Chalcogenide semiconductor research and applications ... CSRA - Jaramillo... · Chalcogenide...
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Chalcogenide semiconductor research and applications
Tutorial 2: Thin film characterization
Rafael JaramilloMassachusetts Institute of Technology
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Section 1: Measuring composition
• Optoelectronic properties are determined by intrinsic and extrinsic defects at ppm (10-6) levels, and below
• Typical analysis techniques for thin films have precision of ~0.5%, and accuracy of ~10% (and much worse for oxides)
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Semiconductor composition analysis
What do we do?
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Considering the options
Electron-in, X-ray out
• Energy-dispersive spectroscopy (EDS) • Typically available in
electron microscopes• Resolution & accuracy <5%
• Wavelength-dispersive spectroscopy (WDS)• Require specialized electron
microprobe systems• Resolution & accuracy <1%
X-ray in, X-ray out
• X-ray fluorescence spectroscopy (XRF) • Relatively low-cost, accessible• Resolution & accuracy <5%
(better with standards)
X-ray in, electron out
• X-ray photoelectron spectroscopy (XPS)• Resolution & accuracy <5%• Highly surface-sensitive
Electron-in, electron-out
• Auger nanoprobe• Resolution & accuracy <5%• Excellent spatial resolution
Ion-in, ion-out
• Rutheford backscattering (RBS)• Resolution & accuracy <5%• Uniquely sensitive to oxygen
• Secondary ion mass spectroscopy (SIMS)• Resolution & accuracy <ppm• Highly technical
Always consider probe & escape depths!
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Section 2: Measuring optical properties
• Measure transmission (T) and reflection (R) of a planar material stack
• Quantitative goals:– Optical absorption coefficient (a)
– Band gap (Eg)
• Unknowns abound– Reflection & transmission
coefficients at each interface
– Indices of refraction
– Thicknesses
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Spectrophotometry 101
Amplitude coefficients for film-on-substrate
r01
t01 r12
t12
t10
r20
t20
t21
r10
• Simplification 1: Normal incidence– Polarization doesn’t matter
• Simplification 2: Substrate is non-existent– T10 = 1-R10
• Simplification 3: Film is fairly opaque– All light absorbed by 2nd pass
through the film
– e-ad << 1, a >> 1/d
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Simplifications and assumptions
R01
T01 R10 = R01
T10
d
𝛼 = −1
𝑑ln
𝑇
1 − 𝑅 2
• Simplification 4: Effective mass model, parabolic band edges, allowed vertical transitions
– Tauc equation (n = 1 for direct band gap)
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Simplifications and assumptions
me
mh
directindirect
allowed vertical transition
𝛼 =𝐴 ℎ𝜈 − 𝐸𝑔
𝑛2
ℎ𝜈
• Evaluate assumptions to determine valid regime for Taucanalysis
• Simplification 3– a >> 1/d
– Typical film thickness = 1 mm a >> 104 cm-1
• Simplification 4– Effective mass model
– Eg < hn < Eg + 200 meV(approximate)
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Implications of the simplifications
Absorption coefficients for select solar cell absorbers
• Need to discard a(hn) data before Tauc analysis– Discard data at the low end that doesn’t satisfy a >> 1/d
– Discard data at the high end that doesn’t satisfy effective mass approximation
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Implications of the simplifications
Absorption coefficient measured on ZnO:Al film
Tauc plot using reliable data
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Section 3: Measuring electrical transport
properties
• Drude model relates conductivity (s) to free carrier concentration (n) and drift mobility (m)– Mobility is determined by generation and dissipation of momentum– Carrier mass (m) determines velocity for given impulse – Momentum relaxation time (t) characterizes randomization of carrier motion following given
impulse
• Low-field current-voltage measurements – with ohmic contacts and well-defined geometry – determine s
• Hall magnetotransport measurements used to disentangle n and m– Hall mobility ≠ drift mobility, but we will ignore this
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Electrical transport 101
𝐽 = 𝜎𝐸
𝜎 = 𝑞𝑛𝜇
𝜇 = Τ𝑞𝜏 𝑚
Drude model Typical Hall bar measurement geometry
• Hall voltage (VH) depends simply on carrier concentration (n) for single conduction band
• Realistic samples have lead placement error (e) that mixes Hall voltage (VH) and longitudinal voltage (VL)
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Details of Hall measurements
current lines
normal to current
current leads
voltage leads
lead placement error (e)
𝑉𝐻 =𝐼𝑥𝐵𝑧𝑛𝑡𝑞
longitudinal current
perpendicular field
x
y
z
thickness
𝑉𝐿 = 𝐼𝑥1
𝜎
𝜀
𝑤𝑡= 𝐼𝑥
1
𝑞𝑛𝜇
𝜀
𝑤𝑡
sample width
• Signal (VH) tends to vary slowly in time as magnetic field is swept
• Background (VL) can vary slowly in time due to temperature drift, variable illumination, etc.
• Slowly varying signal and background
– Need large signal/background (VH/VL)
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Practical complications
𝑉𝐻𝑉𝐿
=
𝐼𝑥𝐵𝑧𝑛𝑡𝑞
𝐼𝑥1𝑞𝑛𝜇
𝜀𝑤𝑡
=𝐵𝑧𝜇
Τ𝜀 𝑤
width (w)
lead placement error (e)
Signal/background:
Geometric factor x = e/w
• Lead placement error limits sensitivity of Hall measurements for low-mobility samples
• Typical van der Pauwsample, x ~ 0.1– Challenging to
measure m < 10 cm2V-
1s-1
• Lithographically-defined Hall bar, x < 0.01– Possible to measure
m < 1 cm2V-1s-1
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Practical limits of Hall measurements for low-mobility samples
• High-conductivity samples encounter limitations due to small Hall voltage
• Depends on mobility and sample geometry
• Measuring small voltages (<1 mV) possible with lock-in measurements
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Practical limits of Hall measurements for high-conductivity samples
𝑉𝐻 =𝐼𝑥𝐵𝑧𝑛𝑡𝑞
= 𝑉𝑥𝐵𝑧𝜇𝑤𝑙
sample aspect ratio
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Section 4: Measuring minority carrier properties
• Doped semiconductors have majority and minority carrier types
• Most electronic transport measurements are insensitive to minority carriers
• Minority carrier processes are critically important for a range of semiconductor technologies– Transistors
– Photodetectors
– Lighting
– Solar cells
– Photochemistry
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Importance of minority carrier processes
• Superposition principle
Illumination current
+ Diode forward current
= Total current
• Good solar cell has
– Large illumination current
– Large diode turn-on voltage, good rectification
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Minority carrier transport in solar cells
J (mA/cm2)
Volts
good
bad
J (mA/cm2)
Volts
light
dark
Jill
turn on
Solar cells in a nutshell
• Electron-hole pairs are generated (G) as the light is absorbed
• Each electron-hole pair has a probability P of being collected
• P is controlled by the diffusion length Ldiff
• Ldiff is controlled by lifetime t
Illumination current
x (mm)
G (cm-2 s-1)
x (mm)
P
Absorber (p-type)
Buffer (n-type)
dxGPJ ill
h+
e-
tDLdiff beware!
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• Diode equation
• Saturation current density J0
– Electron-hole recombination via:
– Light emission (a light emitting diode)
– Band-to-band tunneling
– Auger recombination
– Defect-assisted recombination (bulk)
– Defect-assisted recombination (interface)
– J0 = J0,1 + J0,2 + …
Turn on voltage and VOC
10
kTqV
dark eJJ
superposition
1ln
0J
J
q
kTV ill
OC
Effect of recombination currents on VOC
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Turn on voltage and VOC
eh
defectpn
npR
tt
t ~ 10-12 - 10-3 cm3 s-1
pnpnnpCRAuger
C ~ 10-30 cm6 s-1
BpnRradiative
B ~ 10-14 - 10-10 cm3 s-1
nSJ surface
S ~ 1 - 107 cm s-1
• Diode equation
• Saturation current density J0
– Electron-hole recombination via:
– Light emission (a light emitting diode)
– Band-to-band tunneling
– Auger recombination
– Defect-assisted recombination (bulk)
– Defect-assisted recombination (interface)
– J0 = J0,1 + J0,2 + …
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Lifetime matters … a lot
Jaramillo et al., JAP 119, 035101 (2016)
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Lifetime matters … a lot
YES
NOl
Jaramillo et al., JAP 119, 035101 (2016)
• Transient
– Photoluminescence
– Photoconductivity
• Steady state (or quasi steady state)
– Photoluminescence
– Photoconductivity
How to measure lifetime
Generate minority carriers (typically using light)
Measure material response, back out recombination rates through modeling
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Challenges for metrology on thin films
Want to measure Useful to have
• Bulk lifetime (t)• Surface
recombination velocity (S)
• Optical absorptivity (a), reflectivity (R)
• Equilibrium carrier concentration (p)
• Samples of varying thickness
• Near-total surface passivation
• Minority carrier diffusivity
wafers
thin films
• Instantaneous optical attenuation (Beer-Lambert) leads to exponential excess carrier profile in a uniform material layer
• Excess carriers move through drift & diffusion until reaching symmetrical, half-sine wave profile– Diffusion time tdiff = d2/D
D = diffusion constantd = thickness
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Transient minority carrier generationEvolution of excess carrier concentration through Si wafer following instantaneous illumination at t = 0
Luke and Cheng, JAP 61, 2282 (1987)
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Does excess carrier profile matter?
Case II: Diffusion time >> recombination time
• Excess carriers don’t reach symmetrical profile before recombining
• Carrier profile needs to be explicitly modeled to determine recombination rates
Case I: Diffusion time << recombination time
• Excess carriers reach symmetrical profile
• At long times, free carriers decay with effective lifetime teff
• teff is a function of both bulk and surface recombination
• Extract single exponential decay rate teff
-1 from long-time tail of experimental signal
• Measure samples with varying d and/or S to determine t by regression
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Solving for recombination rates in Case I
TRPL measurement of minority carrier recombination in CZTS thin film
1
𝜏𝑒𝑓𝑓≈1
𝜏+
𝑑2
𝜋2𝐷+
𝑑
2𝑆
Barkhouse et al., Prog. Phot. Res. Appl. 20, 6 (2012)
Solving for recombination rates in Case II• Fit data to drift-diffusion model of excess carrier transport
Jaramillo et al., JAP 119, 035101 (2016)
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• Diffusivity (D) and surface-recombination velocity (S) are strongly correlated
– S = rate at which minority carriers are consumed at the surface
– D = rate at which minority carriers are transported to the interface
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The problem with unknown diffusivity D
Diffusion limited
Surface-recombination limited
10-4
10-2
100
102
104
0.8
1
1.2
1.4
1.6
1.8
2
2.2SRH recombination vs injection
n/p0
t/t 0
• Injection-dependence of bulk recombination
• Injection-dependence of surface recombination
• Ambipolar diffusivity and Dember effects
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Other complications (not discussed here)
eh
defectpn
npR
tt
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Recombination rates & materials processing
Bulk and surface minority carrier recombination in SnS thin films
Jaramillo et al., JAP 119, 035101 (2016)
• Measuring composition is not easy, and may not be possible
• Straightforward optical property measurements need to be interpreted carefully
• Low-mobility semiconductors pose challenges for typical Hall measurements
• Minority carriers recombine by different processes; “lifetime” measurements are ambiguous and should consider the application and focus on the relevant mechanisms
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Concluding remarks: Thin film characterization