Abrasive filament

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Barrel Electroplating Device U.S. Pafent5,490,917. Feb. 13, 1996 A.E. Lazaro and W. Yates, assignors to Hardwood Line Manufacturing Co., Chicago .4 method of spraying a plurality of parts to be plated in a barrel that is operatively associated with a plating tank containing electrolyte, the barrel including a perfo- rated means that sprays electrolyte on the parts below the spray where the barrel can be moved to removably associate it with a source of electrolyte under pressure and can be rotated while the hub thereof re- mains staionary by a coupling device wherein at least one of the coupling mem- berz is associated with the barrel and ex- tending therefrom in a fixed location with respect to the barrel, the other of the cou- pling members is located at a fixed position to enable removable engagement with the other coupling member, comprising mov- ing the electroplating barrel into a position where it is removably coupled with the source of electrolyte under pressure; agitat- ing the parts to be plated in the plating barrel by rotating the plating barrel; and spraying the parts with the electrolyte through the perforated spray means from a fixed position above the parts within the plating barrel while the barrel agitates the parts whereby more efficient electroplating is accomplished. Sputtering Apparatus U.S. Patenf 5490,910. Feb. 13, 1996 C. W. Nelson and RD. Weir, assignors to Tulip Memory Systems Inc., Fremont, Calif A circularly symmetric sputtering appa- ratus with hollow-cathode plasma devices. Magnetron Sputtering U.S. Pafenf 5,490,913. Feb. 13, 1996 R. Scberfler et al, assignors to Balzers AG, Balzers, Liecbtensfein A magnetic field enchanced sputtering arrangement with vacuum treatment appa- ratus. Sputtering Target U.S. Patent 5490,914. Feb. 13, 1996 S. Hurwitl and C. Weiss, assignors to Sony Corp., Tokyo and Materials Research Corp., Orangeburg, N.Y. A high utilization sputtering target for a cathode assembly. Target for Cathode Sputtering U.S. Pafent5,490,915. Feb. 13, 1996 6. Bracher, assignor to Balzers AG, Balzers, Liechtenstein A vacuum coating apparatus comprising a sputtering target including a ring-shaped body made of a metal selected from the group consisting of aluminum and alumi- num alloy, the body having a target surface with an inner target rim, an outer target rim, and a ring-shaped curved and substantially concave sputtering surface between the lin- ear and outer target rim. Abrasive Filament U.S. Patent .5,491,025. Feb. 13, 1996 R.M. Pihl et a/., assignors to 3M Co., St. Paul, Minn. An abrasive filament comprising a core having a continuous surface throughout its length and consisting essentially of a first thermoplastic elastomer having abrasive particles dispersed and adhered therein; and a sheath coterminous with the core, the sheath consisting essentially of a blend of a second thermoplastic elastomer and a ther- moplastic polymer. S olidstrip’s excellent combination of hardness, density and particle angularity delivers a high stripping rate and consistent performance. S olidstrip strips delicate metal and composites safer. And, because it produces minimal dust, Solidstrip provides a safer, cleaner workplace. C ut your media usage up to 50% by using Solidstrip . QUALITY METAL FINISHING FROM EIDSCHUN Eidschun builds depend- able, continuous duty process systems for metal finishing that offer lower operating costs, higher productivity and improved product quality. Call today for details. EIDSCHUN ElOOOSystem configured for reel-to-fee/plating 5131113th Avenue North *Clearwater FL34620*(313) 572-9367. Fax(813) 573-9193 INTERNET: http://eidschun.com ?? e-mail: [email protected] Circle 113 on reader information card Circle 036 on reader information card METAL FINISHING . NOVEMBER 1996 117

Transcript of Abrasive filament

Barrel Electroplating Device U.S. Pafent5,490,917. Feb. 13, 1996 A.E. Lazaro and W. Yates, assignors to Hardwood Line Manufacturing Co., Chicago

.4 method of spraying a plurality of parts to be plated in a barrel that is operatively associated with a plating tank containing electrolyte, the barrel including a perfo- rated means that sprays electrolyte on the parts below the spray where the barrel can be moved to removably associate it with a source of electrolyte under pressure and can be rotated while the hub thereof re- mains staionary by a coupling device wherein at least one of the coupling mem- berz is associated with the barrel and ex- tending therefrom in a fixed location with respect to the barrel, the other of the cou- pling members is located at a fixed position to enable removable engagement with the other coupling member, comprising mov- ing the electroplating barrel into a position where it is removably coupled with the source of electrolyte under pressure; agitat- ing the parts to be plated in the plating barrel by rotating the plating barrel; and spraying the parts with the electrolyte through the perforated spray means from a fixed position above the parts within the

plating barrel while the barrel agitates the parts whereby more efficient electroplating is accomplished.

Sputtering Apparatus U.S. Patenf 5490,910. Feb. 13, 1996 C. W. Nelson and RD. Weir, assignors to Tulip Memory Systems Inc., Fremont, Calif

A circularly symmetric sputtering appa- ratus with hollow-cathode plasma devices.

Magnetron Sputtering U.S. Pafenf 5,490,913. Feb. 13, 1996 R. Scberfler et al, assignors to Balzers AG, Balzers, Liecbtensfein

A magnetic field enchanced sputtering arrangement with vacuum treatment appa- ratus.

Sputtering Target U.S. Patent 5490,914. Feb. 13, 1996 S. Hurwitl and C. Weiss, assignors to Sony Corp., Tokyo and Materials Research Corp., Orangeburg, N.Y.

A high utilization sputtering target for a cathode assembly.

Target for Cathode Sputtering U.S. Pafent5,490,915. Feb. 13, 1996 6. Bracher, assignor to Balzers AG, Balzers, Liechtenstein

A vacuum coating apparatus comprising a sputtering target including a ring-shaped body made of a metal selected from the group consisting of aluminum and alumi- num alloy, the body having a target surface with an inner target rim, an outer target rim, and a ring-shaped curved and substantially concave sputtering surface between the lin- ear and outer target rim.

Abrasive Filament U.S. Patent .5,491,025. Feb. 13, 1996 R.M. Pihl et a/., assignors to 3M Co., St. Paul, Minn.

An abrasive filament comprising a core having a continuous surface throughout its length and consisting essentially of a first thermoplastic elastomer having abrasive particles dispersed and adhered therein; and a sheath coterminous with the core, the sheath consisting essentially of a blend of a second thermoplastic elastomer and a ther- moplastic polymer.

S olidstrip’s excellent combination of hardness,

density and particle angularity delivers a high stripping rate and consistent performance.

S olidstrip strips delicate metal and composites safer. And,

because it produces minimal dust, Solidstrip provides a safer, cleaner workplace.

C ut your media usage up to 50% by using Solidstrip .

QUALITY METAL FINISHING FROM EIDSCHUN Eidschun builds depend- able, continuous duty process systems for metal finishing that offer lower operating costs, higher productivity and improved product quality. Call today for details.

EIDSCHUN ElOOOSystem configured for reel-to-fee/plating

5131113th Avenue North *Clearwater FL34620*(313) 572-9367. Fax(813) 573-9193 INTERNET: http://eidschun.com ??e-mail: [email protected]

Circle 113 on reader information card Circle 036 on reader information card

METAL FINISHING . NOVEMBER 1996 117