AMOAMO GmbH

Otto-Blumenthal-Straße 25 ■ D-52074 Aachen ■ Germany

Phone +49 241 88 67-125 ■ Fax +49 241 88 67-571

services@amo.de ■ www.amo.de

■ Nanoimprint technology

■ Electron beam lithography■ i-line optical lithography

■ Pattern transfer and thin film deposition

■ NanoCMOS & Nanophotonic process libraries

Being a Nanotechnology lab we offer you our research competencies and prototyping services in the field of micro- and nanotechnology for applications in microelectronics, photonics and biotechnology. AMO is equipped with a high quality R&D infrastructure meeting cross-industry specifications by means of:

AMO provides you with:

■ a lexible and powerful infrastructure for Micro- and Nanostructuring■ a technology platform in the area of Nanophotonics and NanoCMOS■ services from prototyping development to small scale production■ as well as the development of individual solutions

Please contact us for further information. ■ Contact: Dipl.-Ing. Herbert Kleinjans ■ services@amo.de

>>> Core Competencies

■ Nanoimprint

■ Nanophotonics

■ NanoBio

■ NanoElectronics

■ Micro- and Nano

>>> Our Strengths

■ individual service■ from ultra-high accuracy

■ to volume production■ flexible

■ short turnaround

■ IP protection

>>> Get Access

Prototyping and Development ServicesFact SheetTechnology

AMO GmbH

Otto-Blumenthal-Straße 25 ■ D-52074 Aachen ■ Germany

Phone +49 241 88 67-125 ■ Fax +49 241 88 67-571

services@amo.de ■ www.amo.de

AMO

Foundry Service, Production Service

Description:

AMO runs a class 10 to class 1000 cleanroom with a total area of 400 m²: Nanolab AMICA. Here, high end fabrication equipment for semiconductor technology is operated in a highly lexible way to enable high quality nanofabrication, quick process changes and unconventional solutions.

Fact SheetEquipment

Lithography■ Raith EBPG 5200 e-beam system:

20/50/100 kV , sub 10 nm resolution, from samples of 10x10mm up to 8“ substrates

■ Canon FPA 3000 i5r i-line Stepper with 0,5 µm resolution■ EVG 420: 6” semi-automatic Maskaligner■ EVG 150: 4”- 8” automatic resist coater and developer■ Süss MA8 Gen3 SCIL: 2“-8“ UV-Nanoimprint Lithography■ EVG 770: 4“ - 8“ UV-Nanoimprint Step&Repeat Lithography■ EVG 620 Soft UV Nanoimprint prototype:

4”- 6” lexible template size, sub 50 nm resolution ■ 2 experimental Interference Lithogarphy systems:

180 nm - 2.5 µm pitch, up to 8” substrates

Wet Processing■ ARIAS Wet benches:

single wafer and batch cleaning and resist processes

■ SCFluids Super Critical Dryer: CO

2, semi-automatic, up to 6” substrates

Furnaces

■ Four 6” - 8“ Centrotherm Furnaces: Oxidation, POCl

3-Diffusion and Annealing

■ Jipelec JetFirst: 6” Rapid Thermal Annealing system

CVD (Chemical Vapour Deposition)

■ Centrotherm 6” LPCVD furnaces: Polysilicon, Silicon Nitride and LTO (low temp. SiO

2)

Sputtering /Evaporators

■ Von Ardenne CS730 Cluster system: 6” DC and RF sput-tering. Materials: W, Ni, Ti, TiN, Al, AlSi, AlCr, SiO

2, Ta

2O

5,

Al2O

3, HfO

2 , etc.

■ Pfeiffer Vacuum Classic 580: 6” e-beam and resistive evaporator. Materials: Al, Cr, Si0

2,Ti, Ta

2O

5 , etc.

Atomic Layer Deposition■ 2 Oxford FlexAL Plasma assisted ALD

Materials: AlN, Al2O

3, TaN, TiN

Etchers

■ Oxford PlasmaLab 100: 3 automatic chamber systems, 6” - 8“ chlorine, luorine and bromine based chemistry

■ Tepla Semi 300: Microwave Plasma Etcher, batch and single wafer processes, 0

2 and CF

4 processes

Metrology

■ Zeiss Supra 60 VP, EDX

High resolution SEM with automated CD control module ■ Veeco (DI) Dimension 3100 SPM:

high resolution STM, AFM, MFM, up to 6” substrates ■ Veeco DekTak³ST surface proiler ■ Leica INM 100 and INM 300 optical microscopes

■ Philips PQ Ruby Ellipsometer

Electrical Testing

■ High end Parameter analyser for small signal DC nanoelec-

tronic device testing

Optical Testing

■ Silicon Photonics device testing @1300 nm @1550 nm, tunable laser, iber & butt coupled

■ Contact: Dipl.-Ing. Herbert Kleinjans ■ services@amo.de