Editorial

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ELSEVIER Surface and Coatings Technology 76-77 (1995) v Preface SURIACE &GIJIlIIIIiB _NOIIOY The 22nd International Conference on Metallurgical Coatings and Thin Films, sponsored by the Vacuum Metallurgy and Thin Films Divisions of the American Vacuum Society, was held in San Diego, California, April 24-28, 1995. The program has continued to represent the combined interest of the divisions in eight symposia and one topical conference with more than 500 invited, contributed and poster papers. The program included special highlights such as the plenary session, an evening forum, several workshops and short courses. The proceedings contain 245 papers that were peer reviewed and accepted on the basis of technical merit and timeliness of submission. As has been the practice since 1987, the proceedings are being published in special issues of either Surface and Coatings Technology or Thin Solid Films. The papers from Symposia A (Coatings for Use at High Temperature), B (Hard Coatings and Vapor Deposition Technology), E (Tribological Coatings/Surface Modifications) (except E4), G (Applications, Manufacturing and Equipment), and the topical conference on Advances in Coating Light-weight Alloys and Materials, will be published in Surface and Coatings Technology; while papers from Symposia C (Optical Thin Films), D (Diamond and Related Materials), F (Advances in Coating and Thin Film Characterization), H (Advanced Materials in Microelectronics), and the session on Mechanical Processes on the Atomic Scale (E4) from Symposium E (Tribological Coatings/Surface Modifications) will be published in Thin Solid Films. The organization of the conference and assembly of a Proceedings of this size and magnitude obviously require the effort of a number of people. The Executive and Program Committees for ICMCTF95 are recognized in the following pages and their efforts are gratefully acknowledged. In addition the generous support of the firms exhibiting at the conference, also listed, is acknowledged. Specifically related to the Proceedings, the Editors would like to thank all those individuals who served as referees for the manuscripts, the Symposium Chairs for identifying qualified reviewers, Mary Gray for her excellent work in creating the manuscript database and distributing papers to referees, and Brenda Cash for assisting with the correspondence with the authors. The hectic week in San Diego runs smoothly due in part to the excellent local arrangements and conference support staff under the able direction of Phyllis Greene, Conference Manager. PROCEEDINGS EDITORS HERMANN A. JEHN ALLAN MATTHEWS GARY E. McGUIRE IVAN PETROV October 1995

Transcript of Editorial

Page 1: Editorial

ELSEVIER Surface and Coatings Technology 76-77 (1995) v

Preface

SURIACE&GIJIlIIIIiB

_NOIIOY

The 22nd International Conference on Metallurgical Coatings and Thin Films, sponsored by the Vacuum Metallurgyand Thin Films Divisions of the American Vacuum Society, was held in San Diego, California, April 24-28, 1995.The program has continued to represent the combined interest of the divisions in eight symposia and one topicalconference with more than 500 invited, contributed and poster papers. The program included special highlights suchas the plenary session, an evening forum, several workshops and short courses.

The proceedings contain 245 papers that were peer reviewed and accepted on the basis of technical merit andtimeliness of submission. As has been the practice since 1987, the proceedings are being published in special issues ofeither Surface and Coatings Technology or Thin Solid Films. The papers from Symposia A (Coatings for Use at HighTemperature), B (Hard Coatings and Vapor Deposition Technology), E (Tribological Coatings/Surface Modifications)(except E4), G (Applications, Manufacturing and Equipment), and the topical conference on Advances in CoatingLight-weight Alloys and Materials, will be published in Surface and Coatings Technology; while papers from SymposiaC (Optical Thin Films), D (Diamond and Related Materials), F (Advances in Coating and Thin Film Characterization),H (Advanced Materials in Microelectronics), and the session on Mechanical Processes on the Atomic Scale (E4) fromSymposium E (Tribological Coatings/Surface Modifications) will be published in Thin Solid Films.

The organization of the conference and assembly of a Proceedings of this size and magnitude obviously require theeffort of a number of people. The Executive and Program Committees for ICMCTF95 are recognized in the followingpages and their efforts are gratefully acknowledged. In addition the generous support of the firms exhibiting at theconference, also listed, is acknowledged.

Specifically related to the Proceedings, the Editors would like to thank all those individuals who served as refereesfor the manuscripts, the Symposium Chairs for identifying qualified reviewers, Mary Gray for her excellent work increating the manuscript database and distributing papers to referees, and Brenda Cash for assisting with thecorrespondence with the authors.

The hectic week in San Diego runs smoothly due in part to the excellent local arrangements and conference supportstaff under the able direction of Phyllis Greene, Conference Manager.

PROCEEDINGS EDITORSHERMANN A. JEHNALLAN MATTHEWS

GARY E. McGUIREIVAN PETROV

October 1995