2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

Lithography Analysis using Virtual Access

UC Berkeley TCAD Research

2000 1998 1997 Steve Lee Toshihiro Horie Peter Chien Elmo Pittenger Timothy James Jefferey Cheng Takashi Orimoto Vinson Lee Chang Hsu Ka Chun Ng Ran Shen Rona Yang

UC Berkeley TCAD Research

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

Educational Applets Deposition and Metalization Basic Aberrations on 2D patterns

Research Applets Aberrations on 2D patterns and defects Electron Beam Simulation

Graphics Gif file output for Electron Beam Gif file output for Tempest

Link to Networking Workstations Technology for active dialog with Millennium First results for Electron Beam and Tempest

2000 1998 1997

Steve Lee Toshihiro Horie Peter Chien

Elmo Pittenger Timothy James Jefferey Cheng

Takashi Orimoto Vinson Lee Chang Hsu

Ka Chun Ng Ran Shen Rona Yang

UC Berkeley TCAD Research

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

Select aberrationsand adjust values

Submit to Splatsimulator

Select available mask patterns

Basic aberration applet Simulates 2D combinatorial aberration effects

Splat Line Intensity OutputComparison of normal and aberrated intensity plots

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

Select aberrationand adjust values

Review Splat sourcecode for reference

Select availablemask patterns

Adjust mask parameters andspecify possiblesplat output

UC Berkeley TCAD Research

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

Submit your parameters to the Sample2D simulator.

The output is plotted using DrawPlot.

• Deposition and metalization applet currently available.• Various source and profile types including user-defined profiles.• Plans for etching, lithography, and multistep processing applets.

Choose from various source types.

Choose a predefinedprofile or designyour own.

UC Berkeley TCAD Research

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

Top 20 organizations Visited by organization type

30,000 hits/month, 17,000 simulations/month, 50% simulations are SPLAT

UC Berkeley TCAD Research

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

JPEG Method:

-1s Load Time Over Ethernet

-30s Load Time Over 33.6 Modem

-Ability to save graphics

Java AWT Method:

-5m+ Load Time Over Ethernet

-20m+ Load Time Over 33.6 Modem

-Cannot save graphics

UC Berkeley TCAD Research

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

Cuervo

Java

Perl/PHP

C

Millennium

Obstacles

-Multiple Languages

-Multiple OS’s

-Syncronization

Solutions

-Use Perl/PHP to ‘glue’ process together

-Message passing between levels

UC Berkeley TCAD Research

e-Beam Timing Results

05

10152025303540

0 5 10 15 20 25

Number of Processors

Sim

ulat

ion

time

(in

min

utes

) 10 uA

20 uA

30 uA

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

User can save Gif image in local directory.User can zoom in any area on the graph.

UC Berkeley TCAD Research

2000 SRC/DARPA Annual Review - Research Network for Advanced Lithography

Enter your Univ. or Group up Here – Task 460.##UC Berkeley TCAD Research

Tempest Output

SPLAT Output

UC Berkeley TCAD Research