AZ® 1500 Photoresistmicrofab.ku.edu/sites/microfab.ku.edu/files/docs... · 2 AZ, the AZ logo,...
Transcript of AZ® 1500 Photoresistmicrofab.ku.edu/sites/microfab.ku.edu/files/docs... · 2 AZ, the AZ logo,...
![Page 1: AZ® 1500 Photoresistmicrofab.ku.edu/sites/microfab.ku.edu/files/docs... · 2 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil,](https://reader034.fdocuments.net/reader034/viewer/2022052612/5f1047267e708231d4485148/html5/thumbnails/1.jpg)
1 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500 Photoresist
![Page 2: AZ® 1500 Photoresistmicrofab.ku.edu/sites/microfab.ku.edu/files/docs... · 2 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil,](https://reader034.fdocuments.net/reader034/viewer/2022052612/5f1047267e708231d4485148/html5/thumbnails/2.jpg)
2 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500 Photoresist
AZ® 1500 series positive photoresists are well established g-line and broad-band resists. Wide exposure latitude and good resolution and depth of focus improve yield and throughput. Various viscosity grades are available for a multitude of applications and dyed versions are engineered to control reflective notching. Resists of AZ’s 1500 series can be developed in a variety of metal ion free developers (with and without surfactants) using a spray/puddle process.
For high throughput batch processing in a tank, inorganic developers are an excellent alternative.
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3 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500 Photoresist Products
AZ® 1500 PhotoresistAZ® 1505 AZ® 1512AZ® 1518AZ® 1529
AZ® 1500-SFD PhotoresistAZ® 1512-SFDAZ® 1518-SFD
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4 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500 Photoresist g-line Resolution at Specific Film Thickness
0.5 0.6 0.7 0.8 0.9 1.0 ~ 1.5 ~ 2Resolution (µm)
Film
Thi
ckne
ss (µ
m)
7
6
5
4
3
2
1
AZ® 1529
AZ® 1518/ 1518-SFD
AZ® 1512
AZ® 1505
AZ® 1512-SFD
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5 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
Great for pad layer applicationsCan be coated from 2.5 to 5µmIdeal for plating processes
AZ® 1529
Good process latitude in g-line, and broad bandExcellent for wet etch processesThicker film for increased etch resistance
AZ® 1518
Good process latitude in g-line, and broad bandExcellent for wet etch processes
AZ® 1512
Lift off process for patterning MR stripeAZ® 1505
AZ® 1500 Photoresist
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6 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
Dyed versionHigher film thickness, can be coated from 1.5 – 3µmSuppresses swing and reflective notching effects on substrates with high or varying reflectivity, e.g. metals and contacts
AZ® 1518-SFD
Dyed versionSuppresses swing and reflective notching effects on substrates with high or varying reflectivity, e.g. metals and contacts
AZ® 1512-SFD
AZ® 1500-SFD Photoresist
![Page 7: AZ® 1500 Photoresistmicrofab.ku.edu/sites/microfab.ku.edu/files/docs... · 2 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil,](https://reader034.fdocuments.net/reader034/viewer/2022052612/5f1047267e708231d4485148/html5/thumbnails/7.jpg)
7 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500 ResistRecommended Process Conditions
Soft Bake: 90-100°C for 30-60sec (hotplate)
Exposure: g-line or broadbandPost Exposure bake: optional
Developer: AZ® 300MIF DeveloperAZ® 917 MIF DeveloperAZ® 1:1 Developer
Develop Cycle: 30-50sec spray@ 100-200rpm or60-120sec immersion @
23±1°C
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8 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
Spin Speed Curve for AZ® 1500 Resist Products
0
2
4
6
8
10
12
0 1000 2000 3000 4000 5000Spin Speed, rpm
Film
Thi
ckne
ss, µ
m
AZ® 1505AZ® 1512AZ® 1518AZ® 1529
6” silicon wafersStatic dispenseSB: 100°C/60sec
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9 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
Summaryg-Line Performance
339mJ/cm²339mJ/cm²319mJ/cm²Dose to Print (DTP)
12%12%20%Exposure Latitude
2.4µm1.8µm1.8µmDepth of Focus
1µm Trench0.9µm L/S1µm L/SParameter
0.8µm0.9µmResolution
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10 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500 Photoresist Optical Parameters
◊ Refractive Index
Bleached 365nm 405nm 435nmn 1.6994 1.6714 1.6571k 0.0058 0.0010 0.0003
Unbleachedn 1.7123 1.6906 1.6948k 0.0358 0.0336 0.0227
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11 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500 Photoresist Optical Parameters
◊ Dill Parametersi-line: g-line:
A = 1.0133 (µm-1) A= NAB = 0.2177 (µm-1) B= NAC = 0.0239 (cm2/mJ) C= NA
◊ Cauchy CoefficientsA B C
Bleached 1.5966 0.003758 2.45E-03Unbleached 1.5996 0.013498 1.90E-04
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12 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500-SFD Photoresist Optical Parameters
◊ Refractive Index
Bleached 365nm 405nm 435nmn 1.6947 1.6665 1.6503k 0.0058 0.0021 0.0047
Unbleachedn 1.7057 1.6822 1.6846k 0.0337 0.0327 0.0257
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13 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500-SFD Photoresist Optical Parameters
◊ Dill Parametersi-line: g-line:
A = 0.9765 (µm-1) A= 0.48 (µm-1)B = 0.2037 (µm-1) B= 0.265 (µm-1)C = 0.0254 (cm2/mJ) C= 0.0223 (cm2/mJ)
◊ Cauchy CoefficientsA B C
Bleached 1.5933 0.007923 1.39E-03Unbleached 1.6028 0.002763 5.21E-03
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14 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1500-SFD Photoresist Optical Parameters - Absorptivity
0.0000
0.0050
0.0100
0.0150
0.0200
0.0250
0.0300
0.0350
0.0400
0.0450
0.0500
300 350 400 450 500 550 600 650
wave length, nm
abs
345 nm
408 nm428 nm
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15 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp
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AZ Electronic Materials
AZ® 1512 PhotoresistResolution for Dense Lines, FT = 1.21 µm
Focus –0.4µmSB: 95°/ 50sec; PEB 105°C/50 secGCA 0.42NA g-line stepper, 70 mJ/cm²AZ® 327 MIF developer, 40 sec spray/puddle @ 21°C
1.2µm 1.1µm
1.0µm
0.9µm0.8µm
1.5µm
0.75µm
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16 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1512 PhotoresistDOF for 1.3 µm Dense Lines, FT = 1.21 µm
SB: 95°/ 50sec; PEB 105°C/50 secGCA 0.42NA g-line stepper, 70 mJ/cm²AZ® 327 MIF developer, 40 sec spray/puddle @ 21°C
1.2µm 0.0µm
-0.4µm
-1.2µm-1.6µm
1.6µm
-2.0µm
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17 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistExposure Latitude for Dense Lines, FT = 2.22 µm
SB: 100°/ 60sec; PEB 110°C/60 secGCA 0.42NA g-line stepperAZ® 425 MIF developer
259mJ/cm² 274mJ/cm²
289mJ/cm²
304mJ/cm²319mJ/cm²
245mJ/cm²
334mJ/cm²
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18 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistLinearity/Resolution - Dense Lines, FT = 2.32µm
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepper, 319 mJ/cm²PEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer./ Single puddle for 60 sec @ 21.0°C
1.20 µm 1.10 µm 1.00 µm
0.90 µm
0.85 µm0.75 µm 0.80 µm
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19 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistExposure Latitude – 1.0 µm Dense Lines, FT = 2.32µm
260 mJ/cm² 270 mJ/cm² 280 mJ/cm²
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepperPEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer./ Single puddle for 60 sec @ 21.0°C
319 mJ/cm² 310 mJ/cm² 300 mJ/cm²
290 mJ/cm²
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20 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistExposure Latitude - 0.9 µm Dense Lines, FT = 2.32µm
280 mJ/cm²
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepperPEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
339 mJ/cm² 329 mJ/cm² 319 mJ/cm²
310 mJ/cm²
300 mJ/cm²290 mJ/cm²
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21 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD Photoresist DOF for 1.0 µm Dense Lines, FT = 2.32µm
1.20 µm 0.90 µm 0.60 µm
0.30 µm
0.00 µm-0.30 µm-0.60 µm
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepper, 319 mJ/cm²PEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
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22 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD Photoresist DOF for 0.9 µm Dense Lines, FT = 2.32µm
1.20 µm 0.90 µm 0.60 µm
0.30 µm
0.00 µm-0.30 µm-0.60 µm
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepper, 339 mJ/cm²PEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
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23 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistExp.Latitude – 1.0 µm Trench – Pitch 1:2, FT = 2.32µm
240 mJ/cm² 250 mJ/cm² 260 mJ/cm² 270 mJ/cm² 280 mJ/cm²
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepperPEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
339 mJ/cm² 329 mJ/cm² 319 mJ/cm² 310 mJ/cm² 300 mJ/cm²
290 mJ/cm²
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24 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistDOF for 1.0 µm Trench – Pitch 1:2, FT = 2.32µm
1.20 µm 0.90 µm 0.60 µm 0.30 µm
0.00 µm
-0.30 µm-0.60 µm-1.50 µm -1.20 µm -0.90 µmSB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepper, 339 mJ/cm²PEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
1.50 µm
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25 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistLinearity - 1.0 µm Trench – Pitch 1:2, FT = 2.32µm
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepper, 339 mJ/cm²PEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
1.50 µm 1.35 µm 1.20 µm 1.10 µm 1.00 µm
0.90 µm
0.85 µm0.70 µm 0.75 µm 0.80 µm0.65 µm
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26 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1529 PhotoresistThermal Stability - Large Pads
Film Thickness: 3.5µm SB : 95°C for 25min convection ovenExposure : Ultratech 1500 stepperDevelop: AZ® Developer (diluted to 0.21N)Hardbake: 2min hot plate
105°C 110°C 115°C 120°C
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27 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD Photoresistg-line Performance
in AZ® 425 MIF and AZ® 917 MIFDeveloper
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28 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistExp. Latitude for 1.30 µm Dense Lines, FT = 1.825 µm
SB : 100°C for 60sec contactExposure : GCA 0.42 NA g-line stepperPEB : 110°C for 60sec contactDevelop: AZ® 917 MIFDeveloper/ Single puddle for 60 sec @ 21°C
155 mJ/cm² 170 mJ/cm² 185 mJ/cm²
200mJ/cm²
215 mJ/cm²245mJ/cm² 230mJ/cm²
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29 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistLinearity - Dense Lines, FT = 2.32 µm
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepper, 339 mJ/cm²PEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
1.50 µm 1.35 µm 1.20 µm
1.10 µm
1.00 µm0.90 µm0.85 µm
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30 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD PhotoresistExposure Latitude for 1.0 µm Dense Lines, FT = 2.32 µm
270 mJ/cm² 280 mJ/cm²
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepperPEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
329 mJ/cm² 319 mJ/cm² 310 mJ/cm²
300 mJ/cm²
290 mJ/cm²
![Page 31: AZ® 1500 Photoresistmicrofab.ku.edu/sites/microfab.ku.edu/files/docs... · 2 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil,](https://reader034.fdocuments.net/reader034/viewer/2022052612/5f1047267e708231d4485148/html5/thumbnails/31.jpg)
31 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
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AZ Electronic Materials
AZ® 1518-SFD Photoresist DOF for 1.0 µm Dense Lines, FT = 2.32 µm
1.20 µm 0.90 µm 0.60 µm
0.30 µm
0.00 µm-0.30 µm-0.60 µm
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepper, 319 mJ/cm²PEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
![Page 32: AZ® 1500 Photoresistmicrofab.ku.edu/sites/microfab.ku.edu/files/docs... · 2 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil,](https://reader034.fdocuments.net/reader034/viewer/2022052612/5f1047267e708231d4485148/html5/thumbnails/32.jpg)
32 AZ, the AZ logo, BARLi, Aquatar, nLOF, and Kwik Strip are registered trademarks and MiR, HiR, HERB, Spinfil, Signiflow, SWG, DX, and AX are trademarks of AZ Electronic Materials USA Corp.
?
.. . .
AZ Electronic Materials
AZ® 1518-SFD PhotoresistLinearity for Dense Lines, FT = 2.32 µm
SB : 95°C for 60sec contactExposure : GCA 0.42 NA g-line stepper, 319 mJ/cm²PEB : 115°C for 60sec contactDevelop: AZ® 917 MIF Developer/ Single puddle for 60 sec @ 21.0°C
1.50 µm 1.35 µm 1.20 µm
1.10 µm
1.00 µm0.90 µm0.85 µm