps
would always remain partially unfilled. Therefore, the
role of the shallow traps would still be seen even beyond
the (deep) trap-filled limit. It was shown by Lampert [19]
that, in the presence of shallow traps, the space-charge
current would still show a square-law dependence on thevoltage.
The trap-filled limit was defined by Lampert [19] as
the onset of non-linearity in a trap-controlled space-
charge conduction phenomenon. In our case, the trap-
filled limit was at 5 V at room temperature, and showed
an increasing trend with temperature. This trend was
observed up to a temperature of 100 8C. Above
100 8C, the trap-filled limit was seen to decrease withvoltage. The initial trend was consistent with the space-
charge controlled current theory, in which the number
of unfilled traps just below the Fermi level (deep traps)
would increase at elevated temperatures. Hence, more
amount of charges would have to be injected (by
applying a higher voltage) into the sample to fill those
empty trap levels. This would finally result in a net
upward shift of the trap-filled limit with temperature.Even though there would not be a single trap level
present in the sample, rather a superposition of several
trap levels differing in energy would exist, but since trap-
filled limits for every individual trap level are going to
increase, the net trap-filled limit would also increase.
However, above 100 8C, it was seen that the trap-filled
limit showed a decreasing trend. This trend continued
till 240 8C and above. It was also observed by ourgroup that, in case of barium bismuth niobate thin films,
the same phenomenon is noticed, but at a relatively
higher temperature [20]. The reason was explained on
the basis of a dynamic equilibrium between the trapping
and de-trapping of injected electrons. However, in the
study of space-charge current conduction, the trapping
is assumed to be a temperature-limited phenomenon.
However, any physical traps would exhibit someamount of electric field dependence on their trapping
and de-trapping processes. In fact, it is an established
fact that space-charge current could be strongly mod-
ified by field-assisted Poole�/Frenkel de-trapping pro-
cess [21]. In such a case, the application of higher field
would lead to the release of trapped electron rather than
injecting more number of charges to fill the already
empty traps. And this process would also be acceleratedif more thermal energy were supplied. The field-assisted
de-trapping would then reduce the effective trap-filled
limit. This might be the reason for the reduction of VTFL
at high temperatures.
3.5. Complex impedance analysis
To understand the role of microstructure, the complex
impedance of the sample was measured at varioustemperature over the frequency range of 100�/100 kHz.
Complex impedance spectroscopy had been a well-
recognized method to gain an insight into the internalFig. 7. The Lampert’s triangle.
S. Halder et al. / Materials Science and Engineering B95 (2002) 124�/130128
structure of the sample in terms of equivalent circuits
[22]. Fig. 8 shows the complex impedance of the sample
for different frequencies with variable temperature. It
was seen that the complex impedance plot had the shape
of a semicircle that passed through the origin. The
nature of this plot indicated that there was a single
internal circuit equivalent to a parallel combination of a
capacitor and a resistor. It can be seen that, for aparallel R �/C combination, the total impedance follows
a frequency dependence of the form [23]
Z��R
1 � jvCR: (1)
If the impedance is represented in the complex plane,
then the tip of the complex vector Z* would trace asemicircle which would pass through the origin. In this
case, it was assumed that both the resistance and the
capacitance were frequency independent. The peak of
the semicircle would correspond to the frequency
vp�1
2pRC: (2)
In the present case, the peak frequency was found to be
at 300 Hz at 275 8C. The peak frequency shifted to
higher values as the temperature of the sample was
increased. For example, the peak frequency was in-
creased to 6 kHz at a temperature of 350 8C. The above
expression for the peak frequency could explain this
phenomenon. With temperature, the resistance of the
sample would decrease nearly exponentially, and, sincethe sample was in paraelectric state at the mentioned
temperatures, the capacitance also would have fallen
down at elevated temperatures. It was seen that the
temperature dependence of the peak frequency vp was
slightly faster than an exponential increase with tem-
perature, which was just a consequence of the previous
statement. It is known that the resistance falls of
exponentially with the temperature [13]. Since the
capacitance also decreased with temperature, the net
inverse of their product would be a faster increasing
function. However, it was not possible to associate any
activation energy with this type of temperature depen-
dence. From the intersection of the extrapolated semi-
circle with the real axis of the impedance plot, the DC
resistance was calculated. This followed an Arrhenius-
type temperature dependence, and the activation energy
was found to be about 0.84 eV (Fig. 9), which was
comparable to that obtained from the actual DC
measurements. This resistance was recognized as the
grain resistance. The nearly equal values of Ea suggested
that both DC and AC conduction properties of the
sample were governed by the grain properties. Since
there was a single semicircle in the complex impedance
plot, it was considered that there was only one parallel
RC element in the circuit, at least in the measured
frequency window. The interfacial capacitance, if at all
present, would be of a very high value, and this would
result in a high time constant. Hence, the interfacial
effects would appear at a very low frequency to be
detected. However, the energies obtained from both the
observed and extrapolated results indicated that there
was a dominant role of the oxygen vacancies in the
conduction behavior of the thin film sample.
Fig. 8. Complex impedance plot at various temperatures.
Fig. 9. Arrhenius plot of the grain conductivity.
S. Halder et al. / Materials Science and Engineering B95 (2002) 124�/130 129
4. Conclusions
The in situ-deposited polycrystalline films were suc-
cessfully deposited which were ferroelectric in nature.This was confirmed from the polarization hysteresis.
The asymmetry in the polarization hysteresis was
explained on the basis of the different electrode materi-
als having different work functions. At higher tempera-
tures the frequency dispersion in the low frequency
regime was much more than high-frequency regime.
This was attributed to space-charge effects. The complex
impedance plots traced a single semicircle, whichindicated a single parallel R �/C circuit within the
sample. The current�/voltage plot indicated a predomi-
nant space-charge conduction mechanism. However,
there was some deviation, which was explained on the
basis of the Poole�/Frenkel effect superimposing itself
on the space-charge conduction mechanism at higher
electric fields.
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S. Halder et al. / Materials Science and Engineering B95 (2002) 124�/130130