3D IC-Package-Board Co-analysis using 3D EM … 2 A 3D INTEGRATION... · 4/25/2014 1 CST –...
Transcript of 3D IC-Package-Board Co-analysis using 3D EM … 2 A 3D INTEGRATION... · 4/25/2014 1 CST –...
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3D IC-Package-Board Co-analysis using
3D EM Simulation for Mobile Applications
Darryl Kostka, CST of America
Taigon Song and Sung Kyu Lim, Georgia Institute of Technology
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Introduction
TSV Array Cross Talk Analysis
Return Path Discontinuity Modeling
2.5D Link Analysis
3D IC Link Analysis
Conclusion
Outline
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Introduction to 3D Integration
Source: Cadence Design Systems, Inc. “3D ICs with TSVs—Design Challenges and
Requirements”
3D IC
System-on-
Chip (SoC)
System-in-
Package (SiP)
2.5D
Stacking
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D=100μm, R=15μm, L=100μm, dox=0.1μm, εSiO2=3.9 (tand=0.001),
εSi=11.9 (cond=10S/m)
TSV Signal-Ground Pair
Sharp slope due to
transition from slow wave
to quasi-TEM mode
Losses due to
displacement
currents in Si
Insertion Loss (dB)
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Cross Talk: TSV Array
Baseline: D=100μm, R=10μm, L=200μm,
dox=1μm, εSiO2=3.9 (0.001), εSi=11.9 (10S/m)
1
2
3
Aggressor via
Neighboring Victim via
Shielded Victim via
Return vias
Victim vias
5x5 TSV array with 1 driven aggressor and two
victim vias;
Aggressor (TSV1) is driven with a pulse
(risetime=100ps, amplitude=2V) using a 50Ohm
source resistor.
Far end of aggressor TSV and both sides of all other
signal TSVs are terminated in 50Ohms
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Cross Talk: TSV Array NEXT – Frequency domain
Neighboring victim
Shielded victim
NEXT – Time domain
Thicker oxide liners help reduce cross talk for low resistivity substrates
High resistivity substrates act as low loss dielectrics and therefore help reduce cross talk
Low resistivity substrate has a larger peak voltage and longer coupled noise duration (ISI)
Chip-package co-design since TSV response in the chip stack can propagate into package
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Interposer: Return Path Discontinuities
Surface current distribution (Glass) @30GHz showing cavity resonance
Microstrip-to-microstrip transition causes
a change in the reference plane (RPD)
Results in large SSN voltage induced
between planes at resonance frequencies
Increased insertion loss
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Eye Diagrams for Silicon and Glass Interposers
Glass Silicon
282.6ps
0.29V 17.89ps
295.2ps
0.31V 6.7ps
3.2 Gbps 210-1 PRBS stream
Jitter and eye opening are considerably improved in the Silicon interposer, in
comparison with the Glass interposer
Performance of glass interposer can be improved by using decoupling capacitors
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2.5D Link Test Case
Die size: 1 mm x 1 mm, 250 um thickness (Die 1 is identical to Die 2)
Double Sided Silicon Interposer size: 40 mm x 40 mm, 300 um thickness
u-bump dimensions: 60 um diameter, 52 um height, 200 um pitch
TPV dimensions: 40 um diameter, 300 um height, 200 um pitch
Signal
Signal
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IC Design I/O Pad Map
GDSII Import from
Cadence Virtuoso
Silicon IC BEOL
NCSU FreePDK 45nm technology library
10 metal layers, 12um thick Cu backend
11 signals total
M1
M10
u-bump
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Double Sided Silicon Interposer Design
IC 1 IC 2
Interposer
(Eps = 2.51, tanD = 0.004)
20mm
Microstrip-to-microstrip signal
routing used to maximize RPD
effects (worst case scenario) 40mm
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Method 1: Complete chip-interposer-chip link co-simulation
2.5D Link: Analysis Methodology I
Pos: Highest level of accuracy since all 3D coupling effects between the ICs and
interposer are captured
Neg: Not computationally feasible (3D full-wave analysis) due to the complexity of the
IC design and the aspect ratios involved
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Method 2: Decoupling / Cascading approach
2.5D Link: Analysis Methodology II
Reference
Plane
Electric Wall used as
Discrete Port Reference
Electric Wall used as Discrete Port Reference
+ port
Center of the u-bump array is used as the reference plane (electric wall)
All signal, power and ground nets need to be terminated to maintain
return current path continuity
S-parameters
(Die 1)
S-parameters
(Interposer)
S-parameters
(Die 2)
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2.5D Link: Analysis Methodology II
IC
Interposer
PEC sheet
reference
PEC sheet
reference
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2.5D Link: Analysis Methodology III Method 2: Decoupling / Cascading approach
Reference Plane
Reference
Plane
The reference plane is selected along a
uniform section of the signal traces to
ensure TEM propagation mode.
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Excitation Port Definition Die 1
Port 1
Port 2
Port 3
Port 4
Port 5
Port 6
Port 7
Port 8
Die 2
Die 1 and Die 2 are identical
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IC: Surface Current Distribution
Coupling to surrounding (non neighboring) nets can be observed at higher frequencies
100 MHz 2 GHz
Signal Excitation Port Signal Excitation Port
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S-Parameter Results Port 5
Port 1
Port 6
FEXT
NEXT
IL
RL …
…
…
…
Port 2
Port 7
Port 3
Port 8
Port 4
For the “fewer pins” case,
only the PWR/GND pins
neighboring the signal pins
were included
Results demonstrate that
good correlation can be
achieved provided the return
current path continuity is
preserved
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3D IC Link Test Case
Signal
Signal
Die size: 1 mm x 1 mm, 250 um thickness
Tier 3 = Signal I/Os, PDN distributed between Tier 2 and Tier 1
Double Sided Silicon Interposer size: 40 mm x 40 mm, 300 um thickness
u-bump: 36 um diameter, 200 um pitch flip-chip bump: 60um diameter
TSV: 12 um diameter, 50 um height TPV: 40 um diameter, 300 um height
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3D IC Link: Analysis Methodology
Method A
Method B
Method C
Full 3D link
Center of the u-bump and flip-chip bump arrays are used for the reference plane locations
All signal, power and ground nets are terminated to maintain return current path continuity
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S-Parameter Results
Stronger coupling between
TSV’s is observed in 3D IC’s
and therefore using a
decoupling simulation strategy
provides inaccurate results
especially for cross talk. FEXT
NEXT
IL RL
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Demonstrated 3D full-wave electromagnetic analysis of a chip to
chip channel using a simple IC (few I/O’s) and Si interposer prototype
TSV’s demonstrate high levels of cross talk due to the conductive
Silicon substrate
For 2.5D applications, it is possible to decouple the IC from the
interposer and obtain accurate results up to around 20 GHz
For 3D IC applications, the strong coupling between the TSV’s in the
IC stack makes it impossible to perform a decoupled analysis
Conclusion