ADS Advanced Design System

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ADS advance design system

Transcript of ADS Advanced Design System

  • 2012 EEsof

    2012/10/23

    Volume 1

  • Time Title Speaker Title Speaker Title Speaker

    0830-0900

    Juergen Hartung

    Agilent

    Move toTracks(10)

    Rick Poore Ming-Chih Lin

    Agilent Agilent

    Shuang Cai

    Agilent Aldec

    1130-1150

    Hsieh-Hung Hsieh Heidi Barnes

    PhD,TSMC Agilent

    1230-1330

    JS Wu Craig Wang Keven Chang

    WINSEMI Silicon Motion Agilent

    Jason Chen Eric Kuo Abby Shih

    Agilent Gemtek Agilent

    1440-1500

    Juergen Hartung Jack Hu Yoshiyuki Yanagimoto

    Agilent TomTom Agilent

    Nick Chin

    JETCONN

    Jason Chen Ming-Chih Lin

    Agilent Agilent

    1650-1700

    A8: Real World CMOS PADesign for MobileApplications withAdvanced SimulationTechnologies

    B8: SI, PI and EMI in HighSpeed Digital Design withADS

    Survey & Lucky Draw

    Break & Product Fair

    1500-1530

    A6: Complete mm-WaveFront-to-Back RFICDesign Flow

    B6: Using ADS Momentumto Differentiate SignalIntegrity Issue Happeningon Board Level or ChipLevel C6: GaN Doherty Amplifier

    Design Using X-Parameters

    1530-1600

    B7: Consideration of High-Speed Connector's SignalIntegrity with EMPro andADS

    1600-1650

    Lunch

    1330-1400 A4: WIN PDK in ADSEnvironment IntroductionB4: The Signal Integrityand Power IntegrityAnalysis by ADS

    C4: System-Level Design& Verification for FlexibleOFDM with SystemVue

    Break & Product Fair

    1150-1230

    A3: ComprehensiveMilimeter Wave Solutionsfor TSMCs 60GHz CMOSReference Design Kit

    B3: The Agilent EEsofIntegrated EDA DesignFlow for High SpeedDigital Designers: Pre-Layout, Post-Layout,Measurement

    1400-1440A5: Addressing the RFNeeds in Nano-ScaleWireless Platforms

    B5: Power IntegrityAnalysis for High SpeedPCB Design Using ADS

    C5: Automating On-WaferMeasurements with theNew Agilent IC-CAPWaferPro

    0950-1040

    A1: Integrated Electro-Thermal Solution DeliversThermally Aware CircuitSimulation

    B1: Validating ofCommunication SystemDesign in C, Matlab, HDLCodes with SystemVue

    1040-1130

    A2: A complete Designer-Oriented Device ModelVerification Solution forAdvanced Technology

    B2: FPGA Simulator Workwith SystemVue

    Registration and Welcome

    0900-0940 Comprehensive RF Microwave Solutions for Wireless Applications

    Track A(RF and Mixed Signal IC Design) Track B(Wireless and Digital system design) Track C(Test measurement implementation withSimulation technology)

  • Comprehensive RF Microwave Solutions for

    Wireless Applications

    Dr. Juergen HartungRFIC Product Marketing & Foundry Program ManagerAgilent EEsof

    October 2012

    1

    Agenda

    Introduction RF/MW Design Challenges Agilent EEsof RF/MW Solution

    Device Modeling MMIC Silicon RFIC 3D RF Components RF Modules

    Whats New in ADS 2012 Summary & Outlook

    2

    1-1

  • RF/MW Design Challenges The Tablet Example

    DataWi-Fi 802.11a/b/g/npossible: 802.11ac

    Personal ConnectivityBluetooth v4.0possible: 802.11ad/WiGIG

    LocationA-GPSpossible: Galileo, Beidou, GLONASS

    Communications4G LTEAlso: LTE-Advanced, MIMO

    HSPA, HSPA+DC-HSDPAAlso: GSM/EDGE, WCDMA, Multi-Standard Radio (MSR)

    o Increasing Integration Multiple different complex systems placed in close proximityo Increasing design complexity and compactiono Concurrent design teams across companieso Verification across design domains (IC/package/board)

    3

    Increasing RF content in a Tablet

    Tablet includes 7 PA modules:

    TriQuint Quad-Band GSMAvago Band 4 LTE

    Avago Band 17 LTE

    Skyworks Band 5 UMTS/HSPA

    Skyworks Band 8 UMTS/HSPA

    Avago Band 2 UMTS/HSPA

    Murata/Panasonic Dual-Band

    Skyworks 77468-16W-CDMA/HSDPA/HSPA+PA and duplexer module

    Murata/Peregrine SP6T Rx diversity switch module

    TriquintGSM PA module

    AvagoBand 4 PA module

    RF Modules require further integration!

    Pictures are courtesy of chipworks

    4

    1-2

  • Integration-dependent design challenges

    5

    Smaller, cheaper, more integration, lower power consumption

    More functionality on chip

    Additional chips III-V technologies

    or Silicon RFIC

    SMT components or integrated on IPD chip

    Embedded passives

    New packaging techniques explored (TSV, 3DIC, PoP, etc.)

    Small-Scale Chips + Module Single Large-Scale Silicon Chip (SoC)

    if it can be done in silicon, it WILL be done in silicon

    Higher levels of integration, lower cost Low breakdown voltage, Low device

    gain, High loss on-chip inductors, linearity issues, poor RF models

    Picture is courtesy of chipworks

    RF/MW Design Segments Application perspective

    RF/MMICDesigner PA, LNA

    RF SiP / ModuleDesigner PAM, TxRx

    PackageDesigner QFN, BGA

    RF Board Designer * Radio module

    Antenna Designer SMD Ant, A/D Ant

    SMD Component Designer L, C, Filter, Active Devices

    System Integrator Tablet, Handset, Radar, Base station,

    RF SoC Designer * Transceiver IC

    Modeling Engineer GaAs, Si, SiGe,GaN, LDMOS

    Connector Designer SMA, USB, HDMI

    Silic

    on

    GaA

    s

    *) Pictures are courtesy of chipworks

    6

    1-3

  • RF/MW Design Segments Flow perspective

    7

    RFIC

    MMIC

    RF ModuleRF SiP

    RF Board

    Design/Implementation Challenges per Segment

    Accurate device models for emerging technologies

    1

    IC design enablement beyondbroad and qualified PDK support

    2

    Integration challenges with multi-technology designs4

    Complete characterization ofcomponent level designs 3

    8

    1-4

  • 1 Accurate Device Models for Emerging Technologies

    9

    NeuroFET Model(Extract in IC-CAP, Simulate in ADS)

    Artificial Neural Network Measurement-based FET Model Complete Solution: data acquisition, extraction and simulation in ADS)

    Equations and derivatives are infinitely continuous Accurate 2nd, 3rd, Nth order effects Robust RF & DC convergence Symmetric: switch, mixer & amplifier applications (Vds

  • Design/Implementation Challenges per Segment

    Accurate device models for emerging technologies

    1

    IC design enablement beyondbroad and qualified PDK support

    2

    Integration challenges with multi-technology designs4

    Complete characterization ofcomponent level designs 3

    11

    MMIC/RFIC Design Enablement

    12

    2

    1-6

  • Complete ADS Desktop Design FlowAgilent EEsof Chip/Module/Board Design

    13

    Most widely used MMIC Design Platform!

    MMIC

    ADS 2011 PDK Support GaAs / GaN

    H01U-xx H02U-xx MP15-01 PL15-xx PP10-xx PP15-xx PP25-xx PP50-xx PS50-xx PH50-xx PD50-xx >40

    TQTRx TQHiP TQHBT3 TQPED TQP13 TQP15 TQP25 TQRLC TQBihemt

    G28V3 G28V4 G40V4 G50V3

    InGaP HBT - P2 InGaP HBT D1 InP SHBT1 InP DHBT2 GaN HEMT0.25umGaN HEMT

    0.50um

    under dev.

    THz SchottkyDiode

    ED02AH D01PH D01MH D007IH DH15IB

    FD30 FD25

    HP07 PH25 PPH25X HB20M HB20P BES100

    Paper: WIN PDK for ADS, by JS Wu (WINSEMI)

    1-7

  • Getting started with MMIC DesignMMIC Design Seminar Material

    Seminar Videos Presentations & Demos ADS projects Hands-on Workshops X-Parameters

    http://www.agilent.com/find/eesof-mmic-seminar

    Page 15

    ADS2011 Complete MMIC-Module-MultiTechDesign - JS

    ADS 2012 Electro-Thermal Simulator

    Applications: high power RFIC / MMIC design

    Deliver thermally aware circuit simulation results by including effects of on-chip temperature rise

    Include effects of package and PCB Easy to set up and use from within the

    ADS environment Works with all simulation types:

    DC, AC, SP, HB, Transient, Envelope

    16

    Integrated Thermal Solver

    ADS LayoutADS Schematic

    Paper: Integrated Electro-Thermal Solution Delivers Thermally Aware Circuit Simulation, by Rick Poore

    1-8

  • MMIC/RFIC Design Enablement

    17

    2

    ADS for Silicon RFIC Applications

    Si RF Components Front-end modules (PA, Mixer, LNA-Mixer) or Antenna switches in

    CMOS-SOI starting to displace discrete GaAs power components

    Si-MMICs Silicon components and transceivers for millimeter wave products,

    like Optical Networks ( 10 to 40Gb/s), Automotive Collision Avoidance, 60GHz WLAN

    IPD Integrated Passive Device (IPD) silicon process technology for

    the production of passive devices such as baluns, filters, couplers, and diplexers that are used in portable, wireless and RF applications

    LDMOS RF power transistors used for basestation, broadcast /

    ISM and aerospace & defense applications

    18

    Small-scale RFIC

    1-9

  • ADS 2011 Extending towards Silicon RFIC Design

    Schematic Entry

    Simulators System Circuit EM

    Data Display

    Layout

    DRC/LVS

    DFM support

    19

    Major (& continued) improvements with ADS 2011

    Agilent Technologies Advanced Design System Selected by Sivers IMA for Front-to-Back Silicon RFIC Implementation

    20

    We are expanding our peak-performance millimeter wave product portfolio toward silicon-based, proprietary MMIC designs to leverage the

    advantages of higher integration and reduced cost,said Christer Stoij, chief technology officer at Sivers IMA.

    We selected ADS for the complete front-to-back implementation of corresponding devices because it delivers proven RF circuit

    simulation, integrated EM solvers and RF-relevant backend support. ADS is designed for our type of application, allowing us to introduce new unique products for E-band and V-band radio links, with full control of the

    millimeter wave architecture.

    1-10

  • ADS 2011 RFIC Design Flow Status

    Inputs from System-level

    Schematic Entry

    Circuit Design & Simulation

    Layout

    DRC/LVS

    GDSII or SOC integration

    EM Extraction

    21

    Proven ADS front-end solution for RFIC Major advantages through integrated EM ADS layout provides all relevant capabilities

    Automatic Metal Fill to be added Assura & Calibre DRC support for sign-off

    ADS DRC covers most recurring checks ADS LVS natively supported without need for dedicated rule files

    Calibre LVS supports complements offering EM-based extraction through Momentum

    Parasitic Extraction support to be added

    Paper: Complete mm-Wave front-to-back RFIC Flow, by Juergen Hartung

    ADS 2011 PDK Support SiGe / BiCMOS / IPD

    Full Front-to-Back PDKs Front-end PDKs

    under dev.

    SG25H3 SG13S

    SG25H1 SG13G2 SGB25V

    CMRF7SF CSOI7RF BiCMOS5PAeBiCMOS8HP

    TSL018 CA18HB

    SBC18H3

    SBC18HA SBC18H2 SBC18HXL

    IPD 0.18umCM013RF 018CMOS

    CM090rf

    CM055SIGE018

    CMOS065 RF H9SOI RF

    BiCMOS6GBiCMOS9MW H9SiGe

    BiCMOS7RFunder dev.BiCMOS9MW

    CA18QC

    BiCMOS8HP

    22

    CSOI7RF

    under dev.

    under dev.CS13Q1

    High-Q IPD

    New

    1-11

  • ADS 2011 RFIC Design Flow Licensing & Bundles

    Inputs from System-level

    Schematic Entry

    Circuit Design & Simulation

    Layout

    DRC/LVS

    GDSII or SOC integration

    EM Extraction

    ADS PlatformADS Core

    (incl. Schematic Entry, Linear Simulation, Optimization, Monte

    Carlo, Data Display, )HB, Tran, Envelope Elements

    ADS Layout Elementincl. DRC & LVS,

    Connectivity-driven layout, )

    Momentum Element

    ADS Core

    HB

    Layout

    Momentum

    W2205Bundle

    23

    ADS Core

    Circuit Sim

    Layout

    Momentum

    W2214Bundle

    New

    ADS 2012 New Via Simplification for faster EM

    Layers are generated for EM only Can be viewed in 3D Viewer Can be used in combination with standard layers for EM simulation

    24

    1-12

  • MMIC/RFIC Design Enablement

    25

    2

    Agilent EEsof RFIC solutions within Virtuoso

    Inputs from System-level

    Schematic Entry

    Layout

    DRC/LVS

    Parasitic Extraction

    GDSII or SOC integration

    26

    GoldenGate RFIC Design and Verification

    SystemVue Verification

    GoldenGate FCE

    Momentum Simulator

    BroadbandSPICEModel

    Generator

    S-parameter

    Component Options

    QFN Designer

    Circuit Simulation GoldenGate

    Inductor & Passive Component Design

    Package & Bond wire modeling

    RF-ESL Analysis & Design support

    1-13

  • New GoldenGate 2012.10 release

    27

    TSMC 60 GHz RDK Example Covers complete RF Design Flow Top-down ESL architecture verification

    Verify at every level vs. consistent 802.11ad TX/RX references

    RFIC circuit simulation & verification Full characterization of complete RF transceiver

    prior to tape-out

    EM analysis & verification Enable EM analysis early and often through

    integrated solvers

    Add off-chip effects & components in overall verification

    Addressing integration issues early in the design cycle

    28

    Paper: Addressing the RF needs in nano-scale Wireless Platforms, by Jason Chen

    Paper: TSMC 60 GHz reference design kit, by Hsieh-Hung Hsieh (TSMC)

    1-14

  • Design/Implementation Challenges per Segment

    Accurate device models for emerging technologies

    1

    IC design enablement beyondbroad and qualified PDK support

    2

    Integration challenges with multi-technology designs4

    Complete characterization ofcomponent level designs 3

    29

    EMPro 3D EM Modeling Environment

    Interactive, Intuitive, Efficient, 3DEM design Environment

    Full Wave 3D EM FEM and FDTD Simulation Technologies

    Parameterize 3D EM components for co-simulation & optimization in ADS

    Transfer ADS Layouts to EMPro for additional 3D-EM simulation

    Full scripting (Python) and parameterization capability

    Windows & Linux

    30

    3

    Paper: The best 3DEM Tool for ADS, by Agilent

    1-15

  • New Release: EMPro 2012Electromagnetic Professional SoftwareKey New Features: New level of integration with Advanced

    Design System Common database allows 3D

    components built in EMPro to be placed on ADS schematics and layout directly.

    New low-frequency analysis algorithm Improves accuracy

  • NEW: FEM DC/Low Frequency w/iterative solver

    Rollback to 1st order, direct solver.1.5 hour per freq

    Legacy solver (wo LF enhancement) cannot converge below 0.1 GHz.5 hours @ 1MHz and aborted.

    Iterative solver converges beyond 1 kHz, 35-50 iterations, 10 min per freq

    33

    Design/Implementation Challenges per Segment

    Accurate device models for emerging technologies

    1

    IC design enablement beyondbroad and qualified PDK support

    2

    Integration challenges with multi-technology designs4

    Complete characterization ofcomponent level designs 3

    34

    1-17

  • Interoperable RF Module / SiP Co-Design Flow

    35

    4

    Integration Challenges with Multi-Technologies

    Amalfi AM7802 PA Front End Module

    Thermal Considerations

    Multiple ICs on different fabricationtechnologies

    Behavioral model for PA IC(X-parameters)

    Passive EM Simulation ofEntire LaminateModel Package,

    solder bumps, bond wires

    Model connector

    Chip, module, board interactions

    Enable end-to-end simulation

    36

    Paper: Real world CMOS PA design form mobile applications with advanced simulation technologies, by Cheng-Cheng Xie

    1-18

  • Integration Challenges with Multi-Technologies

    Amalfi AM7802 PA Front End Module

    Thermal Considerations

    Multiple ICs on different fabricationtechnologies

    Behavioral model for PA IC(X-parameters)

    Passive EM Simulation ofEntire LaminateModel Package,

    solder bumps, bond wires

    Model connector

    Chip, module, board interactions

    Enable end-to-end simulation

    37

    Continues changes requires Interoperable Flows

    Typical PA Module Possible next steps

    and new constraints like board-driven chip (re-)design.

    38

    1-19

  • ADS 2012: Side-by-Side EM Simulation Setup & FEM Analysis

    analyze electromagnetic interactions between ICs of differing technologies and interconnects, wire bond and flip-chip solder bumps in typical in multi-chip RF PA modules.

    39

    IC Interoperability through OpenAccess

    Agilent is a member of Si2, OA Coalition and IPL Alliance

    ADS 2011 moved to OpenAccess as industry-standard database

    40

    1-20

  • Virtuoso Export To EMPro

    Transfers shapes, materials, ports from Virtuoso into EMPro 3D modeler

    Allows using both FEM and FDTD solvers

    41

    Board/PKG Interoperability through ODB++

    Board/Package Enterprise

    ToolsODB++ ADFI ADS

    High Capacity

    Layout Pre-Processor

    42

    1-21

  • Amkor Package Design Kit for ADSPredict Packaged Performance in Minutes

    Configure QFN package

    43

    Vendor Component Library

    GSM/DCS band filters use many SMT parts from Murata and TDK

    All SMT parts are 0201 type

    Download and use ADS component library from the vendors website

    44

    1-22

  • Whats New in ADS 2012 Main focus areas

    New Technologies Side-by-Side FEM & DC/LF Solution Electro-Thermal Simulation NeuroFET Model

    Usability Easily Share workspaces (Archive/Unarchive) Docking Windows Search & Navigator 3D EM Components Almost unbelievable Integration Layout Flight-lines replace wires in layout

    45

    ADS 2012 User Interface Improvements

    Component Search

    Net NavigatorLayer Visibility

    Comp Information Comp Information

    46

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  • New Docking Windows

    Can float the windowOr easily drag window into place

    Can float the windowOr easily drag window into place

    Can stack windows

    Can tab the windows

    Or easily drag window into place

    Can stack windows

    Can tab the windows

    Or easily drag window into place

    47

    New Navigator Tool Displays all the objects in a design

    Traces, paths, rectangles, polygons, circles, pins, components, cell instances, etc.

    Shows all the nets in a design Shows all the objects through the entire design

    hierarchy Cross selection/highlighting between design and

    Navigator Auto Zoom feature automatically windows in to the

    target objects Works in both Layout and Schematic Easily locate objects, even in complex designs

    48

    1-24

  • New Navigator Tool

    Cross selection between Navigator and design

    Cross selection between Navigator and design

    Expand to see full design hierarchyExpand to see full design hierarchy

    Easily filter what is visible in Navigator

    Easily filter what is visible in Navigator

    49

    Powerful New Search Utility

    Great for Finding specific objects in large, complex designs Quickly make edits to objects fitting a specific criteria

    Features Easily locate specific design objects Searches through the entire design hierarchy Type search strings in directly, or use search wizard Intuitive search language supports Boolean search strings Auto zoom opens required cell, zooms then selects object Use the search results to easily visit and edit specific objects

    50

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  • Whats New in ADS 2012 New Capabilities

    User Interface & Design Management

    Docking & Tabbed Windows & Dialog Boxes Component Search: Find objects in the design hierarchy Net Navigator to confirm nodal connectivity Flexible Archive & Unarchive: share parts of your workspace Dozens of additional Schematic & Layout UI refinements Support for 3rd party Design Management/Version Control Tools

    (Cliosoft)

    Layout

    Flight-wires replaces wires in layout Improved and Flexible Connectivity modes

    Multi-layer Interconnect creation copy and oversize simple & complex structures

    Lock components to fixed position Dimension-Line Improvements Direct mouse entry of array spacing ADS Desktop LVS Improvements Layout Command Line Editor

    Cookie Cutter Remove all wires in layout

    Simulation Improvements

    Faster Linear Speed Automation of Linear Network Collapser in Linear Controller

    Improved Convergence/Sweep behavior Ignore and Continue if encounters a convergence issue

    Parallel Computing Faster Transient GPU Simulation Manager to setup and control parallel sims

    With Transient/Convolution 8-pack license

    Power Amplifier Design Applications Enhancements to the Load Pull DesignGuide: Added mismatch

    simulation to indicate device or amplifier sensitivity to load VSWR or phase angle.

    Enhancements to the Amplifier DesignGuide: Extensive update makes it easy to see amplifier performance at a specific output power or a specific amount of gain compression.

    Connection Manager Instrument Support

    ADS Support for PNA-X N524x series and the new PNA N522X

    51

    Improvements to Layout ConnectivityOverview

    Connectivity better reflects users intent User selectable connectivity modes Better display of missing or incorrect connections More user control over connectivity Easier editing of connectivity information

    52

    New Flight WiresNew Flight Wires New Navigator docking window provides easy browsing of nets Highlight complete nets Highlight individual objects attached to netShow complete physical interconnect associated with a net

    New Navigator docking window provides easy browsing of nets Highlight complete nets Highlight individual objects attached to netShow complete physical interconnect associated with a netRetain individual shapes

    or merge objectsRetain individual shapes

    or merge objects

    New Copy and Oversize UtilityNew Copy and Oversize Utility

    1-26

  • ADS 2012 Support for Version Control SoftwareCliosoft SOS via ADS

    53

    ADS 2012 High Speed Digital Mid-channel repeater and opto link channel

    simulation based on IBIS AMI New on Sept CPL!

    W2312 Transient Convolution Distributed Computing Eight-packs September CPL

    W2324 High Capacity Layout Pre-processor IBIS 5.1 and IBIS 5.2 support Via drawing utility Enhanced Net Explorer S-parameter port names and differential pairings,

    enhanced symbol generation Built-in DesignGuides, DesignKit, and Examples

    (SI and PI) HSPICE Compatibility s_element support

    54

    Paper: The Agilent EEsof Integrated Design Flow for High Speed Digital Designer, by Heidi Barnes

    1-27

  • Key RF/MW Technology Investments

    Circuit SimulationMulti-TechnologyPerformanceConvergenceNonlinear StabilityParallel Computing

    Physical ModelingIntegration3D Multi-layer PlanarFull 3D EMMulti-TechnologyThermal

    ModelingDevice (III-IV, Si)NeuroFET/GaNBehavioral ModelingX-ParametersModel VerificationPackagingInterconnect3D passives

    Complete FlowLayout Manufacturing FlowDesktop DRC & LVSPackaging

    InteroperabilityOpenAccessInteroperable PDKsIntegration with IC/PCB frameworks

    Wireless VerificationLTE-A Library802.11ac/ad/n LibraryRadar Library

    Usability InnovationsCircuit SimulationEM-Circuit Co-SimulationInterconnect DesignDesign ManagementOptimization Cockpit

    55

    Summary Comprehensive RF Microwave Solutions for Wireless Applications

    Advanced RF design and simulation support with industry-leading RF simulation speed and capacity

    Best-in-class modeling solutions for passives, interconnects, packaging and active devices

    Unique RF & mm-Wave design support

    Access to scalable system-level solutions from algorithm development through RF architecture exploration

    Interoperable solutions for RFIC / SiP / Module / Board co-design

    Leverage the most complete RF EDA portfolio for your next-generation products!

    1-28

  • Key benefits Best-in-class RF fidelity among todays baseband/PHY environments,

    which allows baseband designers to virtualize the RF and eliminate excessmargin

    Superior integration with test accelerates real-world maturity and streamlines your model-based design flow, from architecture to verification

    World-class reference IP puts Agilent instrument-grade interoperability andLayer

    1 compliance inside your block diagram, before you have hardware Unified, open, polymorphic modeling simplifies tool flow, reduces

    department costs and supports a customizable, vendor-neutral environment

    Priced for networked workgroups to maximize design re-use and capitalize on baseband and RF synergies

  • 1Integrated Electrothermal Solution Delivers Thermally-Aware

    Circuit SimulationRick PoorePrincipal Engineer, R&DAgilent Technologies

    Marc PetersenProduct ManagerAgilent Technologies

    Agenda

    Introduction Thermal Problems in RFIC/MMIC Design Solutions: Traditional Approaches Solutions: A New Approach

    Case Study MMIC PA Design Example Electro-Thermal Simulation Thermal and Electrical Results

    Conclusion and Q&A

    2Copyright Agilent Technologies 2012

    2-1_1

  • The Problem: Thermal Effects Impact RFIC/MMIC DesignThermal Effects Impact RFIC/MMIC Design

    High Power Devices + High Level of Integration+ High Level of Integration = On-Chip Temperature Rise

    IC performance depends on device temperature

    Device temperature depends on: Power dissipation Layout position IC / packaging material thermal properties

    This is a nonlinear problem Thermal conductivities vary with temperature!

    ????

    3Copyright Agilent Technologies 2012

    Traditional Approach:Self-Heating Models Many transistor models now include

    self-heating effects Requires accurate extraction of thermal

    parameters RTH, CTH Does not include thermal coupling

    between transistors Does not include impact on nearby

    passive components Does not include impact of packaging

    4Copyright Agilent Technologies 2012

    2-1_2

  • Traditional Approach:Stand-alone Thermal Solvers Requires user to manually transfer

    layout and expand to 3-D heat sources locations power dissipation values computed device temperaturesand perform any required iteration

    5Copyright Agilent Technologies 2012

    Traditional Approach:Equivalent RC Thermal NetworkExtract thermal RC network from FEM data, add to schematic Must be re-extracted for any layout

    change Requires device models to have

    thermal nodes Large device count make cause slow

    extraction of RC network Large thermal networks may cause

    significant slowdown Does not account for nonlinear thermal

    properties

    6Copyright Agilent Technologies 2012

    2-1_3

  • 7Thermal Equation

    The thermal problem

    c and N are both functions of temperature and spatial location (material)g is a function of temperature, time and spatial location (electrical devices)

    7Copyright Agilent Technologies 2012

    A New Approach Full Electro-Thermal Simulation

    8

    Iteration loop isdone automaticallyuntil powers andtemperatures areself-consistent

    Circuit SimulatorRead temperatures

    Solve electrical equationsWrite power dissipation

    Thermal SimulatorRead power dissipationSolve thermal equation

    Write temperaturesPDISS

    TDEVICES

    Thermaltechnology

    files

    Copyright Agilent Technologies 2012

    2-1_4

  • Electro-Thermal Simulation Results

    More accurate circuit simulation results, showing performance degradation due to temperature rise

    3D temperature maps, providing design insight, leading to more robust layout designs

    Device temperature data, to uncover potential reliability issues and failures

    9Copyright Agilent Technologies 2012

    Thermal Solver Technology

    Provided by Gradient Design Automation Focused on IC thermal simulation

    Full-chip (high capacity) 3-D FEM temperature simulation with device- and wire-level resolution

    Linux-based Proven for large digital and mixed-

    signal applications Used by major IC companies

    On Semi, TI, AMD, Works with any IC process

    GaAs, Si, SiGe, GaN,

    http://www.gradient-da.com/resources/technical-papers.php

    10

    Mixed-Signal IC

    45nm Digital Block with 800k Transistors

    Copyright Agilent Technologies 2012

    2-1_5

  • Agenda

    Introduction Thermal Problems in RFIC/MMIC Design Solutions: Traditional Approaches Solutions: A New Approach

    Case Study MMIC PA Design Example Electro-Thermal Simulation Thermal and Electrical Results

    Conclusion and Q&A

    11Copyright Agilent Technologies 2012

    12

    Case Study: Two Stage LTE PA

    12Copyright Agilent Technologies 2012

    Two-Stage LTE PAGaAsFET; uses EEsof DemoKitGain >25 dBPout > 25 dbm with Pin >1 dbm

    2-1_6

  • 13

    Case Study: Two Stage LTE PAGain >25 dB; Pout > 25 dBm @ Pin >1 dBm

    13Copyright Agilent Technologies 2012

    14

    Two Stage LTE PA

    14Copyright Agilent Technologies 2012

    6- InitialDesign_layout3aa.gif

    6- InitialDesign_layout3bb.gif

    Stage 1 FET4 fingers100 um widePDC=900 mW

    Stage 2 FET6 fingers200 um widePDC=2100 mW

    2-1_7

  • 15

    Two Stage LTE PA LayoutThermal analysis using Rth calculations

    15Copyright Agilent Technologies 2012

    Simple calculation of thermal resistanceRTH for each transistor

    Assume power is dissipated uniformly throughout the transistors channel

    FET1 channel: 100 x 46.6 um: RTH = 168 K/W Power dissipation = 900 mW

    'T=RTH PDISS=168 K/W x 0.9W = 151qC T1=25+151=176qCFET2 channel: 200 x 79.9 um: RTH = 98 K/W

    Power dissipation = 2100 mW'T=RTH PDISS=98 K/W x 2.1W = 206qC T2=25+206=231qC

    16

    Two Stage LTE PA LayoutElectro-thermal simulation

    16Copyright Agilent Technologies 2012

    2-1_8

  • 17

    Electrothermal Simulation Setup

    17Copyright Agilent Technologies 2012

    Step 1 Add an Electrothermal Controller to the schematic page

    18

    Electrothermal Simulation Setup

    18Copyright Agilent Technologies 2012

    Step 2 Open the Electrothermal Controller and specify a few parameters as shown below

    Thermaltechnology

    Thermalboundary

    conditions

    2-1_9

  • 19

    Electrothermal Simulation Setup

    19Copyright Agilent Technologies 2012

    Step 3 Click the Simulate button and electro-thermal simulation starts

    Simulate

    Thermal profiles, plots and data output results are automatically displayed at the end of simulation

    20

    Thermal Profile @ Pin=0dBm

    20Copyright Agilent Technologies 2012

    Simulation time = 6 minutes

    8 point input power sweep:

    from -10 dBmto +4 dBm

    2-1_10

  • 21

    Thermal Profile Max @ DC

    21Copyright Agilent Technologies 2012

    Simulation time = 56 seconds

    22

    Thermal Profile Max @ DC

    22Copyright Agilent Technologies 2012

    2-1_11

  • 23

    Electro-thermal Device Temperatures

    23Copyright Agilent Technologies 2012

    Initial hand calculation with RTH predicted TFET1=176C and TFET2=231CElectrothermal results TFET1=135C and TFET2=158-181C

    24

    Electro-thermal On vs Off3 dB loss in gain

    24Copyright Agilent Technologies 2012

    Electro-thermal ONElectro-thermal OFF

    2-1_12

  • 25

    Electro-thermal On vs OffHB Pin/Pout

    25Copyright Agilent Technologies 2012

    Electro-thermal ONElectro-thermal OFF

    Pin Vs Pout

    26

    Electro-thermal On vs OffHB Power Dissipation Vs Pin

    26Copyright Agilent Technologies 2012

    Electro-thermal ON

    Electro-thermal OFF

    2-1_13

  • 27

    Electro-thermal On vs OffHarmonics

    27Copyright Agilent Technologies 2012

    Electro-thermal ONElectro-thermal OFF

    28

    Modify the Layout of FET2Spread the fingers and place ground/thermal vias

    28Copyright Agilent Technologies 2012

    Initial Design Modified Design

    FET2 temperatures were too high for reliability RF performance no longer met specs Modify the layout of FET2 to spread the heat out and cool the devices

    TFET1 =135qC TFET2 =158-181qC TFET1 =135qC TFET2 =107-115qC Tmax

    2-1_14

  • 29

    Modified Stage 2 FET LayoutSpread out fingers and place ground/thermal vias

    29Copyright Agilent Technologies 2012

    30

    Thermal Profile of Modified Layout @ Pin=0dBm

    30Copyright Agilent Technologies 2012

    Initial DesignTFET2 = 158-181qCModified DesignTFET2 = 107-115qCFET1 Temp now dominates at135qC

    2-1_15

  • 31

    Thermal Profile Max @ DC of Modified Layout

    31Copyright Agilent Technologies 2012

    32

    Thermal Profile of Modified Layout

    32Copyright Agilent Technologies 2012

    2-1_16

  • 33

    Electro-thermal Device Temperatures

    33Copyright Agilent Technologies 2012

    Original layout TFET1=135C and TFET2=158-181CModified layout TFET1=135C and TFET2=107-115C

    34

    Modified Design - Dashed Traces

    34Copyright Agilent Technologies 2012

    2-1_17

  • 35

    Modified Design - Dashed Traces

    35Copyright Agilent Technologies 2012

    Initial Design Electro-thermal OFFInitial Design Electro-thermal ONModified Design Electro-thermal ON

    36

    Modified DesignHB power dissipation

    36Copyright Agilent Technologies 2012

    Initial Design Electro-thermal OFFInitial Design Electro-thermal ONModified Design Electro-thermal ON

    2-1_18

  • 37

    Modified Design

    37Copyright Agilent Technologies 2012

    Initial Design Electro-thermal OFFInitial Design Electro-thermal ONModified Design Electro-thermal ON

    38

    Case Study: Two Stage LTE PAMounted on a QFN Package

    38Copyright Agilent Technologies 2012

    2-1_19

  • 39

    Mounting the IC onto a Package

    39Copyright Agilent Technologies 2012

    Layer summary:725 m plastic package k=1.0

    5 m metal stack on chip100 m GaAs substrate k(25)=46150 m copper lead frame k=401

    40

    Thermal Profile of Modified Design and Package

    40Copyright Agilent Technologies 2012

    2-1_20

  • 41

    Thermal Profile of Modified Design and PackageThermal profiles of all layers IC and package

    41Copyright Agilent Technologies 2012

    42

    Electro-thermal Device Temperatures

    42Copyright Agilent Technologies 2012

    Original layout TFET1=135C and TFET2=158-181CModified layout TFET1=135C and TFET2=107-115CModified, packaged TFET1=141C and TFET2=116-120C

    2-1_21

  • 43

    Thermal Profile of Modified Design and PackageSimulation results S-parameters

    43Copyright Agilent Technologies 2012

    44

    Thermal Profile of Modified Design and PackageSimulation results S21

    44Copyright Agilent Technologies 2012

    2-1_22

  • 45

    Thermal Profile of Modified Design and PackageSimulation results Pin / Pout

    45Copyright Agilent Technologies 2012

    46

    Thermal Profile of Modified Design and PackageSimulation results HB power dissipation

    46Copyright Agilent Technologies 2012

    2-1_23

  • 47

    Thermal Profile of Modified Design and PackageSimulation results fundamental and harmonics

    47Copyright Agilent Technologies 2012

    Agenda

    Introduction Thermal Problems in RFIC/MMIC Design Solutions: Traditional Approaches Solutions: A New Approach

    Case Study MMIC PA Design Example Electro-Thermal Simulation Thermal and Electrical Results

    Conclusion and Q&A

    48Copyright Agilent Technologies 2012

    2-1_24

  • Summary: ADS Electro-thermal Solution

    Applications: high power RFIC / MMIC design

    Deliver thermally aware circuit simulation results by including effects of on-chip temperature rise

    Include effects of package and PCB Easy to set up and use from within

    the ADS environment Works with all simulation types:

    DC, AC, SP, HB, Transient, Envelope Available in ADS 2012

    QUESTIONS?

    49

    Integrated Thermal Solver

    ADS LayoutADS Schematic

    Copyright Agilent Technologies 2012

    2-1_25

  • A complete designer-oriented device model verification solution for

    advanced technology

    1

    Cai ShuangSenior Application EngineerAgilent EEsof

    October 2012

    Agenda

    Copyright 2012 Agilent Technologies2

    Increasing process complexity a challenge to models Complete solutions for model verification

    MQA (Model Quality Assurance) de-facto industry standard SPICE model validation platform

    AMA (Advanced Model Analysis) layout dependent effects model validation platform

    Whats New in MQA2012.07 and AMA 2012.07 Summary & Outlook

    2-2_1

  • Design Requirement for PDK

    Copyright 2012 Agilent Technologies3

    Industry standard model required Physical model and scalable model required Process variation awareness required for ensuring the yield Mismatch model for AMS design required

    Model Challenge with Advanced Technology

    Copyright 2012 Agilent Technologies4

    Stress, Lithography and Well Proximity Effect have made models more complex

    Comprehensive QA and verification on the Models are required in order to ensure design success

    Foundry often encrypts the model principle for proximity models and make it more difficult for verifying the models

    2-2_2

  • When a model/library has been obtained from the foundry,it should be checked against- consistency (simulation convergence, model explosion etc.)- physical behavior- performance in different simulators- etc.

    This means:Creating a lot of netlistsHandling of huge amount of data Intelligent flagging of issuesDetailed reporting & documentation

    and this requires acomprehensive, flexible and customizable tool

    Model QA Challenges And Requirements

    5

    Complete QA Solutions

    Copyright 2012 Agilent Technologies6

    MQA/AMA helps designers to remove uncertainties for sub-45nm technologies

    MQA/AMA is flexible enough to be adjusted to any design flow and compatible to all popular EDA tools

    MQA/AMA integrates the entire flow and all the related tools for PDK verification purposes

    MQA/AMA can be easily adjusted for future challenges

    Agilent has developed an automated yet flexible platform to access foundry proximity models with a click of button

    2-2_3

  • Accelerating Analog Silicon

    Agenda

    - Modeling Challenges

    - Introduction to MQA (Model Quality Assurance)

    - Introduction to AMA (Advanced Model Analysis)

    7

    End-to-end Silicon Device Modeling Flow

    Copyright 2012 Agilent Technologies8

    2-2_4

  • Agilents Validation Tools

    9

    ModelValidation

    Physical Validation

    Design Variability

    MQA

    AMA

    What is MQA?

    10

    MQA the industry standard assurance tool that assists modeling experts and model users to perform comprehensive model QA with an knowledge-based, rule-driven approach.

    It qualifies device models/libraries of ever growing complexity.It is an automated device model verification and documentation

    tool that modeling engineers at IDMs/Foundries use to perform comprehensive

    model QA and to release verified model files/libraries. Fabless Design Houses use to evaluate and accept the model libraries

    from Foundries.

    2-2_5

  • What is MQA?

    11

    OS, Simulators, Input Format

    Copyright 2012 Agilent Technologies12

    Supported operating systems Windows XP, Windows Vista, Windows 7 Linux

    Supported simulators All major EDA simulators: HSPICE, SPECTRE, Eldo, SPICE3, ADS,

    Golden Gate (2012H2), AFS, Titan.. Input format

    Data Native MBP/MQA data format IC-CAP mdm format (2012H2)

    Model Of all supported simulators

    2-2_6

  • MQA Rule-Based, Knowledge-Driven Model QA

    A rule-based, knowledge-driven automatic platform for SPICE model quality assurance through device- and circuit-level figures of merit

    Knowledge Device physics, technology impact on

    circuit design, model-simulator interaction, key FOMs

    Rules Text files to describe FOMs, PVT

    coverage, expectations, graphing options, flagging criteria

    Automation Plotting, analysis, flagging, reporting,

    documentation

    13

    MQA de-facto Industry Standard Acceptance Tool Minimizes costly late-stage

    design surprises Comprehensive acceptance QA Design-specific checks

    Increased efficiency for all design teams Consolidated QA efforts Model library version control Bridge between foundry and design

    house

    14

    2-2_7

  • MQA Ideal Solution for Library Benchmarking

    Exploding varieties of libraries CAD-centric benchmarking

    Cross-simulator equivalence check

    Cross-model (ex., BSIM4 vs. PSP) equivalence check

    Addresses key technology benchmarking challenges What has changed from previous

    library release? What has improved or worsened

    from 32nm to 28nm? How identical is the 2nd source

    foundry to the primary foundry?

    15

    MQA Lib Explorer

    Powerful Lib Parser Parse large model libraries

    Corner View / Model View

    Model Analysis / Benchmark

    2-2_8

  • Apply MQA as

    Qualification tool Knowledge based and rule driven Validate model file/library and measurement data

    Documentation tool Overlay with measurement data Easy to customize report

    Design interface (foundry interface) tool Comparison Sharing the new technology characterization

    Model QA result sharing tool Bridge between foundry and design house Communication between different groups

    17

    MQA Default Rule Sample:

    18

    2-2_9

  • Accelerating Analog Silicon

    Time Cost (2807 plots, 21 tables)

    56.7%

    66.7%

    89.8%

    Slow & Error-prone

    20

    2-2_10

  • Example: Rule Check Idsat vs. LExample: Rule Check Idsat vs. L

    [common]appliedmodel = binning, global, macro

    [Group: 4:Title=Model Scalability]

    [Label: 4001:title= Check Idsat vs. L] *for NMOS[Condition:(devtype=1)and(application=1 or application=2 or application=3)][Loops: X=L(start=g_lmin,stop=g_lmax,perdec=10): P=W (start=g_wmin,stop=g_wmax, num=3): P1=Vgs(vgg) : P2=Vds(vdd) : P3=Vbs(0): P4=T(tmin, tnom, tmax)][Target: y=Idsat][Check: 01:Check Trend: CheckTrend2D (p,x,y,"times=1","incAtFirst=-1"): error: Trend is not right][Check: 02:Check Kink: CheckKink2D (p,x,y): error: Kink occurs]

    A rule (ASCII, customizable) is typically organized like this:1. ID and title for selection in the GUI.2. Conditions, which determine when it is valid,

    i.e. when it will be executed.3. Loops, which defines the variations like bias, W/L/T sweeping,

    etc.4. Target, which defines target, normally it will be Y-axis on plot.5. Check functions, to define which MQA checks to be applied,

    also to define the warning message if check failed.

    A rule (ASCII, customizable) is typically organized like this:1. ID and title for selection in the GUI.2. Conditions, which determine when it is valid,

    i.e. when it will be executed.3. Loops, which defines the variations like bias, W/L/T sweeping,

    etc.4. Target, which defines target, normally it will be Y-axis on plot.5. Check functions, to define which MQA checks to be applied,

    also to define the warning message if check failed.

    Inside the .rule FileA Rule file in MQA is a ASCII text file which defines how MQA performs certain checks on certain objectsunder certain conditions

    tests

    21

    Accelerating Analog Silicon

    Example of MQA Check functions, called by a Rules file:CrossCheckCheckTrend

    22

    2-2_11

  • Accelerating Analog Silicon

    After all isset up,

    execute theMQA test

    and obtaina detailedreport

    the problem isautomatically indicated !

    23

    MQA Demos Multi-library comparison using Lib Explorer Multi-targets Table RF Applications:9S parameter 9Harmonic Balance

    Statistical Applications:9NP correlation + Monte Carlo9Mismatch

    24

    2-2_12

  • MQA Summary

    As the first commercial SPICE model validation solution, MQA is the de-facto industry standard tool for SPICE model validation, comparison and documentation.

    Broad customer acceptance: MQA has been widely adopted by 100+ customers around the world. Dominate in the validation market.

    Comprehensive checking routines built-in. e.g. BSIM4: default 110 rules from 17 rule-groups

    Support all mainstream models and simulators. Compare differences between model versions, SPICE simulators,

    and foundry technologies. Powerful and Flexible Reporting Function. Easy to share QA

    results.

    25

    Accelerating Analog Silicon

    Agenda

    - Overview

    - Introduction to MQA (Model Quality Assurance)

    - Introduction to AMA (Advance Model Analysis)

    26

    2-2_13

  • Why AMA?A MOS transistors drive capability is no longer primarily determined by its width and length. Rather, it is heavily influenced by the layout of its surrounding structures, which has become known collectively as layout dependent effects (LDEs). Stress, Lithography and Well Proximity Effects have made models more complex. Need solution to:

    Verify foundry Models Access Variability using foundry input Remove Uncertainty before tape out.

    27

    Why AMA?

    Modeling approach: LVS + Macro SPICE model

    28

    Schematic

    Layout

    LVS

    Modified Netlist

    LVS

    Hea

    vyM

    acro Heavy

    SPICE

    Schematic

    Layout

    ExtractedNetlist

    SPICE

    LVS

    BSIM

    Customized instance

    Macro Model

    Layout instance correlate model parameters through equations

    2-2_14

  • 45nm/32nm Special Effects

    29

    Layout Dependent Variations

    Foundry Solutions for Addressing Variability

    30

    Proximity Models Stress Lithography Well Proximity

    Proximity Model Means LVS heavy Macro SPICE model heavy LVS+Macro SPICE model 1. Verify foundry Models

    2. Access Variabilityusing foundry input

    Need Solution to

    2-2_15

  • What AMA does

    Model QA with layout dependent parameter consideration. Sweep layout parameters and generate Test Structure automatically. Extract layout parameters Check SPICE model electrical performance vs. layout parameters. Pin-point issues or abnormal behaviors due to LDEs before Tape-Out

    Built-in Modules and Flow

    AMAs architecture

    32

    SPICE Model

    Netlist

    SPICE

    Corner modelStatistical modelMismatch

    CharacterizationComparisonDocumentation

    AssuraCalibreHercules

    GenericRule File

    Layout DB

    AMA

    LVS Decks PCELL or Generator

    User layout or from stand cell

    2-2_16

  • Built-in Modules and FlowLayout Generation PCell mode SKILL Template mode Layout mode

    Layout Extraction Mentor Graphic Calibre Synopsys Hercules & StarRCXT Cadence Assura & QRC

    SPICE Simulation HSPICE or Spectre

    Data Analysis

    33

    LayoutGeneration

    LayoutExtraction

    SPICE simulation

    Data Analysis

    AMA Sample Result

    2-2_17

  • AMA directory structure

    bin: contains key executable of AMA.lib: contains library files for program, such as ".so"

    and ".jar" files. skill: contains SKILL files to initiate AMA program from Virtuoso.

    etc: contains default settings files. icf: contains Instance Connection Files. checker: contains testing cases to check connectivity to 3rd

    party tools. checkfunctions: contains built-in check functions. skill: contains built-in SKILL template files to create layout.lic: contains license related configuration files.help: contains user manual and built-in context-

    sensitive help files.

    35

    Rule File Generator

    36

    This rule file is more complicated than MQAs and since it involves layout generation, we provide a separate module to generate rule files.

    2-2_18

  • Rule File Generator-Layout Source

    37

    Test Bench can have the following three sources: From Foundry PCELL From SKILL based layout generator From existing or user layout

    Sample Rule Syntax

    38

    [Group: 1:Title=MOS Devices] [Condition:1] [Path: $AMAHOME/etc/tb/mos/nmos/xxxx65ng_nch.il] * user has the option to link to foundry PCELL. [SPICE: HSPICE$AMAHOME/examples/hb3v3.lib:tt:nmos] * for circuit, model is defined within circuit definition. [Loops : A1(values for A1) : A2(values for A2) : A3(values for A3)

    [Target: Idsat, Vth, Ioff] [Check: 01:Check Trend: CheckTrend2D (a1,a2,a3,"times=1","incAtFirst=-1"): error: Trend issue] [Compare: CompPlot(a1,a2,a3): error: TBD]

    2-2_19

  • Example: Lithography rounding effects for 32nm

    A predictive 32nm Model is usedA Litho-aware extraction deck of a 45nm technology is used (we expect more rounding effect at 32nm).

    Example: Lithography rounding effects for 32nmAn AMA run is executed and is finished in less than 30 seconds. One can clearly see that the variability due to layout parameter B (OD rounding height) is almost 20% at certain A value, and if A exceeds certain value say 0.1um, OD rounding effects becomes negligible (the number may not make sense, but you get the idea).

    W=60nmL=32nm

    2-2_20

  • Example: Lithography rounding effects for 32nm

    And we have observed using the input from foundry, the followingplot is observed, and it obviously doesnt make sense, so user can define a criteria and let the tool pick up the issue automatically and feedback to foundry.

    Example: WPE effect

    42

    2-2_21

  • Example: WPE effect (cont.)

    43

    AMA Summary

    AMA is the extension of MQA to qualify the layout dependent effects model for cutting-edge technologies.

    Built-in complete workflow for model-LVS co-validation. Technology based and rule driven. Open interface to support popular physical verification tools

    and SPICE simulators. Accurately predict design margin due to process/design

    variability before tape-out. Flexible to be adjusted (extended) to other applications.

    44

    2-2_22

  • Whats New

    MQA 2012.07 Java Version Update Support of Project-level Parallelism Seamless Data Flow for ICCap .mdm data format Enhanced Support of ADS (HPEESOFSIM) Support for III-V Technologies

    AMA 2012.07 Expanded CDF Support

    StarRCXT, Assura Support

    Support of Layout Mode in Rule Generator

    For more: http://edocs.soco.agilent.com/display/mqa201207/MQA+Release+Notes

    Accelerating Analog Silicon

    MQA/AMA in a nut shell:A tool to test simulation or measurement results under all kinds of conditions

    46

    Drawn by: Franz Sischka

    2-2_23

  • Roadmap

    Database preparation to deal with huge amount of data. More flexible parallelization to further speed-up. Continue to contribute to the seamless integration of

    simulation modules with focus on the interplay and interfacing of EDA tools in order to: Enhance design effectiveness Reduce development cycle times Reduce costs

    Build unified platform for modeling verification to combine MQA and AMA functionalities and more.

    Accelerating Analog Silicon

    Thank you for your attention !

    48

    2-2_24

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